EEE118 Problem Sheets
EEE118 Problem Sheets
Fundamental Constants
3. A parallel plate capacitor has a spacing of 10 µm with air between the plates. The
area of the capacitor is 1x10-5m2.
(a) If a dielectric of relative permittivity εr =10 is placed between the plates what should
the new spacing be to leave the capacitance unchanged?
(100 µm)
(b) Calculate the capacitance.
(8.8 pF)
(c) The dielectric in the capacitor has a breakdown field of 50MVm-1. Calculate the
maximum voltage which may be applied to the capacitor.
(5kV)
EEE118 Problem Class Questions – Sheet 2
1. The band-gap of silicon at room temperature has an energy of 1.11 eV. What is this in
Joules?
(1.76×10 −19 J)
3. (a) Calculate the average scattering time of electrons at room temperature in Si and Ge
based upon their mobilities and effective masses.
(660 fs, 490 fs)
(b) If these crystals are ultra-pure and defect-free, what is the origin of these scattering
events?
4. A rod of heavily p-doped germanium is 6 mm long, l mm wide and 0.5 mm thick. It has
an electrical resistance of 120 ohms along its length. Assuming that all the conductivity is
due to holes, determine the impurity concentration.
(3.3x1021 m-3 )
5. A chip of Si is 1 mm x 2 mm in area and 0.1 mm thick. The material has one in every 10 8
atoms replaced by an atom of B
(a) Is the doped material n-type or p-type. Why?
(b) What is the density of majority carriers?
(c) What voltage is required to produce a current of 2mA between the large faces?
Fundamental Constants
Boltzman Constant, k = 1.381x10-23 JK-1 = 8.62×10−5 eVK-1
Charge on Electron, e = 1.602x10-19 C
Data for germanium
Hole mobility, h=0.19
Electron mobilitye=0.39 m2V-1s-1
Band-gap of germanium (Ge) = 0.66eV
Data for silicon
Hole mobility h=0.046 m2V-1s-1.
Electron mobility e =0.12 m2V-1s-1
Band-gap of silicon (Si) = 1.1 eV
1(a) The intrinsic free carrier concentration for Si at 300K is 1.5 x 1016 m-3. From this, derive
the constant of proportionality in the equation for ni. (5x1021 m-3K-3/2)
(b) Using this number, calculate the free carrier concentration of intrinsic silicon at 250K
and 350K. (1.6x1014 m-3, 4x1017 m-3)
(c) Using the same constant, calculate the intrinsic carrier concentration for germanium at
250K, 300K and 350K. (4.4x 1018 m-3, 7.4x 1019 m-3 5.8x 1020 m-3)
(d) How might you expect the majority and minority carrier concentration of heavily n-
doped silicon to change over this temperature range? State your assumptions.
(e) Which of these three materials may be most suitable to be used in a sensor to measure
temperature over this temperature range? State your assumptions.
2). A bar of intrinsic germanium, 2 mm in length, has 2.5x1019 free electrons per m3. A
voltage of 1 V is applied across its length.
a. Calculate the conductivity of the material. (2.3 Ω-1m-1)
b. Find the net drift current density. (1160 Am-2)
c. What fraction of the drift current is due to electrons? (67%)
d. What are the drift velocities of the electrons and holes? (195 ms-1, 95 ms-1)
3) A silicon sample is doped with donors from one side such that Nd= N0exp(-ax) (see
Figure). The sample is at room temperature where all donors may be expected to be ionized.
Fundamental Constants
-4 -2
1. A germanium p-n junction has a bulk resistivity of 4.2×10 and 2.08×10 Ωm for the p-
and n-type material respectively. For germanium µe = 0.3, µh = 0.15 m2V-1s-1, and ni=2.5×
1019 m-3 at room temperature. Stating all assumptions;
a) Show the free electron carrier density in the n-type material is 1x1021 m-3.
b) Show that the free hole carrier density in the p-type material is 9.9x1022 m-3
c) Sketch the extent of the depletion region into the p-type and n-type material.
h) Is the saturation current mainly due to electrons or holes? (Assume the minority
carrier lifetimes are identical).
EEE118 Problem Class Questions – Sheet 5
Fundamental Constants
Boltzman Constant, k = 1.381x10-23 JK-1 = 8.62×10−5 eVK-1
Charge on Electron, q = 1.602x10-19 C
-4 -2
1) A germanium p-n junction has a bulk resistivity of 4.2×10 and 2.08×10 Ωm for the p-
and n-type material respectively. For germanium µe = 0.3, µh = 0.15 m2V-1s-1, and ni=2.5×
1019 m-3 at room temperature. The minority carrier lifetimes of the p and n-type material of
the junction are 150 and 75 µs respectively, and the sample has a cross-sectional area of 1×
-6
10 m2. Assuming that there is a large thickness of semiconductor on each side of the
junction, calculate the saturation current.
l. A JFET has a channel resistivity of 0.15 Ωm. At zero drain bias, calculate the channel
resistance for a gate length, L, of 1 µm a width, Z, of 1mm and a channel thickness of 2 µm
assuming no gate bias and a negligible zero gate bias depletion in the channel. Using the
expression for depletion thickness for a p+n junction in the notes, calculate the pinch off voltage
assuming a negligible built-in potential and an electron mobility of 0.12 m2V-1s-1 in the channel.
Use ε = εo εr = 8.85 x 10-12 x 12 Fm-1.
What is the resistance of the channel when a gate voltage equal to half the pinch off voltage is
applied?
(75 Ω, 1.05 V, 254 Ω)
4. The output characteristics of a depletion mode FET is shown in the figure. From this estimate
the transconductance, gm, and the channel resistance at zero gate bias and low drain bias (neglect
any other resistances).