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'_: ~IRCUITS
·1~PPLIC/~TIONS · SPECIFICATION
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TRANSISTOR
MANUA SIXTH
EDITION
CONTRIBUTORS
Application Engineering
J. H. Phelps - Manager
J. F. Cleary
J. Giorgis
E. Gottlieb
D. J. Hubbard
D. V. Jones
E. F. Kvamme
G. E. Snyder
EDITED AND PRODUCED BY R. A. Stasior
Semiconductor Products Department
Advertising & Sales Promotion
General Electric Company Others
Electronics Park W. P. Barnett
Syracuse, New York R. E. Belke
D. W. Cottle
U.S. Davidsohn
TECHNICAL EDITOR K. Schjonneberg
J. F. Cleary T. P. Sylvan
I
The circuit diagrams included in this manual are included for
illustration of typical transistor applications and are not intended
as constructional information. For this reason, wattage ratings of
resistors and voltage ratings of capacitors are not necessarily given.
Similarly, shielding techniques and alignment methods which may
be necessary in some circuit layouts are not indicated. Although
reasonable care has been taken in their preparation to insure their
technical correctness, no responsibility is assumed by the General
Electric Company for any consequences of their use.
The semiconductor devices .and arrangements disclosed herein·
may be covered by patents of General Electric Company or others.
Neither the disclosure of any information herein nor the sale of
semiconductor devices by General Electric Company conveys any
license under patent claims covering combinations of semiconductor
devices with other devices or elements. In the absence of an express
written agreement to the contrary General Electric Company as-
sumes no liability for patent infringement arising out of any use
of the semiconductor devices with other devices or elements by any
purchaser of semiconductor devices or others.
Copyright 1962
by the
General Electric Company
II
CONTENTS
Page
1. SEMICONDUCTORTHEORY........................ 1
Semiconductors . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 3
Conduction . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 7
Space Charge Neutrality . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 8
Diffusion and Drift . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 9
Diodes ............................................... 11
Transistors . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 11
2. TRANSISTORCONSTRUCTIONTECHNIQUES.... .. 15
Metal Preparation . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 15
Junction Formation .................................... 16
Alloy Transistors . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 19
Grown Junction Transistors ............................. 20
Germanium Mesa Transistors . . . . . . . . . . . . . . . . . . . . . . . . . . . . 21
Silicon Planar Transistors . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 22
Encapsulation . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 23
Reliability . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 24
3. THE TRANSISTORSPECIFICATIONSHEET......... 28
General Device Capabilities . . . . . . . . . . . . . . . . . . . . . . . . . . . . 30
Absolute Maximum Ratings . . . . . . . . . . . . . . . . . . . . . . . . . . . . 30
Voltage ............................................ 30
Current ............................................ 34
Transistor Dissipation . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 34
Temperature ....................................... 35
Electrical Characteristics . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 35
DC Characteristics . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 35
Cutoff Characteristics . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 36
High Frequency Characteristics . . . . . . . . . . . . . . . . . . . . . . . 36
Switching Characteristics . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 36
Generic Characteristics . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 37
Explanation of Parameter Symbols . . . . . . . . . . . . . . . . . . . . . . . 38
Symbol Elements . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 38
Decimal Multipliers .................................. 39
Parameter Symbols . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 39
Abbreviated Definitions of Terms ...................... 43
4. SMALLSIGNALCHARACTERISTICS............... 47
5. LARGESIGNALCHARACTERISTICS
................ 65
Parameters . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 65
Basic Eq nations . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 66
Active Operation . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 67
Saturated Operation ................................... 67
Cutoff Operation . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 69
Useful Large Signal Relationships ....................... 69
Collector Leakage Current (IcEo) . . . . . . . . . . . . . . . . . . . . . . 69
Collector Leakage Current (IoEs) . . . . . . . . . . . . . . . . . . . . . . . 69
Collector Leakage Current (IcBa) . . . . . . . . . . . . . . . . . . . . . . 70
Collector Leakage Current-Silicon Diode in Series with
Emitter . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 70
Base Input Characteristics . . . . . . . . . . . . . . . . . . . . . . . . . . . . 70
Voltage Comparator Circuit . . . . . . . . . . . . . . . . . . . . . . . . . . . 71
III
Page
6. SWITCHINGCHARACTERISTICS
................... 73
Steady State Characteristics . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 75
Transient Response Characteristics ....................... 81
Transient Response Prediction . . . . . . . . . . . . . . . . . . . . . . . . . . . 86
Circuit Techniques to Augment Switching Characteristics ... 96
7. BIASING ........................................... 101
Thermal Runaway ..................................... 109
8. AUDIOAMPLIFIERS ............................... 113
Single Stage Audio Amplifiers : .......................... 113
Two Stage R-C Coupled Amplifier ....................... 113
Class B Push-Pull Output Stages ........................ 114
Class A Output Stages ................................. 115
Class A Driver Stages ................................. 116
Design Charts ........................................ 116
Preferred Types and Substitution Chart ................... 122
9. HIGH FIDELITYCIRCUITS ......................... 125
Preamplifiers ......................................... 125
Bass Boost Circuit . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 128
Power Amplifiers ..................................... 130
Stereophonic System . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 132
Silicon Power Amplifiers ............................... 133
12-Watt Amplifier .................................... 137
NPN Preamplifier ..................................... 139
1O. RADIORECEIVERANDTUNERCIRCUITS ......... 141
Autodyne Converter Circuits ........................... 141
I. F. Amplifiers ....................................... 142
Emitter Current Control ............................. 143
Auxiliary A. V. C. Systems ............................ 144
Detector Stage ....................................... 145
Reflex Circuits ........................................ 146
F. M. Tuner ......................................... 147
A. M. Tuner . . . . ..................................... 147
Complete Radio Receiver Diagrams ...................... 148
Additional Component Information ..................... 154
11. BASICCOMPUTERCIRCUITS..................... .155
Flip-Flop Desi~ Procedures ............................ 155
Saturated Flip-Flops ................................ 155
Non-Saturated Flip-Flop Design ........................ 158
Non-Saturating Flip-Flop Design Procedure ................ 161
Triggering ............................................ 166
Special Purpose Circuits ................................ 169
Schmitt Trigger .................................... 169
Astable Multivibrator ................................ 170
Monostable Multivibrator ............................ 170
Indicator Lamp Driver ............................... 171
Pulse Generator ..................................... 171
Ring Counter ....................................... 173
12. LOGIC............................................. 175
Common Logic Systems ................................ 184
Binary Arithmetic ..................................... 188
13. UNIJUNCTIONTRANSISTORCIRCUITS............ 191
Theory of Operation ................................... 191
Parameters-Definitions and Measurement .................. 193
Relaxation Oscillator ................................... 194
IV
Page
Ultra-Linear Sawtooth Wave Generator ................... 196
Voltage Sensing Circuit ................................ 196
Staircase Wave Generator .............................. 197
Time Delay Relay ..................................... 198
Multivibrator ......................................... 198
Hybrid Timing Circuits ................................ 199
14. FEEDBACKAND SERVOAMPLIFIERS-
TRANSISTORCHOPPERS.......................... 203
Use of Negative Feedback in Transistor Amplifiers .......... 203
Servo Amplifiers for Two Phase Servo Motors .............. 206
Preamplifiers ........................................ 206
Bias Design Procedure for Stage Pair. . . . . . . . . . . . . . . . . . . 206
Driver Stage . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 208
Output Stage ....................................... 210
Junction Transistor Choppers ............................ 214
15. TRANSISTORMEASUREMENTS................... 219
Introduction .......................................... 219
Reverse Diode Characteristics . . . . . . . . . . . . . . . . . . . . . . . . . . . 220
General ............................................ 220
D. C. Tests ........................................ 221
Current Measurements ............................... 226
Large Signal (D. C.) Transistor Characteristics ............. 228
Large Signal Definitions and Basic Test Circuits ........... 229
Some Test Circuits .................................. 230
Junction Temperature Measurements ..................... 233
Junction Temperature (TJ) ............................ 233
Thermal Impedance .................................. 233
Test Circuit for Junction Temperature Measurements ..... 234
Small Signal Measurements (Audio) of Transistor Parameters .. 238
Common Base Configuration ........................... 238
Common Emitter Configuration ........................ 240
Common Collector Configuration ...................... 243
General ............................................ 244
High Frequency Small Signal Measurements of Transistor
Parameters . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 246
General . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 246
Input Impedance (h11,,h,.) ............................ 246
Output Admittance (hob, hoe) ......................... 248
Forward Current Ratio (htb, hre, and fhrb) ................. 250
Power Gain Measurement .............................. 256
General . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 256
Measuring Power Gain ............................... 257
Neutralization ....................................... 259
Transistor Noise Measurements .......................... 261
General . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 261
Measurement of Noise Figure ......................... 262
Equivalent Noise .ciment ang_Noise Voltage ............. 264
Measurement of (e:/)½ and (i:,.2)* For Transistors ......... 266
Measurement of Noise Factor without using Signal Generator
or Noise Diode ................................... 267
Transistor Noise Analyzer ............................ 269
Charge Control Parameter Measurement .................. 270
Tn, The Effective Lifetime in the Active State ............ 270
~Effective Lifetime in Saturated State ................ 271
\..;a&,The Average Emitter Junction Capacitance ......... 272
Composite Circuit for Ta, Tb, Ca& . . . . . . . ............. 273
Qa•, Total Charge to Bring Transistor to Edge of Saturation 274
Calibration of Capacitor Con Qa• Test Set ............... 275
V
Page
16. REGULATEDDC SUPPLYAND INVERTER
CIRCUITS .......................................... 277
Regulated DC Supply .................................. 277
Parallel Inverters ...................................... 278
DC to DC Converter .................................. 280
17. SILICON SIGNALDIODES ......................... 281
Planar Epitaxial Passivated Silicon Diode ................. 281
DC Characteristics .................................... 282
AC Characteristics ..................................... 284
Diode Assemblies ..................................... 287
18. SEMICONDUCTORRELIABILITY................... 289
Achieving Reliability .................................. 289
Design for Reliability ................................ 290
Examples of Reliable Design .......................... 292
Production for Reliability ............................. 292
Application for Reliability ............................ 294
Measuring Reliability .................................. 299
Measurement of Reliability for Applications Guidance ..... 300
Measurement of Reliability for Acceptance .............. 301
Measurement of Reliability for Control ................. 302
Past Practice, Future Trends .......................... 302
Failure Mechanisms .................................... 303
Structural Flaws .................................... 303
Encapsulation Flaws ................................. 304
Internal Contaminants ............................... 306
Material Electrical Flaws ............................. 308
Metal Diffusion ..................................... 309
Susceptibility to Radiation ............................ 309
Failure Analysis .................................... 310
Failure Distributions ................................... 310
Mathematics of Failure Distributions ................... 311
Generalized Failure Distribution ....................... 313
Acceleration Factor and Modulus of Failures ............... 315
Definitions ......................................... 316
Response Surface Relationship ........................ 317
Screening ............................................ 318
Reliability Data for Typical Transistor Types .............. 320
Explanation of Analysis and Presentation ................ 320
Reliability Data on a Germanium PNP Alloy Transistor .... 322
Reliability Data on a Silicon NPN Grown Diffused
Transistor . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 325
Reliability. Data on a Germanium PNP Mesa Transistor . . . 327
Reliability Data on a Silicon NPN Diffused Planar Passivated
Transistor . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 332
19. SILICONCONTROLLED SWITCH ................... 335
What Is It? . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 335
What Functions can it Perform? ......................... 335
What Are Its Applications? .............................. 335
Introduction . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 336
Construction ......................................... 337
Thermal Characteristics ................................ 337
Two Transistor Analogue of PNPN ...................... 338
General Comparison with Other Semiconductors ........... 341
Comparison with Silicon Controlled Rectifier .............. 341
Comparison with Complementary SCR ................... 342
Comparison with Trigistor, Transwitch .................... 343
VI
Page
Comparison with Four Layer Diode ...................... 343
Comparison with Unijunction Transistor .................. 344
Comparison with Binistor . . . . . . . . . . . . . . . . . . . . . . . . . ..... 344
Definition of Terms used in SCS Specifications .............. 345
Basis for Nomenclature ............................... 345
Maximum Ratings ................................... 346
Electrical Characteristics ............................. 346
Definitions ......................................... 347
Gate Characteristics ................................... 347
Ge Characteristics ................................... 347
G" Characteristics ................................... 347
Firing Characteristics ................................ 347
Tum-OH Characteristics .............................. 349
Anode to Cathode Characteristics . . . . . . . . . . . . . . . . . . . . . . . . 349
Rate Effect-dV /dt .................................. 350
Breakover Voltage ................................... 351
Holding Current .................................... 351
Forward Voltage .................................... 351
Reverse Leakage Current ............................. 352
Blocking Leakage Current . . . . . . . . . . . . . . . . . . . . . . . . . . . . 352
Turn-On Time ...................................... 352
Recovery Time ...................................... 353
Measurement of Electrical Characteristics .................. 355
Measurements on Tektronix 575 ....................... 355
Leakage Current Measurements ........................ 357
Dynamic Breakdown Voltage Measurements ............. 357
Tum-OH Time Measurements ......................... 358
SCS Applications ..................................... 359
Lamp Driver ....................................... 359
Basic Alarm-Voltage Sensing Circuit ................... 359
Multiple Alarm Circuit ............................... 360
Square Wave Generator .............................. 360
Sawtooth Generator .................................. 361
Pulse Amplifiers-Stretchers ........................... 361
Time Delay Generator-Pulse Actuated .................. 362
Time Delay Generator-Gate Actuated ................... 362
Time Delay Generator-AC Operated ................... 363
Schmitt Trigger ..................................... 363
Bistable Memory Element ............................ 364
Pulse Sequence Detector .............................. 364
Pulse Coincidence Detector ........................... 365
Ring Counter-Including Reset ........................ 365
Ring Counter with Independent Outputs per Stage ....... 366
Ring Counter-Loads with Common Ground ............ 366
Shift Register Configuration .......................... 367
20. EXPERIMENTERSCIRCUITS ...................... 369
21. READER'SLIST ................................... 379
Directory of Publishers ................................. 384
22. TRANSISTORSPECIFICATIONS ................... 385
Introduction .......................................... 385
GE Type Index ........................... 386
GE Transistor and Diode Selection Charts ................ 387
GE Outline Drawings .................................. 406
Registered JEDEC Transistor Types with Interchangeability
Information ........................................ 412
VII
FOREWORD
During the past year and a half, many new processes and develop-
ments in semiconductors have been introduced. The Sixth Edition
of the General Electric Transistor Manual has been completely
rewritten and expanded by over 100 pages to include these
many improvements.
New processes and developments have been responsible for the
creation of totally new product lines. These new lines include the
General Electric Family of Silicon Planar Epitaxial Passivated
Transistors (PEP), the NPNP Silicon Controlled Switch, PEP
Controlled Conductance Diodes with ultra fast switching speeds,
and many other new transistor and diode types. These new devices,
with their unique characteristics have opened up many new areas
of applications and have ultimately produced higher reliability,
less complex circuitry and lower cost.
At the same time, General Electric has been actively engaged in a
major program to increase reliability in semiconductor devices by
several orders of magnitude. The MINUTEMAN Product Improve-
ment Program is designed to accomplish the reliability objective of
0.001 % failure rate per 1,000 hours. While this product improve-
ment program is directed specifically to the MINUTEMAN types,
process improvements developed and confirmed in this activity
are fed into other product manufacturing lines. This assures con-
stantly improved devices for circuit applications where reliability
is of utmost importance.
The addition of all these latest improvements to your Sixth Edition
General Electric Transistor Manual will assure its continued use-
fulness as your handy reference guide.
VIII
SEMICONDUCTORTHEORY
In 1833, Michael Faraday, the famed English scientist, made what is perhaps the
first significant contribution to semiconductor research. During an experiment with
silver sulphide Faraday observed that its resistance varied inversely with temperature.
This was in sharp contrast with other conductors where an increase in temperature
caused an increase in resistance and, conversely, a decrease in temperature caused a
decrease in resistance. Faraday's observation of negative temperature coefficient of
resistance, occurring as it did over 100 years before the birth of the practical transistor,
may well have been the "gleam in the eye" of the future.
For since its invention in 1948 the transistor has played a steadily increasing part
not only in the electronics industry, but in the lives of the people as well. First used in
hearing aids and portable radios, it is now used in every existing branch of electronics.
Transistors are used by the thousands in automatic telephone exchanges, digital com-
putors, industrial and military control systems, and telemetering transmitters for
satellites. A modern satellite may contain as many as 2500 transistors and 3500 diodes
as part of a complex control and signal system. In contrast, but equally as impressive,
is the two transistor "pacemaker," a tiny electronic pulser. When imbedded in the
human chest and connected to the heart the pacemaker helps the ailing heart patient
live a nearly normal life. What a wonderful device is the tiny transistor. In only a few
short years it has proved its worth - from crystal set to regulator of the human heart.
But it is said that progress moves slowly. And this is perhaps true of the first
hundred years of semiconductor research, where time intervals between pure research
and practical application were curiously long. But certainly this cannot be said of the
years that followed the invention of the transistor. For since 1948 the curve of semi-
conductor progress has been moving swiftly and steadily upward. The years to come
promise an even more spectacular rise. Not only will present frequency and power
limitations be surpassed but, in time, new knowledge of existing semiconductor mate-
rials ... new knowledge of new materials . . . improved methods of device fabrication
... the micro-miniaturization of semiconductor devices ... complete micro-circuits ...
all, will spread forth from the research and engineering laboratories to further influence
and improve our lives.
Already, such devices as the tunnel diode, the mesa transistor, and the high-speed
diode can perform with ease well into the UHF range; transistors, that only a short time
ago were limited to producing but a few milliwatts of power, can today produce thou-
sands upon thousands of milliwatts of power; special transistors and diodes such as the
unijunction transistor, the high-speed diode, and the tunnel diode can simplify and make
more economical normally complex· and expensive timing and switching circuits. Intri-
cate and sophisticated circuitry that normally would require excessive space, elaborate
cooling equipment, and expensive power supply components can today be designed
and built to operate inherently cooler within a substantially smaller space, and with
less imposing power components, by designing with semiconductors. In almost -all
areas of electronics the semiconductors have brought immense increases in efficiency
and in reliability.
In the short span of years since the advent of the transistor a variety of semi-
conductor devices have been developed. Symbols representing these devices are shown
1
SEMICONDUCTORTHEORY
in Figure 1.1. Numerous individual types are today commercially available from each
category to answer the needs of the professional electronic equipment designer, the
radio amateur, and the experimenter. It goes without saying that with time more and
newer devices will be added.
I~
NPN
TRANSISTOR
2~
4~
PNP
TRANSISTOR
Bl
NPN TETRODE
E
TRANSISTOR
(REVERSE EMITTER
::~o~sri~I
82
FIELD EFFECT
TRANSISTOR
~··
UNIJUNCTION
TRANSISTOR
Bl
7. 8. 9. 10.
$*t ~
·~ * Cf
TRANSISTOR TUNNEL BACKWARD DIODE, ZENER OR SYMMETRICAL
(REVERSE ARROWS DIODE SIGNALDIODE, BREAKDOWN ZENER
FOR PNPN DEVICE) OR RECTIFIER DIODE DIODE
'Ar '4
A -ANODE B-BASE
B -BREAKDOWN DEVICE (9 AND 10) E -EMITTER
B,-BASE ONE G - GATE
GA B2-BASE TWO GA- ANODE
C -CATHODE (7,8,9,11 AND 12 ONLY) GATE
C -COLLECTOR (1,2,3 ANO 4 ONLY I Ge-CATHODE
GATE
Ge C
SILICON
* SEE GE TUNNEL DIODE MANUAL, P 16-17
FOR ADDITIONAL SYMBOL INFORMATION SILICON
CONTROLLED CONTROLLED
SWITCH RECTIFIER
STANDARDSYMBOLSFOR SEMICONDUCTORDEVICES
Figure1.1
For the most part this chapter is concerned with the terminology and theory of
semiconductors as both pertain to diodes and junction transistors. The variety of semi-
conductor devices available preclude a complete and exhaustive treatment of theory
and characteristics for all types. Such devices as the silicon controlled rectifier and the
tunnel diode are well covered in other General Electric Manuals;* treatment of the
unijunction transistor will be found in Chapter 13 of this manual. Other pertinent
literature will be found in Chapter 21.
Although a complete understanding of the physical concepts and operational theory
of the transistor and diode are not necessary to design and construct successful tran-
sistor circuits, they can be helpful. The professional electronics engineer, the radio
amateur, and the serious experimenter can all obtain practical and rewarding benefits
from a general understanding of the basic physics and theory of semiconductors. Such
•See Reference List
2
SEMICONDUCTOR THEORY
understanding will often aid in solving special circuit problems, will help in under-
standing and using the newer semiconductor devices as they become available, and
surely will help clarify much of the technical literature that more and more abounds
with semiconductor terminology.
SEMICONDUCTORS
Semiconductor technology is usually referred to as solid-state. This suggests, of
course, that the matter used in the fabrication of the various devices is a solid, as
opposed to liquid or gaseous matter - or even the near pedect vacuum as found in the
thermionic tube - and that conduction of electricity occurs within solid material. "But
how," it might be asked, "can electrical charges move through solid material as they
must, if electrical conduction is to take place?" With some thought the answer becomes
obvious: the so-called solid is not solid, but only partially so. In the microcosmos, the
world of the atom, there is mostly space. It is from close study of this intricate and
complicated "little world," made up mostly of space, that scientists have uncovered the
basic ingredients that make up solid state devices - the semiconductors. Transistors
and diodes, as we know them today, are made from semiconductors, so-called because
they lie between the metals and the insulators in their ability to conduct electricity.
There are many semiconductors, but none quite as popular at the present time as
germanium and silicon, both of which are hard, brittle crystals by nature. In their
natural state they are impure in contrast, for example, to the nearly pure crystalline
structure of high quality diamond. In terms of electrical resistance the relationship of
each to well known conductors and insulators is shown in Chart 1.
Chart 1
Because of impurities the R/CM 3 for each in its natural state is much less than
an ohm, depending on the degree of impurity present. Material for use in most prac-
tical transistors requires R/CM 3 values in the neighborhood of 2 ohms/ CM•. The
ohmic value of pure germanium and silicon, as can be seen from Chart 1, is much
higher. Electrical conduction then, is quite dependent on the impurity content of the
material, and precise control of impurities is the most important requirement in the
production of transistors. Another important requirement for almost all semiconductor
devices is that single crystal material be used in their fabrication. To better appreciate
the construction of single crystals made from germanium and silicon, some attention
must be first given to the makeup of their individual atoms. Figure l.2(A) and (C)
show both as represented by Bohr models of atomic structure, so named after the
Danish physicist Neils Bohr.
