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CERN Document Server Znaleziono 2,030 rekordów  1 - 10następnykoniec  skocz do rekordu: Szukanie trwało 0.46 sekund. 
1.
(100)
Improved Techniques for Characterization and Optimization of SIMOX Implantation / Dolan, R ; McKenna, C ; Richards, S ; Aoki, Y ; Nakai, T ; Nakamura, S ; Walden, M
2006 - Published in : AIP Conf. Proc.: 866 (2006) , pp. 578-581 External link: Published version from AIP
In : 16th International Conference on Ion Implantation Technology, Marseilles, France, 11 - 16 Jun 2006, pp.578-581
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2.
(91)
Enhancing the Ibis $i2000^{TM}$ SIMOX Oxygen Ion Implanter / McKenna, C ; Dolan, R ; Blake, J ; Richards, S
2006 - Published in : AIP Conf. Proc.: 866 (2006) , pp. 622-625 External link: Published version from AIP
In : 16th International Conference on Ion Implantation Technology, Marseilles, France, 11 - 16 Jun 2006, pp.622-625
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3.
(24)
Ion Sources for Commercial Ion Implanter Applications / Walther, S R ; McKenna, C M ; Pedersen, B O
1991 External link: Published version from JACoW
In : 14th IEEE Particle Accelerator Conference, San Francisco, CA, USA, 6 - 9 May 1991, pp.2088
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4.
(24)
Charm physics : summary and outlook / McKenna, J A
1994 Access to fulltext document: TIF PDF;
In : 8th Meeting of the Division of Particles and Fields of the American Physical Society, v.1-2, Albuquerque, NM, USA, 2 - 6 Aug 1994, pp.608-616 - CERN library copies
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5.
(19)
Production and decay of the d(s) and d(s)% mesons in e+ e- annihilation / McKenna, J A
RX-1191-TORONTO. - 1987. - 132 p.
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6.
(16)
$\Lambda_{c}^{+}$ production in Z$^{0}$ decays / McKenna, J A (CERN)
1994 Access to fulltext document: TIF PDF;
In : 8th Meeting of the Division of Particles and Fields of the American Physical Society, v.1-2, Albuquerque, NM, USA, 2 - 6 Aug 1994, pp.581-584 - CERN library copies
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7.
(15)
Merits of CMOS/SIMOX technology for low-voltage SRAM macros / Kumagai, K ; Iwaki, H ; Yamada, T ; Nakamura, H ; Onishi, H ; Matsubara, Y ; Imai, K ; Kurosawa, S
A 128-kbit SRAM (static random access memory) macro with the 0.35 mu m FD (fully-depleted) CMOS/SIMOX (separation by implantation of oxygen) technology has been developed to demonstrate the merits of that technology for low-voltage $9 applications. Its access time at Vdd =1.5 V was comparable with that obtained with the 0.35 mu m standard bulk CMOS technology at Vdd=3.3 V, due to the combination of the small S/D capacitance and the small back-bias effect. [...]
1999 - Published in : NEC Res. Dev.: 40 (1999) , no. 3, pp. 287-91
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8.
(15)
Plasma Based X-ray Lasers Used For Opacity and Ablation Rate Measurements / Tallents, G J ; Edwards, M H ; Mistry, P ; Whittaker, D S ; Booth, N ; Huang, H ; Pert, G J ; Rus, B ; Mocek, T ; Kozlova, M et al.
2006 - Published in : AIP Conf. Proc.: 827 (2006) , pp. 353-364 External link: Published version from AIP
In : 3rd International Conference on Superstrong Fields in Plasmas, Varenna, Italy, 19 - 24 Sep 2005, pp.353-364
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9.
(15)
Pion production from deuterium by the bombardment with polarized protons of 277 and 500 MeV / Lolos, G J ; Auld, E G ; Giles, G L ; Jones, G ; McParland, B J ; Ottewell, D F ; Walden, P L ; Ziegler, W
TRI-PP-82-41. - 1982. - 12 p.
Fulltext - CERN library copies
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10.
(15)
Analyzing power of the pd --> tpi$^{+}$ reaction at 305, 330, 375 and 400 MeV / Lolos, G J ; Mathie, E L ; Jones, G ; Auld, E G ; Giles, G L ; McParland, B J ; Walden, P L ; Ziegler, W ; Falk, W R
TRI-PP-82-6. - 1982. - 12 p.
Fulltext - CERN library copies
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