PYL102 Semiconductor Practice Prob
PYL102 Semiconductor Practice Prob
MATERIALS
Practice Problems
1. The effective mass of the hole is five times the effective mass of an electron. Calculate
the Fermi level position of a semiconductor with a bandgap of 0.7eV at room
temperature.
2. Relation between bandgap and temperature for Si is given by
4. Using general equation for p, show that (dp/dE) is maximum in the valence band at Ev
– E = (kBT)/2.
5. The mobilities of electrons and holes in intrinsic Ge are 0.39 and 0.19 m2/V-s
respectively. Determine the intrinsic carrier concentration and conductivity of Ge at
300 K if the band gap of Ge is 0.67 eV and the effective masses of electrons and holes
are 0.55m0 and 0.37m0 respectively, m0 being the electronic rest mass. How many
dopants must be added per cubic metre of Ge to increase its conductivity by a factor of
104?
8. Calculate the temperatures at which p-n junctions made with Si, Ge and GaN will lose
their rectifying characteristics.
Assume that, in all cases the acceptor and the donor concentration: Na = Nd = 1014 cm−3,
Eg are independent of the temperature and are 1.12, 0.66 and 3.44 eV for Si, Ge and
GaN, respectively.
Intrinsic carrier concentrations at room temperature are niGe = 2 × 1013, niSi = 1010, and
niGaN = 10−9 cm−3. The effective mass of the electron and holes for the three materials
are: (mn*= 1.18m0, mp*= 0.59m0) for Si, (mn*= 0.57m0, mp*= 0.37m0) for Ge and (mn*=
0.22m0, mp*= 0.61m0) for GaN, where m0 is the rest mass.
11. Find the built-in potential for a p-n Si junction at room temperature if the bulk
resistivity of Si is 5.5 Ω cm. Electron mobility in Si at RT is 1100 cm 2/Vs; µn/µp
= 3.1; ni = 1.4 × 1010 cm−3. Consider, at room temperature all donors and acceptors
are ionized.
Calculate the total depletion-layer width for applied bias voltages V = −5 V, 0,
and +0.1 V. Consider Si = 11.9.
12. A hole diffusion current of 7 mA is injected into an n-type silicon device of
cross-section 1 mm2 and the excess hole concentration falls off exponentially with
distance from the injecting contact. If the diffusion coefficient is 1.15 x 10-3 m2/s
and 0.3 mm from the contact the excess hole concentration is 23% of that at the
contact, calculate the excess hole concentration at the contact.