Alphatross v1

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National Ion Sources

Electrostatics
Corp.
7540 Graber Rd., P.O. Box 620310, Middleton, WI 53562-0310 USA 02/17

Alphatross Source
RF-Charge Exchange Ion Source
The NEC RF-charge exchange ion source, henceforth referred to as the Alphatross source, was designed
primarily for the production of He- beams for injection into tandem accelerators. Its use has been expanded
to include H-, NH- and O- beams. The source design was patterned after the RF-charge exchange ion source
built and in regular use by Professor H.T. Richards at the University of Wisconsin - Madison, Department of
Physics. The design has been continuously improved since its introduction on the S-Series tandem Pelletrons®
in 1979. There are now more than one hundred Alphatross sources in use on tandem accelerators worldwide.

APPLICATIONS

Modern, MeV ion beam analytical instruments


require a long lived and simple to operate source
of He-, H- and NH- beams. The Alphatross source
satisfies these requirements.

The entire source is designed for a simple,


straightforward operation. On initial start up, the
source can be expected to provide 2μA of He-
and can be tuned to beyond 4μA. In addition, The Alphatross source is a compact, reliable
factory tests and customer reports have shown that source of light negative ions. A positive RF
this source demonstrates a beam lifetime between source injects immediately into a compact
rubidium charge exchange cell.
routine maintenance in excess of 1000 hours while
producing 2μA of He-.

Other ion species are also available such as H- in


excess of 10μA and NH- in the 2-3μA range. H- is
used in PIXE applications while the NH- is used for
Nuclear Reaction Analysis (NRA). The NH- beam
is used primarily to produce a positive nitrogen beam
for hydrogen profiling.

DESIGN

The only way that the He- ion can be formed is by a


two step process which involves the production of The Alphatross source and oscillator are housed
the He+ ion followed by charge exchange using an in an RF shielded box. The RF plasma bottle is
easily demounted for rapid servicing.
alkali metal vapor.

[Alphatross v1]

TELEPHONE: 608-831-7600 ♦ FAX: 608-831-9591 ♦ E-MAIL: [email protected] ♦ WEB-SITE: http://www.pelletron.com


Alphatross Source
The entire RF source is housed in an RF sealed
enclosure. The source uses a quartz bottle which is
o-ring sealed to the source flange. The quartz bottle
can be cleaned and reused.

PERFORMANCE
The chart below is a guide to those beams which
have been demonstrated. However, they do not
represent the limit in capabilities of the ion source.
All elements which can exist in the gaseous form
and form negative ions (either atomic or molecular)
Helium gas (for He-) or a gas mixture (N2 + H2) for could be considered candidates for ion production
NH- is bled into a quartz bottle. An RF oscillator in the Alphatross source.
is connected to the quartz bottle to disassociate the
neutral gas. The potential difference across the NEC has not done a detailed study of the ion source
bottle is typically 2-6kV. The beam exiting the emittance. However, customers have reported
quartz bottle is immediately injected into a rubidium emittances both for He- and H - beams. The group
vapor charge exchange cell. at Los Alamos1 has reported a best emittance of
~1.2 πmm mR (MeV)1/2 for 80% of the He- beam.
Rubidium is chosen because it has a higher charge For H- beams, this same group reported a 3 πmm
exchange efficiency than other alkali metals. The mR (MeV)1/2. These measurements were taken on
rubidium is heated to form a vapor in the beam path. the injector to their 3MV tandem Pelletron®.
The vapor condenses on the cell walls and returns to
the oven for reuse. Source lifetime is dependent on ion species
mass. Customer reports and factory tests have
For long ion source lifetime, it is essential that demonstrated a beam time between maintenance
the rubidium vapor remain trapped in the charge of over 1000 hours while producing 2μA of He-.
exchange cell. This is accomplished by air cooling However, heavier ions will sputter away the canal
to the cell body and liquid cooling to baffles at the faster than light ions, resulting in shorter source life.
entrance and exit to the charge exchange cell.
Beam Current Canal Type Gas
2-3µA He- Tantalum Helium
>10µA H- Aluminum Hydrogen
> 10µA O- Tantalum He and O2 controlled independently
2-3µA NH- Aluminum H2 and N2 controlled independently
1-2µA NH- Aluminum 99% H2 + 1% N2 premixed
1µA He-
2µA H- } Tantalum 99% He + 1% H2 premixed

National [Alphatross v1]

Electrostatics
Corp.
7540 Graber Rd., P.O. Box 620310, Middleton, WI 53562-0310 USA

TELEPHONE: 608-831-7600 ♦ FAX: 608-831-9591 ♦ E-MAIL: [email protected] ♦ WEB-SITE: http://www.pelletron.com


Alphatross Source

OPTIONS AND ACCESSORIES

The ion source is normally supplied with two (2)


quartz bottles, two (2) sets of boron nitride insulators
and two (2) extractor canals.

Tantalum extractor canals are recommended for


He- beams and aluminum extractor canals are
recommended for H- beams.

The NEC rack-mountable liquid cooling system is


required and a separate simple air cooling system is
highly recommended. These systems are designed
to provide coolant at the proper temperature and
flow rate for optimum source life.

Source gas bottle assemblies with mass flow controllers


are available in single, double and triple unit sizes.
Double or triple unit assemblies are recommended
when a gas mixture is required. Separate source gas
metering units allow the precise mixing of the gases
in the RF plasma. Exit Flanges Available (A):
8” O.D. NEC
Below is a list of the recommended power supplies. 8” O.D. ConFlat
These power supplies are available in an insulated 6” ASA
cabinet to allow operation at source potential. Focus Other flanges may be available upon request
and extractor power supplies will vary, depending on
final configuration.

Recommended Power Supplies

Probe +10kV, 12mA Voltage regulated


Magnet 80V, 4.5A Current regulated
Extractor 10kV, 12mA Voltage regulated
Focus 15kV, 5mA Voltage regulated
Rb oven 160 VDC, 2A Voltage regulated

1J.R. Tesmer, C.J. Maggiore and D.M. Parkin, Nucl. Instr. and Meth. B40/41 (1989) 718.
J.R. Tesmer, C.R. Evans and M.G. Hollander, proceeding of the
Symposium of Northeastern Accelerator Personnel, (1987), World Scientific, 77.

National [Alphatross v1]

Electrostatics
Corp.
7540 Graber Rd., P.O. Box 620310, Middleton, WI 53562-0310 USA

TELEPHONE: 608-831-7600 ♦ FAX: 608-831-9591 ♦ E-MAIL: [email protected] ♦ WEB-SITE: http://www.pelletron.com

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