Objective: "CMOS 0.25 Micron Technology Inverter Characteristics and Layout in Microwind"
Objective: "CMOS 0.25 Micron Technology Inverter Characteristics and Layout in Microwind"
Objective: "CMOS 0.25 Micron Technology Inverter Characteristics and Layout in Microwind"
1. Objective
In this lab students will design and implement a CMOS Inverter. Different design
Parameter’s effects like transistor sizing, supply voltages etc well be analyzed and delay,
area, power and currents will be observed. This lab assumed that students are familiar
with MicroWind and Lambda based design rules. The tool used in this lab is MicroWind.
The goals for this Lab are:
• Design of CMOS Inverter and transistor sizing.
• Layout Design using the tool.
• Gate delay, area, power and current analysis and the effects of transistor sizing on these
parameters.
2. Theory
2.1 MOSFET
The Metal Oxide Semiconductor Field Effect Transistor is very important part of Digital
Integrated Circuits. It is mostly used as switch in digital design. MOSFET is a four
terminal device. The voltage applied to the gate terminal determine the current flow
between drain and source terminals. The body/substrate of the transistor is the fourth
terminal. Mostly the fourth terminal (body/substrate) of the device is connected to dc
supply that is identical for all devices of the same type (GND fro nMOS and Vdd for
pMOS). Usually this terminal is not shown on the schematics
2.2 nMOS
The nMOS transistor consists of n+ drain and source diffusion regions, which are
embedded in a p-type substrate. The electrons in the channel beneath the gate between
source and drain terminal are responsible for the current flow.
2.3 pMOS
The pMOS transistor consists of p+ drain and source diffusion regions, which are
embedded in an n-type substrate. The holes in the channel beneath the gate between
source and drain terminal are responsible for the current flow.
2.4 CMOS
CMOS Inverter/NOT gate is considered to be the heart of VLSI circuits, based on the
understanding of NOT gate we can extend it easily to NAND and NOR gates which are
VLSI Design
the basic building blocks of more complex circuits e.g. multipliers and microprocessors.
As per discussion and design on white board in the Lab, a NOT gate can be implemented
using two FETs i.e. a pFET and an nFET both connected in series, in which Vdd is
supplied to pFET and nFET is grounded, input x is applied to the gate terminals of both
and the output is obtained at node y.
3. Design/ Diagram/Circuit
VDD
X Y
X Y
X Y
0 1
1 0
Gnd
Figure 3.1 Inverter Symbol
4. Lab Instructions
NAND Gate
As per discussion and design on white board in the Lab, a NAND gate can be
implemented using four FETS i.e. two pFETs and two nFETs as the inputs of the gate is
two. pFETs are connected in parallel while nFETs are connected in series, Vdd is
supplied to the parallel combination of pFETs while the series combination of nFETs is
grounded. Inputs a & b are applied to the gate terminals of all FETs, and the output f is
obtained from the common junction of these series and parallel combinations as
illustrated in NAND circuit under the heading of Design Diagram / Circuit.