VL2021220505858 Da02 PDF

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School of Electronics Engineering

DA-2
Winter Semester (2021-22)
Subject : Electronics Materials and Devices
Question Question Marks
Number
1 For an abrupt pn junction, the doping densities of the n and p side are ND = 2
1018 cm-3 and NA = 1017 cm-3 respectively.

i) Calculate the Fermi level positions of the n and p regions


ii) Draw the energy band diagram of the junction at equilibrium and
show the barrier potential
iii) Determine the barrier potential of the junction
iv) Compare the results obtained in (ii) and (iii)
2 A Si pn junction diode is formed from p-material doped with 1018 2
acceptors/cm3 and n-material doped with 1.2 x 1017 donors/cm3. If the
breakdown voltage of the diode is 26V, determine the maximum electric field
across the junction during breakdown.
3 i) Calculate the minority carrier concentrations at the edge of the 2
space charge regions in a forward-biased pn junction. Consider a
silicon pn junction at T = 300 K. Assume the doping concentration
in the n region is ND = 1016 cm-3 and the doping concentration in
the p region is NA = 6 × 1015 cm-3 and assume that a forward bias
of 0.60 V is applied to the pn junction.

ii) Consider an abrupt pn junction with doping concentrations of ND =


1016 cm-3 and NA = 5×1015 cm-3. Calculate the junction capacitance
at a reverse bias potential of 5V.
4 a) Draw the energy band diagram of a pnp bipolar junction transistor at 2
equilibrium and in different modes of operation

b) Assume DE = 4DB, WE = 3WB, NB = 1018 cm-3, NE = 1020 cm-3. The


intrinsic carrier concentration of the emitter and the base regions are
1.5×1010 cm-3. ΔEgE = 50meV. Calculate the current gains (α and β) of
the transistor.
5 Draw the band diagrams of a MOSCAP at equilibrium, accumulation, 2
depletion and inversion regions. Consider the semiconductor to be an n-type
Si. Also, plot the CV characteristics

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