02 Materials For MEMs and Microsystems
02 Materials For MEMs and Microsystems
02 Materials For MEMs and Microsystems
Introduction
In MEMS, common substrate materials (silicon Si, germanium Ge, gallium arsenide GaAs)
all fall in the category of semiconductors.
Why?
They are at the borderline between conductors and insulators, so they can be made either a
conductor or an insulator as needed.
Can be converted to a conducting material by doping (p- or n-type).
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Silicon as A substrate Material
The Ideal Substrate for MEMS
Single crystal silicon is the most widely used substrate material for MEMS and microsystems.
Silicon (Si) is the most abundant material on earth. It almost always exists in compounds with
other elements.
The popularity of silicon for such application is primarily for the following reasons:
(1) It is mechanically stable and it is feasible to be integrated into electronics on the same
substrate (b/c it is a semiconducting material).
(2) Electronics for signal transduction such as the p or n-type piezoresistive can be readily
integrated with the Si substrate-ideal for transistors.
(3) Silicon is almost an ideal structure material. It has about the same Young’s modulus as steel
( ∼ 2x10 5 MPa), but is as light as aluminum with a density of about 2.3 g/cm 3 .
(4) It has a melting point at 1400o C, which is about twice higher than that of aluminum. This
high melting point makes silicon dimensionally stable even at elevated temperature.
(5) Its thermal expansion coefficient is about 8 times smaller than that of steel, and is more than
10 times smaller than that of aluminum.
(6) Silicon shows virtually no mechanical hysteresis. It is thus an ideal candidate material for
sensors and actuators.
(7) Silicon wafers are extremely flat for coatings and additional thin film layers for either being
integral structural parts, or performing precise electromechanical functions.
(8) There is a greater flexibility in design and manufacture with silicon than with other substrate
materials. Treatments and fabrication processes for silicon substrates are well established and
documented.
These boules are sliced into thin disks (wafers) using diamond saws.
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Standard sizes of wafers are:
100 mm (4”) diameter x 500 µm thick.
150 mm (6”) diameter x 750 µm thick.
200 mm (8”) diameter x 1 mm thick
300 mm (12”) diameter x 750 µm thick (tentative).
Single Silicon Crystal Structure
Single silicon crystals are basically of “face-cubic-center” (FCC) structure.
The crystal structure of a typical FCC crystal is shown below:
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● Total no. of atoms in a single silicon crystal = 18.
● The unsymmetrical distribution of atoms within the crystal make pure
silicon anisotropic in its mechanical properties.
● In general, however, we treat silicon as an isotropic material
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Characteristics of silicon by principal planes
1) The (100) planes contain least number of atoms → the weakest plane →
easiest to work with.
2) The (110) planes offers the cleanest surfaces in micro fabrications.
3) The (111) contains shortest bonds between atoms → strongest plane →
toughest to work with.
SILICON COMPOUNDS
There are 3 principal silicon compounds used in MEMS and microsystems: Silicon
dioxide (SiO2), Silicon carbide (SiC) and silicon nitride (Si3N4) – each Has distinct
characteristic and unique applications.
Silicon dioxide (SiO2)
Quartz
● Quartz is a compound of SiO2.
● Quartz crystal is made of up to 6 rings with 6 silicon atoms.
● The single-unit cell is in shape of tetrahedron:
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● It is used as piezoelectric material in many devices.
● It is also excellent material for microfluics systems used in biomedical
applications.
● It offers excellent electric insulation in microsystems.
POLYMERS
What is polymer? Polymers include: Plastics, adhesives, Plexiglass and Lucite.
Principal applications of polymers in MEMS:
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Characteristics of polymers:
● Low melting point; Poor electric conductivity
● Thermoplastics and thermosets are common industrial products
● Thermoplastics are easier to form into shapes.
● Thermosets have higher mechanical strength even at temperature up to 350o C.
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● The process was first introduced by Langmuir in 1917 and was later
refined by Blodgett. That was why it is called Langmuir-Blodgett
process, or LB films.
● The process involves the spreading volatile solvent over the surface-
active substrate materials.
● The LB process can produce more than one single monolayer by
depositing films of various compositions onto a substrate to produce a
multilayer structure.
● LB films are good candidate materials for exhibiting ferro (iron)- , pyro
(heat)- and piezoelectric properties. LB films may also be produced with
controlled optical properties such as refractive index and anti reflections.
● They are thus ideal materials for micro sensors and optoelectronic
devices.
Following are a few examples of LB film applications in microsystems:
(1) Ferroelectric (magnetic) polymer thin films:
● The one in particular is the Poly-vinylidene fluoride (PVDF).
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Applications of this type of films include:
PACKAGING MATERIALS
Unlike IC packaging in which plastic or ceramic are extensively used as
encapsulate materials for the delicate IC circuits, MEMS packaging involve a great
variety of materials-varying from plastic and polymers to stainless steel, as can be
seen in a specially packaged micro pressure sensor.
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● Packaging also includes performance and reliability testing of the finished
products
Distinction between the IC packaging and the microsystems packaging:
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