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Department of Electrical Engineering Indian Institute of Technology, Kanpur EE 311 Home Assignment #8 Assigned: 13.3.23 Due: 20.3.23

This document contains 5 homework problems assigned to electrical engineering students at IIT Kanpur. The problems cover topics related to p-n junction diodes including: 1) calculating charge in the p-region as a function of bias voltage, 2) calculating avalanche breakdown voltage and minimum p-region thickness, 3) determining built-in voltage and depletion width from capacitance-voltage data, 4) deriving equations for electric field, depletion width and capacitance for a graded junction, and 5) determining time constant and maximum operating frequency accounting for resistances.

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0% found this document useful (0 votes)
21 views

Department of Electrical Engineering Indian Institute of Technology, Kanpur EE 311 Home Assignment #8 Assigned: 13.3.23 Due: 20.3.23

This document contains 5 homework problems assigned to electrical engineering students at IIT Kanpur. The problems cover topics related to p-n junction diodes including: 1) calculating charge in the p-region as a function of bias voltage, 2) calculating avalanche breakdown voltage and minimum p-region thickness, 3) determining built-in voltage and depletion width from capacitance-voltage data, 4) deriving equations for electric field, depletion width and capacitance for a graded junction, and 5) determining time constant and maximum operating frequency accounting for resistances.

Uploaded by

Manan Kalavadia
Copyright
© © All Rights Reserved
We take content rights seriously. If you suspect this is your content, claim it here.
Available Formats
Download as PDF, TXT or read online on Scribd
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Department of Electrical Engineering

Indian Institute of Technology, Kanpur

EE 311 Home Assignment #8 Assigned: 13.3.23 Due: 20.3.23

1. Find the total charge of electrons injected into the p-region of an n+-p Si diode as a function
of the bias voltage VD. Doping density, length, and diffusion length of electrons
corresponding to the p-region are NA, L, and Ln respectively. Consider three cases: i)
arbitrary relation between L and Ln, ii) L > 5Ln, and iii) L < Ln/5. Assume that at the external
contact on the p-side, the electron concentration n = np0, where np0 is the equilibrium
concentration of electrons in the p-region.

2. An abrupt p-n junction in Si has doping densities NA = 1016 cm3 and ND = 1017 cm3.
Assume Écrit(avalanche) = 5  105 V/cm. Calculate the junction avalanche breakdown
voltage. Also, determine the minimum thickness of the neutral p-region required to avoid
punch-through before avalanche. (Punch-through is another form of device breakdown, when
the entire neutral region gets depleted, with a consequent very large current flow).

3. The measured junction capacitance Cj (in F) as a function of the applied voltage VD (in
volts) of an abrupt Si p-n junction (area = 10 mm2) is given by 1/ C 2j = [2.5  105  (4 
6.25VD)]. Determine the built-in voltage and the depletion region width at zero bias. Also,
calculate the dopant concentrations on the two sides of the junction.

4. Assume a linearly graded junction with a doping distribution given by |ND  NA| = Gx, where
G is a grade constant giving the slope of the net impurity distribution. The doping is
symmetrical, so that xn0 = |xp0| = W/2, where W is the total width of the depletion region.
Show that the electric field is given by E(x) = [q/(2)]G[x2  (W/2)2], the width of the
depletion region is W = [12(V0  VD)/(qG)]1/3, and the junction capacitance is Cj =
A[qG2/{12(V0  VD)}]1/3, where VD is the applied voltage and A is the junction area.

5. Consider Ex.4.15 of text. Without neglecting rp and rn, determine the time constant of the
circuit. Hence, determine the maximum frequency of operation for: i) sinusoidal and ii) pulse
excitations, assuming that rp = rn = 100 . Compare the results with those obtained in
Ex.4.15.

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