Pulse Current Electrodeposition of Manganese Metal From Sulfate Solution
Pulse Current Electrodeposition of Manganese Metal From Sulfate Solution
Pulse Current Electrodeposition of Manganese Metal From Sulfate Solution
A R T I C LE I N FO A B S T R A C T
Keywords: In this study, pulse current (PC) electrodeposition method was successfully introduced to the process of man-
Manganese ganese electrodeposition. The results showed that, due to the transient high current density, pulse electrolysis
Pulse current electrodeposition can rise cathode overpotential (larger 90–100 mV than the direct current (DC)) at the same current density. And
Hydrogen evolution high cathode overpotential can significantly suppress the hydrogen evolution and improve the reaction rate of
Current efficiency
manganese deposit. At the same time, the higher cathode potential promotes crystal nucleus formation, which
tends to get smooth manganese metal product surface. Through electrolysis experiment, it was found that when
the pulse frequency was 500Hz, the duty ratio was 0.5, the average current density was 300A/m2, after elec-
trolysis for 2h under the condition, the current efficiency can reach 88.3%, being improved by 8.72% and anode
slime was 0.49g, being reduced by 55.5% compare to 300A/m2 of DC electrodeposition. In addition, PC elec-
trodeposition method may have a certain significance to the development of electrolytic manganese industry.
⁎
Corresponding authors.
E-mail addresses: [email protected] (X. Zhang), [email protected] (Z. Liu).
https://doi.org/10.1016/j.jece.2019.103010
Received 14 December 2018; Received in revised form 7 March 2019; Accepted 8 March 2019
Available online 09 March 2019
2213-3437/ © 2019 Elsevier Ltd. All rights reserved.
X. Zhang, et al. Journal of Environmental Chemical Engineering 7 (2019) 103010
by changing the current waveform, and eliminate concentration po- 2.3. Electrochemical testing
larization by adjusting the duty ratios [17]. Moreover, it plays relatively
significant roles in improving cathode current density [18], suppressing Voltammetric studies were carried out on a CHI660D electro-
side reaction, reducing impurity content and enhancing current dis- chemical workstation (Shanghai Chenhua, China). A three-electrode
tribution [19,20]. In recent years, therefore, pulse current(PC) have system was used, including the reference electrode (RE), a saturated
been applied in the electrodeposition of metals, and have achieved good calomel electrode (SCE), the working electrode (WE) (area = 98.5
results in controlling the metal surface morphology and particle sizes, mm2, Ф = 11.2 mm), made of stainless steel(304 L) and commonly used
improving coating corrosion resistance, and reducing the dosage of in the electrolytic metallic manganese industry, and the counter elec-
electrolytic additive [19,21–26]. trode (CE) (area = 249 mm2, Ф = 17.8 mm), made of
In this study, PC electrodeposition method was introduced to the PbSn0.4Ag0.014Sb0.014 alloy. To prevent fluctuation of the electrode area
process of manganese electrodeposition. The impact of PC on the in- during stirring besides the effective area of the electrode, the rest was
hibition of hydrogen evolution reaction, electrodeposition manganese sealed by an insulating polymer. The scanning speed of the cyclic vol-
cathode potential, current efficiency and surface morphology were in- tammetry was 10 mV/s.
vestigated. Cathode potential experiments were carried out on a CHI660D
electrochemical workstation (Shanghai Chenhua, China).
Chronopotentiometry technique was employed to measure the over-
2. Materials and methods
potential during manganese electrodeposition. The reference electrode
(RE), which was a saturated calomel electrode (SCE). The working
2.1. Materials
electrode (WE) was the cathode, and the counter electrode was the
anode.
