Module 1
Module 1
MODULE 1
Dr. Shashank M Gowda
Associate Professor,
Department of ECE, YIT, Moodbidri
Introduction
◼ It all started in 1958
◼ First IC with 2 transistors at Texas Instruments.
◼ Flip-Flop by Jack Kilby- Nobel Prize for IC in 2000
◼ As on 2023
◼ 134 billion transistors in Apple Microprocessor
◼ 153 billion transistors in AMD’s GPU
◼ TSMC's 5 nm semiconductor manufacturing process.
1 billion is equivalent to 100 crores
◼ Reason
◼ As transistors became smaller
◼ They became faster Became Cheaper to Manufacture
◼ Dissipate less power Consumed Less Power
Introduction
◼ First was point contact transistor.
◼ Bipolar Junction Transistor
◼ Reliable, less noisy, and more power efficient
◼ Power dissipated by the base currents was more even when the
device is not switching
◼ Field Effect Transistor’s
◼ MOSFET’s found its way in 1960’s.
◼ Zero Control current in idle state.
▪ Types- nMOS and pMOS
◼ CMOS Logic
◼ Complementary MOS
◼ nMOS Logic Gates- Intel’s nMOS technology
A Brief History
Invention of the Transistor
◼ Vacuum tubes ruled in first half of 20th century
◼ Large, Expensive, Power- hungry, Unreliable.
◼ 1947: First point contact transistor (3 terminal devices)
◼ Shockley, Bardeen and Brattain at Bell Labs
A Brief History
Kilby’s IC
A Brief History
◼ First Planer IC built in 1961
◼ 2003
◼ Intel Pentium 4 processor (55 million transistors)
◼ 512 Mbit DRAM (> 0.5 billion transistors)
◼ 53% compound annual growth rate over 45 years
◼ No other technology has grown so fast so long
◼ Driven by miniaturization of transistors
◼ Smaller is cheaper, faster, lower in power!
◼ Revolutionary effects on society
MOS Integrated Circuits
❑ 1970’s processes usually had only nMOS transistors
Inexpensive, but consume power while idle
❑ 1980s-present: CMOS processes for low idle power
→Performance Requirements.
Si Si Si
Si Si Si
Si Si Si
Dopants
◼ Silicon is a semiconductor at room temperature
◼ Pure silicon has few free carriers and conducts poorly
◼ Adding dopants increases the conductivity drastically
◼ Dopant from Group V (e.g. As, P): extra electron (n-type)
◼ Dopant from Group III (e.g. B, Al): missing electron, called
hole (p-type)
Si Si Si Si Si Si
- +
+ -
Si As Si Si B Si
Si Si Si Si Si Si
p-n Junctions
◼ First semiconductor (two terminal) devices
◼ A junction between p-type and n-type
semiconductor forms a diode.
◼ Current flows only in one direction
p-type n-type
anode cathode
Transistor Types
◼ Bipolar transistors
◼ npn or pnp silicon structure
◼ Small current into very thin base layer controls large
currents between emitter and collector
◼ Base currents limit integration density
n+ n+ p+ p+
p bulk Si n bulk Si
NMOS PMOS
NMOS Operation
◼ Body is commonly tied to ground (0 V)
◼ Drain is at a higher voltage than Source
◼ When the gate is at a low voltage:
◼ P-type body is at low voltage
◼ Source-body and drain-body “diodes” are OFF
◼ No current flows, transistor is OFF
Source Gate Drain
Polysilicon
SiO2
0
n+ n+
S D
p bulk Si
NMOS Operation Cont.