3
SEMICONDUCTOR THEORY
VALENCE
BAND
VALENCE
SILICON ATOM
=0 SIMPLIFIED
CCl IDI
4
SEMICONDUCTORTHEORY
CENTRALCORE
OR KERNEL
/
-e, \
(0)
' ....__/
SHARED
ORBIT
, ...:,, ~--e-..
' , '
COVALENTOR
ELECTRON-PAIR
OF ATOMS
BOND '0Y
\ f.:i=\'
'-:!:)
I \
' ---a--"''····(}'
/
I
Figure1.3
5
SEMICONDUCTOR THEORY
' I \ / \ I \/ \ I
v J X ~
/ A
'\
+4
....,,,,
;<, -
@'\
e .....
>( -
@'
e\ ->~®./_\
,,,
e ', ><-~\e '/ .... ,
x
,, ~ ..,,,,," ,, ' 'I'/ 'I ,,, '
\ I \ I \ I \ I ,/
,1 \ I \ I \ I \t
X <
/\ @'\ ©/_\ @'' @'\..
i\ J\ i,
~......
,,,,,. '
\1
@,-?-
\I
,_r
\I
..... ,,,
E) ,,,,,x,E) ,,,,,x,
-:.-<,, ,,,,,'><..,
,-
\
..... /.
E) ,,,'>--,
..... ,,,,
x,
- E) -....
- I
/,
I
/
/\ ,x ':(
1< 1\
I \,/ \ I \ I
/
' ,,,,.
'>',
'
0 -' ')'~
....,
/
/
,,,.., - Q
' Q
- "'
,,"
..... ....
~
.... ....
';,< Q
,, ' Q
....,
- >,
,,
/
' Q ....
"" ',
,,
t" - l - (j" \
\\ I \ I \ / \ / \ /
/4 X X X X
' ,,,,,.I'
)(
,, ', @ @'-\
•
,,-
\/
...
;< •
-
@/\-.......,
@'\ ..X-(04....,
/
,, r
@/\
,.,<,-•-
X
/
' Q
~
.....
/
/,
'..l
\/
Q
....
,, '
~
/
/
\/
Q
.... ,,
'>~
,..... '
\1 \/ \ I \/ \/
A
,,,,,
1'\
.,, 1,
I\ /\
.,, 1,i\
TWO DIMENSIONAL
GERMANIUM
LATTICE STRUCTURE
Figure 1.4
Figure 1.5
6
SEMICONDUCTOR THEORY
CONDUCTION
As already mentioned, to be of practical use transistors require crystal material of
greater conductivity (lower R/CM 1 ) than found in highly purified germanium and
silicon. The conductivity can be increased by either heating the crystal or by adding
other types of materials (impurities) to the crystal when it is formed.
Heating the crystal will cause vibration of the atoms which form the crystal. Occa-
sionally one of the valence electrons will acquire enough energy (ionization energy) to
break away from its parent atom and move through the crystal. When the parent atom
loses an electron it will assume a positive charge equal in magnitude to the charge of
the electron. Once an atom has lost an electron it can acquire an electron from one of
its neighboring atoms. This neighboring atom may in tum acquire an electron from one
of its neighbors. Thus it is evident that each free electron which results from the break-
ing of a covalent bond will produce an electron deficiency which can move through
the crystal as readiJy as the free electron itself. It is convenient to consider these elec-
tron deficiencies as particles which have positive charges and which are called holes.
Each time an electron is generated by breaking a covalent bond a hole is generated at
the same time. This process is known as the thermal generation of hole-electron pairs.
The average time either carrier exists as a free carrier is known as lifetime. If a hole
and a free electron collide, the electron will fill the electron deficiency which the hole
represents and both the hole and electron will cease to exist as free charge carriers.
This process is known as recombination.
Conductivity can also be increased by adding impurities to the semiconductor
crystal when it is formed. These impurities may be donors, such as arsenic which
"donates" extra free electrons to the crystal since each arsenic atom contains five elec-
trons in its valence band; or acceptors, such as aluminum which "accepts" electrons
from the crystal to produce free holes since each aluminum atom contains only three
electrons in its valence band. A donor atom, which has five valence electrons, takes
the place of a semiconductor atom in the crystal structure. Four of the five valence
electrons are used to form covalent bonds with the neighboring semiconductor atoms.
The fifth electron is easily freed from the atom and can move through the crystal.
The donor atom assumes a positive charge, but remains fixed in the crystal. A semi-
conductor which contains donor atoms is called an n-type semiconductor since con-
duction occurs by virtue of free electrons (negative charge). A two dimensional model
of n-type semiconductor is shown in Figure 1.6.
', X
\/ ', A l
I\ @I_\ @/\
@ ,,x, e ~/><..
e
' ,,, ' ,,, ........ ' ,
,'>~ ,,,x,
'..-.
\ I
,,,>-"'@+4
, 0
, - r
/',1®
' I V
/ ,,,,
, ®
'
- .... ,,, -,
W ,,Y@+4
-
OONOR ATOM\<.
, 0 - ,,,~"'
- ,,,
.....
,
I'
XI
~ .....
\ I EXCESS \ / \ /
N-TYPE SEMICONDUCTOR v'
'\ @'\ @'~\
ELECTRON \ / ' /
Figure 1.6
' ,,,
,/ @
'A..
"
,
E)-
'
-r ,
'
.>< '
/
X'
,,, ..., ,,,
/
>,
' 0
0 ,,,
,
'
'.,tI \
)I I '1
I
,
i,
' /
'
' I
X\
7
SEMICONDUCTORTHEORY
An acceptor atom, which has three valence electrons, can also take the place of a
semiconductor atom in the crystal structure, All three of the valence electrons are used
to form covalent bonds with the neighboring atoms. The fourth electron which is
needed can be acquired from a neighboring atom, thus giving the acceptor atom a
negative charge and producing a free hole in the crystal. A semiconductor which con-
tains acceptor atoms is called a p-type semiconductor since conduction occurs by virtue
of free holes in the crystal (positive charge). A two dimensional model of p-type semi-
conductor is shown in Figure 1.7.
'\ />....,@/_\
\ I \/ \ I
X A ,'<
@1_\
@ e 'l',,x-e ..
.. ,,,,
,,,,'>(
\
\
I
I ACCEPTOR
' //
\
\ /
I
',
\
,/
I
' ,
✓><
X 1< 1,
'@'-', ,,,,'-
•..
' ....@'\...
,'
ATOM
P-TYPESEMICONDUCTOR
/
Y
8 / ' ... ,,.. '
' ,,,,"' +4-X ft; Y-+4-'<
\ ~ \ - HOLE - /
Figure 1.7 \ / , /<ELECTRON \ ,
/\ @'' @'-_\
\t \( DEFICIENCY) X
"/
/
')<'
- ?'
/
>, ...\ ,,,, ..
' I \
'v
/\ ,
>1
I
'· 'x
, '
I
To summarize, solid-state conduction takes place by means of free holes and free
electrons (carriers) in semiconductor crystals. These holes or electrons may originate
either from donor or acceptor impurities in the crystal, or from the thermal generation
of hole-electron pairs. During the manufacture of the crystal it is possible to control
conductivity, and make the crystal either n-type or p-type by adding controlled
amounts of donor or acceptor impurities. A variety of such impurities are shown in
_ _,- Chart 2. On the other hand, thermally generated hole-electron pairs cannot be con-
trolled other than by varying the temperature of the crystal.
8
SEMICONDUCTOR THEORY
GROUPIN NUMBER
ELEMENT PERIODIC VALENCE APPLICATIONSIN
(SYMBOL) ELECTRONS SEMICONDUCTORDEVICES
TABLE
9
SEMICONDUCTOR THEORY
£
'W
DIFFUSED CHARGES
e e 0 e 0
0 e e 0 e
e e e e e
Figure1.8
of space charge neutrality, the total number of electrons in the semiconductor is deter-
mined by the total number of acceptor atoms in the crystal. For the case of the p-type
semiconductor, hole-electron pairs are generated at the upper terminal. The electrons
flow through the wire to the positive terminal of the battery and the holes move down-
ward through the semiconductor and recombine with electrons at the lower terminal.
-- @
•
ft
e +
•
fI G> DONOR ATOMS
(POSITIVECHARGE)
• +
(¼)
-
+ + e - e ACCEPTOR ATOMS
• • (NEGATIVE CHARGE)
(±) e +
• • + FREE HOLES
+
@ • e
FREE ELECTRONS
N-TYPE P-TYPE
CONDUCTION IN N-TYPE AND P-TYPE SEMICONDUCTORS
Figure1.9
10
SEMICONDUCTOR THEORY
DIODES
H a p-type region and an n-type region are formed in the same crystal structure,
we have a device known as a diode. The boundary between the two regions is called
a ;unction, the terminal connected to the p-region is called the anode, and the ter-
minal connected to the n-region is called the cathode. A diode is shown in Figure
1.10 for two conditions of applied voltage. In Figure l.IO(A) the anode is at a negative
voltage with respect to the cathode and the diode is said to be reverse biased. The
holes in the p-region are attracted toward the anode terminal (away from the junction)
and the electrons in then-region are attracted toward the cathode terminal (away from
the junction). Consequently, no carriers can How across the junction and no current
will How through the diode. Actually a small leakage cu"ent will How because of the
few hole-electron pairs which are thermally generated in the vicinity of the junction.
Note that there is a region near the junction where there are no carriers (depletion
layer). The charges of the donor and acceptor atoms in the depletion layer generate a
voltage which is equal and opposite to the voltage which is applied between the anode
and cathode terminals. As the applied voltage is increased, a point will be reached
where the electrons crossing the junction (leakage current) can acquire enough energy
to produce additional hole-electron pairs on collision with the semiconductor atoms
(avalanche multiplication). The voltage at which this occurs is called the avalanche
voltage or breakdown voltage of the junction. If the voltage is increased above the
breakdown voltage, large currents can How through the junction and, unless limited by
the external circuitry, this current can result in destruction of the diode.
ANODE
I -+O
e + e + e + e + t1
+ P REGION ++ .. + t +
e e e e +-e +
G) @ @+-(t) tG> -
+ N REGION t- +@ -t @- -t
@ e
CATHODE
(A) REVERSE BIAS ( B) FORWARD BIAS
CONDUCTION
IN A PN JUNCTIONDIODE
Figure1.10
In Figure l.l0(B) the anode of the diode is at a positive voltage with respect to the
cathode and the rectifier is said to be forward biased. In this case, the holes in the
p-region will flow across the junction and recombine with electrons in the n-region.
Similarly, the electrons in the n-region will How across the junction and recombine
with the holes in the p-region. The net result will be a large current through the diode
for only a small applied voltage.
TRANSISTORS
An NPN transistor is formed by a thin p-region between two n-regions as shown
in Figure 1.11. The center p-region is called the base and in practical transistors is
generally less than .001 inch wide. One junction is called the emitter junction and the
11
SEMICONDUCTORTHEORY
other junction is called the collector junction. In most applications the transistor is
used in the common emitter configuration as shown in Figure 1.11 where the current
through the output or load (RL) Howsbetween the emitter and collector and the control
or input signal (VBE) is applied between the emitter and base. In the normal mode of
operation, the collector junction is reverse biased by the supply voltage Vco and the
emitter junction is forward biased by the applied base voltage VBB, As in the case of
the diode, electrons How across the forward biased emitter junction into the base
region. These electrons are said to be emitted or injected by the emitter into the base.
They diffuse through the base region and How across the collector junction and then
through the external collector circuit. Transistor action is therefore one of injection,
di/fusion, and collection.
COLLECTOR
+
=_Vee (DONOR AND ACCEPTOR ATOMS
ARE NOT SHOWN)
IE f EMITTER
CONDUCTION
IN AN NPN JUNCTIONTRANSISTOR
(COMMON EMITTER CONFIGURATION)
Figure1.11
If the principle of space charge neutrality is used in the analysis of the transistor,
it is evident that the collector current is controlled by means of the positive charge
(hole concentration) in the base region. As the base voltage Vam is increased the posi-
tive charge in the base region will be increased, which in tum will permit an equivalent
increase in the number of electrons flowing between the emitter and collector across
the base region. In an ideal transistor it would only be necessary to allow base current
to How for a short time to establish the desired positive charge. The base circuit could
then be opened and the desired collector current would How indefinitely. The collector
current could be stopped by applying a negative voltage to the base and allowing the
positive charge to How out of the base region. In actual transistors, however, this can
not be done because of several basic limitations. Some of the holes in the base region
will How across the emitter junction and some will combine with the electrons in the
base region. For this reason, it is necessary to supply a current to the base to make up
for these losses. The ratio of the collector current to the base current is known as
the current gain of the transistor hrm = Io/le. For a-c signals the current gain is
= =
fJ hr. ic/ib, The ratio of the a-c collector current to a-c emitter current is desig-
nated by Cl= htb = icli •.
When a transistor is used at higher frequencies, the fundamental limitation is the
12
SEMICONDUCTOR THEORY
time it takes for carriers to diffuse across the base region from the emitter to the col-
lector. Obviously, the time can be reduced by decreasing the width of the base region.
The frequency capabilities of the transistor are usually expressed in terms of the
alpha cuto.i frequency (fhrb). This is defined as the frequency at which ci decreases to
0.707 of its low frequency value. The alpha cutoff frequency may be related to the
base charge characteristic and the base width by the equations:
TE =~
IE
= -~
2D
= ....Q:!!!_
fhrb
where TE is the emitter time constant, QBis the base charge required for an emitter
current IE, W is the base width, and D is the diffusion constant which depends on the
semiconductor material in the base region.
The operation of the transistor has been described in terms of the common emitter
configuration. The term grounded emitter is frequently used instead of common
emitter, but both terms mean only that the emitter is common to both the input circuit
and output circuit. It is possible and often advantageous to use transistors in the
common base or common collector configuration. The different configurations are shown
in Figure 1.12 together with their comparative characteristics in class A amplifiers.
COMMON
EMITTER
(CE)
d}RL moderate input impedance
moderate output impedance
high current gain
high voltage gain
highest power gain
(1.3 K)
(5()K)
(35)
(-270)
(40 db)
•Numerical values are typical for the 2N525 at audio frequencies with a bias of
(500 0)
5 volts and 1 ma., a loaa resistance of 1 OK, and a source ( generator) resistance
of lK.
(-36)
(1.00)
(15 db)
13
SEMICONDUCTOR THEORY
REFERENCES
Bardeen, J. and Brittain, W.H., "The Transistor, A Semiconductor Triode,'' Physics Review, Vol. 74,
No. 2, page 230, July 15, 1948.
Bragg, Sir William, "Concerning the Nature of Things,'' Dover Publications, New York, New York.
Bush, G.L., and Silvidi, A.A., "The Atom - A Simplified Description,'' Barns & Noble, Inc., New
York, New York.
•"Controlled Rectifier Manual," General Electric Company, Rectifier Components Department,
Auburn, New York ( 1961 ).
Pearson, G.L. and Brittain, W.H., "History of Semiconductor Research,'' Proc. IRE, Vol. 43,
pp. 1794-1806 (December 1955).
Shoclcley, W., "Transistor Electronics: lmpe1fedions, Unipolar and Analog Transistors,'' Proc. IRE,
Vol. 40, pp. 1289-1313 (November 1952).
•"Tunnel Diode Manual,'' General Electric Company, Semiconductor Products Department, Liver-
pool, New York ( 1961 ).
14
TRANSISTORCONSTRUCTION
TECHNIQUES
The knowledge of many sciences is required to build transistors. Physicists use the
mathematics of atomic physics for design. Metallurgists study semiconductor alloys and
crystal characteristics to provide data for the physicist. Chemists contribute in every
facet of manufacturing through chemical reactions which etch, clean and stabilize
transistor surfaces. Mechanical engineers design intricate machines for precise handling
of microminiature parts. Electronic engineers test transistors and develop new uses for
them. Statisticians design meaningful life test procedures to determine reliability. Their
interpretation of life test and quality control data leads to better manufacturing
procedures.
The concerted effort of this sort of group has resulted in many different construc-
tion techniques. All these techniques attempt to accomplish the same goal - namely to
construct two parallel junctions as close together as possible. Therefore, these tech-
niques have in common the fundamental problems of growing suitable crystals, form-
ing junctions in them, attaching leads to the structure and encapsulating the resulting
transistor. The remainder of this chapter discusses these problems.
METAL PREPARATION
Depending on the type of semiconductor device being made, the structure of the
semiconductor material varies from nearly perfect single crystal to polycrystalline. The
theory of transistors and rectifiers, however, is based on the properties of single crystals.
Defects in a single crystal produce generally undesirable effects.
Germanium and silicon metal for use in transistor manufacture IJlUStbe so purified
that the impurity concentration is less than one part in 10'0 • Donor and acceptors are
then added in the desired amounts and the material is then grown into a single crystal.
DIRECTION OF TRAVEL
__, ____ OF INDUCTION COIL AND
MOLTEN ZONE
15
TRANSISTORCONSTRUCTIONTECHNIQUES
The initial purification of germanium and silicon typically involves reactions which
produce the chemical compounds germanium and silicon tetrachloride or dioxide.
These compounds can be processed to give metallic germanium or silicon of relatively
high purity. The metal so prepared is further purified by a process called zone refining.
This technique makes use of the fact that many impurities are more soluble when the
metal is in its liquid state, thus enabling purification to result by progressive solidifica-
tion from one end of a bar of metal.
In practical zone refining a narrow molten zone is caused to traverse the length of
a bar. A cross-sectional view of a simplified zone refining furnace is shown in Figure
2.1. High purity metal freezes out of the molten zone as the impurities remain in
solution. By repeating the process a number of times, the required purity level can be
reached. During the process it is important that the metal be protected from the intro-
duction of impurities. This is done by using graphite or quartz parts to hold the metal,
and by maintaining an inert atmosphere or vacuum around it. The heating necessary to
produce a narrow molten zone is generally accomplished by induction heating, i.e., by
coils carrying radio frequency energy and encircling the metal bar in which they
generate heat.
The purified metal is now ready for doping and growing into a single crystal.
A common method for growing single crystals is the Czochralski method illustrated in
Figure 2.2. In it a crucible maintains molten metal a few degrees above its melting
point. A small piece of single crystal called a seed is lowered into the molten metal and
then slowly withdrawn. If the temperature conditions are properly maintained a single
crystal of the same orientation, i.e., molecular pattern as the seed grows on it until aJl
the metal is grown into the crystal. Doping materials can be added to the molten metal
in the crucible to produce appropriate doping. The rate at which doping impurities are
transferred from the molten metal to the crystal can be varied by the crystal growing
rate, making it possible to grow transistor structures directly into the single crystal.
This is discussed in detail in the next section.
The floating zone technique for both refining and growing single crystals has
recently been introduced. It is quite similar in principle to zone refining except that
the graphite container for the bar is· eliminated, reducing the risk of contamination.
In place of it, clamps at both ends hold the bar in a vertical position in the quartz
tube. The metal in the molten zone is held in place by surface tension. Doping agents
added at one end of the bar can be uniformly distributed through the crystal by a
single cycle of zone refining. This technique has had much success in producing high
quality silicon metal.
JUNCTIONFORMATION
A junction is a surface separating two regions of a semiconductor, one with n type
and the other with p type conductivity. Since transistors consist of two closely spaced
junctions, it is necessary to establish highly non-uniform distributions of n and p type
impurities in the semiconductor lattice. The techniques used for establishing these
impurity distributions provide the basis for the different types of transistors being
made today.
Three basic techniques are used, individually or in combination, in establishing
the desired impurity distribution. The first of these is to form an alloy of the semi-
conductor and a material which acts as either a donor or acceptor in the semiconductor
lattice. The most common materials used for this purpose are indium, which is used
for making the emitter and collector regions of germanium alloy transistors such as the
2N43A and the 2N396, and aluminum, which is used for making the emitter region of
16
TRANSISTOR CONSTRUCTION TECHNIQUES
~DD
SEED HOLDER
SEED
GRAPHITECRUCIBLE
HEATER
••
•
••• -=========-=--
•
•••••••o••••
17
TRANSISTORCONSTRUCTIONTECHNIQUES
germanium mesa transistors such as the 2N705 and 2N711. In these cases, an alloy
is formed with the metal and some of then type germanium. Upon freezing, a p type
semiconductor layer is deposited creating a pn junction.
A second method is to change the impurity concentration in the crystal as it is being
grown from the liquid state. Ordinarily, crystals are grown so as to produce some
constant level of impurity throughout. Because of a tendency for most impurities to
remain in the melt rather than deposit in the solid, which is also the basis of zone
refining, the concentration does not remain uniform as the crystal is grown, but in-
creases continuously due to the increasing impurity concentration in the melt. The
concentration of impurities deposited in the solid is affected by the rate at which the
crystal is grown, in the case of some impurities. By a proper selection of impurities
and the inclusion of both p and n type impurities in the melt, pn junctions can be
grown into the crystal by periodically changing the growth rate.
Diffusion is a third method of impurity control. It consists of a gradual movement
of impurity atoms through the semiconductor lattice while the semiconductor remains
a solid. Because this movement is a function of the thermal energy of the impurity
atoms, the rate of movement is temperature sensitive and appreciable movement takes
place at high temperatures. Temperatures used in diffusion range from 500°C to 800°C
for germanium and from 900°C to 1300°C for silicon.
INDIUM
~
MOLTENALLOY
\.
'
N·TYPE GERMANIUMI HEAT
REMOVED
FORMATION BY ALLOYING
SEED
N-TYPE N
GERMANIUM p
\~/
HEAT
\l/
HEAT
APPLIED APPLIED
JUNCTIONFORMATIONBY RATEGROWING
JUNCTIONFORMATIONS
Figure2.3
18
TRANSISTOR CONSTRUCTION TECHNIQUES
ALLOY TRANSISTORS
The alloy transistor is made by alloying metal into opposite sides of a thin piece
of semiconductor to form an emitter and collector region. In order to achieve uniformity
of the transistor characteristics, the pellet thickness, the quantity of metal to be alloyed,
the area of contact of the metal to the semiconductor and the alloying temperature
must be carefully controlled. Each of these variables affects the base width of the
transistor, which in turn affects most electrical characteristics. Because of the large
number of variables, thin base widths cannot be achieved consistently; therefore, a
practical lower limit exists for the base width and with it an upper limit on the oper-
ating frequency is also established. One measure of the maximum operating frequency
is fhrb; this is the frequency at which the current gain of the transistor is 3 db below
its low frequency value, commonly referred to as the alpha cutoff frequency. Typical
values of fhrbfor alloy transistors range from 1 me for the 2N43 to 8 me for the 2N396.
