HW6 Solution 2022
HW6 Solution 2022
ANS)
Problem 2. (10 points)
Repeat Problem 1, taking NA=1017 /cm3 to be the p-side doping. Briefly compare the
results here with those of Problem 1.
ANS)
Problem 3. (10 points)
A pn junction diode has the doping profile sketched as follows. Mathematically, ND-NA =
N0[1-exp(-ax)], where N0 and a are constants. (a) Give a concise statement of the depletion
approximation. (b) Invoking the depletion approximation, make a sketch of the charge
density inside the diode. (c) Establish an expression for the electric field E(x), inside the
depletion region.
ANS)
Problem 4. (10 points)
A pn junction diode has the doping profile sketched as follows. Make the assumption that
xn > x0. (a) What is the built-in potential across the junction? (b) Invoking the depletion
approximation, sketch the charge density versus distance inside the diode. (c) Obtain an
analytical solution for the electric field, E(x), inside the depletion region.
ANS)
(a)
(b)
(c)
Problem 5. Modified Textbook Problem 7.12 (10 points)
An “isotype” step junction is one in which the same impurity type doping changes from
one concentration value to another value. An p-p isotype doping profile is shown as follows
(a) Sketch the thermal equilibrium energy-band diagram of the isotype junction. (b)
Determine the built-in potential barrier. (c) Make rough sketches of the potential, electric
field, and charge density inside the junction.
ANS)
a)
b)
For Nd =1016 cm-3,
𝑁𝑎 1016
𝐸𝐹𝑖 − 𝐸𝐹 = 𝑘𝑇𝑙𝑛 ( ) = (0.0259)𝑙𝑛 ( )
𝑛𝑖 1.5 × 1010
𝑜𝑟
𝐸𝐹𝑖 − 𝐸𝐹 = 0.3473 𝑒𝑉
For Nd =1015 cm-3,
1015
𝐸𝐹𝑖 − 𝐸𝐹 = (0.0259)𝑙𝑛 ( )
1.5 × 1010
𝑜𝑟
𝐸𝐹𝑖 − 𝐸𝐹 = 0.2877 𝑒𝑉
Then,
𝑉𝑏𝑖 = 0.34732 − 0.28768
𝑜𝑟
𝑉𝑏𝑖 = 0.0596 𝑉
c)
Charge density distribution:
-qNA
(x)
Electrostatic potential:
Vbi
x
Problem 6. Textbook Problem 7.16 (10 points)
An abrupt silicon pn junction at T = 300 K has impurity doping concentrations of Na = 5
1016 cm-3 and Nd = 1015 cm-3. Calculate (a) Vbi, (b) W at (i) VR = 0 and (ii) VR = 5 V,
and (c) |Emax| at (i) VR = 0 and (ii) VR = 5V.
ANS)
a)
(5 × 1016 )(1015 )
𝑉𝑏𝑖 = (0.0259)𝑙𝑛 [ ] = 0.6767V
(1.5 × 1010 )2
b)
2 ∈𝑠 (𝑉𝑏𝑖 + 𝑉𝑅 ) 𝑁𝑎 + 𝑁𝑑 1/2
W= { ( )}
𝑒 𝑁𝑎 𝑁𝑑
(i) For VR=0,
1/2
2(11.7)(8.85 × 10−14 )(0.6767) 5 × 1016 + 1015
W= { × [ ]}
1.6 × 10−19 (5 × 1016 )(1015 )
