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Question: Problem 1: in Semiconductor Manufacturing Wet Chemical Etc

422

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Problem 1: In semiconductor manufacturing wet chemical etching is often used to remove silicon from the Enter question
backs of wafers prior to metallization. The etch rate is an important characteristic of this process. Two
different etching solutions are being evaluated. Eight randomly selected wafers have been etched in each
solution, and the observed etch rates (in mils/min) are as follows.

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(a) Do the data indicate that the claim that both solutions have the same mean etch rate is valid? Use α = link
0.05 and assume equal variances.
(b) Find a 95 percent con dence interval on the difference in mean etch rates.
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Q: In semiconductor manufacturing, wet chemical etching is often used to remove silicon from the backs of wafers prior
to metallization. The etch rate is an important characteristic in this process and known to follow a normal distribution.
Two different etching solutions have been compared using two random samples of 10 wafers for each solution. The
observed etch rates are as follows...

A: See step-by-step answer 100% (2 ratings)

Q: In semiconductor manufacturing, wet chemical etching is often used to remove silicon from the backs of wafers prior
to metallization. The etch rate, an important characteristic in this process, is known to follow a normal distribution.
Two different etching solutions have been compared, using two random samples of ten wafers for each solution. Use
the etch rate information in the...

A: See step-by-step answer

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