Micro Injection Molded Microtopographic Polymer Plates Used To Mechanically Direct Stem Cell Activity
Micro Injection Molded Microtopographic Polymer Plates Used To Mechanically Direct Stem Cell Activity
chosen as the stiffness reduction geometry. According to the Table 1: DRIE Conditions used to create microchannels.
Euler-Bernoulli beam bending approximation, the deflection Plasma flow time Source
Cycles
Processing
Type (SCCM) /cycle (s) Power (W) time
is given by:
SF6 125 3 1200 34 2 m 50 s
C4 F8 100 2 1200
υ = 64FL3 / 3πED4 (2) C4 F8 150 20 1500 1 20 s
F is a force applied at the tip of the beam, L is the length of square window present in the aluminum insert. A 0.02’’
the beam, E is the bulk modulus of the material, and D is the thick layer of PTFE was positioned between the wafer and
diameter of the pillar. It is hypothesized that if the cell wafer backing to dampen the impact load of the polymer
comes into contact with the deflecting micropillars (instead during molding. A 0.01’’ thick PTFE gasket was fixed in
of bulk PS) that the mechanical perception of the substrate front of the wafer to provide a mechanical buffer between
from a cellular processing perspective will be a more aluminum and silicon, and to seal off the cavity. The main
compliant substrate. mold cavity includes a sprue, cold slug well, short runner,
The current study focuses on the manufacturability of such and fan gate. The type of gate was chosen to provide a
stiffness reducing microfeatured substrates, and specifically uniform flow front across the part and presumably impart an
the filling behavior of a micro injection molded network of equal filling of microcavities. The resultant macroscale
polystyrene pillars. molded part was a plate with a raised platform containing the
microtopography (Fig. 3). Two cartridge heaters on either
side of the mold which were used to heat the assembly,
EXPERIMENTAL combined with wire thermocouples, provided a closed-loop
feedback control to maintain specific mold temperatures
A. UV PHOTOLITHOGRAPHY throughout the molding process.
A 1564 Å thick layer of silicon dioxide was deposited onto C. MICRO INJECTION MOLDING
the surface of a P-type Crysteco 3 inch silicon wafer with a
Micro injection molding trials were conducted with a 3 ton 2
thickness of 509 ± 26 μm. OCG 825 positive photoresist was
stage injection unit micro injection molding machine (Nissei
spin coated at 5,000 rpms for 40 s onto the wafer, yielding a
AU3E). The polymer molded was general purpose
layer of 9000 Å. A photolithography mask containing
polystyrene (666D, Americas StyrenicsLLC).
transparent holes orthogonally arrayed with a diameter of 2
μm and spacing of 3 and 4 μm was placed over top of the The polymer has a melt flow rate of 8 g/10 min (200 oC / 5
coated wafer, and UV exposure was applied using a Karl kg; D-1238), elastic modulus of 3,000 ± 34 MPa, and Vicat
Suss MJB3 mask aligner at a power of 25 W for 1.4 s. The Softening Temperature of 99 oC. Polystyrene was chosen
wafer was immersed in an OCG 809 solution for 20 s due to its widespread use as a cell culture platform in the
(photoresist developer), and rinsed with water, leaving laboratory. A study on the effect of lower mold
regions of exposed silicon dioxide (SiO2). To remove the temperatures (<Tg) was executed to analyze the progression
SiO2 and expose silicon in preparation for etching, the wafer of the melt flow into microchannels (trial 1).
was submerged in buffered HF for a period of 7 min.
The Bosch process was used, in which activation and A
passivation gases were plasma polymerized for a prescribed
number of cycles. The etching conditions are shown in Table
1. Each cycle consisted of a 3 s period of sulfur hexafluoride
(SF6), which etches isotropically, and a 2 s period of
octafluorocyclobutane (C4F8), which provides a protective
coating to the sidewalls of the microchannel (allowing for a
net anisotropic feature). The wafer was then immersed in
photoresist stripper to reveal bare silicon. A final deposition
of C4F8 was applied as an anti-stiction agent. Fig. 1b shows a B
schematic of the etched profile that is created from the
process.
B. MOLD ASSEMBLY
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8th ICOMM, March 25-28, 2013
A B C
Fig. 2: Full mold assembly schematic. The red rods are wire
thermocouples.
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8th ICOMM, March 25-28, 2013
A B
Fig. 5: Trial 1 near gate of Tmold = 65.6 oC (A) vs. Tmold = 76.7 oC
at identical flow rate of 7.54 cm3/s.
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8th ICOMM, March 25-28, 2013
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8th ICOMM, March 25-28, 2013
μm)
Fig. 12: Pillar heights along the part for different flow rates
at a mold temperature of 104.4 oC.
Fig. 9: Micrographs of 9 regions of PS molded with flow rate of
2.01 cm3/s.
case that the flow path narrows as the polymer is
Molecular effects have also been suggested as a cause for filling.Consequently, a local microscale flow regime can
increased elastic modulus with decreasing scale [13]. occur, in which the solidified polymer essentially functions
For the pillars with the highest replication, the tip concavity as a part of the mold cavity. Resultantly, the microscale flow
is relatively reduced. The presence of taller pillars indicate phenomenon of lower viscosity towards the middle of the
that the flow length inside of the microchannel increased. As channel could provide enhanced filling capacity away from
the polymer flows through the channel, it is most likely the the wall and thus decrease the concave features present on
the lesser filled microchannels.
One consideration previously mentioned is the need for a
taper on negative tooling (i.e., positive featured parts). The
scallops present on the sidewalls of the silicon tooling are
seen as witness marks on the sides of the pillars. There also
appears to be a slight stretching of the pillars occurring in
response the interaction between the pillars and silicon
scallops (Fig. 13).
CONCLUSION
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8th ICOMM, March 25-28, 2013
REFERENCES
A
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