= 9.452 × 10−5 𝑐𝑚
𝑜𝑟
𝑊 = 0.9452 𝜇𝑚
c)
2(𝑉𝑏𝑖 + 𝑉𝑅 )
|𝐸𝑚𝑎𝑥 | =
𝑊
(i) For VR=0,
2(0.6767)
|𝐸𝑚𝑎𝑥 | = −4
= 1.43 × 104 𝑉/𝑐𝑚
0.9452 × 10
ANS)
(a)
2 ∈𝑠 (𝑉𝑏𝑖𝐴 + 𝑉𝑅 ) 𝑁𝑎 + 𝑁𝑑𝐴 1/2
𝑊(𝐴) { ( 𝑁 𝑁 )}
𝑒 𝑎 𝑑𝐴
=
𝑊(𝐵) 2 ∈𝑠 (𝑉𝑏𝑖𝐵 + 𝑉𝑅 ) 𝑁𝑎 + 𝑁𝑑𝐴 1/2
{ ( 𝑁 𝑁 )}
𝑒 𝑎 𝑑𝐵
𝑜𝑟
𝑊(𝐴) (𝑉𝑏𝑖𝐴 + 𝑉𝑅 ) (𝑁𝑎 + 𝑁𝑑𝐴 ) 𝑁𝑑𝐵 1/2
=[ ( )]
𝑊(𝐵) (𝑉𝑏𝑖𝐵 + 𝑉𝑅 ) (𝑁𝑎 + 𝑁𝑑𝐵 ) 𝑁𝑑𝐴
We find
(1018 )(1015 )
𝑉𝑏𝑖𝐴 = (0.0259)𝑙𝑛 [ ] = 0.7543V
(1.5 × 1010 )2
(1018 )(1016 )
𝑉𝑏𝑖𝐵 = (0.0259)𝑙𝑛 [ ] = 0.8139V
(1.5 × 1010 )2
We find
1/2
𝑊(𝐴) 5.7543 1018 + 1015 1016
= [( ) ( 18 ) × ( )]
𝑊(𝐵) 5.8139 10 + 1016 1015
𝑜𝑟
𝑊(𝐴)
= 3.13
𝑊(𝐵)
(b)
2(𝑉𝑏𝑖𝐴 + 𝑉𝑅 )
𝐸(𝐴) 𝑊(𝐴) 𝑊(𝐵) 𝑉𝑏𝑖𝐴 + 𝑉𝑅 1 5.7543
= = ∙ =( )( )
𝐸(𝐵) 2(𝑉𝑏𝑖𝐵 + 𝑉𝑅 ) 𝑊(𝐴) 𝑉𝑏𝑖𝐵 + 𝑉𝑅 3.13 5.8139
𝑊(𝐵)
𝑜𝑟
𝐸(𝐴)
= 0.316
𝐸(𝐵)
(c)
1/2
∈𝑠 𝑁𝑎 𝑁𝑑𝐴
𝐶′𝑗 (𝐴) [ ] 𝑁𝑑𝐴 𝑉𝑏𝑖𝐵 + 𝑉𝑅 𝑁𝑎 + 𝑁𝑑𝐵 1/2
2(𝑉𝑏𝑖𝐴 + 𝑉𝑅 )(𝑁𝑎 + 𝑁𝑑𝐴 )
= 1/2
= [( )( )( )]
𝐶′𝑗 (𝐵) ∈𝑠 𝑁𝑎 𝑁𝑑𝐵 𝑁𝑑𝐵 𝑉𝑏𝑖𝐴 + 𝑉𝑅 𝑁𝑎 + 𝑁𝑑𝐴
[ ]
2(𝑉𝑏𝑖𝐵 + 𝑉𝑅 )(𝑁𝑎 + 𝑁𝑑𝐵 )
1/2
1015 5.8139 1018 + 1016
= [( 16 ) ( )( )]
10 5.7543 1018 + 1015
𝑜𝑟
𝐶′𝑗 (𝐴)
= 0.319
𝐶′𝑗 (𝐵)
ANS)
An n+p junction with Na = 1014 cm-3,
(a)
A one-sided junction and assume VR >> Vbi.
Then,
2 ∈𝑠 𝑉𝑅 1/2
𝑥𝑝 ≅ [ ]
𝑒𝑁𝑎
𝑜𝑟
−4 2
2(11.7)(8.85 × 10−14 )𝑉𝑅
(50 × 10 ) =
(1.6 × 10−19 )(1014 )
which yields
𝑉𝑅 = 193 𝑉
(b)
𝑥𝑝 𝑁𝑑 𝑁𝑎
= ⟹ 𝑥𝑛 = 𝑥𝑝 ( )
𝑥𝑛 𝑁𝑎 𝑁𝑑
so
−4 )
1014
𝑥𝑛 = (50 × 10 ( 16 ) = 0.50 × 10−4 𝑐𝑚 = 0.50𝜇𝑚
10
(c)
2𝑉𝑅 2(193.15)
|𝐸𝑚𝑎𝑥 | ≅ =
𝑊 50.5 × 10−4
𝑜𝑟
|𝐸𝑚𝑎𝑥 | = 7.65 × 104 𝑉/𝑐𝑚
ANS)
(a)
From Equation (7.36),
1/2
2𝑒(𝑉𝑏𝑖 + 𝑉𝑅 ) 𝑁𝑎 𝑁𝑑
|𝐸𝑚𝑎𝑥 | = { ( )}
∈𝑠 𝑁𝑎 + 𝑁𝑑
Set |𝐸𝑚𝑎𝑥 | = Ecrit and VR = VB
(2 × 1016 )(2 × 1016 )
𝑉𝑏𝑖 = (0.0259)𝑙𝑛 [ ] = 0.7305 V
(1.5 × 1010 )2
Then
1
5
2(1.6 × 10−19 )(𝑉𝑏𝑖 + 𝑉𝑅 ) (5 × 1015 )(5 × 1015 ) 2
4 × 10 = { ×[ ]} ⇒ 𝑉𝑏𝑖 + 𝑉𝑅 = 207.1
(11.7)(8.85 × 10−14 ) 5 × 1015 + 5 × 1015
So 𝑉𝑅 ≅ 206 V
Problem 10. Modified from Textbook Problem 7.34 (10 points)
A silicon PIN junction has the doping profile shown in Figure P7.34. The “I” corresponds
to an ideal intrinsic region in which there is no impurity doping concentration. (a) Draw
charge, E-field and potential briefly. (b) Determine Vbi, 𝑥𝑝 , 𝑥𝑛 , 𝐸𝑚𝑎𝑥 .
ANS)
(a)
(b)
𝑘𝑇 𝑁𝑎 𝑁𝑑 (5 × 1015 )(5 × 1015 )
𝑉𝑏𝑖 = 𝑙𝑛 ( 2 ) = (0.0259)𝑙𝑛 [ ]
𝑞 𝑛𝑖 (1.5 × 1010 )2
𝑜𝑟
𝑉𝑏𝑖 = 0.66𝑉
𝑤𝑛 𝑁𝑑 = 𝑤𝑝 𝑁𝑎 … (2)
𝑞 1.6 × 10−19 𝐶
𝐸𝑚𝑎𝑥 = 𝑁𝑑 𝑤𝑛 = × (5 × 1015 )𝑐𝑚−3 × 4.2 × 10−6 𝑐𝑚
𝜀𝑠 11.7 × 8.854 × 10−14 𝐹/𝑐𝑚
= 3.24 × 103 𝑉/𝑐𝑚