Digital VLSIlayoutown
Digital VLSIlayoutown
Dr.J.Sheeba Rani
Edited for Teaching
IIST
Detailed Mask Views
Six masks
n well
– n-well
– Polysilicon
Polysilicon
– n+ diffusion
– p+ diffusion n+ Diffusion
– Contact p+ Diffusion
– Metal Contact
Metal
CMOS Inverter
Pull Up network responsible for true VDD
output
Pull down network responsible for
complementary output
A Y
GND
1: Circuits & Layout CMOS VLSI Design 4th Ed. 3
Layout
Chips are specified with set of masks
Minimum dimensions of masks determine transistor
size (and hence speed, cost, and power)
Feature size f = distance between source and drain
– Set by minimum width of polysilicon
Feature size improves 30% every 3 years or so
Normalize for feature size when describing design
rules
Express rules in terms of λ = f/2
– E.g. λ = 0.3 μm in 0.6 μm process
NWELL
P+
G -Contact cut
IN A
OUT
T
E
P Substrate not shown
N+
GND
Gate
Courtesy: https://www3.nd.edu/~kogge/courses/cse40462-VLSI-fa18/www/Public/Lectures/Design_
Rules.pdf
M2
M4
Diffusion M3
M1
N+
Contact
Cut
Metal GND
19 CMOS VLSI Design 4th Ed.
Transistor Width and length
GND GND
INV NAND3
40
32
6 tracks =
C D
Y
48 Y
D
A B C
GND
5 tracks =
40