Test I - Answers: QUESTION 1 (10 Marks)
Test I - Answers: QUESTION 1 (10 Marks)
30/30
QUESTION 1 [10 marks]
1a). Name the following three cubic-crystal unit cells. (1½ marks)
b). Name and draw the 3 types of solids, classified according to atomic arrangement.
(3 marks)
k = crystal momentum
parameter
Page 1 of 5
d). Find the percentage of the dopant in the valence level. Consider the value of Boron (2.75
x 1017 cm-3) doping in Silicon with EV – EFp is equal to -0.013 eV. [2½ marks]
1
pa N ( EFp Ev )
1 v exp
p pa 4 N a k BT
1
pa 9.84 1018 0.013
1 17
exp
p pa 4(2.75 10 ) 0.026
pa
1 (8.945)(0.6) 0.1557 100 15.57% (in the dopant ( acceptor ) level )
1
p pa
in the valence level 100 15.57 84.43%
a). Find the impurity concentration (i.e the majority and minority carriers density) by
using the intrinsic value, [2
marks]
b). Find the resistivity of the charge carrier density of the material. [2 marks]
1 1
10cm
nn .q.n (6.25 x10 cm )(1.6 x10 19 C )(1000cm 2 / Vs)
14 3
c). Find the intrinsic Fermi level for the majority carriers density [2
marks]
n 6.25 x1014
EFnn Ei k BT ln n (0.026) ln 10
0.276eV
ni 1.5 x10
d). How fast the electrons move under the influence of the electric field, ε = 8 V/m with
the average time between collisions of 0.5 ns. [4 marks]
Page 2 of 5
q. q. 1.6 1019 0.5 10 9
n 31
87.912 m 2 / Vs
mn me 9.1 10
8V
vdrift n . (87.912 m 2 / Vs )( ) 703.30 m / s or 70330 cm / s
m
QUESTION 3 [10 marks]
3. What is the Metallurgical junction?
The interface separating the ‘n’ and ‘p’ regions [1
mark]
4. An abrupt GaAs pn junction with built-in potential barrier Vbi = 1.4 V and Na = 1020 cm-3
at 300 K.
a). Calculate the dopant (acceptor) Fermi level with respect to the intrinsic Fermi level in
GaAs pn junction.
Na 1020
EFi EFp k BT ln 0.026 ln 6
0.8223eV [2 marks]
ni 1.84 x10
b). Calculate the dopant (donor) Fermi level with respect to the intrinsic Fermi level in GaAs
pn junction.
1 1
Vbi 1.4V ( EFn EFi ) ( EFi EFp ) ( EFn EFi ) 0.8223
q q [2 marks]
EFn EFi 0.5777 eV
d). Explain of the situation when the value of xn >> xp, with respect to the dopant. [1
mark]
The space width, xn is fill up with ‘holes’ whereas the xp is fill up with ‘electrons’, the
electrons move faster than the holes. As a conclusion it takes less width to fill up the
region for the same amount of dopant otherwise. In ideal situation:
x p N a xn N d
In order to have xn x p
N a N d
Page 3 of 5
e). Find the value of xp if the value of xn is given as 4.51 x 10-5 cm. [2 marks]
x p N a xn N d
List of Equations
E Ei
Electron density, n ni exp F
kT
E EF
Hole density, p ni exp i
kT
Conductivity of the electron, n.q.n
q.
Mobility of the electron
mn
v
Electric Field of the electron
n
1
Fraction of electrons tied to the donor levels, nd N ( EC Ed )
1 C exp
n nd 2 N d k BT
1/ 2
2 V N 1
xn S bi a
e N d N a N d
Space charge width, 1/ 2
2 V N d 1
x p S bi
e N a N a N d
Quantity Symbol Value
Electron mass. me 0.91 x10-30 kg
Boltzman constant. kB 1.38066 × 10-23 J/K (R/Nav)
Elementary charge. e 1.6 × 10-19 C
Thermal voltage at 300K. kBT/q 0.026 V
µn Dn µp Dp
Si 1000 35 480 12.4
GaAs 8500 220 400 10.4
Ge 3900 101 1900 49.2
Typical mobility and diffusion coefficient values of T=300K (µ=cm2/Vs and D=cm2/s)
Page 4 of 5
Effective densities and intrinsic carrier concentrations of Si, Ge and GaAs.
Page 5 of 5