0% found this document useful (0 votes)
28 views2 pages

B.tech ECE14

SD PYQ

Uploaded by

ffshivam62
Copyright
© © All Rights Reserved
We take content rights seriously. If you suspect this is your content, claim it here.
Available Formats
Download as PDF or read online on Scribd
0% found this document useful (0 votes)
28 views2 pages

B.tech ECE14

SD PYQ

Uploaded by

ffshivam62
Copyright
© © All Rights Reserved
We take content rights seriously. If you suspect this is your content, claim it here.
Available Formats
Download as PDF or read online on Scribd
You are on page 1/ 2
hal No... otal Pages : 3 008301 December 2023 B.Tech. (ECE) III SEMESTER Electronic Devices (EC-301) ‘Time : 3 Hours] (Max, Marks : 75, Instructions 1. Itis compulsory to answer all the questions (1.S marks each) of Part-A in shor. 2, Answer any four questions from Part-B in detail, Each question maximum marks is 15 4. Different sub-parts of a question are to be attempted ‘adjacent to each other PART-A 1, (@) Why extrinsic semiconductors are preferred for fabrications of devices? as) (©) Write the equation for the net current in a semiconductor. What is the physical significance of ‘each term? as (©) What type of capacitances associated with PN Junction Diodes? as) (@ Find the location of Fermi energy level for and extrinsic type of semiconductors, as) 008901/2701111/188, Pro. (©) Compare the IV Characteristics of PN Junction diode for Ge and Si based diode. as) (Plot the Common base transistor input and output characteristics for BIT: as (g) What is the input resistance of MOSFET? (1.5) (1) Define the term electrical base width. as) (Explain upon what four parameters does the contact ifference of potential depend? as) @ Compare the properties of Si and Ge material for various parameters in tabular form. as) PART-B 2, What are the four advantages of Integrated circuits? And [Explain the five basic processes involved in te fabrication of an integrated circuit (IC), assuming you already have 2 substrate. as) 3. (@) Explain the breakdown mechanism in junction diodes in detail, @) (B) Derive the Generalized transistor equations for PNP transistor, o 4. (@)_AGe sample is doped with phosphorus to the extent ‘of [atom per 10* atoms. Assume that the effective ‘mass of electron (m,) is half of its true mass. Find the location of Fermi level. Repeat part (a) ifthe doping is 1 per 10° atoms. ® (008301/270/111/188 2 a (©) How does the transition capacitance C, vary with the depletion layer width? o (@) With the applied reverse voltage? (b) What is the order of magnitude of C, (@) Discuss and plot the open circuited p-n Junction diode characteristics. ® (©) Discuss and plot the p-n-p transistor characteristics {in open circuited condition and in active mode of ‘operation ofthe transistor. Diagrams must be properly, sketched. @ ‘Consider a step graded junction p-n junction with doping. profile N,> N,, Then drive a mathematical relationship for ‘charge density, field intensity and potential as fumetion ‘of distance from the junction for reverse bias. (15) Explain construction and working of n-channel enhance- ‘ment type MOSFET in detail, Plot its small signal ‘equivalent model when operating in saturation region. as) (008301/270/111/188 3

You might also like