Application of Optimization Methods For Improved Electrical Metrology
Application of Optimization Methods For Improved Electrical Metrology
ISSN: 2221‐870X
November 2016, Volume 5, Number 3, 9‐15
ABSTRACT
In electrical quantities metrology numerous examples of stochastic processes exist and a need for optimal solutions is posed. Here
stochastic genetic algorithm optimization is used for solving two typical metrological problems: 1) minimization of the metrological
parameters (final accuracy) in the design process of instruments and 2) predicting metrological reference standard’s time‐drift, i.e. re‐
calibration interval. The first case is the optimal metrological design of a combined instrument transformer and the second case is the
analysis of resistance standard time‐drift.
Figure. 7. Genetic algorithm changes through the generations of the VMC Figure. 11. Genetic algorithm changes through the generations of the CMC
secondary winding resistance per turn. primary winding leakage reactance per turn.
Figure. 8. Genetic algorithm changes through the generations of the CMC Figure. 12. Genetic algorithm changes through the generations of the CMC
secondary winding resistance per turn. secondary winding leakage reactance per turn.