Chemical Synthesis of Nanomaterial

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CHEMICAL SYNTHESIS

OF NANOMATERIAL
By
Easha Iftikhar
M.Anas Liaquait
Saba Rasheed
Ayesha Waheed
Contents
Nanomaterial
Synthesis
Chemical methods
Mechanism
Advantages
Disadvantages
Application
Conclusion
Nanomaterial
Material whose one dimension is in the range of 1 to
100nm.
Nanomaterial Synthesis
Chemical synthesis
The synthesis of nanoparticles using chemical methods is based
on fundamental chemical reactions.

Chemical
methods

Sol-gel CVD

Spray
pyrolysis
Sol-Gel Method
Bottom up synthesis method.
 In this process, the final products are formed by
performing a number of irreversible chemical
reactions.
Sol is colloidal
Gel is semi-rigid mass that form when the solvent
from sol begins to evaporate and ions or particles
left behind begin to join together in continuous
form.
Precursors
these colloids precursors consist of metal or
metalloid elements surrounded by various reactive
ligands.
Process
Steps
Hydrolysis
The primary homogeneous molecules (sol) become an
infinite, heavy, three-dimensional molecule called a gel.
The conversion of tuberculosis to gel is done through a
process called “compaction process” and leads to the
production of wet gel.
Condensation
 The conversion of sol to gel is usually done by changing the
pH or changing the concentration of the solution
Steps
Aging and Drying
After drying the gel, due to volumetric shrinkage, a solid and
rigid structure is obtained.
by controlling the drying conditions of the gel, it is possible to
achieve nano sized porosity.
Aerogel
the first stage or the gel-making stage, the solvent penetrates the
gel and in the next stage the solvent is removed or dried.
Xylogels
Xylogels are substances that have dried under normal
conditions
Cryogel.
 The liquid inside the gel is first frozen and then dried by
sublimation
Advantages
Simplicity of the process
Preparation of high purity products;
Very high production efficiency
Synthesis of uniform compounds in the form of composite
oxides
Disadvantages
The cost of the raw materials (the chemicals) may be high.
There is often a large volume shrinkage and cracking during
drying
Application
 inorganic membranes
 monolithic glasses and ceramics,
thin films, and ultra-fine powders
• Reference
• Dmitry Bokov, Abduladheem Turki Jalil, Supat Chupradit, Wanich
Suksatan, Mohammad Javed Ansari, Iman H. Shewael, Gabdrakhman H.
Valiev, Ehsan Kianfar
• https://doi.org/10.1155/2021/5102014
Chemical vapour deposition
Bottom up Approach
This process is often used in the semiconductor
industry to produce high-purity, high-
performance thin films.
Background
CVD involves the dissociation and/or
chemical reactions of gaseous reactants in an
activated (heat, light, plasma)
Patent literature by de Lodyguine in 1893 on
the deposition of W onto carbon lamp
filaments through the reduction of WCl6 by
H2 lead to the industrial exploitation of CVD
Process
In a typical CVD process, the substrate is exposed
to volatile precursors, which react and/or
decompose on the substrate surface to produce the
desired film.
Frequently, volatile by products that are produced
are removed by gas flow through the reaction
chamber.
Conti..
Conti..
To avoid undesired chemical reaction the substrate
surface temperature, deposition ,time pressure and type
of surface carefully selected.
Principal
CVD involve the formation of nanomaterial from the
gas phase at elevated temperature usually onto solid
surface
Key factors in CVD
Substrate material
Substrate temperature
Composition of reaction gas mixture
Types
Advantages
Versatile –any element or compound can be deposited.
 High purity can be obtained
High density – nearly 100% of theoretical value
 CVD films are harder than similar materials produced using
conventional ceramic fabrication processes.
 Material formation well below the melting point
Economical in production, since many parts can be coated at the
same time
Disadvantages
High deposition temperatures (often greater than 600 °C) are
often unsuitable for structures already fabricated on substrates
Chemical and safety hazards caused by the use of toxic,
corrosive, flammable and/or explosive precursor
Applications
Coatings for a variety of applications such as wear resistance,
corrosion resistance, high temperature protection.
Used in the microelectronics industry to make films serving as
dielectrics, conductors, passivation layers, oxidation barriers,
and epitaxial layers.
References
• https://www.researchgate.net/publication/259118068
Spray pyrolysis
 In spray pyrolysis, the source is deposited to the substrate in
droplets of liquid sprayed onto the surface of the substrate to
form a coating.
The substrate is heated to about 350-500o C, which results to
film formation.
Spray pyrolysis is a process that atomizes a precursor solution
with the help of a spray nozzle, and heats the droplets to form
solid particles on the substrate
The liquid that is sprayed is made of the material diluted in either
water or alcohol, or both.
Setup
Procedure
The distance between spray gum and substance was adjusted to
cover the entire substrate.
Make precursor solution for the required thin film.
 Example ; zinc acetate as precursors solution for zinc
The precursor was dissolved in distilled water and acetic acid in
order to make solution transparent by dissolving the minor
precipitate.
The acetic acid is in avoiding the formation of hydroxides
The heating of substrate was performed using a heating plate
with electric wires
The vapour of solution is spray on glass.
Advantages
low-cost setup
simple, rapid film growth rates
the potential for mass production
reproducibility of the films
Disadvantages
 Spray pyrolysis requires precise control over
several parameters, including temperature,
spray rate, and precursor concentration
Applications
Spray pyrolysis is a highly applicable, facile, and effective
strategy to synthesize different functional nanostructures with
tunable pore size and surface chemistry.
Reference

https://www.researchgate.net/publication/259118068
Hydrothermal method
The reacts are dissolved in water or another solvent in closed
vessel.
Hydrothermal synthesis can be defined as a method of synthesis
of single crystals that depends on the solubility of minerals in
hot water under high pressure.
Process
The process is referred to as hydrothermal because in this
method water is used as solvent
Its is also refer to heterogeneous reaction for synthesizing in
organic material in aqueous media above ambient temperature.
Aqueous mixture of precursor is heated and sealed in stainless
steel autoclave
Above boiling point of water and consequently the pressure
within the reaction autoclave is dramatically increased above
atmosphere
This effect of high temperature and pressure provide one step
process to produce highly crystalline material.
Advantages
Disadvantages
The need for expensive autoclaves and the difficulty of
observing the crystal as it grows.
Application
to grow synthetic quartz, and other single crystals with
commercial value.
Reference
• https://www.researchgate.net/publication/259118068
Conclusion
These all methods are used for the synthesis of nanomaterial
They also have advantages some disadvantages.
And they have ,any applications that are used for various
functions.

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