Lab - 3-Spin Coating
Lab - 3-Spin Coating
During this laboratory session, you will learn how to use spin coating machine to
prepare polymer thin film. Additionally, the effect of the spin speed and solution
concentration on the film’s quality will be visually investigated.
However, the following parameters can have minor effects in the film properties (Which
you are not investigating in this lab but important to know):
a. Spread speed (An initial low speed spin which distributes the solution
across the substrate).
b. Static or dynamic spin coating. (Static – the solution is dispensed before
the substrate starts spinning. Dynamic – the solution is dispensed once
the substrate has begun spinning).
c. Amount of polymer solution dispensed.
d. Acceleration up to final coating speed.
e. Substrate material and size.
f. Surface of the substrate (e.g. Electrically neutral or charged)
g. Solution temperature (the solution temperature can have an effect on the
evaporation of solvents during the spinning process and hence on the
properties of the final film).
h. Humidity in the room and room temperature.
Objective: During this exercise, you will learn how to prepare a polymer thin film using
the spin coating technique.
Lab Procedure_1:
Exercise 2: Investigating the effect of the spin speed and solution concentration
on the quality/thickness of the film.
Objective: During this exercise, you will learn how spin speed and solution
concentration effect deposited layer quality (uniformity) and thickness. Samples
prepared during this exercise will be used during the next lab where the thickness of the
deposited films will be measure using elipsometer.
Lab Procedure_2
1. For each PVAc concentration prepare samples using different spin speeds (from
1000 rpm to 10000 rpm).
2. Use silicon substrates for spin coating
3. Label each sample.
4. Every sample will be visually checked and the observation will be discussed
5. Put the samples in sample boxes provided.
6. In the next lab, we are going to measure the film thickness using elipsometer.