Nterconnect Odeling: M.Arvind 2 M.E Microelectronics
Nterconnect Odeling: M.Arvind 2 M.E Microelectronics
M.Arvind
2nd M.E Microelectronics
OVERVIEW
Introduction to On-Chip interconnects
Modeling the parasitics
Elmore Delay Model
Repeater insertion
Min delay condition
Power Model
Optimizing Power
Introduction to On-chip
interconnects
Wires linking the transistors together
Three types of interconnects :
Local
Semi-global and
Global interconnect
Introduction to On-chip
interconnects
Can be modeled as R, RC, LC, RLC or RLGC
network.
Signal lines C, RC
Capacitance
• cw = 2 * (cg + cf * cc )
• cf is the coupling factor
Capacitance Modeling (cont)
cg1 f ( ILDT , w, )
cg 2 f ( ILDT , , s, h)
cc f (s, , h)
Simplified Capacitance Model
cg1 f ( w)
cg 2 f ( s )
cc f ( s )
Fringing Effects
Cf 1
Cf 2
Cf 0
Cf 1
Cf 1
Modeling Wire Resistance
Resistance
l
rw
A
l
h w h sq
Pros and Cons of Cu
Pros
Better electro-migration resistance
Cons
Cu atoms diffuses into SiO2
Cladding layers of TiN, Si3N4 used to prevent this
Increases the resistance
Elmore Delay Model
L 2
Delay equations
Cw
Ctotal (Cgate C p ) * N
2
Vgs Vth Vds
I leak I 0e nVt
(1 e Vt
)
Vdd
I sc I d at Vgs ,Vds 0.1Vdd
2
Wtotal Wmin * size * N
Optimizing power