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Nterconnect Odeling: M.Arvind 2 M.E Microelectronics

The document discusses modeling and optimizing on-chip interconnects. It covers: 1) Three types of interconnects and how they can be modeled as R, RC, LC, RLC or RLGC networks. Capacitance is modeled based on geometry and materials. 2) The Elmore delay model for calculating delay in RC networks. Delay grows quadratically for long wires. 3) Repeater insertion to reduce delay by breaking long wires into shorter segments. Optimal repeater size and spacing can be found by minimizing total delay. 4) Power modeling that considers dynamic, short-circuit, and leakage power. Total power can be reduced by optimizing supply voltage, repeater size
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0% found this document useful (0 votes)
64 views26 pages

Nterconnect Odeling: M.Arvind 2 M.E Microelectronics

The document discusses modeling and optimizing on-chip interconnects. It covers: 1) Three types of interconnects and how they can be modeled as R, RC, LC, RLC or RLGC networks. Capacitance is modeled based on geometry and materials. 2) The Elmore delay model for calculating delay in RC networks. Delay grows quadratically for long wires. 3) Repeater insertion to reduce delay by breaking long wires into shorter segments. Optimal repeater size and spacing can be found by minimizing total delay. 4) Power modeling that considers dynamic, short-circuit, and leakage power. Total power can be reduced by optimizing supply voltage, repeater size
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© © All Rights Reserved
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INTERCONNECT MODELING

M.Arvind
2nd M.E Microelectronics
OVERVIEW
 Introduction to On-Chip interconnects
 Modeling the parasitics
 Elmore Delay Model
 Repeater insertion
 Min delay condition
 Power Model
 Optimizing Power
Introduction to On-chip
interconnects
 Wires linking the transistors together
 Three types of interconnects :
 Local
 Semi-global and
 Global interconnect
Introduction to On-chip
interconnects
 Can be modeled as R, RC, LC, RLC or RLGC
network.

Power lines R,RL

Signal lines C, RC

Clock lines & buses RLC


Modeling a piece of wire
Capacitance Modeling

 Capacitance
• cw = 2 * (cg + cf * cc )
• cf is the coupling factor
Capacitance Modeling (cont)

 cg has 2 components: cg1, cg2

cg1  f ( ILDT , w,  )
cg 2  f ( ILDT ,  , s, h)
cc  f (s, , h)
Simplified Capacitance Model

 For a circuit designer


 ILDT, h and ε are fixed. Therefore,

cg1  f ( w)
cg 2  f ( s )
cc  f ( s )
Fringing Effects

Cf 1
Cf  2

Cf  0

Cf 1
Cf 1
Modeling Wire Resistance

 Resistance

l
rw  
A
 l  
 
h w h sq
Pros and Cons of Cu

 Pros
 Better electro-migration resistance
 Cons
 Cu atoms diffuses into SiO2
 Cladding layers of TiN, Si3N4 used to prevent this
 Increases the resistance
Elmore Delay Model

 Delay of a RC network is given by

D  R1C1  ( R1  R2 )C2  ( R1  R2  R3 )C3  ...


 ( R1  R2  ...  Rn )Cn
Delay of a long wire

 Delay grows quadratic


 Hence need repeaters
Repeater Insertion

 Repeaters are placed to reduce delay


Repeater Insertion (cont)

 Delay grows linear


Modeling the repeater

 Repeater is a large inverter (5-25μm) placed in-


between interconnect lines.
 Cgate, Cp α size of the repeater
 RT = VDD/2*Iavg, where Iavg = ∫Iddt in the interval Td
Modeling the repeater (cont)

I d  I dlin Vds  Vgs  Vth


 I dsat (1   (Vds  Vdsat ) Vds  Vgs  Vth
I dsat  I d at Vds  Vdsat  Vgs  Vth
2
W V
I dlin  eff Cox {(Vgs  Vth )Vds  } ds

L 2
Delay equations

 Delay of an interconnect segment is


Cw
D= R T * (Cw  C gate  C p )  Rw * (  Cgate )
2
 Total delay is
Cw
D tot = {R T *(Cw  Cgate  C p )  Rw *(  Cgate )}* N
2
Optimal Repeater Size and
Spacing
 The minimum delay condition
rT cwl rwl cwl
D [ {(cgate  c p ) size  }  {  c gate s}]* N
size N N 2N
D D
 0;  0;
size N
rt cw
Size 
rwcgate
rwcw
N
2rt (cgate  c p )
Power modeling

 Total power dissipated in the interconnect network


is given by
• Ptotal= Pdy + Psc + Pleak
• Pdy = Ctotal V²ddf
• Psc = Isc per μm Vdd Wtotalftt
• Pleak = Ileak per μm WtotalVdd

Where  is the switching factor, tt is the time taken


for the input to transit from Vthn to Vdd – Vthp
Power modeling (cont)

Cw
Ctotal  (Cgate  C p  ) * N
2
Vgs Vth Vds

I leak  I 0e nVt
(1  e Vt
)
Vdd
I sc  I d at Vgs  ,Vds  0.1Vdd
2
Wtotal  Wmin * size * N
Optimizing power

 Min delay does not imply min power


Techniques to Reduce Power

 Can be reduced by decreasing


 Supply voltage
 Size of repeaters
 Number of repeaters
Optimal Power Delay Tradeoff
References

 William J.Dally John W.Poulton., ”Digital Systems Engineering”


Cambridge University Press,1998

 Kaustav Banerjee et al., ”A power-optimal insertion methodology for


global interconnects in nanometer designs” IEEE TRANSACTION
ON ELECTRON DEVICES, VOL. 49, NO. 11, NOVEMBER 2002

 Kaustav Banerjee et al., ”A global interconnect optimization scheme


for nanometer scale VLSI with implications for latency, bandwidth,
and power dissipation” IEEE TRANSACTION ON ELECTRON
DEVICES. VOL. 51, NO.2, FEBRUARY 2004.
Thank You

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