◼ When the gate is at a high voltage: Positive charge
on gate of MOS capacitor
◼ Negative charge is attracted to body under the gate
◼ Inverts a channel under gate to “n-type” (N-channel, hence
called the NMOS) if the gate voltage is above a threshold
voltage (VT)
◼ Now current can flow through “n-type” silicon from source
through channel to drain, transistor is ON
Source Gate Drain
Polysilicon
SiO2
1
n+ n+
S D
p bulk Si
PMOS Transistor
◼ Similar, but doping and voltages reversed
◼ Body tied to high voltage (VDD)
◼ Drain is at a lower voltage than the Source
◼ Gate low: transistor ON
◼ Gate high: transistor OFF
◼ Bubble indicates inverted behavior
Source Gate Drain
Polysilicon
SiO 2
p+ p+
n bulk Si
Power Supply Voltage
◼ GND = 0 V
◼ In 1980’s, VDD = 5V
d d d
nMOS g OFF
ON
s s s
d d d
pMOS g OFF
ON
s s s
CMOS Logic
→ A static CMOS gate has
→ An nMOS pull-down network to connect the output to 0 (GND)
→ An pMOS pull-up network to connect the output to 1 (VDD)
CMOS Logic
→ When both pull-up and pull-down are OFF, the highimpedance or floating Z
output state results.
→ This is of importance in multiplexers, memory elements, and tristate bus
drivers.
→ The crowbarred (or contention) X level exists when both pull-up and pull-
down are simultaneously turned ON.
→ Contention between the two networks results in an indeterminate output level
and dissipates static power.
→ It is usually an unwanted condition.
CMOS Logic
Connection and behavior of series and parallel transistors
CMOS Logic
Connection and behavior of series and parallel transistors
CMOS Inverter
A Y
0
1
A Y
CMOS Inverter
A Y VDD
0
1
A Y
A Y
GND
CMOS Inverter
A Y VDD
0
1
A Y
A Y
GND
CMOS Inverter
A Y VDD
0
1 0 OFF
A=1 Y=0
ON Y is pulled low by the
turned on NMOS
Device. Hence
A Y NMOS is the pull-
down device.
GND
BACK
CMOS Inverter
A=0 Y=1
OFF
A Y
GND
CMOS NAND Gate
A B Y
0 0
0 1
1 0
1 1
CMOS NAND Gate
A B Y
0 0 1
0 1 1 Y
1 0 1 A
1 1 0
B
CMOS NAND Gate
A B Y
0 0 1 ON ON
0 1 Y=1
1 0
A=0 OFF
1 1
B=0 OFF
CMOS NAND Gate
A B Y
0 0 1 OFF ON
0 1 1 Y=1
1 0
A=0 OFF
1 1
B=1 ON
CMOS NAND Gate
A B Y
0 0 1 ON OFF
0 1 1 Y=1
1 0 1
A=1 ON
1 1
B=0 OFF
CMOS NAND Gate
A B Y
0 0 1 OFF OFF
0 1 1 Y=0
1 0 1
A=1 ON
1 1 0
B=1 ON
CMOS NAND Gate
CMOS NOR Gate
A B Y
0 0 1
0 1 0
1 0 0
1 1 0
CMOS NOR Gate
A B Y
0 0 1 A
0 1 0
1 0 0 B
1 1 0 Y
3-input NAND Gate
◼ Y is pulled low if ALL inputs are 1
◼ Y is pulled high if ANY input is 0
3-input NAND Gate
◼ Y is pulled low if ALL inputs are 1
◼ Y is pulled high if ANY input is 0
Y
A
B
C
3-input NOR Gate
→ If any input is high, the output is pulled low through the nMOS
transistors.
→ If all inputs are low, the output is pulled high through the pMOS
transistors.
3-input NOR Gate
→ If any input is high, the output is pulled low through the parallel nMOS
transistors.
→ If all inputs are low, the output is pulled high through the series pMOS
transistors.
Compound Gates
→More complex logic function in a single stage of logic.
→Using a combination of series and parallel switch structures.
→Example
Y = (A · B) + (C · D)
AND-OR-INVERT-22, or AOI22
Compound Gates
→ The AND expressions (A · B) and (C · D) may be
implemented by series connections of switches.
Compound Gates
→ Now ORing the result requires the parallel connection of these two
structures.
2:1 MUX Y
Y= ~s.a + s.b
S
2:1 MUX using AOI22
Signal Strength
→The strength of a signal is measured by how closely it
approximates an ideal voltage source.
Note that both the control input and its complement are required by the
transmission gate. This is called double rail logic.