On the other hand, the emitter and collector regions of an alloy transistor are quite
thin and have a high electrical conductivity. Because of this alloy transistors have a
very low saturation resistance. The saturation resistance is a measure of how nearly
the transistor can be made to appear as a short circuit when it is turned on in switch-
ing circuits, and in most transistors it is made up primarily of the parasitic resistance
of the emitter and collector bodies. A typical value for the 2N396 is 1.6 ohms at 50 ma.
The microalloy transistor is a variation of the alloy transistor. In order to achieve
a thin base width without making the transistor unduly fragile, electrochemical etching
techniques are used to provide a very thin region in the middle of an otherwise rela-
tively thick pellet. Metal is then deposited on each side of this thin region and alloyed
with a very small amount of germanium. Electrically, the characteristics are those of
an alloy transistor with a thin base. Mechanically, the transistor is less fragile than it
would be if the entire pellet were the same thickness as the base region.
A variation of the microalloy transistor is the microalloy diffused transistor. In this
case, a diffused layer is established over the entire pellet surface prior to etching the
thin region in the middle of the pellet. The etching is then done predominantly on
one side so as to remove the diffused layer from the region of the collector contact.
The other side of the pellet is etched only slightly so that the emitter is adjacent to
the diffused region. Both the microalloy and microalloy diffused transistors represent
improvements in frequency response over conventional alloy transistors. Typical of
these processes are the microalloy 2N393 with fhrbof 40 me and the microalloy diffused
transistor 2N502 with f11rb of 200 me.
19
TRANSISTOR CONSTRUCTION TECHNIQUES
p-TYPE
P-TYPE COLLECTOR
EMITTER REGION
REGION
INDIUM-
GERMANIUM
ALLOY
n - TYPE
GERMANIUM
GROWNJUNCTIONTRANSISTORS
Grown junction transistors diJfer from alloy transistors in that the junctions are
created during the growth of the crystal rather than by alloying after the crystal is
grown. This results in significant differences in geometry and electrical characteristics.
One technique of growing junctions into the crystal is to vary the rate of growth and
utilize the variation of segregation coefficient with growth rate. In germanium, a very
slow growth speed is used to produce p regions while rapid growth is used to produce
n regions, thus creating a series of n and p regions; thirty or more pairs of junctions
can be produced in a single crystal in this manner. While both npn and pnp transistors
can be produced by rate growing, the npn structures are inherently more attractive
and rate growing is not used for making pnp transistors. (In silicon, rate growing is not
used because it does not produce transistors competitive with those produced from
grown diffused crystals. Grown diffused transistors are discussed on the next page.)
After the crystal is grown each pair of junctions is sawed from the wafer and diced
into several hundred individual pellets. Each pellet is thus an npn transistor, requiring
only leads and proper mounting. ( See Figure 2.5.)
n
20
TRANSISTORCONSTRUCTIONTECHNIQUES
The geometry of this device is such that mechanical strength is not a function of
the base width. It is simple to produce a base width as small as desired, but it is
difficult to control this consistently, as thermal conditions are not uniform throughout
the crystal during growth. Furthermore, it is difficult to achieve a high concentration of
p type impurities in the base region. For these reasons, rate grown transistors have a
lower limit on the base width, and, therefore, a limited frequency range. The 2N78
and 2N167 are typical rate grown transistors, both of which have an fbtb of 9 me.
It is necessary to make a contact to the base region of this transistor without signifi-
cantly altering the original structure. Any portion of the base lead which overlaps the
collector or emitter regions reduces the breakdown voltage and adds capacitance to
these junctions.
Another transistor with similar geometry is the grown diffused transistor. This tran-
sistor utilizes a combination of impurity segregation during growth and diffusion.
The segregation and diffusion coefficients are such that npn silicon and pnp germanium
transistors are produced by this process. In the case of silicon, a lightly doped n type
crystal is dipped into molten silicon containing n and p type impurities. A highly
conducting n type region is grown which also contains a considerable quantity of p type
impurities. After a short time at elevated temperatures these p type impurities diffuse
from the newly grown layer into the lightly doped n type material, thus creating a p
type base region between a heavily doped n type emitter region and a lightly doped n
type collector region. This technique provides better control of the base width and a
higher concentration of impurities in the base than can be achieved by rate growing.
Such transistors will therefore operate at higher frequencies even though the base
lead overlap still limits the performance. The 2N338 is a typical grown diffused tran-
sistor with an f htb of 20 me.
All grown junction transistors are mounted and supported by contacts to their
emitter and collector regions. Various methods have been used; the most reliable is
the use of a ceramic disc which has metallized regions to which the emitter and
collector regions are alloyed. This is known as fixed-bedconstruction. The rigid disc
prevents stresses in the semiconductor material which arise from vibration of the
header leads.
GOLOSTRIPE
IBASE
CONTACT)
P-TYPE
----- PELLET I
I COLLECTOR
21
TRANSISTOR CONST~UCTION TECHNIQUES
The mechanical reliability is not affected by the thickness of the base region because
it is diffused into the pellet from the surface. The use of diffusion results in excellent
control of the base width. In addition, resistivity of the base and collector regions can
be varied at will over a wide range to obtain optimum device characteristics.
The metal stripes are evaporated onto the surface of the diffused pellet. One stripe
is gold which provides a non-rectifying contact to the base region; the other stripe is
aluminum which forms a rectifying contact and thus serves as an emitter. Most of the
diffused layer outside the stripes is removed by etching so as to reduce the collector
junction capacitance and give better collector diode characteristics. The fabrication is
completed by mounting the pellet onto a header and bonding small gold wires to the
metal stripes. The thermal impedance between the junctions and the header is low
since the pellet is mounted directly on the header. High speed switching transistors
with an excellent reliability record have been made with this process.
The conventional mesa transistor utilizes a collector resistivity which is a com-
promise between a high resistivity for a high BVcuo and low capacitance on one hand,
and a low resistivity for a low saturation voltage on the other hand. The need for
compromise can be largely eliminated by using a combination of high and low resis-
tivity material in a single pellet. This is achieved by growing a high resistivity film
onto a low resistivity pellet.
Such films are called epitaxial films because the atoms are aligned in a continuation
of the original crystalline structure, resulting in one single crystal pellet. The base
region is then diffused into the thin film and the rest of the fabrication is the same as
for the conventional mesa. Epitaxial transistors represent a substantial improvement
over the conventional mesas in that a higher BVcuo, lower capacitance, and lower
saturation voltage can be achieved simultaneously. These improved characteristics in
tum permit higher switching speeds and operation at higher current levels. The 2N994
is an epitaxial transistor which is similar to the non-epitaxial 2N705. Cobis 30% smaller,
however, and VcE<SAT>is 50% smaller. In addition, the 2N994 provides a 400% in-
crease in current handling capability together with a 50% reduction in switching time.
22
TRANSISTOR CONSTRUCTION TECHNIQUES
BASE
ALUMINUM
EMITTER CONTACT
ALUMINUM DIFFUSED DIFFUSED
CONTACT EMITTER BASE
BASE
ALUMINUM
CONTACT
S 10 2 COVERING
COLLECTOR-BASE
JUNCTION
n-TYPE SILICON
(COLLECTOR)
SILICON PLANARPELLET
Figure2.7
ENCAPSULATION
The term encapsulation is used here to describe the processing from the completion
of the transistor structure to the final sealed unit. The primary purpose of encapsulation
is to ensure reliability. This is accomplished by protecting the transistor from mechani-
cal damage and providing a seal against harmful impurities. Encapsulation also governs
thermal ratings and the stability of electrical characteristics.
The transistor structure is prepared for encapsulation by etching to dissolve the
surface metal which may have acquired impurities during manufacture. Following
etching, a controlled atmosphere prevents subsequent surface contamination. The
transistor now is raised to a high temperature, is evacuated to eliminate moisture and
is refilled with a controlled atmosphere. Then the cap, into which a getter may be
placed, is welded on.
In some respects the design of the case, through its contribution to transistor reli-
ability, is as important as that of the transistor structure. Mechanically, users expect to
drop transistors, snap them into clips or bend their leads without any damage. Ther-
23
TRANSISTORCONSTRUCTIONTECHNIQUES
mally, users expect the header lead seals to withstand the thermal shock of soldering,
the junctions to be unaffected by heating during soldering, and the internal contacts to
be unchanged by thermal cycling. Considerable design skill and manufacturing cost is
necessary to meet the users expectations. Within the transistor structure, coefficients of
expansion are matched to prevent strain during thermal cycling. Kovar lead seals with-
stand the shock of soldering and do not fatigue and lose their effectiveness after thermal
cycling. Hard solders and welds maintain constant thermal impedance with time, avoid-
ing possible crystallization of soft solders.
For the stability of electrical characteristics, hermetic seals cannot be over-
emphasized. They not only preserve the carefully controlled environment in which the
transistor is sealed but they exclude moisture which causes instability. Moisture can
be responsible for slow reversible drifts in electrical characteristics as operating con-
ditions are changed. Also, while a transistor is warming up after exposure to low tem-
peratures, precipitated moisture may cause a large temporary increase in Ico. Kovar
glass lead seals are used in transistors designed for reliability. Kovar does not have the
low thermal impedance or ductility of copper, however, and therefore seal integrity is
paid for by a lower dissipation rating and a lower tolerance to lead bending.
The case design governs the transistor's thermal impedance, which should be as
low as possible and consistent from unit to unit. Very small cases minimize the junction
to case impedance while increasing the case to air impedance. Larger cases such as
the JED EC 370 mil TO-9 combine a lower case to air impedance, with a lead configura-
tion and indexing tab permitting automatic insertion of transistors into printed circuit
boards.
RELIABILITY
In principal, transistors have no known failure mechanism which should limit their
life expectancy. However, in practice, failure mechanisms do exist. To date sufficient
data has been collected to show that with careful construction techniques, transistors
are capable of operation in excess of 40,000 hours at maximum ratings without appre-
ciable degradation. There is no reason to believe this is the limit of operating life.
Since transistors can perform logical operations at very low dissipation and amplify at
high efficiency, the resulting low dissipation reduces the ambient temperature for
other components, enhancing their reliability as well. The transistor's small physical
size and its sensitivity to small voltage changes at the base results in low circuit capaci-
tances and low power requirements, permitting large safety factors in design. The
variety of manufacturing processes being used by the industry permits choosing the
optimum transistor for any circuit requirement. For example, rate grown transistors
offer low loo and low Cc for applications requiring low collector current. Alloy tran-
sistors offer high peak power capabilities, great versatility in application, and are
available in both PNP and NPN types. Mesa and planar epitaxial transistors give high
speed at high voltage ratings and with good saturation characteristics.
While reliability must be built in, it has seldom proved practical in the past to
make an absolute measurement of a specific transistor's reliability. Transistors cur-
rently are sufficiently reliable that huge samples and considerable expense in man-
power, equipment, and inventory are necessary to get a true measure of their reliability.
However, tests can readily show if a transistor falls far short of the required reliability;
therefore, they are useful in assigning ratings, in obtaining rate of degradation meas-
urements, and as a measure of quality control or process variability. Figures 2.8, 2.9,
2.10 and 2.11 show some of the considerations in designing reliable transistors.
24
TRANSISTOR CONSTRUCTION TECHNIQUES
ALLOY TRANSISTOR
DESIGN FOR RELIABILITY
(TYPES 2N43, 2N396, 2N525)
Figure 2.8
25
TRANSISTOR CONSTRUCTION TECHNIQUES
26
TRANSISTOR CONSTRUCTION TECHNIQUES
~
~z
DC CHARACTERISTICS Min. Max. Min. Max. Min. Max.
I>- Colloctor to Baso Volto90 Uc= 100 p.a) Vcuo 80 60 46 volts
• Colloctor to Ernlttor Voltago Uc = 26 ma) t
Emlttor to Boso Voltage (I 11= 100 µa)
Vcco
V111110
60
8
40
6
26
6
volts
volts
)-o,4
n
~
Forward Current Tran1for Ratio
(le= 160ma, Ve • = 10 V)t hr• 40 120 20 60 20
(le= lOma, Ve• = 10 V) hi'& 30 16 00
(le= lOOOma, Vcu = 10 V)t hn 16 )-o,4 ,-..,c
Uc= 0.1 ma, Vea= 10 V) hn 16
0 00
(le=
(le=
600ma, Vcs = 10 V)t
lOma, Vea= lOV, TA= -66°C)
Baso Saturation Volto90 Uc= 160 ma, Ia = 15 ma)
hn
bra
Va • 1a•T>
20
20
1.8
12
1.3 1.3 volts
z~
• Calloctor Saturation Valta90 (le= 160 ma, Ia= 16 ma)
CUTOFF CHARACTERISTICS
Vc • ,a1.T1
Vc• cuT1
VcmcuT>
(0.36 volts max., 2N2193, 94, 96 only)
(0.25 volts max., 2N2193A, 94A, 96A only)
(0.16 volts typ., 2N2193A, 94A, 95A only)
00
~~
=
• Collector Loalca90 Current !Von= SOV)
Von= 30 V, T. = 150°C)
~Von= 60V)
loao
lono
lono 10
10
26
100
50
mp.a
p.a
mp.a ...,
Von= 60 V, T. = 150°C) lcno 25 p.a
Ernitkr Base Cutoff Current (Vaa = 5 V~ lno 60 mp.a
• Emitkr Base Loalcage Current (Vu=
HIGH FREQUENCY
3 )
CHARACTERISTICS
lno 50 100 mp.a
Current Tranafor Ratio (le= 60 ma, V ca = 10 V, f = 20 me) bro 2.5 2.6 2.6
Colloctor Capacltonce (la= O,Von= 10 V, f = 1 me) c•• 20 20 20 pf
SWITCHING CHARACTERISTICS (See Figure 1)
IV,~== 15V, V,. = 15Vl
Rise Time t. 70 70 nsec
Storage Time t. 150 160 nsec
Fall Tlmo tt 50 50 nsec
tPulse width ~300 "sec, duty cycle ~2%
CHAPTER
GENERAL@ELECTRIC
~
THE TRANSISTOR SPECIFICATION SHEET
1. GENERALDEVICE CAPABILITIES
The lead paragraph found at the top of the sheet furnishes the user with a concise
statement of the most likely applications and salient electrical characteristics of the
device. It is useful in first comparison of devices as one selects the proper device for a
particular application.
2. ABSOLUTEMAXIMUM RATINGS
Absolute maximum' ratings specify those electrical, mechanical, and thermal ratings
of a semiconductor device which, as limiting values, define the maximum stresses
beyond which either initial performance or service life is impaired.
VOLTAGE
The voltages specified in the Absolute Maximum Ratings portion of the sheet are
breakdown voltages with reverse voltage applied to one selected junction, or across
two junctions with one junction reverse biased and the second junction in some speci-
fied state of bias. Single junction breakdown either between collector and base or
between emitter and base has the form shown in Figure 3.1.
CURRENT
FORWARD
CURRENT
P-N JUNCTION
FORWARD BIASED
BREAKDOWN
VOLTAGE
VOLTAGE
I
I
I
,... AVALANCHE
I CURRENT
: P-N JUNCTION
I REVERSEBIASED
I
I
TYPICALVOLTAGECURRENT
CHARACTERISTICSOF A P-N JUNCTION
Figure 3.1
30
THE TRANSISTOR SPECIFICATION SHEET
The solid portion of the curve is the active, normally used portion of a diode or
any compound junction device. The dotted portion exhibits large dramatic changes in
reverse current for small changes in applied voltage. This region of abrupt change is
called the breakdown region. If breakdown occurs at relatively low voltage, the mecha-
nism is through tunneling or "zener" breakdown. The means of conduction is through
electrons which have ..tunneled" from valence to conduction energy levels. A more
complete explanation of tunneling is contained in the Tunnel Diode Manual.•
At higher voltage levels conduction is initiated and supported by solid ionization.
When the junction is reverse biased, minority current flow (leakage current) is made
up of holes from the N-type material and electrons from the P-type material. The
high field gradient supplies carriers with sufficient energy to dislodge other valence
electrons, raising their energy level to the conduction band resulting in a chain genera-
tion of hole-electron pairs. This process is called avalanche. While theory predicts an
abrupt, sharp (sometimes called hard) characteristic in the breakdown region, a soft or
gradual breakdown often occurs. Another possibility is the existence of a negative
resistance ..hook." The hook usually occurs when zener breakdown is the predominant
mechanism. Figure 3.2 graphically illustrates these possibilities. In practice, silicon,
because of lower leakage current, exhibits a sharper knee than does germanium.
VOLTAGE
--.::.---
,.... \ ~/ ..,1--- RESISTIVE
LEAKAGECURRENT
..,""" COMPONENT
NEGATIVE
RESISTANCE SOFT KNEE
P-N JUNCTION
REVERSE BIASED
CURRENT
AVALANCHE
CURRENT
TYPICALVARIATIONS
IN BREAKDOWN
CHARACTERISTIC
OF A P-N JUNCTION
Figure3.2
The family of the 2N2193 to 2N2195 silicon devices are measured for individual
junction breakdown voltages at a current of 100 microamperes. Vcno, the collector-base
diode breakdown voltage- with emitter open circuited or floating - is shown to be a
minimum of 80 volts for the 2N2193 and 2N2193A.
VEno,the emitter-base breakdown voltage - with collector open circuited or floating
- is specified at 8 volts minimum for the 2N2193 and 2N2193A.
The breakdown voltage between collector and emitter is a more complex process.
The collector-base junction in any configuration involving breakdown is always reverse
biased. On the other hand, the condition applied to the emitter-base diode depends
upon the nature of base lead connection. The most stringent requirement is realized
by allowing the base to float. The next most stringent requirement is connecting the
•see references at end of Chapter I.
31
THE TRANSISTOR SPECIFICATION SHEET
base to the emitter through a resistor. A more lenient measurement is with base and
emitter shorted. Finally, the condition yielding the highest breakdown voltage is that
which applies reverse bias to the emitter-base junction. The symbols for the breakdown
voltage, collector to emitter, under the foregoing base connection conditions are VcEo,
VcEn, VcEs, and VcEx respectively. On some specification sheets the letter B, signifying
breakdown, precedes the voltage designation, i.e., BVcEo,
The generic shape of breakdown characteristics differs among transistors fabricated
by different processes. Figure 3.3 is typical of the planar epitaxial 2N2193. Note that
the BVcEo curve exhibits little current flow (Ict:o) until breakdown is initiated. At break-
down a region of negative resistance appears and disappears at increased collector
voltage. The region of negative resistance is not suitable for measurement and specifi-
cation because of instability. The low current positive resistance region below (in volt-
age) the breakdown region is so low as to cause instrumentation difficulties. It is
desirable, therefore, to measure breakdown voltage at a current, in the breakdown
region, where the slope is positive. This current for the 2N2193 family is 25 ma.
Since BVcEn and BVcEx as well as BVcEoexhibit a negative resistance region, they
must also be measured in a region of positive resistance. The voltage thus measured is
always less than voltage needed to establish breakdown. For this reason it has been
suggested that these voltages be named differently than breakdown voltages. One
proposal is to designate them as "sustaining" voltages with the prefix letter L substi-
tuted for B, i.e., LVcEn, The nomenclature VcEa c• u • t.> has also been used.
1000,-.-------------------,
1001---------------------1
i _ 25 MILLIAMPERESENSINGLEVEL
BVcu
i 101------------....---------1
a
a:
I
!THESE LEAKAGECURRENTSARE
EXAGGERATEOI
Ic[o Icn Icu
BVaolSUST.I
COLLECTORVOLTAGE
Yee
TYPICAL PLANAREPITAXIALCOLLECTOR
BREAKDOWNCHARACTERISTICS
Figure 3.3
32
THE TRANSISTOR SPECIFICATION SHEET
I0K
IK
100
BVct:11 is measured with the base shorted to the emitter. It is an attempt to indicate
more accurately the voltage range in which the transistor is useful. In practice, using
a properly stabilized circuit, such as those described in Chapter 7, the emitter junction
is normally forward biased to give the required base current. As temperature is in-
creased, the resulting increase in 1.-oand hFE requires that the base current decrease if
a constant, i.e., stabilized, emitter current is to be maintained. In order that base
current decrease, the forward bias voltage must decrease. A properly designed biasing
circuit performs this function. If temperature continues to increase the biasing circuit
will have to reverse bias the emitter junction to control the emitter current. This is
illustrated by Figure 7.1 which shows that VnE 0 when I .. =
0.5 ma at 70°C for =
=
the 2N525. VBE 0 is identically the same condition as a base to emitter short as far
as analysis is concerned. Therefore, the BVcEs rating indicates what voltage can be
applied to the transistor when the base and emitter voltages are equal, regardless of
the circuit or environmental conditions responsible for making them equal. Figure 3.4
indicates a negative resistance region associated with lc&s.At sufficiently high currents
the negative resistance disappears. The 600 µ.a sensing current intersects IcEs in the
negative resistance region in this example. Oscillations may occur depending on the
circuit stray capacitance and the circuit load line. In fact, "avalanche,. transistor
oscillators are operated in just this mode.
Conventional circuit designs must avoid these oscillations. If the collector voltage
does not exceed VA (Figure 3.4) there is no danger of oscillation. V,. is the voltage
at which the negative resistance disappears at high current.
To avoid the problems of negative resistance associated with BVcEs, BVcEa was
introduced. The base is connected to the emitter through a specified resistor. This
condition falls between BVcv.oand BVc•:Rand for most germanium alloy transistors
avoids creating a negative resistance region. For most low power transistors the resistor
is 10,000!2. The significance of BVc&a requires careful interpretation. At low voltages
the resistor tends to minimize the collector current as shown by equation ( 5q), in
Chapter 5. Near breakdown the resistor becomes less effective permitting the collector
current to increase rapidly.
Both the value of the base resistor and the voltage to which it is returned are
important. If the resistor is connected to a forward biasing voltage the resulting base
drive may saturate the transistor giving the illusion of a collector to emitter short.
Returning the base resistor to the emitter voltage is the standard BVcF.atest condition.
H the resistor is returned to a voltage which reverse biases the emitter junction, the
33
THE TRANSISTOR SPECIFICATION SHEET
collector current will approach I ..o, For example, many computer circuits use an emitter
reverse bias of about 0.5 volts to keep the collector current at cut-off. The available
power supplies and desired circuit ·functions determine the value of base resistance.
It may range from 100 to 100,000 ohms with equally satisfactory performance pro-
vided the reverse bias voltage is maintained.
In discussing the collector to emitter breakdown so far, in each case the collector
current is I ..o multiplied by a circuit dependent term. In other words all these collector
to emitter breakdowns are related to the collector junction breakdown. They all
depend on avalanche current multiplication.
