Control of Distillation Column
Control of Distillation Column
1. material-balance control
2. product quality control
3. satisfaction of constraints
MATERIAL-BALANCE CONTROL
• The column control system must cause the average sum of the
product streams to be exactly equal to the average feed rate.
• Harbed has called this requirement that of keeping the column
in “balance.”
• The resulting adjustments in process flows must be smooth
and gradual to avoid upsetting either the column or
downstream process equipment fed by the column.
• Column holdup and overhead and bottoms inventories should
be maintained between maximum and minimum limits.
• The material-balance controls on any given column must be
consistent with the material-balance controls on adjacent
process equipment.
• In most cases material balance will be controlled by so-called
“averaging” liquid-level or pressure controls.
PRODUCT QUALITY CONTROL
• Maintain the concentration of one component in either the
overhead or bottoms at a specified value.
• Maintain the composition at the other end of the column as
close as possible to a desired composition.
• It is usually true that minimum operating cost is achieved when
the products are controlled at minimum acceptable purities.
• This is so because the relationship between thermodynamic
work of separation and purity is nonlinear.”
• For some columns compositions are allowed to vary at one
end, and sometimes both ends, to satisfy certain economic
constraints
Both material-balance and composition controls must
function satisfactorily in the face of possible
disturbances in:
• Feed flow rate
• Feed composition
• Feed thermal condition
• Steam supply pressure
• Cooling-water supply temperature
• Cooling-water header pressure
• Ambient temperature, such as that caused by rainstorms
SATISFACTION OF CONSTRAINTS
• The column shall not flood.
• Column pressure drop should be high enough to maintain
effective column operation, that is, to prevent serious weeping
or dumping
• The temperature difference in the reboiler should not exceed
the critical temperature difference.
• Column feed rate should not be so high as to overload reboiler
or condenser heat-transfer capacity.
• Boilup should not be so high that an increase will cause a
decrease in product purity at the top of the column.
• Column pressure should not exceed a maximum permissible
value.
OTHER FACETS OF COLUMN CONTROL
• Startup and Shutdown
• Transitions
• Heat Recovery
• Testing
• Miscellaneous
• operator‘s work station
• minimum maintenance.
• Avoid frequent or critical “tuning” should be avoided. The
hardware
• convenient access
DESIGNING THE CONTROL STRATEGY
• First, obtain or develop a steady-state model
– Need to know target compositions, normal flows, pressures,
the column’s temperature profile, etc.
– This gives you a snapshot of the desired operation
– A steady-state model also yields insight on the “control knobs”
• Next, pair controlled variables with manipulated variables
– Based on “Chemical Engineering” knowledge
– Utilizing information regarding key control objectives and
predicted disturbances
CONTROL CONFIGURATION
Four valves are used to
control
• flow rate of B (the
bottom product)
• temperature of V
(the boilup)
• flow rate of L (the
reflux)
• flow rate of D (the
distillate).
INPUTS AND OUTPUTS
Condenser cooling
supply, W
CONTROL CONFIGURATIONS
• Choosing the control structure is the most important step
in designing a controller for the system.
• The column pressure and reboiler and condenser levels
must be controlled very carefully to maintain stable
operation.
• The control systems for these variables are called
inventory controllers.
• This leaves two degrees of freedom to control the top and
bottom concentrations.
• Deciding the control structure then amounts to choosing
which two inputs will control the compositions.
CONTROL CONFIGURATIONS
• LV configuration
• DV configuration
LV CONFIGURATION
• Most common is called the LV
configuration
• Reflux flow rate L is used to control the
composition of the top product
• boilup temperature V is used to control
the composition of the bottom product
• Distillate flow rate D and bottom product
flow rate B are used to control the levels
of the condenser and reboiler
respectively
• Variables L and V are the ones most likely
to be used by a manual operator to
control the product compositions.
DV CONFIGURATIONS
• Distillate flow rate D is used to
control the composition of the top
product
• Boilup temperature V is used to
control the composition of the
bottom product
• Reflux flow rate L and bottom
product flow rate B are used to
control the levels of the condenser
and reboiler respectively.
BASIC FEATURES OF COPOSITION
CONTROL SCHEMES
• Adjust the spilt between distillate and bottoms
by controlling one or the other of these
streams
• Most important adjustable parameter – ratio
D/F or B/F
• Separation achieved also depends on slope of
operating line (L/V – liquid flow to vapour
flow)
BASIC FEATURES OF COPOSITION
CONTROL SCHEMES
• For a given feed the range of D/F to obtain
very high purity produts is narrow
• If F and xF are almost constant, a flow
controller can be used to regulate either D or
B
• When D is controlled with flow control,
bottoms is regulated to keep constant level in
the reboiler.