VIDEO LINK
nmos ON → g=1
pmos ON → g=0
Transmission gate
→ When an nMOS or pMOS is used alone as an imperfect switch. Single nmos
or pmos is also called as pass transistor.
→ By combining an nMOS and a pMOS transistor in parallel we get a
transmission gate or pass gate.
Tristate Buffer
→When the enable input EN is 1, the
output Y equals the input A.
Logic Circuit
multiplexer.
Symbol
→The transmission gates produce a
nonrestoring multiplexer.
Sequential Circuits
→ Combinational circuits, whose outputs depend only on the current
inputs.
→ latches and flip-flops receive a clock, CLK, and a data input, D, and
produce an output, Q.
CLK CLK
LATCH Q D LATCH Q
D
Master Slave
Flop- Flop : Edge Triggered D-FF
→ While CLK is LOW, the master negative-level-
sensitive latch output (QM) follows the D input
=0
1=
Master Slave
Flop- Flop : Edge Triggered D-FF
→When the CLK transitions from 0 to 1, the master
latch becomes opaque and holds the D value at the
time of the clock transition.
Master Slave
Flop- Flop : Edge Triggered D-FF
→This flip-flop copies D to Q on the rising edge of the clock.
nMOS
pMOS
Polysilicon Gate
Silicon Dioxide Insulator
+ + + + + + + + + + +
+ + + + + + + + + + +
+ + + + + + + + + + + P-type Body
+ + + + + + + + + + +
+ + + + + + + + + + +
Accumulation Mode
→ A negative voltage is applied to the gate.
→ The holes in the body are repelled from the region directly beneath
the gate
→ This higher positive voltage, attracts more positive charge to the gate.
→ The holes are repelled further and some free electrons in the body are
attracted to the region beneath the gate.
→ This conductive layer of electrons in the p-type body is called the
inversion layer.
nMOS transistor
That small amounts of leakage
currents through OFF transistors
can become significant, especially
Cutoff when multiplied by millions or
billions of transistors on a chip.
→ The channel is no longer inverted near the drain and becomes pinched off
→ However, conduction is still brought about by the drift of electrons under the
influence of the positive drain voltage.
Saturation
→ As electrons reach the end of the channel
→ They are injected into the depletion region near the drain and
accelerated toward the drain.
→ Above this drain voltage the current Ids is controlled only by the gate
voltage and ceases to be influenced by the drain.
→ If Vgs > Vt and Vds is large, the transistor acts as a current source
in which the current flow becomes independent of Vds .
SATURATION
Summary
Long- Channel I-V Characterstics
→ To derive a Model relating the current and voltage (I-V) for an nMOS
transistor in each of the three regions.
→ The model assumes that the channel length is long enough that the lateral
electric field i.e., the field between source and drain, is relatively low.
→ When a transistor turns ON (Vgs > Vt), the gate attracts carriers (electrons)
to form a channel.
→ Drain is at Vd.
Vs Vd
→ Gate voltage is Vg.
→ Channel Voltage is Vc. n+ n+
Vc
Long- Channel I-V Characterstics
Long- Channel I-V Characterstics
Long- Channel I-V Characterstics
→ We can model the gate as a parallel plate
capacitor with capacitance proportional to area
over thickness.
→ The εox/tox term is called Cox, the capacitance per unit area of the gate oxide.
Long- Channel I-V Characterstics
→ Each carrier in the channel is accelerated to an average velocity, v,
proportional to the lateral electric field,
→ i.e., the field between source and drain.
▲t = L/v.
→The equations are given both in terms of Vgs /Vds and Vin /Vout.
→Vtp = –Vtn
→ Region A
→ The nMOS transistor is OFF so the pMOS
transistor pulls the output to VDD.
→ Region B
→ The nMOS transistor starts to turn ON, pulling
the output down.
Static CMOS Inverter DC
Characteristics
→Region C
→Both transistors are in saturation.
→ Region D
→The pMOS transistor is partially ON
→ Region E
→ The pMOS transistor is completely OFF
Static CMOS Inverter DC
Characteristics
Beta Ratio Effects
→We have seen that for βp = βn, the inverter threshold voltage
Vin=VDD/2.