Another phenomenon associated with collector to emitter breakdown is that of
reach-through or punch-through. Silicon devices as typified by grown diffused, double
diffused, planar, mesa, and planar epitaxial structures (see Chapter 2) do not exhibit
this characteristic. The phenomenon of reach-through is most prevalent in alloy devices
having thin base regions, and lighter base region doping than collector region doping.
As reverse voltage is increased the depletion layer spreads more in the base than in the
collector and eventually "reaches" into the emitter. An abrupt increase in current
results.
The dotted lines in Figure 3.4 indicate the breakdown characteristics of a reach
through limited transistor. Several methods are used to detect reach through. BVczx
(breakdown voltage collector to emitter with base reverse biased) is one practical
method. The base is reverse biased by 1 volt. The collector current Iczx is monitored.
If the transistor is avalanche limited BVcExwill approach BVcno. If it is reach-through
limited it will approach BVcEs,
Note that IcEx before breakdown is less than I ..o, Therefore, if I ..o is measured at a
specified test voltage and then the emitter is connected with a reverse bias of 1 volt,
the I ..o reading will decrease if reach-through is above the test voltage and will increase
if it is below.
"Emitter Boating potential" is another test for reach-through. If the voltage on an
open-circuited emitter is monitored while the collector to base voltage is increased, it
will remain within 500 mv of the base voltage until the reach-through voltage is
reached. The emitter voltage then increases at the same rate as the collector voltage.
VaT is defined as (Vcs - I) where Ven is the voltage at which VEs =
lv.
CURRENT
The absolute maximum collector current, shown as 1 ampere for the 2N2193, is a
pulse current rating. In this case it is the maximum collector current for which hFE is
specified. In some cases the current level at which hn drops from its maximum value
by 50% is specified. In all cases judgement concerning adverse life affects is a major
consideration. Also in all cases no other absolute maximµm rating can be exceeded in
using this rating. In cases of very short, high current pulses, the power dissipated in
transition from cutoff to saturation must be considered so that thermal ratings are
not exceeded.
TRANSISTOR DISSIPATION
Transistor dissipation ratings are thermal ratings, verified by life test, intended to
limit junction temperature to a safe value. Device dissipation is shown for three cases.
The first indicates the transistor in free air at an ambient temperah1re of 25°C. The
2N2193 under these conditions is capable of dissipating .8 watt. Further, we must
derate at a rate of 4.6 mw/°C for an ambient temperature above 25°C. This thermal
derating factor can be interpreted as the absolute maximum thermal conductance
34
THE TRANSISTOR SPECIFICATION SHEET
junction to air, under the specified conditions. If dissipation and thermal conductance
are specified at 25°C case temperature an infinite heat sink is implied and both dissipa-
tion and thermal conductance reach their largest allowable values. For the 2N2193
these are 2.8 watts arid 16 mw/°C respectively.
Both free air and infinite heat sink ratings are valuable since they give limit appli-
cation conditions from which intermediate (in thermal conductance) methods of heat
sinking may be estimated.
TEMPERATURE
The 2N2193 family carries a storage temperature rating extending from -65°C
to +300°C. High temperature storage life tests substantiate continued compliance
with the upper temperature extreme. Further, the mechanical design is such that
thermal/mechanical stresses generated by rated temperature extremes cause no elec-
trical characteristic degradation.
Operating junction temperature although stated implicitly by thermal ratings is
also stated explicitly as an absolute maximum junction tempetature.
3. ELECTRICALCHARACTERISTICS
Electrical characteristics are the important properties of a transistor which are
controlled to insure circuit interchangeability and describe electrical parameters.
DC CHARACTERISTICS
The first characteristics shown are the voltage ratings, repeated in the order of the
absolute maximum ratings, but this time showing the conditions of test. Note that
.these and subsequent electrical parameters are measured at 25°C ambient temperature
unless otherwise noted. The 2N2193 has the highest rated breakdown voltages of the
series at Vcuo = 80V, VcF.o= 50V, and VEuo= 8V.
Forward current transfer ratio, hFF!,is specified over four decades of collector
current from 100 microamperes to 1 ampere. Such wide range in collector current is
feasible only in transistors having very small leakage currents. Note that hvE measure-
ments at 150, 500 and 1000 ma. are made at a 2 % duty cycle and pulse widths less
than or equal to 300 microseconds. This precaution is necessary to avoid exceeding
thermal ratings. Both the 2N2193 and 2N2193A have a specified minimum current gain
at -55°C. A collector current of 10 ma. was chosen as being most useful to the circuit
designer who wishes to predict low temperature circuit performance.
Base saturation, VBE<KAT>, specifies the base input voltage characteristic under the
condition of both junctions being foreward biased. The conditions of measurement
specify a base current of 15 ma. and a collector current of 150 ma. Base-emitter drop
is then 1.3 volts. This parameter is of particular interest in switch designs and is
covered in further detail in Chapter 5 (Equations 5s & 5t).
Collector saturation voltage, VcE c11AT>, is the electrical characteristic describing the
voltage drop from collector to emitter with both base-emitter and collector-base junc-
tions foreward biased. Base and collector currents are stipulated. For the 2N2193
through 2N2195 these are 15 ma. and 150 ma. respectively. The quotient of collector
and base currents is termed "forced Beta."
The principal difference between "A" and "non-A" versions of the 2N2193 family
lie in their maximum collector saturation voltages. "A" versions exhibit .16 volts
typically and are specified at .25 volts maximum. The "non-A" versions are specified
at .35 volts maximum. It is interesting to note that the 1.05 volt (minimum) difference
35
THE TRANSISTORSPECIFICATIONSHEET
between VBE (RAT> and VcF: (RAT> is the level of false trigger ( noise immunity level) for
DCTL switches. In germanium alloy devices this level is generally less than .3 volt
and is seldom greater than .7 volt in other silicon devices (see Chapter 6). The wide
difference in V nE (sAT> and VcE 1RAT> is undesirable if Darlington connection of devices
is desired for saturated switching. The collector saturation· characteristic of the com-
pound device demonstrates that the lead section is incapable of saturating the output
section. Modification of the circuit to provide separate connection of the input section
collector directly to the joint collector supply will provide the needed VBE (sAT> · to
allow output section saturation.
CUTOFF CHARACTERISTICS
Chapter 6 contains a detailed study of transistor leakage currents. This examination
deals with phenomena which predominate in alloy structures. The principal differences
in planar epitaxial devices lie in the relative magnitudes of the leakage current compo-
nents. The complete protection afforded by the passivation layer reduces surface
leakage to a very small value. Further, it reduces tbe surface thermal component by
decreasing recombination velocity. Figure 6.6(D) shows the variation with temperature
of Icno for units of the 2N2193 family. It is interesting to note that the theoretical
semi-log plot of lcso vs. temperature is a straight li~e. At high .temperatures planar
devices follow predicted behavior quite well. At lower temperatures, the temperature
rate is considerably less than that which would be predicted by the theoretical model.
The 25°C Iceo and IF:eo maximum limits are both 100 nanoamperes. Icno rises to
25 microamperes at 150°C, typically, and carries a 150°C upper limit of 50 µ.a.
HIGH FREQUENCYCHARACTERISTICS
The small-signal foreward current trans(er ratio, h,., is shown as a minimum of 2.5
at 20 me. This parameter is specified for those amplifier applications requiring control
of high frequency h,., Chapter 15 treats the measurement of high frequency h,. in
detail.
SWITCHING CHARACTERISTICS
Chapters 6 and 15 on switching and measurements, respectively, discuss and define
transient response times tc1,tr, t., and t,. The circuit used to measure tr, t., and tr is
shown in Figure 3.5. The specified maximum rise, #orage, and fall times are measured
in this circuit. The base of the transistor under test is clamped at approximately -1.5
volts by the diode returned to a -1 volt bus. As the point VI n is raised in potential the
base is undamped and the transistor moved through the active region to saturation.
As noted in the referenced chapters, the switching times measured are highly circuit
-IV
,,.._..._---tt---ovour
0--------11-- .... ---"N'~----1"1
51
OHMS
Figure3.5
SWITCHING
CIRCUIT
36
THE TRANSISTOR SPECIFICATION SHEET
dependent. By the time this description is published more thorough switching char-
acterization will be made available, which specify td, t,, t., and tr as a function of the
ratio of collector current to foreward base current (forced beta).
GENERIC CHARACTERISTICS
Much information about the behavior of semiconductor devices is conveyed by
showing typical behavior. This information is presented graphically and differs from
other electrical specifications by not bearing the high statistical assurance associated
with maximum and minimum limits. Statistical confidence is assigned the generic
characteristics of some devices by showing 5th, 50th, and 95th percentile points of a
given characteristic. This sort of specification is found as part of very thoroughly
characterized devices such as the 2N335 and 2N396.
600 ff--:Nl---:::;j_.-t""""'9:-
J 500
400
rr-----,----:;:,r-:::::t=~
i++- ______ _
10 20 30 40
VcE (VOLTS} VcE (VOLTS}
2N2193,A 2N2194, A
1000
900
800
700
600
0
! 500
u
M
400
300
200
100
0 5 10 15 20 25
VcE (VOLTS)
2N2195, A
Figure3.6
37
THE TRANSISTOR SPECIFICATION SHEET
The specification sheet for the 2N2193 family includes collector family data for
the 2N2193, 2N2194 and 2N2195 and associated "A" versions. The hyperbola of con-
stant 2.8 watt 25°C dissipation is shown in Figure 3.6 to demark the area of permissible
static operation as defined by previously discussed thermal limitations. In addition, a
triangular area bounded by the collector current and collector voltage axes and a line
noted as "region defined by specification" is specified. This area is one that defines
the safe boundary for transient operation and should at no time be exceeded.
Semiconductor manufacturers go to great lengths in constructing their product
specification sheets because they realize the value of offering the designer adequate
information. H the device described therein is to be of use to the design engineer, is to
be used properly for optimum performance and reliability by the designer within the
limits specified by the manufacturer, the specification sheet must be accurate, com-
plete, and reliable. This requires precise and time consuming measurements, coupled
with costly hours of anlysis and preparation af the final specification sheet. The tran-
sistor specification .sheet is, without doubt, the most important work tool the electronics
circuit designer has at his disposal. When understood by the designer and used intelli-
gently, many labor hours can be saved.
EXPLANATIONOF PARAMETERSYMBOLS
SYMBOL ELEMENTS
A Ampere (a.c., r.m.s or d.c.), ambient, anode electrode
a Ampere (peak or instantaneous)
B,b Base electrode, breakdown
C,c Capacitance, collector electrode, cathode electrode
( Delta) A small change in the value of the indicated variable
E,e Emitter electrode
F, f Frequency, forward transfer ratio
G,g Gain, acceleration of gravity, gate electrode
h General symbol for hybrid parameter
I, i Current, input, intrinsic region of device
J, j Reference electrode
K,k Unspecified (general) measurement electrode
L Inductance
N,n n-region of device
O,o Output, open circuit
P,p Power, P-region of device
0 Charge
R,r Resistance, reverse transfer ratio
T Temperature
Time
38'
THE TRANSISTOR SPECIFICATION SHEET
DECIMAL MULTIPLIERS
Pre&x Abbreviation Multiplier Pre&x Abbreviation Multiplier
tera T 1012 milli m 10-a
giga G 1011 micro p. 10-0
mega Mor Meg me nano n 10-11
kilo· Kork 10a pico p 10-12
PARAMETERSYMBOLS
BVceo *DC breakdown voltage collector to base junction reverse biased,
emitter open-circuited ( value of le should be specified).
BVcEo *DC breakdown voltage, collector to emitter, with base open-
circuited. This may be a function of both "m" (the charge carrier
multiplication factor) and the hrb of the transistor. Specify le.
BVcER •DC breakdown voltage, similar to BVcEoexcept a resistor value "R"
between base and emitter.
BVcr:v •DC breakdown voltage, similar to BVcEo but emitter to base junc-
tion reverse biased.
BVce:x *DC breakdown voltage, similar to BVc11:o but emitter to base junc-
tion reverse biased through a specified circuit.
BVEBO •DC breakdown voltage, emitter to base junction reverse biased,
collector open-circuitecl. Specify IE,
Barrier capacitance.
c .. Input capacitance.
39
THE TRANSISTORSPECIFICATIONSHEET
-g Negative Conductance.
hrJ (General)
h,. (real) (Common emitter) real part of the small-signal value of the short-
circuit input impedance at high frequency.
hob,hoe, (Common base, common emitter, common collector, general) small-
hu.,,h ..J signal, output admittance, input ac open-circuited.
h,b, h,.., (Common base, common emitter, common collector, general) small-
h,c, h,J signal, reverse voltage transfer ratio, input ac open-circuited.
I, i Region of a device which is intrinsic and in which neither holes nor
electrons predominate.
40
THE TRANSISTOR SPECIFICATION SHEET
lex DC base current with both the emitter and collector junctions
reverse biased.
lceo ( lco) *DC collector current when collector junction is reverse biased and
emitter is open-circuited.
lcEo *DC collector current with collector junction reverse biased and base
open-circuited.
*DC collector current with collector junction reverse biased and a
resistor of value "R" between base and emitter.
Icii:s *DC collector current with collector junction reverse biased and base
shorted to emitter.
*DC collector current with collector junction reverse biased and with
a specified base-emitter voltage.
lcu *DC collector current with collector junction reverse biased and with
a specified base-emitter circuit connection.
41
THE TRANSISTOR SPECIFICATION SHEET
NF Noise Figure .
Pt (peak) Peak collector power dissipation for a specified time duration, duty
cycle and wave shape.
Power output.
pt (peak) Peak total power dissipation for a specified time, duration, duty
cycle and wave shape.
Load resistance.
Junction Temperature
42
THE TRANSISTOR SPECIFICATION SHEET
Va DC reverse voltage.
ABBREVIATEDDEFINITIONS OF TERMS
I. Absolute Max. Ratings - the value when so specified is an "absolute limit" and
the device is not guaranteed if it is exceeded.
2. Applied Voltage - voltage applied between a terminal and the reference point.
*3. Constant Current - one that does not produce a parameter value change greater
than the required precision of the measurement when the generator impedance is
halved.
*4. Constant Voltage - one that does not produce a parameter value change greater
than the required precision of the measurement when the genrator impedance is
doubled.
*5. Breakdown Voltage (BV) - that value of applied reverse voltage which remains
essentially constant over a considerable range of current values, or where the incre-
mental resistance = 0 at the lowest current in avalanche devices.
6. Limits - the minimum and maximum values specified.
7. Noise Figure (NF) - at a selected input frequency, the noise figure (usually 10
log of base 10 of ratio) is the ratio of the total noise power per unit bandwidth at a
corresponding output frequency delivered to the output termination, to the portion
thereof engendered at the input frequency by the input termination, (whose noise
0
43
THE TRANSISTOR SPECIFICATION SHEET
8. Open Circuit - a condition such that halving the magnitude of the terminating
impedance does not produce a change in the parameter measured greater than the
required precision of the measurement.
9. Pulse - a flow of energy of short duration which conveys intelligence.
10. Pulse Average Time ( tw) - the time duration from a point on the leading edge
which is 50% of the maximum amplitude to a point on the trailing edge which is 50%
of the maximum amplitude.
11. Pulse Delay Time (t.s)- the time interval from a point on the leading edge of
the input pulse which is 10% of its maximum amplitude to a point on the leading edge
of the output pulse which is 10% of its maximum amplitude.
12. Pulse Fall Time (tr) - the time duration during which the amplitude of its
trailing edge decreases from 90 to 10 % of the maximum amplitude.
13. Pulse Rise Time (tr)-the time duration during which the amplitude of its lead-
ing edge increases from 10 to 90% of the maximum amplitude.
14. Pulse Storage Time (t.) - the time interval from a point 10% down from the
maximum amplitude on the trailing edge of the input pulse to a point 10% down from
the maximum amplitude on the trailing edge of the output pulse.
15. Pulse Time (tp) - the time interval from a point on the leading edge which is
90% of the maximum amplitude to a point on the trailing edge which is 90% of the
maximum amplitude.
16. Short Circuit - a condition where doubling the magnitude of the terminating
impedance does not produce a change in the parameter being measured that is greater
than the required precision of the measurement.
17. Small Signal - a signal is considered small when halving its magnitude does
not produce a change in the parameter being measured that is greater than the required
precision of the measurement.
18. Spike - an unintended How of electrical energy of short duration.
19. Supply Voltage (Van, Vee, VEE)-the potential of the circuit power source.
20. Thermal Equilibrium - a condition where doubling the test time does not
produce a change in the parameter that is greater than the required precision of the
measurement.
21. Thermal Resistance (0) - the temperature rise per unit power dissipation of
the junction above the device case or ambient temperature under conditions of steady-
0
state operation (where applicable, case" means device mounting surface).
22. Thermal Response Time hr) - the time required for the junction temperature
to reach 90% of the final value of junction temperature change caused by a step func-
tion in power dissipation when the device case or ambient temperature is held constant.
23. Thermal Time Constant ('Yt)-the time required for the junction temperature
to reach 63.2 % of the final value of junction temperature change caused by step func-
tion in power dissipation when the device case or ambient temperature is held constant.
24. Base Voltage (Vu1)- the voltage between the base terminal and the reference
point (J).
25. Collector Voltage (Ve1)- the voltage between the collector terminal and the
reference point (J).
44
THE TRANSISTOR SPECIFICATION SHEET
26. Cut-off Current (IK,o, IKrn, IK,ic,IKn·, IK,x) - the measured value of (K) elec-
trode DC current when it is reverse-biased by a voltage less than the breakdown voltage
and the other electrode(s) is (are) DC open-circuited (IKJo)or:
1. returned to the reference electrode (J) through a given resistance (IKrn)
2. DC short circuited to the reference electrode (J) (IK,s)
3. reverse-biased by a specified voltage (IK,v)
4. under. a specified set of conditions different from the above (IK,x),
27. Depletion Layer Capacitance (C dep) - the transition capacitance of a reverse-
biased PN junction. (Small signal as well as DC conditions to be stated).
28. Diffusion Capacitance (C dif) - the transition capacitance of a forward biased
(with an appreciable current How) PN junction.
29. Emitter Voltage (Vv.,)- the voltage between the emitter terminal and the
reference point (J).
30. Floating Potential (VKJF)- the DC voltage between the open circuit terminal
(K) and the reference point (J) when a DC voltage is applied to the third terminal and
the reference terminal.
31. Input Capacitance (C1J)- the shunt capacitance at the input terminals.
32. Input Terminals - the terminals to which input voltage and current are applied.
33. Inverse Electrical Characteristics [XKJ(INV)] - those characteristics obtained
when the collector and emitter terminals are interchanged.
34. Large-signal Short Circuit Forward-current Transfer Ratio (hFJ) - ratio of the
change in output current (.1.Io)to the corresponding change in input current (.1.L).
35. Large-signal Transconductance (Gm) - the ration of the change in output
current (.1.1.,)to the corresponding change in input voltage (.1.V,).
36. Large-signal Power Gain (G.,) - the ratio of the ac output power to the ac
input power under the large signal conditions. Usually expressed in decibels (db).
(ac conditions must be specified).
37. Maximum Frequency of Oscillation (f..... or fmnx)- the highest frequency at
which a device will oscillate in a particular circuit.
38. Output Capacitance (C.,J)- the shunt capacitance at the output terminals.
39. Output Terminals - the terminals at which the output voltage and current may
be measured.
40. Power Gain Cut-off Frequency (fpJ) - that frequency at which the power out-
put has dropped 3 db from its value at a reference test frequency (G,,(f) =
constant)
with constant input power.
41. Reach Through Voltage (VaT) (formerly referred to as "punch through volt-
age") - that value of reverse voltage at which the reverse-biased PN junction spreads
sufficiently to electrically contact any other junction or <.'Ontact, and thus act as a
short circuit.
42. Real Part of Small Signal Short-circuit Input Impedance [h, 1 ( real)] - the
real part. of the ratio of ac input voltage to the ac input current with zero ac output
voltage.
45
THE TRANSISTOR SPECIFICATION SHEET
43. Reference Point (electrical) - the terminal that is common to both the input
and output circuits.
44. Saturation Resistance [rK1(SAT)]-the ratio of saturation voltage to the
measurement (K) electrode DC current.
45. Saturation Voltage [VK1 (SAT)] - the DC voltage between the measurement
electrode (K) and the reference electrode (J) for the saturation conditions specified.
46. Small-signal Open-circuit Forward Transfer Impedance (ztJ) - the ratio of the
ac output voltage to the ac input current with zero ac output current.
47. Small-signal Open-circuit Input Impedance (z1J)- the ratio of the ac input
voltage to the ac input current with zero ac output current.
48. Small-signal Open-circuit Output Admittance (hoJ)- the ratio of the ac output
current to the ac voltage applied to the output terminals with zero ac input current.
49. Small-signal Open-circuit Output Impedance (ZoJ)- the ratio of the ac voltage
applied to the output terminals to the ac output current with zero ac input current.
50. Small-signal Open-circuit Reverse Transfer Impedance (ZrJ)- the ratio of the
ac input voltage to the ac output current with zero ac input current.
51. Small-signal Open-circuit Reverse Voltage Transfer Ratio (hrJ) -the ratio of
the ac input voltage to the ac output voltage with zero ac input curre~t.
52. Small-signal Power Gain (Gp)-the ratio of the ac output power to the ac
input power. Usually expressed in db.
53. Small-signal Short-circuit Forward Current Transfer Ratio (htJ) - the ratio of
the ac output current to the ac input current with zero ac output voltage.
54. Small-signal Short-circuit Forward Current Transfer Ratio Cut-off Frequency
{fhrJ)- the frequency in cycles per second (cps) at which the absolute value of this
ratio is 0.707 times its value at the test frequency specified (Gp(f) = constant).
55. Small-signal Short-circuit Forward Transfer Admittance (ytJ) -the ratio of the
ac output current to the ac input voltage with zero ac output voltage.
56. Small-signal Short-circuit Input Impedance (h1J)-the ratio of the ac input
voltage to the ac input current with zero ac output voltage.
57. Forward Voltage (Vvp)-highest value of positive voltage at which the forward
current equals the maximum specified peak point current (I,.= IP),
58. Peak Point Current (Ir) - value of the static current flowing at the lowest posi-
tive voltage at which ddr= 0.
V d
59. Peak Point Voltage {Vr) -the lowest positive voltage at which d: = 0.
60. Peak to Valley Ratio ~: - the ratio of peak point current to valley point current.
61. Valley Point Current {Iv)-the value of the static current flowing at the second
d
lowest positive voltage at which d: = 0.
62. Valley Point Voltage {Vv)- the second lowest positive voltage at which~:= 0.
•Test conditions must be specified.
46
SMALL SIGNAL
CHARACTERISTICS
A major area of transistor applications is in various types of low level a-c amplifiers.
