Calypso: Option 7 OVCMM Measuring Uncertainty Definition
Calypso: Option 7 OVCMM Measuring Uncertainty Definition
Option 7
OVCMM Measuring
uncertainty definition
Operating Instructions
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gram packages, and the relevant documentation are subject to change.
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CALYPSO
Version 2018
Operating Instructions
2018-04-17
61212-2771502
Table of contents
Preface
Alphabetic index
NOTE
The additional CALYPSO options are described in separate manuals.
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A at the same time.
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manual. The icons appear in the marginal column next to the respective
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figuration of safety instructions.
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System configuration
File Pages
Measuring method
Advanced definition
Simulation
Prismo-Ultra RDS-CAA RDS RST Rotos
OK Cancel Apply
Chapter
Basics of OVCMM
Basic principle of OVCMM
Using the OVCMM, CALYPSO can determine the possible deviations
from the real value for all characteristics of a measurement plan, i.e., it
uses the method of the virtual CMM to determine the characteristic-spe-
cific measuring uncertainty and output this in a printout.
Benefits of the OVCMM The measuring uncertainty calculation using the virtual CMM has the fol-
lowing advantages:
– It is objective and in line with standards.
– It is performed automatically and requires, contrary to other meth-
ods, no special knowledge on the part of the user.
– It is not excessively time-consuming.
– It matches the complexity of connected uncertainty components oc-
curring during measurements on CMMs.
– Its high degree of automation allows to meet the requirements of
the various measuring jobs performed by CMMs.
Influencing variables
The following influencing variables are taken into account by the
OVCMM:
– Systematic residual deviations of the CMM geometry
– Fluctuations of the geometry deviations due to temporal and spatial
temperature gradients
– Direction-dependent systematic residual deviations of the stylus sys-
tem
– Random deviations of the probing system
– Uncertainty caused by thermal workpiece expansion
– Uncertainty in qualification of the stylus diameter
– Uncertainty in qualification of the styli within a stylus system
– Roughness of the workpiece surface
– Uncertainty of the standards used for connection to the international
SI units
The following influencing variables are not automatically taken into ac-
count:
NOTE
The ambient conditions of your CMM must have been determined by
ZEISS Service or a different accredited laboratory and entered in the
OVCMM.
Standard definition
In most cases, determining the stylus characteristics with the standard
definition is fully adequate.
Probe Influence
Name
OK Cancel Help
3 Enter the name of the stylus characteristics and confirm with OK.
The CMM now starts qualifying the stylus.
4 Save and close with OK.
Advanced definition
The advanced definition is used for analysis purposes.
Name
No. of axis
24
Stylus intersection points
Longitudinal intersection plane No. of longitudinal
7
intersection points
Reference sphere
Equator
• Measuring points
Multiple Probings
OK Cancel Help
Quality
Qual. Temperature 20,0000 Rigidity 0,0000
Qual. Date 3.3.09 Sigma 0,0000
Qual. Time 16:40:49 Dyn. Sigma 0,0000
Close
The following fields are provided for this in the stylus system manage-
ment:
– Base Char. in the display area <stylus system name>
– Stylus Char. in the display area Stylus
These two additional fields are only editable if the OVCMM is activated.
System configuration
File Pages
Measuring method
Advanced definition
Simulation
Prismo-Ultra RDS-CAA RDS RST Rotos
OK Cancel Apply
NOTE
At present, the base alignment must not be created using a CMM and
the OVCMM Measuring Uncertainty Definition option. Recommended
procedure:
At first, measure the data without activating the OVCMM Measuring
Uncertainty Definition option.
Then perform the simulation in another CNC run without resetting the
results.
O
OVCMM 1-2
Activating 1-10
Basics 1-3
Configuring 1-6
Influencing variables 1-4
Interaction 1-5
Results 1-12
Stylus characteristics 1-6
Using 1-10
S
Standard definition
Stylus characteristics 1-6
Stylus characteristics
for OVCMM 1-6
U
Uncertainty of measuring results 1-4
V
Virtual CMM 1-2
Method 1-3
OVCMM 1-2
OVCMM results 1-12