BASIC FEATURES OF COPOSITION
CONTROL SCHEMES
• When D is controlled with flow control,
bottoms is regulated to keep constant level in
the reboiler.
BASIC FEATURES OF COPOSITION
CONTROL SCHEMES
• When B is controlled with flow control,
distillate is regulated to keep constant level in
the reflux drum.
BASIC FEATURES OF COPOSITION
CONTROL SCHEMES
• Direct control of both D and B will make the
system overdetermined andwould lead to
unstable operation, as the sum of product
flow would not match the feed rate.
• Take care of material balance at each end of
the column
• Liquid flow to reboiler = B + V. Steam flow
which determines V cannot be controlled if
direct control of bottom is used
BASIC FEATURES OF COPOSITION
CONTROL SCHEMES
• Generally, the split between overhead and bottom is
adjusted automatically to maintain constant
composition of one product or constant temperature at
some point the column
• If D is more important than B, sensing element is placed
in the top section of the column and decrease in purity
is corrected by decreasing the rate of D
• If B is more important than D, sensing element is placed
in the bottom section of the column and decrease in
purity is corrected by decreasing the rate of B
BASIC FEATURES OF COPOSITION
CONTROL SCHEMES
Product flow is controlled
• Directly by control valve is place in product
line or
• Indirectly by changing reflux rate or steam
flow
CONTROL OF OVERHEAD COMPOSITION
SCHEME 1
• Direct scheme
• Signal from composition
controller is used to adjust
distillate flow D
• Reflux flow adjusted by
averaging type level controller
• Decrease in D will eventually
produce an equal increase in R
• Extra vapour would be returned
to the column without
disturbing product flow.
CONTROL OF OVERHEAD COMPOSITION
SCHEME 1
Accumulator
Keep liquid seal on the reflux
and product lines.
Provide disengaging space for
non condensibles
Large accumulators dampens
the changes in flow and
provide high purity material for
reflux
Inadequate mixing can worsen
control
CONTROL OF OVERHEAD COMPOSITION
SCHEME 1
• Nearly constant vapor flow
rate is maintained by
regulating the steam
pressure or by controlling
steam flow
• Accurate flow control is
obtained by an upstream
pressure regulator because
flow for a given orifice
pressure drop depend on
square root of upstream
density
CONTROL OF OVERHEAD COMPOSITION
SCHEME 1
• Another way of controlling
vapor flow is to control
pressure drop across the
column. Pressure drop
across plate depends on
gas velocity and liquid
depth. As liquid depth
changes only slightly with
liquid rate, pressure drop is
a satisfactory measure of
flow rate
CONTROL OF OVERHEAD COMPOSITION
SCHEME 2
• Indirect scheme
• Adjust R using composition
controller and use level
controller to adjust D
• Sensitive to upsets than
scheme 1 for very high reflux
ratios
• More sensitive to changes in
reflux temperature
• More popular than scheme 1
CONTROL OF OVERHEAD COMPOSITION
SCHEME 3
• Decrease vapor rate when overhead
purity drops
• Reflux flow is controlled at a fixed value
• Lower value of V means lower value of D
• Slower scheme – wide separation
between sensing element and controlled
flow
• If sensing element is at a location several
plates from top, faster than scheme 1 and
2 - change in vapor flow transmitted
faster than change in liquid flow
CONTROL OF OVERHEAD COMPOSITION
SCHEME 3
• Modification of scheme 3 is to
use cascade control.
• Composition controller is used
to adjust the set point of
steam controller
CONTROL OF BOTTOM COMPOSITION
• When direct control
of bottoms is used
steam flow is adjusted
by reboiler level
control
• Reflux is controlled at
constant rate and
overhead product is
adjusted by reflux
drum level controller
CONTROL OF BOTTOM COMPOSITION
• Composition controller
regulates steam flow
and level controller
adjusts bottom flow
• Reflux is controlled at
constant rate and
overhead product is
adjusted by reflux
drum level controller
CONTROL OF BOTH COMPOSITIONS
If there is variation in xF
and xD is maintained
constant, xB will change
Shift in feed composition
will decrease the separation
that is achieved.
Separation can be increased
by using higher vapour rate
and higher reflux rate
xD and xB can be controlled
by varying D/F and V/F
independently
DISTILLATION COLUMN CONTROL
Other Aspects
• Location of sensing elements
• Pressure control
• Varying feed rate
• Feed Temperature control
• Dynamic lags – liquid flow, vapour flow,
concentration
• Frequency response
• Model predictive control