One example is a phonograph preamplifier where the output of a phonograph pickup
(generally about 8 millivolts) is amplified to a level suitable for driving a power ampli-
fier (generally 1 volt or more). Other examples of low level or small signal amplifiers
include the IF and RF stages of radio and TV receivers and preamplifiers for servo
systems.
As described in Chapter 5, Large Signal Characteristics, a transistor can have very
nonlinear characteristics when used at low current and voltage levels. For example, if
conduction is to take place in an NPN transistor the base must be positive with respect
to the emitter. Thus, if an a-c signal were applied to the base of an NPN transistor,
conduction would take place only during the positive half cycle of the applied signal
and the amplified signal would be highly distorted. To make possible linear or undis-
torted amplification of small signals, fixed d-c currents and voltages are applied to the
transistor simultaneously with the a-c signal. This is called biasing the transistor, and
the d-c collector current and d-c collector to emitter voltage are referred to as the
bias conditions. When bias conditions are chosen so that the largest a-c signal to be
amplified is small compared to the d-c bias current and voltage, the transistor is said
to be operating in small signal mode.
Transistors used in small signal amplifiers are normally biased at currents between
0.5 and 10 ma. and voltages between 2 and 10 volts. Bias currents and voltages below
this range can cause problems of distortion, while bias currents and voltages above this
range can cause problems of excessive noise and power dissipation.
For the purpose of circuit design, any component, including the transistor, can be
considered as a black-box (B-B) having two input terminals and two output terminals.
With the help of Matrix Theory the circuit designer, knowing the electrical character-
istics of the black-box, can calculate the performance of the amplifier when various
signal sources are applied to its input and various loads are connected to its output.
Although possibly foreboding in name Matrix Theory is, in fact, easy to understand
and apply. The relative ease with which it may be used in circuit analysis, com-
pared to other analysis methods, makes the understanding of it a "must" for the
circuit design engineer. When certain stipulations are made, Matrix Theory is perfectly
applicable to circuits involving active elements like the transistor. Its use is virtually
mandatory in complicated circuits involving feedback, particularly where the preserva-
tion of the sanity of the analyst is considered necessary.
EXAMPLESOF BLACK-BOXES
Figure 4.1
47
S~ ALL SIGNAL CHARACTERISTICS
Basically, the matrix method of analysis involves the black-box concept where the
fundamental components or groups of components of a circuit (inductors, capacitors,
resistors, and active elements) are considered as black-boxes having two input and two
output terminals.
Conventionally the input terminals are on the left side of the box with the corre-
sponding output terminals on the other side. There is also a convention regarding the
input and output potentials and currents shown in Figure 4.2.
INPUT
TERMINALS
{ BLACK
BOX
Figure4.2
[e,]
e:1 -
[Zn
Z:n Z::i
[it]
Z12]
. or more concisely (e]
1:
= [Z] [i] (4c)
Z parameters are useful when two or more black-boxes are connected together such
that their input terminals are connected in series and their output terminals are also
in series as shown in Figure 4.3.
[Z] -----c,I
e2
e,_
___
_
8
I l
I
[Z']
BLACK-BOXESWITH SERIES CONNECTIONS
AT INPUT AND OUTPUT
Figure4.3
48
SMALL SIGNAL CHARACTERISTICS
Because of the method of connection i1 and i2 are the same as for a single B-B. The ei's
are added, as are the e/ s.
Z combined is the matrix of the single black-box which is equivalent to the two black-
=
boxes combined. E1 e1 + e1', K1 e:1+ e/. =
(4e)
!El= (cz1
+ cz·1)
[~] (4f)
Matrix theory tells us that Z + Z' is obtained by simple summing of the individual
terms of the matrixes, i.e.
Z1:1 + Z12']
Z:i-,+ 'hi'
[i•]
i2
(4g)
Therefore the two original B-B's may be replaced by one B-B having the parameters
shown in equation (4g).
If two black-boxes are to have their input terminals paralleled and their output
terminals paralleled also, then a different set of original equations is set up.
1, =Ci,+i,') 1 2=<i2+ 12'>
[Y] 12
•11
~-----
,.•-----
'2' -----~ !•2
-----c_,
[Y']
BLACK-BOXES
IN PARALLEL
Figure 4.4
The currents are now additive, voltages e1 and e: are the same for the combination as
for the individual B-B's. The currents ii and i: have to appear on the left hand side of
the two equations.
(4h)
The "y" parameters have the dimensions of conductance and are called the "admittance
parameters." So far the parallel combination of two black-boxes
For cascaded black-boxes yet another set of parameters called "a" parameters has
to be established and these are perhaps the most useful of any.
[a] [a'J
~-~ ----------r~-~
BLACK-BOXES
IN CASCADE
Figure4.5
Notice in Figure 4.5, e.' is the same as ea since their respective terminals are connected
together. However, ii' = -i1 but the sign is taken care of by making the basic equation
of this form
~1
1t
= au e:r-
= a:ne:i -
au!~'} [ ~•
au i, 1i
J= [al [ e2.
-12
J (4k)
So, the over-all equation for the two cascaded B-B's shown in Figure 4.5, is
[~1]
= e~'.]
h
[Al [
-1:i
(41)
therefore
1
[ ~ ] = [al [~
h
1
h
:J = [al X [a'l [ e,:,]
-t,
(4o)
[A] =
[a] X [a'] (4p)
and the "a" matrix is called the "multiplier matrix" for obvious reasons.
Matrix theory tells us that the expansion of [al X [a'l is done as follows
[
e• 1] = [(anau' + a12a21'),(a11a12'
11
+ a12an')] [ ez'
(an au' + a22a,i'), (821 a1,.'+ 822 an') -i2'
J (4q)
50
SMALL SIGNAL CHARACTERISTICS
When inputs are "seriesed" and outputs "paralleled," a set of parameters called
the "h" parameters is obtained to represent the B-B's as shown in Figure 4.6.
[h]
[h'J
WITHINPUTS IN SERIES
BLACK-BOXES
ANDOUTPUTSIN PARALLEL
Figure4.6
[::J
[;:] = [h] (4r)
[::J=[h•i[:J (4s)
(4t)
Finally the "g" parameters, those used when analyzing B-B configurations wherein
the B-B inputs are "paralleled" and the outputs are "seriesed."
--•~•t l
(v·--- ---._,,
E2= (e2+e2 1
BLACK-BOXES
-------~
WITH INPUTS IN PARALLEL
AND OUTPUTSIN SERIES
Figure4.7
For the first B-B
[::] = [g] [
for the second B-B
:J (4u)
51
SMALL SIGNAL CHARACTERISTICS
Knowing one set of the above established parameters, the others may be worked out,
or more conveniently, obtained from Figure 4.8.
MATRIX INTERRELATIONS
1~~[z]l
[Y] [h] [9] [a]
[z]
llz z12
Z22 Z22 Y11
[h_] -z21 _I_ 1A_ flY
z22 z22 YII YII
[g]
[a]
-1i -yll -h22 ~ .!LL Ilg
Y21 Y21 h21 h21 921 921
Figure 4.8
52 -----------------------
SMALL SIGNAL CHARACTERISTICS
The restriction placed on the derivation of the various black-box parameters is that
the equations connecting input and output voltages and currents shall be linear. The
parameters may be complex (frequency-dependent) but the relationships must be linear.
A transistor can be considered linear when the signal excursions within it are small
compared to its bias current and voltage conditions. Under these conditions, known as
"Small Signal Operation" the transistor may be thoroughly represented as a black-box
when any one set of parameters, z, y, a, h, or g are obtained.
The matrix chosen to define a transistor by its manufacturers is naturally enough
that involving those parameters which are easiest to measure. Usually, the "h" param-
eters are measured and, more often than not, with the transistor in the common-base
configuration. The reader is referred to Chapter 15 of this manual for practical meas-
urement details. The reason why it is easier to measure the "h" parameters rather than
the others may be seen from their definition.
[h]
BLACK-BOXREPRESENTING11h" PARAMETERMEASUREMENTS
REFERREDTO IN TEXT
Figure4.9
(4x)
expanded
(4y)
(4z)
From equation (4y)
1
hn = ~ when e2 = 0
h
h:1 = ~h when e2 =0
h22 = e2i:1 when i1 = 0
=
For the transistor, hn is often called h1, the input impedance. The condition e2 0 is
the same as saying the output terminals are short-circuited to the signal. In addition,
hu is called h., the reverse voltage transfer ratio. The condition ii= 0 means open-
53
SMALL SIGNAL CHARACTERISTICS
circuit input. hn becomes h,, the forward current transfer ratio with output short-
circuited to signal currents. And finally, bu is ho, the output admittance with open-
circuit input. h,, hr, hr and ho usually also have yet another subscript to indicate to
which transistor configuration they refer. For example: h,b is the input impedance of a
transistor with output signal short-circuited when used in the common-base configura-
tion, and hrc is the reverse voltage transfer ratio with the input of a transistor open
circuited when used in the common-collector configuration. It will be noticed that in
defining the h parameters two conditions are stipulated:
1. Output short-circuited with respect to signal.
2. Input° open-circuited with respect to signal.
The phrase with respect to signal is necessary in these two conditions, since in any
practical circuit it is necessary to provide for bias currents as in Figure 4.10.
~
,
I
I
I
--
•2
_l.
··re R4
I
R2 I
I R1R2
J RAa
R1+R2
(A) PRACTICAL
CIRCUIT (B) EQUIVALENT
CIRCUIT
Figure4.10
"Short-circuited output with respect to signal" would then mean placing a hefty
capacitor across the output terminals in the manner shown. The transistor has a fairly
low input impedance and a high output impedance, at least in the common-base and
common-emitter configurations (measurements are seldom made on a transistor in the
common-collector connection owing to its proneness to instability). It is therefore easy
to provide a high impedance current source for the input to obtain the open-circuit
input condition and a stiff voltage source for the output (i.e. short-circuit). Hence it is
easiest, in practice, to measure the h parameters. The letter h, incidentally, stands for
hybrid,"a name which reflects the mixing of input and output voltages and currents in
the two h parameter equations of the black-box.
Once the· h parameters of a transistor are known for a particular configuration, the
z, y, a, and g parameters may be obtained from the conversion table in Figure 4.8.
Corresponding h parameters of the other configurations may be found by referring
to the table in Figure 4.11 which gives the h parameters in terms of the 'T' equivalent
circuit as well.
54
SMALL SIGNAL CHARACTERISTICS
APPROXIMATECONVERSIONFORMULAE
H PARAMETERSAND T EQUIVALENTCIRCUIT
.(NUMERICALVALUES ARE TYPICAL FOR THE 2N525 AT I MA, !5V)
SYMBOLS T EQUIVALENT
COMMON COMMON COMMON CIRCUIT
EMITTER BASE COLLECTOR (APPROXIMATE)
IRE OTHER
h J_ hib
hja 1400 OHMS hie 'b+.!L
lie •y
111 T+ii;;"" I-a
_ _Mt_ _a_
hfe "21,,/J 44 -(l+htc> I-a
l+htb
I hob I
hoe hu.-z22e ?:TX 10-6 MHOS l • hfb
hoc (I-a) re
htb
I
hu 'Yu
hie
l+hft
3IOHMS -~htc 'e + (1-a)rb
hoe hoc I
hall h22•z I
22 l+hfe
0.60 X I0- 6 MHOS
-~ re
h J_ hib
hie hit I4000HMS rb+...!!...
lie 'Ync l+hfb I-a
I I
htc h21c10 1b -(l+h11>
- l+hfb
-45 -i=;
~ 27 X 10- 6 MHOS
I
lhoch22c•z 22
I
c hot
l+hfb (1-a)rc
h1b- !!!Jt
.!n I-hrc
re hob(l+htb) 12.!5OHMS
hot hoc
h !!m htc
'b hje- ~ (l+hfe) hie+ hocU-h,c) 840 OHMS
hob
Figure 4.11
55
SMALL SIGNAL CHARACTERISTICS
The h parameter equivalent circuit is shown in Figure 4.12 together with the
,.T,, equivalent circuit of the transistor.
e .------------4n C
.Le2
t
hob I
ba-------~-----~------ob
(A) HYBRID EQUIVALENTCIRCUIT
(COMMON BASE CONFIGURATION)
bc• -----------ub
(B) "T" EQUIVALENTCIRCUIT
(COMMON BASE CONFIGURATION)
Figure4.12
The "T" equivalent circuit is of interest since it approximates the actual transistor
structure. Thus r. and r., represent the ohmic resistances of the emitter and collector
junctions respectively while rh represents the ohmic resistance between the base con-
tact and the junctions. The current generator ct1 .. represents the transfer of current from
the emitter junction to the collector junction across the base region. The ,.T,, finds its
greatest use in circuit synthesis particularly when the designer is initially laying out
his circuit. He knows, for example, that the input impedance of a common-emitter
stage is approximately rb plus /3 times the total impedance appearing in the emitter
circuit (which includes r.,) - such approximations not being so easily arrived at from a
knowledge of hybrid parameters. When it is necessary, however, to analyze the per-
formance of a given circuit with a fair degree of accuracy, four-pole parameters are
extremely useful, in some cases almost indispensable. As might be expected from the
,.small signal" restriction, h parameters vary with operating point. Specification sheets
56
SMALL SIGNAL CHARACTERISTICS
often carry curves of the variation of the small signal parameters with bias current
and voltage. Such curves are shown in Figure 4.13. These are specifically for the
2N525 and are plotted with respect to the values at an operating point defined by a
collector potential of 5 volts and an emitter current of 1 ma.
/
11
..
/
IO
r°"('lb TA•25°C
,,,,
i,
Yc•-5V
'-
~
'-
~ ~ /
_.,,/'
'/
1.;
"''\. .........
I'-..
,,
l+h,-
-- __,,...... "
O.J
'\. ....,
I'\ "'i-.,
","'~111, ...............
j;';;-..
0. I
"l.
-0.1 -o.J -1.0 -1.0 -«>
EIIITTlR CUIIIIEIIT lt(IIAI
CHARACTERISTICS
VS EMITTERCURRENT
::=T,. 2s•c 0
I
a: ll.O
i-- It•IMA
s
a:
i,,..hob
h~
~
I
~ ........
~ ~ hr, h11
~ h111t ~-.. _.., L---"
w 1.0 h111t
~ ht, h11
~~
~ hob
d
a:
h,11,
t
Ill
ii
§ 0.ll
o.,
-1.0 -s.0 -10.0 -so.o
COLLECTORVOLTAGE,
IVcl
57
SMALL SIGNAL CHARACTERISTICS
Suppose, for example, the typical value of hobis required for the 2N525 at I., = 0.5 ma
and V., = 10 volts. From Figure 4.11 the typical value of hob at 1 ma and 5 volts is
0.6 X 10-0mhos. From Figure 4.13 the correction factor at 0.5 ma is 0.6 and the correc-
tion factor at 10 volts is 0. 75. Therefore,
hob(0.5 ma, 10 volts)= 0.6 X 10-0 X 0.6 X 0.75
(4aa)
= 0.27 X 10-0mhos.
Once the h parameters are known for the particular bias conditions and configuration
being used, the performance of the transistor in an amplifier circuit can be found for
any value of source or load impedance.
Figure 4.14 gives the equations for determining the input and output impedances,
current, voltage, and power gains of any black-box, including the transistor, when any
set of its four-pole parameters (z, y, a, h, or g) are known or have been calculated.
PROPERTIES
OF THE TERMINATED
FOUR-TERMINAL
NETWORK
z y h g a
1
ll +z 11z 1 Y22+Y\ /lh +hu Y\ 022+z1 a 11z\ +a 12
Zi
Zzz+ Z\ fl
1
+YnY\ h22+Yt t. 9 +ouzt G21Z\+022
Figure 4.14
Let us work ari example using four-pole parameters to analyze the circuit shown in
Figure4.15.
-12V
OUT
(A) PRACTICAL
CIRCUIT (B) EQUIVALENT
CIRCUIT
Figure4.15
We will concern ourselves with the small signal gain and ignore the D.C. stability.
The black-box equivalent at signal frequency is shown in Figure 4.16.
58
SMALL SIGNAL CHARACTERISTICS
R,
B-B'4to4
:E.
2NS25 2NS25
GROUNDED
EMITTER
5 VOLTS
@O.SMA.
GROUNDED
EMITTER
5 VOLTS
@O.SMA.
]•,•470
B-B*I B-B4t2 B-8#3
B-B's 1, 2, and 3 are cascaded, so "a" parameters will be needed. We will first need to
derive the h parameters for the 2N525 which is used here under two different operating
points and two different configurations, common-emitter and common-collector. Values
obtained from Figures 4.11 and 4.13 can be tabulated as follows
TransistorType2N525 hu h12 1 + hn hn hn
OperatingConditions
CommonBase
Vc:= -5v, IE = 1 ma 31 5 X 10-' 0.022 -0.978 0.60 X 10-0
CommonEmitter
Vc:= -5v, Is= 0.5 ma 2400 4.04 X 10-, 37.5 13.85 X 10-0
CommonCollector
Vc:= -5v, IE = 5 ma 280 1 -56.8 136 X 10-0
The "boxed" operating conditions are those which apply to the circuit of Figure
4.15. Using the table in Figure 4.8, the corresponding "a" parameters are
CommonEmitter
Vc:= -5v, Im= 0.5 ma -4.8 X 10-' -64 -3.69 X 10-1 -2.67 X 10-1
CommonCollector
Vc: = -Sv, Is = 5 ma 1 4.91 2.4 X 10 -o 17.6 X 10-a
59
SMALL SIGNAL CHARACTERISTICS
Combining B-B's 1, 2, and 3 of Figure 4.17 and neglecting B-B 4 (the feed-back
loop)
[
-4.8 X 10-',
-3.7 X 10-1,
-64 ] [l
-2.7 X 10-r X 1~-',
OJ [I,
1 X 2.4 X 10-e,
4.9]
17.6
When multiplying several matrices together, the method is to start at the right hand
side and multiply the last two matrices in the manner which has been described earlier
in this chapter. This gives one combined matrix representing the last two matrices.
This combination is then multiplied by the next matrix to the left and so on until the
whole product has been reduced to one final matrix combination.
After carrying out this procedure on the open-loop circuit, that is, no feed-back
applied (see Figure 4.16), the following "a" matrix is obtained
-70 X 10-', -11,400 X 10-']
[
-31.2 X 10- , 1
-4910 X 10-1
As a quick check on the arithmetic so far the voltage gain will be calculated for a load
of 4700 using the table in Figure 4.14.
470
11,400 X 10-, - 70 X lO~ X 47 0
-47,000 ~ -106
Av= 443 -
A negative value of voltage gain is expected since there is a total phase shift of 1r radians
over the whole circuit.
From knowledge of the "T" equivalent, a rough value for the gain can be deter-
mined. With a load of 4700, the emitter-follower stage has an input impedance of
approximately
hnc X Z1R:S 57 X 470 A:$ 27 K
This 27K in parallel with the lOK resistor forms the load of the first stage. The voltage
gain of the first stage is around
= 37.5 X 7.3 X 1<>3= 114
2.4 X 1<>3
To obtain the over-all voltage gain this figure has to be multiplied by the voltage trans-
fer of the emitter-follower which is very approximately h11b,The open-loop voltage
gain of the amplifier by this rough method is therefore about 114 X 0.98 = 112 which
differs by only a few percent from the figure arrived at with the matrix equation,
namely 106.
One might argue that this degree of accuracy was sufficient for the practical case
and why bother with matrices. However, when feed-back is applied the matrix method
offers a distinct advantage. Figure 4.17 shows this condition.
60
SMALL SIGNAL CHARACTERISTICS
Rf
FEED-BACK
-- -
~
AMPLIFIER
-
- -
-
FEEDBACKBLACK-BOXSHOWN IN PARALLEL
WITH AMPLIFIER BLACK-BOX
Figure4.17
It is easily seen that the feed-back black-box is in parallel with the amplifier black-box.
The y parameters of each are therefore needed to effect a simple combination.
Using table 4.11, they parameters of the amplifier are obtained from the "a" param-
eters. They parameters for a series impedance (i.e., the feed-back resistor) are
[f!]
So, with Rrh equal to 10 KD, the total y matrix equals
e0 e
- -=Av - 0 -=G
eI '89
Figure 4.19 shows the variation of Av,Z1,Zufor three values of R,: oo•, !OK, and lK.
R. R, Av z. la
1 K!l oo* 106 2.3K 160 n
1 Kn !OK 105 son 1611
1 K!l lK 95 10.sn 2.711
*(In assigning an infinite value to R,, it must be assumed that bias for the first stage
of the practical amplifier is provided by an auxiliary means since this bias is ordinarily
available through the feed-back loop.)
As would be expected Av is affected by R, only as far as the feed-back loop loads
the output. Z1 and Zo are significantly affected though, and the reduction of Z1 with
R, affects G, the overall gain, since
G=~
1 + z.
R"
REFERENCE
• Shea, Richard F. et al, "Principles of Transistor Circuits," John Wiley & Sons, Inc. ( 1953)
62
SMALL SIGNAL CHARACTERISTICS
io hfhr
OUTPUT ADMITTANCE Yo= e'; = ho - hi +ZQ (4dd)
i ht
CURRENT GAIN A·=~•--- (4ff)
1 ii l+hoZL
80 I
VOLTAGE GAIN (4gg)
Av=efs:h _.!!I_(l+hoZL)
r ZL hf
OPERATING POWER GAIN (LOW FREQUENCY ONLY, Zg:RQ,ZL•RL)
ht =at+ j bf
D = ✓1-F-C 2
ho=oo +jbo
63
LARGE SIGNAL
CHARACTERISTICS ffi©
t:
cc
:::c
u
PARAMETERS
The parameters used in the following large signal equations are listed below and
indicated in Figure 5.1.
Bu----------1-------~B
PARAMETERSUSED IN LARGE SIGNAL EQUATIONS
Figure5.1
lco lcso Collector leakage current with reverse voltage applied to the collector,
and the emitter open circuited ( Ico has a positive sign for NPN tran-
sistors and a negative sign for PNP transistors ) .
ho lt:eo Emitter leakage current with reverse voltage applied to the emitter,
and the collector open circuited ( IEo has a positive sign for NPN
transistors and a negative sign for PNP transistors).
Normal alpha, the d-c common base forward current transfer ratio
from emitter to collector with output short circuited ( a has a positive
sign for NPN transistors and PNP transistors ) . In practice, best results
are obtained if the collector junction has a few tenths of a volt reverse
bias. Since a is a function of emitter current, the value at that particular
value of emitter or collector current should be used in the large signal
equations.
Inverted alpha, same as ax but with emitter and collector interchanged.
Ohmic resistance internal to the transistor and in series with the base,
emitter, and collector leads respectively.