The manganese sulfate (MnSO4), ammonium sulfate ((NH4)2SO4)
and selenium dioxide (SeO2) were analytical grade and purchased from
Chongqing Boyi Chemical Reagent Co., Ltd., China. Purified water used 2.4. Morphology analytical methods
in the experiment was provided by the Water Purification System
(HMC-WS10). The concentrations of Mn2+, (NH4)2SO4 and SeO2 in Surface morphology of the manganese deposits were analyzed via
electrolyte were constantly maintained at 30 g/L, 120 g/L and 0.03 g/L, scanning electron microscopy (SEM) (VEGA II LMV, Tescan Co., LTD.,
respectively. The pH value (measured by PHSJ-3 F, Lei-Ci Shanghai) of Czech) and the metallurgical microscope (MIT300, Ao Te Optical
the solution was adjusted to 7.0 by adding ammonia or H2SO4. Instruments Co., LTD., Chongqing, China).
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X. Zhang, et al. Journal of Environmental Chemical Engineering 7 (2019) 103010
aF βF
jc = j 0 [exp( η ) − exp(− η )]
RT c RT c (6)
0
where, jc is the cathode current density; j is the exchange current
density; ηc denotes cathode overpotential; α and β are reaction transfer
coefficients. When cathode polarization (ηc) increased, the reaction rate
(jc) was larger. Thus, when the cathodic polarization reached a certain
value, manganese precipitation accelerated, and also accompanied by
the precipitation of hydrogen.
RT jj −K
ηc = ( c d − lnj 0 ) υ = K1 exp ⎜⎛ 2 ⎟⎞
aF jd − jc (12) ⎝ η ⎠ (13)
In the Eq. (10), jd denotes limiting diffusion current density; n is ion where, υ is nuclei formation rate, K1 is proportionality constant, K2 is
charge number; D denotes ion diffusion coefficient; δ is diffusion layer the amount of energy needed for nucleation and is the crystallization
thickness; c0 denotes ion concentration of bulk solution. overpotential.
According to the Eq. (12), with the increase of cathodic current
density, cathodic polarization (ηc) increases in the DC electrodepostion. 3.4. Microstructure analysis of pulse electrodeposition Manganese
Then the deposition of manganese ions in the cathode surface accel-
erates and manganese ion concentration on the surface of the cathode In Fig. 6a–c, spherical particles on the surface of manganese after
reduces. At last, diffusion layer thickness δ gradually increases (jd de- electrolysis for 5 min were observed. When the metal ions were ad-
creases); manganese deposition rate is gradually controlled by ion dif- sorbed in the cathode surface, electron transferred and then formed
fusion steps (jc < jd), that is not conducive to manganese deposition. deposit layer, which was also accompanied by hydrogen adsorption
In the process of PC electrodeposition, within the period of off-time [18]. The newly-generated hydrogen bubble on the surface of electrode
of pulse current electrodeposition, manganese ion in the solution had quite high surface energy [29,30], so metal crystal nucleus were
transferred to near the cathode surface by diffusion, and insufficient more likely to form in the active position, and metal crystal grown
manganese ion on the cathode surface can be timely supplemented by along the surface of the overall bubble. After long time of electro-
the bulk solution [17]. Thus, the diffusion layer thickness (δ) could be deposition, the spherical “dendrite” was formed. At the pulse current
reduced, which is suitable for high current density electrodeposition. condition, however, with the decrease of the pulse duty ratio, the peak
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X. Zhang, et al. Journal of Environmental Chemical Engineering 7 (2019) 103010
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X. Zhang, et al. Journal of Environmental Chemical Engineering 7 (2019) 103010
Fig. 6. Metallurgical microscope image of manganese deposits after electrolysis for 5 min, (A) direct current (r = 100%), (B) f = 500 Hz, r = 50%, (C) f = 500 Hz,
r = 20%.
Fig. 7. SEM images of manganese deposits at current for 2 h, (A) direct current, (B) f = 500 Hz, r = 50%, (C) f = 500 Hz, r = 20%.
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X. Zhang, et al. Journal of Environmental Chemical Engineering 7 (2019) 103010
4. Conclusions
Acknowledgment
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