65
LARGE SIGNAL CHARACTERISTICS
Ia, IE, le D-C currents in the base, emitter, and collector leads respectively;
positive sense of current corresponds to current How into the terminals.
</Jc Bias voltage across collector junction, i.e., collector to base voltage
exclusive of ohmic drops ( across Re, Re); forward bias is considered
a positive polarity.
Bias voltage across emitter junction, i.e., emitter to base voltage exclu-
sive of ohmic drops ( across Re, RE) ; forward bias is considered a
positive polarity.
VF.a,Vee, VcE Terminal voltages: emitter to base, collector to base, and collector to
emitter respectively.
A=mKT 1/ A = 26 millivolts at 25°C form 1. =
q Electronic charge = 1.60 X 10-111coulomb.
K Boltzmann's constant= 1.38 X 10-23 watt sec/°C.
T Absolute temperature, degrees Kelvin= °C + 273.
m A constant of value between 1 and 2 ( m tends to be nearly 1 for
germanium transistors and varies between 1 and 2 for silicon tran-
sistors ) . <2 >
A --1 n (~)
.1.V (Sa)
where .:1V is the corresponding change in voltage for a .'11change in current on the
linear portion of the plot. For both silicon and germanium transistors, the best correla-
tion between theory and practice is obtained if the grounded base configuration is
used, and the other junction has a slight reverse bias.
BASIC EQUATIONS
The basic equations which govern the operation of transistors under all conditions
of junction bias are
It: + Ia + le =0 (5e)
The above equations are written for the direction of current flow shown in Figure 5.1
and the sign of I.:o and Ico as given above under Parameters. The three possible areas
of transistor operations are: 1) one junction forward biased and one junction reverse
biased (active), 2) both junctions forward biased (saturated), 3) both junctions
reverse biased (cutoff).
66
LARGE SIGNAL CHARACTERISTICS
ACTIVE OPERATION
The transistor behaves as an active device if one junction is forward biased and
the other is reverse biased. Under normal operation, the collector is reverse biased so
f/>oin equations ( 5c) and ( 5d) is negative. If this bias exceeds a few tenths of a volt,
<<I,
eA(/,c and it can be eliminated from the equations. The collector current can then
be solved in terms of the leakage currents, current gains, and emitter-base potential,
thus giving the large signal behavior of the device.
SATURATEDOPERATION
The transistor can be operated in the normal ( grounded emitter) or the inverted
( grounded collector) connection as seen in Figure 5.2. The equations which are devel-
oped for each respective configuration will be labeled "normal" and "inverted." The
directions of base, collector, and emitter current respectively are taken as into the
transistor. Where a current flows out of the transistor, it is to be given a minus sign.
When a ( ± ) sign proceeds the equat:on, the plus applies to a PNP transistor while
the minus applies to an NPN transistor.
C E
!l
B B
Under conditions of saturation and neglecting ohmic voltage drops, the voltage drop
between collector and emitter is given as
111 [ 1 _ .!:_~(1_-_a:-.---=-·)]
1 In a:-.
( Normal) Vet:= ( ± )T In--------- (5f)
[ 1 + {~-(1 - 111 ) ]
a.s [ 1 - ~ (1 - a.) ]
1
(Inverted) V t:c = (±) A In ----=--------In a, (5g)
[ 1+ ~: (1 - 11.s ) ]
67
LARGE SIGNAL CHARACTERISTICS
Notice that equation ( Sg) can be obtained from (Sf) by replacing le by I&, ciN by 111 in
the numerator, and 111by aN in the denominator. If the ratio of load current to base drive,
:: or :: , is very small, equations (Sf) and (5g) respectively reduce to
The voltage given by (Sh) or (Si) is termed "offset voltage" and is an important
property in transistor chopper and other low level switching applications. Since ci,<ciN
for most transistors, the offset voltage of the inverted connection will be less than
that of the normal connection. The offset voltage c~n be made zero by forcing a current
to How from collector to emitter for a PNP transistor and from emitter to collector for
an NPN transistor.
The transistor in either mode of operation will remain saturated as long as the
bracketed terms in the numerator or denominator of equations (Sf) and ( Sg) remain
larger than one. Thus, the transistor behaves as a "closed switch," and the load current can
How through the transistor from collector to emitter or emitter to collector, depending
upon the polarity of the load supply. If either the numerator or denominator bracketed
term becomes zero, the log becomes infinite and the transistor comes out of saturation.
Since ci,<ciN, it can be seen from equations (Sf) and (5g), that both the normal and
inverted configurations will become unsaturated respectively at lower ratios of :: &
if the load current passes from collector to emitter in a PNP transistor and from emitter
t
to collector in an NPN transistor.
By differentiating equation (Sf) and ( Sg) respectively with respect to le and h,
1 4
the dynamic impedance of the saturated transistor can be found. If ( - N le ) and
CIN 111
(
1-
-a-,-a,) IE
hare muc h less than I, t hen
(Normal) _!_(
A
1- a1
le
CIN)
a1
( Sj)
and (51)
Thus, the dynamic impedance is inversely proportional to the base current. Also, the
dynamic impedance of the inverted connection is larger than that of the normal con-
nection since c&N>a1. ( This is in contrast to the offset voltage where it is smaller for
the inverted mode than for the normal connection).
The body resistances RE and Re can be found by respectively plotting VcE and V Ee
as a function of In. The collector and emitter are respectively open-circuited, and the
voltage is measured with a high impedance millivoltmeter. At high values of base
current ( 1 ma and up for most signal transistors ) , VcE and VEe become linear functions
68
LARGE SIGNAL CHARACTERISTICS
of Io. The slope of this linear portion of VcE gives RE while that of V Ee gives Re. This
technique applies only to alloy and grown transistors. For mesa and planar transistors,
the technique does not apply. The reason for this is that the collector junction overlaps
the base lead forming a forward biased diode between the collector and base contact.
This diode coupled with the le Re drop between the base contact and emitter edge
prevents the transistor from going hard into saturation. 141 For these transistors, RE and
Re cannot be found indirectly from external measurements. However, at lower base
currents ( where the internal resistance voltage drops are negligible) equations ( 5h)
and ( Si ) are valid for these transistors.
CUTOFF OPERATION
By reverse biasing both emitter and collector, equations (Sb), ( c), and ( d) can
be solved for the emitter and collector currents
Equations ( Sm) and ( n) indicate that with both junctions reverse biased, the collector
current will be less than Ieo, and the emitter current will be less than IEo. Thus, for
switching circuits where low leakage currents are desired, the advantage of using the
inverted connection can readily be seen.
f Iceo
-Vc?-O.I VOLT
I B =O lcEo=~ (So)
1-a.N
lcEo is the collector leakage current with the base open-circuited and is generally
much larger than lco,
IcES
-VCE>-0.1 VOLT
IcEs = __l_co
__ (Sp)
1-aNaa
69
LARGE SIGNAL CHARACTERISTICS
leEs is the collector leakage current with the base shorted to the emitter and equals
the leakage current the collector diode would have if the emitter junction was not
present. Accurate values of aN and a1 for use in the equations in this section are best
obtained by measurement of lco, leEo and lezs and calculation of as and a1 from equa-
tions (So) and (Sp). The value of L:romay be calculated from equation ( 5b).
VcE>-O.1 VOLT
f IcER ler:n = (I + Alr.:oR)lco (Sq)
R
1- + ARLi:o{1-ciN)
aNci1
leEa is the collector leakage current measured with the emitter grounded and a resistor
R between base and ground. The size of the resistor is generally about 10 K. From
equation (Sq), it is seen that as R becomes very large, less approaches lezo-equation
(So). Similarly, as R approaches zero, lcEn approaches lezR-equation (Sp).
t ~>-0.8VOLT
This circuit is useful in some switching applications where a low collector leakage
current is required and a positive supply voltage is not available for reverse biasing
the base of the transistor. The diode voltage Vo used in the equation is measured at a
forward current equal to the lco of the transistor. This equation holds for values of le
larger than leo.
BASE INPUT CHARACTERISTICS
for le= 0
70
LARGE SIGNAL CHARACTERISTICS
A comparison of equations ( 5s) and ( 5t) indicates that they are approximately
equal if REis small and ClN is smaller than a,. For this condition, the base input charac-
teristic will be the same whether the collector is reverse biased or open-circuited.
VOLTAGE COMPARATORCIRCUIT
If an emitter follower is overdriven such that the base current exceeds the emitter
current, the emitter voltage can be made exactly equal to the collector voltage. For
example, if a square wave with an amplitude greater than Ve.- is applied to the base
of the transistor, the output voltage Vo will be a square wave exactly equal to V .....
Equation ( 5u) gives the base current required for this condition and indicates that the
transistor should be used in the inverted connection if the required base current is to
be minimized. This circuit is useful in voltage comparators and similar circuits where
a precise setting of voltage is necessary.
REFERENCES
cu Ebers, J.J., Moll, J.I., "Large - Signal Behavior of Junction Transistors," Proc. I.R.E., Vol. 42,
December, 1954.
(S> Pritchard, R.C., "Advances in the Understanding of the P-N Junction Triode,'' Proc. I.R.E., Vol.
46, June, 1958.
< Henkels, H.W., "Germanium and Silicon Rectifiers,'' Proc. I.R.E., Vol. 46, June, 1958.
31
m Rundenberg, H.G., "On the Effect of Base Resistance and Collector-to-Base Overlap on the Satura-
tion Voltages of Power Transistors," Proc. I.R.E., Vol. 46, pp. 1304-1305, June, 1958,
71
SWITCHING CHARACTERISTICS
RATED DISSIPATION
Ic
l
E
COLLECTORCHARACTERISTICS
Figure6.1
sistor collector characteristics are shown in Figure 6.1 which illustrates a transistor in a
switching application. Near the operating point A, the transistor switch is in the open
or high resistance state. When In= 0, le= Ieo divided by 1-ci. Since 1 -ii is a small
number le may be several times greater than Ieo. A higher resistance may be achieved
by shorting the base to the emitter. Once the emitter junction is reverse biased by more
than .2 volts le approaches Ico. This achieves the highest resistance from collector to
emitter.
Operating point B corresponds to a closed switch. Ideally the voltage from collector
to emitter would be zero. In practice, however, there is always an appreciable voltage
across the transistor. The best switches are germanium alloy transistors such as the
2N525 which has about 1 ohm resistance when switched on. Germanium mesa tran-
sistors such as the 2N781 have a saturation resistance of 5 ohms or less. Silicon planar
epitaxial units such as the 2N2193A have about 1.2 ohms saturation resistance and
approach the performance of germanium alloy types. These values, however, are
73
SWITCHING C~CTERISTICS
dependent upon collector and base current levels and are normally specined as a
saturation voltage, VcE <BAT>,for given current levels. In order that a low resistance be
achieved, it is necessary that point B lie below the knee of the characteristic curves.
The region below the knee is referred to as the saturation region. Enough base current
must be supplied to ensure that this point is reached. It is also important that both
the on and off operating points lie in the region below the maximum rated dissipation to
avoid transistor destruction. It is permissible, however, to pass through the high dissi-
pation region very rapidly since peak dissipations of about one watt can be tolerated
for a few microseconds with a transistor rated at 150 mw. In calculating the Ia neces-
sary to reach point B, it is necessary to know how hn varies with le. Curves such as
Figure 6.2 are provided for switching transistors. Knowing hFE from the curve gives
Ia min since Ia min = hie . Generally Ia is made two or three times greater than Ia
FE
min
to allow for variations in hFE with temperature or aging and, as will be pointed out
later, to improve some of the transient characteristics. The maximum rated collector
voltage should never be exceeded since destructive heating may occur once a transistor
breaks down. Inductive loads can generate injurious voltage transients. These can be
avoided by connecting a diode across the inductance to absorb the transient as shown
in Figure 6.3.
Even with the diode connected, large peak power transients can occur unless the
transistor is switched off rapidly. If the transistor is switched off slowly, as soon as
the collector comes out of saturation the collector voltage will rise to the supply
voltage as the inductor attempts to maintain a constant current. At this instant, tran-
sistor dissipation is the product of supply voltage and maximum load current. Specinc
circuit components determine whether this dissipation is excessive.
lu•-IV'
Ta•2"C
IOO
--
--- ----
- -- --
/ r--- r-..
- ZNU7
;- ~
/'"
r--- r--- r--
ZNffl -
r---
Zll5ZS
-
111$14
~ -- ~ -
CCIUfflUI - ~
tcPIAI --- - -
74
SWITCHING CHARACTERISTICS
DIODE
IN36O5 FOR SMALL INDUCTANCE
IN91 FOR LARGE INDUCTANCE
TYPICAL VALUES
75
SWITCHING CHARACTERISTICS
occurs. Conduction can be avoided by reducing the bias source resistance, by increas-
ing the reverse bias voltage, or by reducing lco through a heat sink or a lower dissipa-
tion circuit design.
The lco of a transistor is generated in four ways. One component originates in
the semiconductor material in the base region of the transistor. At any temperature,
there are a number of interatomic energy bonds which will spontaneously break into
hole-electron pairs. If a voltage is applied, holes and electrons drift in opposite direc-
tions and can be seen as the lco current. If no voltage is present, the holes and electrons
eventually recombine. The number of bonds that will break can be predicted theo-
retically to double about every 10°C in germanium transistors and every 6°C in silicon.
Theory also indicates that the number of bonds broken will not depend on voltage over
a considerable voltage range. At low voltages, lco appears to decrease because the drift
field is too small to extract all hole-electron pairs before they recombine. At very high
voltages, breakdown occurs.
A second component of lco is generated at the surface of the transistor by surface
energy states. The energy levels established at the center of a semiconductor junction
cannot end abruptly at the surface. The laws of physics demand that the energy levels
adjust to compensate for the presence of the surface. By storing charges on the surface,
compensation is accomplished. These charges can generate an loo component; in fact,
in the processes designed to give the most stable lco, the surface energy levels con-
tribute much lco current. This current behaves much like the base region component
with respect to voltage and temperature changes. It is described as the surface
thermal component in Figure 6.5.
A third component of lco is generated at the surface of the transistor by leakage
across the junction. This component can be the result of impurities, moisture, or surface
imperfections. It behaves like a resistor in that it is relatively independent of tempera-
ture but varies markedly with voltage.
The fourth component of lco is generated in the collector depletion region. This
component is the result of hole-electron pair formation similar to that described as the
first Ico component. As the voltage across the collector junction is increased, the deple-
tion region will extend into the base and collector regions. The hole-electron pairs
generated in the base portion of the depletion region are accounted for by the first Ico
component discussed, but those generated in the collector portion of the depletion
region are not included. The number of pairs generated in the collector portion of the
depletion region and, thus, the Ico from this region depend on the volume of the
depletion region in the collector. Inasmuch as this volume is a function of collector
and base resistivity, of junction area, and of junction voltage, the fourth component
of lco is voltage dependent. In an alloy transistor, this component of loo is negligible
since the collector depletion layer extends only slightly into the collector region due to
the high base resistivity and low collector resistivity. In a mesa or planar structure
where the collector region is not too heavily doped the depletion region extends into
the collector, and this fourth Ico component may be appreciable. Since the mechanism
of lco generation here is hole-electron pair formation, this component will be tempera-
ture sensitive as well as voltage dependent.
Figure 6.5(A) shows the regions which contribute to the four components. Figure
6.5(B) illustrates how the components vary with voltage. It is seen that while there is
no way to measure the base region and surface energy state components separately,
a low voltage Ico consists almost entirely of these two components. Thus, the surface
leakage contribution to a high voltage Ico can be readily determined by subtracting
out the low voltage value of Ico, if the collector depletion layer contribution is small.
76
SWITCHING CHARACTERISTICS
COU.[CTOII
•"HOU
O=£LECTRON
;::!! :INDICATES D4R[CTIQH CW
CARRIU DOIIFT
NOT[;
CIJRVU A - IND4CAT£TH[ IIAU REGION I co
CURVESU-INOICATETH[ o,
11111 IIASl RE-
ANOSUR,Act THERMAL Ico
CUIIY£SC-INCWO( TIC SUIWact LEAKAGE
COMPONlNT
CURI/ES 0-IICLUCf: THE COLLECTOfl
CO'LETION REGION Ico
AND IIOICAT[ TH[ ll[ASUR[O l:co
BREAKDOWN
LOW VOLTAGE VOLTAGE
REGION REGION I
~ j.J
I
1 i~;t~~rg:
I
I
REGIONIco ----- _£..----/
,- B /
1
I SURFACE ;,-----------
I THERMAL
I co -- ____ A __ /
Ico " I
I
I I I I ( J
: ;' ,:✓ /
I
I
✓
I I
I
I ,,,,, I
1 I _s,_/ :
I .,,.
,,v.:_::_A~~~
..V/
SURFACE I 1/
,,,,-------- ,;,
,,,-r l.1 BASE I' -- - - - - - .Jl - ...,,",
_.J--- - - - __ .-, EGION .,----------,_,A
COLLECTOR VOLTAGE l:co COLLECTORVOLTAGE
77
SWITCHING CHARACTERISTICS
is open circuited, a collector current still Bows, le hr. Ico, Thus, hvF.is infinite when =
Is =0. As base current is applied, the ratio le/la becomes more meaningful. If hFE
is measured for a sufficiently low le, then at a high temperature h,.Ico will become
equal to Io. At this temperature hFmbecomes infinite since no Is is required to maintain
Io. The AC current gain h,., however, is relatively independent of Ico and generally
increases about 2: I from -55°C to +85°C. Figure 6.7 illustrates this fact.
I I I I I
-- ...
...
...
... n:-~= c,:::,
-~ i!=
I I I I I -'-
~::
1--
fOlllrdlJ2CDaaYI
C\e••IV "' z.-,u,.a,
... nPO~IBIIO
~Da:iiN
i-- tna NN.nD.QIIDl.lltat I
D
l
I ..
I
.... '
I/
'/
; v WQ••N.•IW.a•IOW =
I
-'""'~
·• ................
·~•e.c
.. 0
r1/ ,---,
~
'I I
-,,rltl•t.MIT-
I
I
I
I
. ,= //1. "'i~~
,
..
/'J I '/ ~
~I,'" / :
j //
)
V
/
-nl"IC-l4,z-
~•-·-•·
. /,I
I
1///
I
~
=~
·•.
... : //1
,'//
.
Jc .. 'lltCWUANll:I
,
,
........ ._.ne....,,.tl9Pl,n. I I
'fl
M
'I
78
SWITCHING CHARACTERISTICS
The different electrical properties of the base, emitter, and collector regions tend
to disappear at high temperatures with the result that transistor action ceases. This
temperature usually exceeds 85°C and 150°C in germanium and silicon transistors,
respectively.
When a transistor is used at high junction temperatures, it is possible for regenera-
tive heating to occur which will result in thermal run-away and possible destruction of
the transistor. For the maximum overall reliability, circuits should be designed to pre-
clude the possibility of thermal run-away under the worst operating conditions. The
subject of thermal run-away is discussed in detail in Chapter 7.
A major problem encountered in the operation of transistors at low temperatures is
the reduction in both the a-c and d-c current gain. Figure 6.7 shows the variation of
h.-F.with temperature for the 2N525 and indicates that at -50°C the value of hFE
drops to about 65% of its value at 25°C. Most germanium and silicon transistors show
approximately this variation of h••e and h,. with temperature. In the design of switch-
ing circuits the decrease of h.-e and the increase of VBE at the lower temperatures must
be taken into account to guarantee reliable circuit operation.
2.0
1.0
I
I.I
V I/
V
u
: 14
/ /
~V
,/
/"
-7"
--
-------
~
h~
i--- V'
~
L-- ht,
04
02
0
-50 -30 -10 +10 +30 +50 +70 +90
JUNCTIOHTEMPERATURE (•ti
79
SWITCfilNG CHARACTERISTICS
derating factor. Since the thermal mass of the junctions is not considered, the calcula-
tion is conservative.
In some applications there may be a transient over-voltage applied to transistors
when power is turned on or when circuit failure occurs. If the transistor is manufactured
to high reliability standards, the maximum voltages may be exceeded provided the
dissipation is kept within specifications. While quality alloy transistors and grown
junction transistors can tolerate operation in the breakdown region, low quality alloy
transistors with irregular junctions should not be used above the maximum voltage
ratings. Many mesa and planar transistors exhibit negative resistance after breakdown.
Precautions should be taken to avoid this region or limit dissipation.
Quality transistors can withstand much abuse. 2N396 transistors in an avalanche
mode oscillator have been operated at peak currents of one ampere. 2N914 transistors
in the avalanche mode have generated an 8 ampere pulse with no apparent degradation.
Standard production units however should be operated within ratings to ensure con-
sistent circuit performance and long life.
It is generally desirable to heatsink a transistor to lower its junction temperature
since life expectancy as well as performance decreases at high temperatures. Heat
sinks also minimize thermal fatigue problems, if any exist.
•160
IWLLECTORDISSIPATION
IOOmwl!I0mw
\ COMMON
EMITTERCOLLECTOR CHARACTERISTICS
-140 FOR A TYPICALUNIT t-- r--
\Ie•-3.0ma _/
\ TYPE 2N396
~w -120 \L 1•••••f''"ra•-2.5ma i.--- TA=25•C
I::; I~ \ 1.....+--1
l.,..,l,..
Ie•-2.0mo ..-
i -JOO ~
~ f-1"
i- i--
u ..... \
\ r 8 • -l.5ma
,__.......
~ -80
w
a:
~~ ~- i- i--
i---
\ ,._ 1--
--- ----
a: 18 °-1.oma i-- ,._~
a -eo I\
,---
~ ~ ~-OBma_ i-- i--
~ -40
~
~ .... ,i,,. 1 8 •-0.6mo
I--
....... le •-0.4ma
--
8 -....- --
-
,.
.....,_
1 ....
le •-0.2ma
--
-20
r- -
---- I
Figure6.B(A)
80
SWITCHING CHARACTERISTICS
-200
___..,,... ----
--
-180
TYPICALCOLLECTOR
SATURATIONCHARACTERISTICS J.-1
TYPE 2N396 / a•-IOmo
-160
,..v
/
; -140
,/
w_,
-- --
V
/
-120
~ /
.!'
...
i
-100
/
/
_J"v
Ie•-Sma
_J"i..---
--
-80
,I
,,/ ,../ ---
----
I 8 •-3l'IICI
-- ---
~ -60
V v .,.,...
i..---~
V /., r8 • -2ma
8 -40
/
...
v ,,,.,.1-"" TA•2S'C
/_,,, V la•-lrna
'--
.......
~
/,/_,,
-
/L,1-'"'"
-20
,t % ;...--
0
~:::::::.
~
-----
o -20 -40 -60 -80 -100 -l20 -140 -160 -180 -200 -220 -240 -260 -280
COLLECTORVOLTAGE.\t[ (MILLIVOLTS)
Figure 6.8(8)
TRANSIENT RESPONSECHARACTERISTICS
The speed with which a transistor switch responds to an input signal depends on
the load impedance, the gain expected from the transistor, the operating conditions
just prior to application of the input signal, as well as on the transistor's inherent
characteristics.
81
SWITCHING CHARACTERISTICS
Ic1:1 10 ma
Ir/ < hFE
7Ie1
I
I I
I I
::~~--------+
I
I
:•
I
I
1 ;'
( b)
(c)
WAVEFORM GENERATED
AT A BY SWITCH
WAVEFORMAT 8
SHOWINGFORWARDBIAS
-10v1 ---------+--i- : , ' ON BASE DURING
:
I
: I:
. I I
--- SATURATION
TRANSIENT RESPONSE
Figure6.9
Consider the simple circuit of Figure 6.9(A). Closing and opening the switch
to generate a pulse as shown in Figure 6.9(B), gives the other waveforms shown. When
the switch closes, current Hows through the 20K resistor to turn on the transistor. How-
ever there is a delay before collector current can begin to How since the 20K must
discharge the emitter capacitance which was charged to -10 volts prior to closing
the switch. Also, the collector capacitance which was charged to -20 volts prior to
closing the switch must be discharged to -10 volts.
Time must also be allowed for the emitter current to diffuse across the base region.
A third factor adding to the delay time is the fact that at low emitter current densities
current gain and frequency response decrease. The total delay from all causes is called
the "delay time" and is measured conventionally from the beginning of the input pulse
to the 10% point on the collector waveform as shown in Figure 6.9(0). Delay time
can be decreased by reducing the off bias voltage, and by reducing the base drive
resistor in order to reduce the charging time constant. At high emitter current densities,
delay time becomes negligible. Figure 6.10 shows typical delay times for the 2N396
transistor.
82
SWITCHING CHARACTERISTICS
-2.5V
00~--_,......----_,..,,._o---_......,L5----...J2.L..o---_2.-'-s----_.30
Ie1 (ma)
Figure6.10
1.4
PNP ALLOY TRANSISTOR TYPE 2N396
.2 \ PULSE RESPONSE RISE TIME
.o \ tr (,iS) VS Ie 1 (ma}
Vee· 5V
-
-~ \ le a
RL a
R9 •
5mo
IKQ
10 KQ
,.
!: 0 .. \'
Q4 ~
~
0 .2
I"'---...
--~
-
"') -0.5 -1.0 -1.5 -2.0 -2.5
I91 - ma
Figure6.11(A)
The "rise time" refers to the tum-on of collector current. By basing the definition of
rise time on current rather than voltage it becomes the same for NPN and PNP tran-
sistors. The collector voltage change may be of either polarity depending on the tran-
sistor type. However, since the voltage across the collector load resistor is a measure
of collector current, it is customary to discuss the response time in terms of the collector
voltage. If all other circuit parameters are kept constant, the rise time will decrease
as the drive current is increased as shown in Figure 6.ll(A). Tum-on time (delay time
plus rise time) is shown for the 2N994, a germanium epitaxial mesa in Figure 6.ll(B).
83
SWITCHING CHARACTERISTICS
Storage time is the delay a transistor exhibits before its collector current starts to
tum off. In Figure 6.9, Ru and RL are chosen so that RL rather than hFE will limit the
collector current. The front edge of the collector waveform, Figure 6.9(0), shows the
delay time, td, followed by the nearly linear rise time, tr. When the collector voltage
falls below the base voltage, the base to collector diode becomes forward biased with
the result that the collector begins emitting. By definition, the transistor is said to be
in saturation when this occurs. This condition results in a stored charge of carriers in
the base region and in some cases in the collector region.
Since the flow of current is controlled by the carrier distribution in the base, it is
impossible to decrease the collector current until the stored carriers are removed.
When the switch is open in Figure 6.9, the voltage at A drops immediately to -10
volts. The base voltage at B however cannot go negative since the transistor is kept on
by the stored carriers. The resulting voltage across Ra causes the carriers to flow out .of
the base to produce a current lu2. As soon as the stored carriers are swept out, the
transistor starts to turn off with the base voltage dropping to -10 volts and the base
current decreasing to zero. The higher Ia1 is, the greater the stored charge; the higher
lu2 is, the faster charge is swept out. Figure 6.12 shows the dependence of storage
time on lu1 and Ia2 for the 2N396 transistor.
~
C
@) Ic =20ma
10
Vcc=5VOLTS
0.1 2 5 10 20
I (MA)
81
The "fall time," tr, of a transistor is analogous to the rise time in that the transistor
traverses the active region during this time. As normally defined, fall time is the time
for the transistor to switch from 90% ON to 10% ON as shown in Figure 6.9(0).
Figure 6.13(A) shows typical fall time measurements for a 2N396. Turn off time (stor-
age plus fall time) for the 2N994 is shown in Figure 6.13(B).
84
SWITCHING CHARACTERISTICS
192 mo
PNP TRANSISTOR TYPE 2N396
.2 5
Vee• - 5V
1.4 Ie • - 5mo
RL • = I Ktl
1.2 Re " I0Ktl
---
82
0.7 .25
0.6 ~
~
/
in
:t.
-
- 0.5
0.4
.50
0.3
.75
02
1.0
0.1
Figure6.13(A)
85
SWITCHING CHARACTERISTICS
30 .---....----------..-----..-------,
g
fl)
t)
I
fl)
~
I 10 ~-I------I-.J,,..----1-..:JJ4C..----;;.;;.__ ___ ~
_o =
5 10 2.0 100
TRANSIENT RESPONSEPREDICTION
A number of methods exist which enable one to predict the speed of response of
a given transistor in a given circuit. Three fundamental methods are: the equivalent
circuit approach, charge control analysis, and the diffusion equation solution. The
equivalent circuit method normally uses the equivalent circuits shown in Figure 6.14.
NPN polarity is used in the circuits.
DELAYTIME
EQUIVALENTCIRCUIT
(A)
E 1• ON DRIVE
E • 0FF BIAS
2
NOTE:
Ccb AND Cob ARE
NON-LIH£AR JUNCTION
CAPACITANCES
TRANSISTOREQUIVALENTCIRCUITS
Figure 6.14
B
86
SWITCHING CHARACTERISTICS
(6b)
where
a1 = low frequency inverse common base current gain.
fa1= inverse a cutoff frequency.
Using equivalent circuits, the storage time is defined as the time required for the
collector to become back-biased - i.e., to stop emitting. As will be shown shortly, this
is also the same as requiring that excess base charge be removed.
From the equivalent circuit, the transient times can be approximated. For delay
time, the effects of the collector capacitance can be neglected if Eco is much greater
than E:1.If E1 and R (in Figure 6.14(A)) approximate a current source, then
td= c.bCE.)x E:1 (6c)
IRt
C.b (E2) is the average effective capacitance of the emitter junction between E2
volts reverse bias and the forward biased condition. A method of approximating this
capacitance will be discussed later in this section in conjunction with the charge
control parameters. In the following graphs results of the equivalent circuit approach
are shown for the common emitter configuration. Figure 6.15 gives the rise time
information.
f ----~~,1--------------------
hFE Ie1
I, , I +2irf 0 RLCco \n ~
2•1a 11-a,.1 hrc Iei-Ics
/
a:
Ic
~ ,. " Ier 2,r la IF' 2r la RL c,. <<I ANO hiccIea > 3Ics
u
w
.J
8
tr h FE/2'D'fa TIME ----+
GRAPHICALANALYSIS OF RISE TIME
Figure6.15
87
SWITCHING CHARACTERISTICS
If the load resistor Rt in Figure 6.9(a) is small enough that a current hn ls1,
through it will not drive the transistor into saturation, the collector current will rise
exponentially to hvEls1with a time constant, hve/2irfa, However, if Rt limits the cur-
rent to less than hvEle1the same exponential response will apply, except that the curve
will be terminated at lcs = VRt cc , the saturation current. Figure 6.15 illustrates the case
for lcs A:$ hnle1/2. Note that the waveform will no longer appear exponential but
rather almost linear. This curve can be used to demonstrate the roles of the circuit
and the transistor in determining rise time. For a given transistor it is seen that increas-
ing hvEIBt/lc will decrease rise time by having le intersect the curve closer to the
origin. Since the approximate equation assumes that hn and fa are the same for all
operating points and that the collector capacitance effects are negligible, the calcu-
lated results will not fit experimental data where these assumptions are invalid. Figure
6.ll(A) showed that the rise time halves as the drive current doubles, just as the
expression for tr suggests, since in this case capacitance effects were small; however,
the calculated value for tr using the approximate expression is in error by more than
50%. This shows that even though the calculations may be in error, if the response
time is specified for a circuit, it is possible to judge fairly accurately how it will change
with circuit modifications using the above equations.
Collector current fall time can be analyzed in much the same manner as rise time.
Figure 6.16 indicates the exponential curve of amplitude Io + hnle2, and a time con-
stant, hv1d271'fa,
Fall time is given by the time it takes the exponential to reach lcs,
THE INTERCEPTOF Ic ANO THE CURVE GIVES t f·
Ie2 hFE + 1 c
------~--------------------
,,
f I
I
I
/ I EXPONENTIALCURVE
TIME_,.
hFE Ics
ft Q: -- -------------- IF 271fa RL Ccb<< I ANDhFEie2>3Ics
27Tfa hFEie2+Ics
GRAPHICALANALYSIS OF FALL TIME
Figure6.16
In the approximate expression in Figure 6.16, tr will be approximately equal to
_l_ X 108 if hn is very large compared to Ics/Ie,.
2,rfa l01
Figure 6.17 shows a curve which is useful for calculating storage time graphically.
The maximum value is hvE (101+ Ie2),where Ia2 is given the same sign as IBl, ignoring
88
SWITCHING CHARACTERISTICS
the fact it flows in the opposite direction. The time constant of the curve involves the
forward and inverse current gain and frequency cut-off. The storage time corresponds
to the time required to reach the current hFEla1-le. It can be seen that for a given
frequency response, high hFE gives long storage time. The storage time also decreases
______
as l02 is increased or Is, is decreased.
?:'___________________ _
h FE (I91 + 102>
l~
._
z
hFElal-lc
+-
/
/ I
ILi
IX
IX
::,
u
GRAPHICALANALYSIS OF STORAGETIME
Figure6.17
seen that the generally specified normal hvE and fa are of little use in determining
storage time. For a symmetrical transistor, the time constant is approximately
t
hvE 1 . It is possible for a symmetrical transistor to have a longer storage time than
27"a
an unsymmetrical transistor with the same hvE and fa,
Using the charge control approach, the transistor is viewed from a more funda-
mental vantage point. The actual charge requirements of various regions within the
device are determined, and the transient times are found by calculating the time
required to supply the various charge components. The emitter and collector junctions
of a transistor when in the cutoff condition are reversed biased; in this condition only
leakage currents flow across the junctions, the base charge is negligible and the junc-
tion depletion layers are wide because of the reverse bias applied as shown in Figure
6.18(A). In Figure 6.9(A), this condition exists in the transistor when the switch is
open; VnE is equal to -10 volts and Vcs is equal to 20 volts. Immediately after the
switch is closed, no collector current flows since the emitter junction is reverse biased,
thus the initial base current which flows supplies charge to the emitter and collector
junction depletion layers and soon causes the emitter junction to become forward
biased and begin emitting as shown in Figure 6.18(B). The quantity of charge which
has been supplied to the emitter junction depletion region is called QE and is a func-
tion of the reverse bias voltage which was applied to the junction prior to the appli-
cation of the turn-on signal. The charge supplied to the collector depletion region
during this time is denoted Qco and is a function of the reverse bias on the emitter,
89
SWITCHINGCHARACTERISTICS
and the collector supply voltage being switched. Looking again at Figure 6.9(A), the
condition illustrated in Figure 6.18(B) exists when VBr:equals about .3 volts and Vee
equals about 10 volts.
With the emitter junction now forward biased, the transistor enters the active
region. Collector current begins to flow and the voltage at the collector begins to drop
because of the presence of the collector load resistor, RL, shown in Figure 6.9(A).
During this time a gradient of charge is established in the base region of the tran-
sistor. The slope of this charge gradient is proportional to the collector current which
is flowing. If the base current supplied is greater than the rate of recombination of
charge in the base region, the gradient will continue to rise until an equilibrium
condition is reached. If equilibrium is reached before the collector junction is for-
ward biased, the transistor will not saturate. Since the recombination rate of charge
in the base is Ic/hFe (or 1B1),the collector current will rise to hFE Ie1 if the device
does not saturate. If, on the other hand, the collector current causes the collector-base
junction to become forward biased before equilibrium is reached, the device will
saturate. The existing condition within the transistor at the edge of saturation is
depicted in Figure 6.18(C). The time required to move from the edge of cutoff to the
DIITTDI I j._C:Ol.L[CTOA
.AIHCTIOII-, I JUl«:TION
I I
EMITTER
BAK
I
I
.....-c:oLLtcTOII
I
I RJ JR I 0£PLETION REGIONS
I I
10,-PLIED :
Oco IU't'LIEDI
I IIAIIROWD£PL£TIDN R£CIIOIIS l
( B) EDGEOF CUTOFFCONDITION
I I
I Oc SUPPUEDI
! IIAIIRDW0£PL£TIDN lltGIDNS I
(C) EDGE OF SATURATIONCONDITION
I I
I I
lliNill I
(D) TRANSISTORSATURATED
l
90
SWITCIDNG CHARACTERISTICS
edge of saturation is the rise time. Charge quantities involved are the base gradient of
charge Qa, which is a function of collector current Bowing, and Qc, which is a function
of Vce. Qc is the charge required to cause the collector junction to narrow and becomes
forward biased. Since measurement of Qe and Qc is frequently accomplished by
measuring the two quantities together and then separating them as shown in Chapter
15, the sum of Qs and Qc is frequently used and is called Qn*. At the edge of satura-
tion the V BE is about .3 volt and V ca is O volts if the bulk resistance of the collector
body is neglected. Since equilibrium is not established with respect to the base current,
charge in excess to that required to saturate the transistor is introduced into the base
region. The base gradient of charge remains constant since the collector current is at a
maximum for the circuit; the excess charge, Qax, is a function of the current which is
permitted to How into the base in excess of that required to saturate the transistor.
This current is called lex. Distribution of Qax in the transistor is shown in Figure
6.18(D).
In the alloy type transistor, essentially all of the stored charge is in the base region.
In devices where the collector bulk region has high minority carrier lifetime, excess
carriers can also be stored in the collector. These carriers reach the collector from the
base since the collector junction is now forward biased and base majority carriers are
free to flow into the collector region during saturation. These stored carriers have no
effect in tum-on time. Storage time, however, is the time required to remove these
stored carriers as well as those stored in the base. Both the mesa a~d planar devices
exhibit collector minority carrier storage. The epitaxial process used in General Electric
transistors 2N781, 2N914, 2N994 and the 2N2193 minimizes collector storage while
not adversely effecting collector breakdown voltage or other desirable characteristics
of the transistor. Incidentally, it may be possible to meet the electrical specification of
a given registration without using epitaxial techniques. Component manufacturer's
data should be consulted for process information.
From the various charge quantities introduced, a number of time constants can be
described that relate the charge quantities to the currents flowing; these time constants
are defined in equations (6d).
Ta=~
les
Tr=..2! (6d)
lcs
Tb=-2!!
lax
Ta is called the active region lifetime, T., is called the collector time constant, and
Tb is the effective lifetime in the saturated region. In some literature Tb has been called
T • , Where collector minority carrier storage exists the measurement method for Tb
shown in Chapter 15 does not only measure Qax/IBXbut includes much of the collec-
tor stored charge; as such, this parameter is still a valuable tool in rating the storage
characteristics of various transistors since a low Tb value indicates a low storage time.
The time constants defined are constant over large regions of device usage and are
normally specified as device constants.
To determine the transient response using the charge approach, the required charge
for the time in question is divided by the current available to supply that charge; thus,
the basic equations are as given in Equation (6e).
91
SWITCHING CHARACT£RISTICS
tc1=OE+ Oco
101
tr Oe± Oc Te I.,+ Oe
101 le1 (Be)
t. =.9.!!.,
l02
= lex
les
Tb
tr = Oe ± Oc= le +Oc Tc
le:1 le,
The simplicity of these equations is readily seen. Their accuracy is dependent upon
the assumption made in the equations that l01 and 101truly are constant. Refinements
in these equations arise from the fact that some of the charge in the base recombines
on its own and must be accounted for in determining transient speed. These refine-
ments are seen primarily in equations (6£) for rise and fall time.
tr= Oe± Oc
101- .5 les (6£)
tr= Oe± Oc
Ie1 + .5 la11
Equations (6e) and (6f) assume that the current Ie1 is sufficient to drive the tran-
sistor well into saturation. If 101is three times greater than les, these equations are
valid. For the cases where the drive-on is not large compared to les, but nevertheless
is greater than les, equations (6g) are more accurate expressions.
t. RL Oc]In (
=[TA+ hFF. ln1 )
Vee l01 - las
t. = Tb In l01 ± Ie2 (6g)
+
Ie2 Ies
tr =[TA+hFERL Oo]In (Ie2 + le 11
)
Vee 102
The lack of simplicity of these equations is also readily seen. If the drive-on current
is not sufficient to drive the transistor into saturation the collector current will rise to
h,.£ Ie with a time constant slightly greater than Ta as shown in (6g). Fall time is also
determined by using the time constant of the tr expression in (6g), but the magnitude
attempts to reach hn Ie:1in the reverse direction before it is interrupted at le= 0. Thus,
the tum-off time from the non-saturated state is
tr= [Ta
+hvE RLOc]In (102 + let)
Vee Ie2
The charge control parameters as they appear on the 2N396A alloy device are
shown in Figure 6.19(A). On the specification, transient times are defined from 10% to
90% points to make their measurements easier as shown in Figure 6.9(0). This defini-
tion, however, demands that the equations be slightly modified to accommodate these
new definitions of transient times. The modified form is shown in Figure 6.19(A) with
the 2N396A specification. Figure 6.19(B) shows the charge graphs for the 2N994.
Frequently, it is convenient to know some of the relationships between charge
control parameters and small signal parameters. Convenient approximate interrelation-
ships are shown in equations (6h).
Qe = le Ta
= le • ;;;a
_ _ 1 1
Qe - le Tc - le • 21rfaor I., • 21rfT (6h)
!.!.
Tc
= hP'E
92
SWITCHING CHARACTERISTICS
4000
/ 0990 (MAX}
3000
/ 0 890 (TYPI
2000
/ / 0111001
1000 /
/ /
~
/ 0s,o1MAX.l 400
800
/ / /
600
/ V ,Iv 200
j
1200
400
V
/ V
l/
v/
/
/ .,
"'
:I! 100
TYPICAL
~
--;, 100
O 80
60
/
/
/
/
/
/
/
/
0 e VERSUS Ics -
i
~
~
eo
60
40
0c100VERSUS VcE INOTE I
/ V u
/ 0
v//
~
40
20
20
V
4 6 810 20 40 60 80100 • e a 10 20
VcclVOLTSI
I cs (MILLIAMPERES)
2N396A
SPECIFICATION TA• 25° Cl
••• ACTIVE REGIONLIFETIME
MIN.
I.I
TYP. MAX.
I.B ,.,
'b• SATURATED REGIONLIFETIME .65 1.2 ,..
CB[,AVERAGE EMITTER JUNCTION CAPACITANCE 12 17 pl
Id • VeE (OFF) cii£ + 1/9 X 0990 +Oc,o t, • 8/9 X Oe,o + Oc,o Ie1+I12)
Ie1 I 8, -.SI 85 Ia, -.Sies
la••b 1,,( --- +
Ies+I12
NOTE: Oc90 • Oc,oo AT Vet MINUS Oc100 AT .I Vet AS ILLUSTRATED FOR Vet •
so
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20
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::>
g Ia :
20t----+---+-~--,-"'"+-,J,,l'++----I
15t-----+----+----,,l"-""""'+-lt-t-++-----f 4
/
c., ts ~'...."'"'/
~ 10----------.....-----++-----1 0 z
.,,II' /
a' a---------------++-----1 ; /
// """"I
Cl.I
0.8
'
o,7
4.__ __ _ _._.....____.__._......,t-.L.._____,
__._
0.1
0.5
, I
-I -2 -3 -4 -5-6 -8 -IO -15 o.4., •Z •I •4 • •8 •IO •ZO •30 •40 •IO •eel -tOO
2N994 CHARGESPECIFICATION
(8)
Figure 6.19
93
SWITCIUNG CHARACTERISTICS
Expressions for the emitter and collector depletion layer charge can be approxi-
mated from small signal capacitance measurements on the respective junctions. If Cob
is known at some reverse bias V ca with Is: =
0, the Qc can be approximated if it is
known whether the device has alloy, grown, or diffused junctions. If the device is an
alloy transistor, then
=
Cob k Vea-t/1 (6i)
where k is a proportionality constant. The approximate depletion layer charge required
for the alloy junction voltage to move from V oa1 to V cs2 is found from equations 6j and
6k or Table 6.1.
Vcs:1
Qo =f Cob dV = rVon2
kv- 1111
dV (6j)
Vou1 • Vcs1
Vce2
Qc =2 k Vca 112IVcu1=2 k (Vcui 12 - Vca1111
) (6k)
The value of k is found from the small signal capacitance measurement and the
expression given in equation (6i); that is, the junction constant k is found for the
collector junction of an alloy transistor by multiplying the measured Cob by (Vcu)112
where Vcu is the measurement voltage. Table 6.1 gives these formulae for other struc-
tures. For grown junctions, the capacitance is proportional to Vcu-111 while for diffused
junctions - mesa and planar structures - an approximate value of Vca -o., is frequently
used. The diffused junction capacitance may, however, be proportional to voltage
functions anywhere from Vcu- 112to Vca- 111 and will vary with voltage level. Table 6.1
indicates some of the results from these considerations.
Qg I
2k., VEu1/1 Vrrn:r 1.5k. V ca•talV EB:i 1.6k. Vzuo.o VsB2 I
VEn1 Vza1 Vznt
•The Ven or Vim in these expressions is the measurement voltage for Cob or C1b respectively.
Table 6.1
APPROXIMATE
VALUESOF Ge AND QE FROMCob AND C1b
An instance where Table 6.1 would be of value is in determining the charge re-
quirements for delay time. From equations (6d), it is seen that the delay time charge
is Qs + Qc», If the reverse bias on an alloy transistor is VI and the supply voltage is
V..,.,,then
94
SWITCHING CHARACTERISTICS
V2
Qv. = 2k. Vv.e
112
I=
O 2k. V2
112
V2+ V.,.,
= 2k., [ (V2+ v.,.,)112 - v.,.,112]
or
Qco = 2k., Vce112
Iv.,.,•
QE + Qco = 2k. V2 + 2k ..
112
[<v2 + v., ..)
112 112
..... v., .. ]
On the 2N396A specification shown in Figure 6.19, the Qco value would be taken
from the Q0100graph by finding Qc at V2 + V.,., and subtracting Qc at V.,., from it.
CaE is specified as the average base-emitter junction capacitance and is essentially
equivalent to the capacitance at 1 volt reverse bias. The Cei;:value is thus numerically
equal to k ... Using these charge parameters, one can rapidly determine response char-
acteristics. Even if the input is not a current source, the charge requirements of the
device are useful. For example, the speed-up capacitor in RCTL (Resistance Capacitor
Transistor Logic) circuits can be estimated.
Also, since the charge graphs as shown in Figure 6.19 illustrate the effects of col-
lector current and voltage separately, a designer can readily estimate the effects of
supply voltage or load current variation on the transient response of a circuit. It is
interesting to note, for example, that at high current levels in the 2N396A specification
the depletion layer charge, Qc, is only a small fraction of Qa, whereas on a mesa device
like the 2N781 or 2N994, the collector depletion charge Qc is a large fraction of the
total base charge (Qa + Qc) at almost all operating points of interest, as .shown in
Figure 6.19 for the 2N396A and 2N994. These observations would argue that for alloy
transistors the supply voltage level which is being used need not be as critically
selected as for mesa units, and that the mesa's ability to switch rapidly is shown more
readily at low collector supply voltages.
Solution of the diffusion equation for transient speed of a transistor is beyond the
scope of this manual. Two important results of this analysis should be stated however.
First, any prediction using equations given in this section to predict a response time
approaching 1/(25 fa) should not be accepted since approximations made are not valid
at these speeds. Secondly, as Ie2 becomes larger, the error in storage and fall time
equations increases since the minority carrier density in the base, shortly after the
application of the turn-off pulse, is not as shown in Figure 6.18(D), but is more like
that shown in Figure 6.20
EMITTER COLLECTOR
JUNCTION JUNCTION
I I
95
SWITCHING CHARACTERISTICS
0.2V o.ev
VcE(sat> 2N914
is seH evident and is responsible for its popularity, However, special requirements are
placed on the transistors. The following are among the circuit characteristics:
First, the emitter junction is never reverse biased permitting excessive current to
flow in the off transistor at temperatures above 40°C in germanium. In silicon, how-
ever, operation to 150°C has proved feasible.
Second, saturation is responsible for a storage time delay slowing up circuit speed.
In the section on transient response we see the importance of drawing current out of
the base region to increase speed. In DCTL this current results from the difference
between VcEcsAT> and VsE of a conducting transistor. To increase the current, VcEcsAT>
should be small and rb' should be small. However, if one collector is to drive more
than one base, rb' should be relatively large to permit uniform current sharing between
bases since large base current unbalance will cause large variations in transient response
resulting in circuit design complexity. High base recombination rates and epitaxial
collectors to minimize collector storage result in short storage times in spite of rb'.
Third, since V cE csAT>and VaE differ by less than .3 volt in germanium, stray voltage
signals of this amplitude can cause faulty performance. While stray signals can be
minimized by careful circuit layout, this leads to equipment design complexity. Silicon
transistors with a 0.6 volt difference between V cE cRAT>and V BR are less prone to being
turned on by stray voltages but are still susceptible to turn-off signals. This is some-
what compensated for in transistors with long storage time delay since they will remain
on by virtue of the stored charge during short turn-off stray signals. This leads to
conflicting transistor requirements - long storage time for freedom from noise, short
storage time for circuit speed.
Another application of saturation is in saturated flip-flops of conventional configura-
tion. Since VcE cSAT1is generally very much less than other circuit voltages, saturating
the transistors permits the assumption that all three electrodes are nearly at the same
potential. making circuit voltages independent of transistor characteristics. This yields
good temperature stability and good interchangeability. The stable voltage levels are
SWITCHING CHARACTERISTICS
useful in generating precise pulse widths with monostable flip-flops. The section on
Hip-flop design indicates the ease with which saturated circuits can be designed.
In general, the advantages of saturated switch design are: (a) simplicity of circuit
design, (b) well defined voltage levels, (c) fewer parts required than in non-saturating
circuits, (d) low transistor dissipation when conducting, and (e) immunity to short
stray voltage signals. Against this must be weighed the probable reduction in circuit
speed since higher trigger power is required to tum off a saturated transistor than one
unsaturated.
l
Ic
_,_
RL
Eo Ecc~vcE
DIODECOLLECTOR COLLECTORCHARACTERISTICS
CLAMPINGCIRCUITTO SHOWINGLOAD LINE AND OPERATING
AVOID SATURATION POINTS
COLLECTORVOLTAGECLAMP
Figure6.22
97
SWITCHING CHARACTERISTICS
change in hn is known and the load is relatively fixed, this circuit prevents saturation.
To avoid the dependence of VoE on le and hn, Ramay be added as in Figure 6.23(B).
By returning Rato a bias voltage, an additional current is drawn through Ra. Now
VcE is approximately (hie
VE
+ Ia)Ra.Ia can be chosen to give a suitable minimum Vcs.
The power consumed by Racan be avoided by using the circuit of Figure 6.23(C),
provided a short lifetime transistor is used. Otherwise fall times may be excessively
long. Ra is chosen to reverse bias the emitter at the maximum Ico. The silicon diode
replaces R2. Since the silicon diode has a forward voltage drop of approximately .7
volts over a considerable range of current, it acts as a constant voltage source making
Veg approximately .7 volts. If considerable base drive is used, it may be necessary to
use a high conductance germanium diode to avoid momentary saturation as the voltage
drop across the diode increases to handle the large base drive current.
Ihl
98
SWITCHING CHARACTERISTICS
In applying the same technique to silicon transistors with low saturation resistance,
it is possible to use a single germanium diode between the collector and base. While
this permits VcE to fall below VBE, the collector diode remains essentially non-
conducting since the .7 volt forward voltage necessary for conduction cannot be
reached with the germanium diode in the circuit.
Diode requirements are not stringent. The silicon diode need never be back biased,
consequently, any diode will be satisfactory. The germanium diode will have to with-
stand the maximum circuit VcF.,conduct the maximum base drive with a low forward
voltage, and switch rapidly under the conditions imposed by the circuit, but these
requirements are generally easily met.
Care should be taken to include the diode leakage currents in designing these
circuits for high temperatures. All the circuits of Figure 6.23 permit large base drive
currents to enhance switching speed, yet they limit both IB and Ic just before saturation
is reached. In this way, the transistor dissipation is made low and uniform among
transistors of differing characteristics.
It is quite possible to design flip-flops which will be non-saturating without the
use of clamping diodes by proper choice of components. The resulting Hip-Hop is
simpler than that using diodes but it does not permit as large a load variation before
malfunction occurs. Design procedure for an undamped non-saturating Hip-flop can be
found in Transistor Circuit Engineering by R. F. Shea, et al (John Wiley & Sons, Inc).
Ecc
99
SWITCHING CHARACTERISTICS
100
BIASING
One of the basic problems involved in the design of transistor amplifiers is estab-
lishing and maintaining the proper collector to emitter voltage and emitter current
(called the biasing conditions) in the circuit. These biasing conditions must be main-
tained despite varations in ambient temperature and variations of gain and leakage
current between transistors of the same type. The factors which must be taken into
account in the design of bias circuits would include:
I. The specified maximum and minimum values of current gain (hn) at the oper-
ating point for the type of transistor used.
2. The variation of hFE with temperature. This will determine the maximum and
minimum values of hFE over the desired temperature range of operation. The
variation of hFE with temperature is shown in Figure 6.7 for the 2N525
transistor.
3. The variation of collector leakage current (Ico) with temperature. For most
transistors, Ico increases at approximately 6.5-8%/°C and doubles with a tem-
peratu're change of 9-11 °C. In the design of bias circuits, the minimum value of
Ico is assumed to be zero and the maximum value of Ico is obtained from the
speci6cations and from a curve such as Figure 6.6. If silicon transistors are used,
it is best to use the specified high temperature Ico for estimating the maxi-
mum Ico,
4. The variation of base to emitter voltage drop (V1n:) with temperature. Under
normal bias conditions, VnE is about 0.2 volts for germanium transistors and 0.7
volts for silicon transistors and has a temperature coefficient of about -2.5 milfi-
volts per °C. Figure 7 .1 shows the variation of VBF: with collector current at
several different temperatures for the 2N525. Note that for some conditions of
high temperature it is necessary to reverse bias the base to get a low value of
collector current.
5. The tolerance of the resistors used in the bias networks and the tolerance of the
supply voltages.
- ~•c
v- --
Y) /
Ill
Zll't
-
(/ i....-- ~•c
-
0
(
/ --....-~
/
~
c- - -70't
I
+•
,-/ I) •I -2 -l -4
_, -6
EMITTERCIRIENT. SE-MILLIAMPERES
101
BIASING
Two of the simpler types of bias circuits are shown in Figures 7.2 and 7.3. These
circuits can be used only in cases where a wide range of collector voltage can be
tolerated (for Figure 7 .2 at least as great as the specified range of hvE) and where
hvsmu times Ioom•x is less than the maximum desired bias current. Neither circuit can
be used with transistors which do not have specifications for maximum and minimum
hvs unless the bias resistors are selected individually for each transistor. The circuit of
Figure 7.3 provides up to twice the stability in collector current with changes in hvE
or loo than the circuit of Figure 7.2. However, the circuit of Figure 7.3 has a-c feed-
back through the bias network which reduces the gain and input impedance slightly.
This feedback can be reduced by using two series resistors in place of R2 and connect-
ing a capacitor between their common point and ground.
+Vee
TRANSISTORBIAS CIRCUITS
Figure 7 .2 Figure 7 .3
In cases where more stability is desired than is provided by the circuits of Figure
7.2 or 7.3, it is necessary to use a resistor in series with the emitter of the transistor as
shown in Figure 7.4. There are several variations of this circuit, all of which may be
obtained by the general design procedure outlined below. The currents shown in
Figure 7.4 are those which would be measured if an ammeter were inserted in that
circuit; thus, for example, the value of Is in the figure includes Ico,
+Vee
102
BIASING
and at the highest temperature of operation IE will have its maximum value and the
worst conditions would occur for hl'E = hvEmax,VaE = VuEmln,Ico = Icomax.
at highest
temperature:
V8 = [ Rs
hFEmu+ 1
+ R
m
J
I max+ V min_ I mu R8 .
t: BE co
(7d)
from these two equations the value of Rs can be calculated by equating the two
expressions:
Rs= (lt:max_ lt:mln)Rv.+ y 8 Emln_ y 8 Emax
(7e)
I max It:max l&mln
CO - hvt:max+ 1 + hnmln + 1
As an example, consider the following bias circuit design:
1. Select the transistor type to be used (2N525)
2. Determine the required range of temperature
0°c to+ 55°C
3. Select the supply voltage and load resistance
Vee= 20 volts; RL = 7.5K
4. Determine Icomax:
From the electrical specifications the upper limit of Ico is 10 µ,a at 25°C and
from Figure 6.6 Ico will increase by a factor of 10 at 55°C, thus Icomu:= 10 X
=
10 100 µ,a.
5. Determine the values of hFEmlnand hFEmax
From the electrical specifications, the range of hvE at 25°C is 34 to 65. From
Figure 6.7 hFE can change by a factor of 0.75 at 0°C and by a factor of 1.3 at
+55°C.
= = =
Thus hl"Emla 0.75 X 34 25 and hFEmax 1.3 X 65 = 85.
6. Determine the allowable range of Ii;::
In general, the variation of the circuit performance with emitter current
determines the allowable range of emitter current. In some cases the allowable
range of emitter current is determined by the peak signal voltage required
across RL.
Assume that the minimum current is .67 ma which gives a minimum voltage
of 5 volts across RL and the maximum emitter current is 1.47 ma which gives a
maximum voltage of 11 volts across RL, The allowable range of emitter current
must be modified to take into account the tolerance of the bias resistors. That is,
if the allowable range of emitter current is .67 ma to 1.47 ma, the circuit must
be designed for some narrower range of emitter current to allow for resistor
tolerances.
103
BIASING
104
BIASING
105
BIASING
In Figures 7.8 and 7.9, biasing techniques are used which will improve the input
impedance of the amplifier being designed. In Figure 7.8, the a.c. feedback through
R1 is essentially eliminated by the existence of Gr. R1 can therefore be quite small in
order to obtain good temperature stability for the amplifier. In Figure 7.9 bootstrapping
techniques are used. Here the a.c. and d.c. feedback are quite large. Temperature
stability and input impedance can be optimized but the gain of the circuit is sacrificed
for increased input impedance.
Vo
1---oouT
Cz
DIRECT COUPLEDAMPLIFIER
Figure 7.8
OUT
Rz
BOOTSTRAPPED
AMPLIFIERS
Figure 7.9
106
BIASING
I _ Vp;:i- V1 {7p)
f::l - R:.
l1 =Vi
Ro
(7q)
Substituting these voltage and resistor values into the node equations, and eliminating
lei and Ia2by use of the transistor equations (7j) and (7k), the following results
Vo - Ve, h .
R: Ft:1
(v,-
Rt
Vm) + (h + 1) I + Vo - Ve: -(hFF.2 +
FF.1 Cot hFt::1R. hF.:2
1) I
COi
(7r)
(1 + h FE!)( V, -Vn,+
R, I•COi )- - V•:1
Ra (7s)
( Vo -R.VeQ
- - I CO:! ) (l+ h ) =h
FE:! ••&:1
(VE2R
- ...V1) (7t)
107
BIASING
current relationships within the circuit must also change so that equations (7r) through
(7y) are satisfied. In practical design, for example, the specifications for the amplifier
normally demand that the output be capable of a specific voltage excursion. This peak
to peak allowable swing at the collector of the output transistor can theoretically equal
the supply voltage, if the bias voltage, Vc:i, is exactly Vo/2. Maintaining Vc:i exactly
over the range of hFE and Ico is essentiaJly impossible, and thus the output voltage
excursion must be somewhat less than the supply voltage so that limiting does not
occur on the output waveform as the bias level changes. At the lowest temeperature of
interest, the emitter currents will be a minimum and the worst conditions would occur
for hn = hP'Bmin,VoEmax,and Ico = 0. At high temperature, the emitter currents will
have a maximum value, and the worst case is encountered for hFE = hFEm•x,VBE =
VeEmln,and lco = lco.mu
The choosing of resistor values throughout the circuit is normaUy accomplished by
considering circuit requirements in conjunction with transistor operating conditions.
Equations (7f) through (7q) may also be of value in selecting resistors. A pedectly
general biasing scheme is difficult to describe since individual circuit requirements
play an important role in every amplifier. Some considerations are mentioned earlier
in this chapter and also in Chapter 14. A general method of checking the values of
resistance chosen could be worked out by solving equations (7r) through (7y) for Vc:i
by eliminating all voltages except Vo, V0.:1,and Vov.:z.The resulting equation will be
of the form
Ve-•= K1Vo+ K: Vev.1+ KaVe•:2+ K. lco1+ K, Ico:i (7z)
- Ko
If no approximations are made, these constants can be quite lengthy. For the case of
Figure 7.18 the constants are
Ro = Ra Rs + R: Ro + Ra Ro (7hh)
Re = R1 Rs+ R1Ro + RsRo (7ii)
By calculating the value of Ve2 using the worst case values for h1% VoE, and loo at
the temperature extremes the variation in Ve2with temperature can be checked. Though
this procedure is tedious, one is able to determine the stability of any given amplifier
using steps similar to those outlined for the circuit of Figure 7 .18.
Because of the circuit configuration used in this example, other types of bias
schemes can also be analyzed by setting some of the resistor values at zero. Two
different bias schemes would call for the following resistor changes: Ro= O; or Ro= 0,
and R1represents resistance seen at the base by the first transistor.
108
BIASING
THERMALRUNAWAY
When a transistor is used at high junction temperatures (high ambient temperatures
and/ or high power dissipation) it is possible for regenerative heating to occur which will
result in thermal run-away and possible destruction of the transistor. In any circuit the
junction temperature (T1) is determined by the total power dissipation in the transistor
(P), the ambient temperature (TA), and the thermal resistance (K).
L=L+U ~
If the ambient temperature is increased, the junction temperature would increase an
equal amount provided that the power dissipation was constant. However, since both
hFE and Ico increase with temperature, the collector current can increase with increas-
ing temperature which in tum can result in increased power dissipation. Thermal run-
away will occur when the rate of increase of junction temperature with respect to the
power dissipation is greater than the thermal resistance (b. T1/ b.P K).>
Thermal run-away is generally to be avoided since it can result in failure of the
circuit and possibly in destruction of the transistor. By suitable circuit design it is
possible to ensure either that the transistor can not run away under any conditions or
that the transistor can not run away below some specified ambient temperature. A dif-
ferent circuit analysis is required depending on whether the transistor is used in a
linear amplifier or in a switching circuit.
In switching circuits such as those described in Chapter 6, it is common to operate
the transistor either in saturation (low collector to emitter voltage) or in cutoff (base to
emitter reverse biased). The dissipation of a transistor in saturation does not change
appreciably with temperature and therefore run-away conditions are not possible. On
the other hand, the dissipation of a transistor in cutoff depends on Ico and therefore
can increase rapidly at higher temperatures. If the circuit is designed to ensure that the
emitter to base junction is reverse biased at all temperatures (as for the circuit of Fig-
ure 7.10) the following analysis can be used:
Ico
+-- Vcc=-30V
--~V'v----0
Figure7.10
The transistor power dissipation will be,
P = IcoVCE = Ico(Vcc - lcoRL)= Ico Vcc - lco2 RL (7kk)
The rate of change of power dissipation with temperature will be,
~; = 1i: 0
• ~;' = (V cc - 2lcoRL) 8lco (7ll)
where 8 E!! 0.08 is the fractional increase in Ico with temperature. The condition for
run-away occurs when dP/dT =
1/K or,
(V cc - 2IcouRL) 8lcou =
1/K {7mm)
where Icou is the value of Ico at the run-away point. Solving for Icou gives,
lcou = Vee±
1
V (Vcc) - (8RL)/(8K) {7nn)
4RL
109
BIASING
In this equation the solution using the negative sign gives the value of Icou, while the
solution using the positive sign gives the value of Ico after run-away has occurred. It is
seen from the equation that the value of Ico after run-away can never be greater than
Vcc/2RL so that the collector voltage after run-away can never be less than one half of
the supply voltage V cc, If the term under the square root sign in the-above equation is
zero or negative, thermal run-away cannot occur under any conditions. Also, if thermal
run-away does occur it must occur when the collector voltage is greater than 0.75Vcc.
since when the term under the square root sign is zero, 10011 RL equals .25 V cc, As RL
goes to 0, the solution for Ico11using the negative sign is indeterminant, i.e., equal to
0/0. In this case Equation (7mm) is used and
1
=
IcoM a K Vee (700)
Since no RL exists, the current after thermal runaway is theoretically infinite, and the
transistor will be destroyed unless some other current limiting is provided. Once the
value of IcoMis determined from Equation (7nn) or (700) the corresponding junction
temperature can be determined from a graph such as Figure 6.6. The heating due to
10011 is found by substituting Icou for Ico in Equation (7kk). Finally, the ambient tem-
perature at which run-away occurs can be calculated from Equation (7jj).
In circuits which have appreciable resistance in the base circuit such as the circuit
of Figure 7.11 the base to emitter junction will be reverse biased only over a limited
temperature range. When the temperature is increased to the point where the base to
emitter junction ceases to be reverse biased emitter current will flow and the dissipation
will increase rapidly. The solution for this case is given by:
Ve =+IV
,----o vcc=-30V
IK
2N527
Figure7.11
Ico11 = (Vee - 2R~tol:1:) ± v(Voo - 2RJi,.Lr) 1
- (8RL)/(aK) (7pp)
4R~,.
where Is = Va/Ra, When RL approaches 0.
Ioou =hn l
a K Vee
(7qq)
In the analysis of run-away in linear ampliBers it is convenient to classify linear
amplifiers into preamplifiers and power amplifiers. Preamplifiers are operated at low
signal levels and consequently the bias voltage and current are very low particularly in
stages where good noise performance is important. In capacitor coupled stages a large
collector resistance is used to increase gain and a large emitter resistance is used to
improve bias stability. Accordingly, thermal run-away conditions are seldom met in
preampliBer circuits.
110
BIASING
vcc=-3ov
V9=2V
Figure7.12
111
BIASING
= =
which K 250°C/watt and Icomu: 16,aa at 25°C and 25 volts. Calculating the circuit
values corresponding to Figure 7.12 and Equation (7ss):
Vee= 9 v, R1:= 100 0
Va = (1000) (9)
1000 + 4700
= 1.58 V Ro= (1000) (4700) = 825 0
1000 + 4700
R1
= 100 + 2(825)
100 + 825
= 189 R:i = 8(100) (825) =713 0
. 100 + 825
Calculating Icou from Equation (7ss)
Icou= 6 ± v<fA7
3300
=.1 61 ma or 2 .02 ma
Since the quantity under the square root is positive, thermal run-away can occur. The
two solutions give the value of Ico11(1.61 ma) and the value of Ico after run-away has
occurred (2.02 ma). The fact that these two currents are very nearly equal indicates
that the change in power dissipation when run-away occurs will not be very large.
=
Using the value Icou/Icomax 100 the junction temperature at run-away from Figure
6.6(A) is about 92°C. The dissipation at run-away, calculated from Equation (7rr), is
about 187 milliwatts. The rise in junction temperature due to this power dissipation
=
is (0.25) (187) 46.7°C. The ambient temperature at run-away is then calculated to be
92 - 46.7 = 45.3°C. The above value of maximum transistor power dissipation is
calculated under the assumption that the series collector resistance is zero. In the
circuit under consideration the transformer primary will have a small d-c resistance (RT)
which will reduce the transistor power dissipation by approximately (Ic)2 RT where le is
given by the second term in Equation (7rr). Assuming that the d-c resistance of the
transformer is 20 ohms the reduction in power dissipation for the case just considered
will be 18.8 milliwatts and the ambient temperature at run-away will be increased
to 50.0°C.
112
AUDIO AMPLIFIERS
-----~---- -12V
- c,
+I_ 50µ.fd
With the resistance values shown, the bias conditions on the transistor are 1 ma
of collector current and six volts from collector to emitter. At frequencies at
which C1 provides good by-passing, the input resistance is given by the formula:
R,n = (1 + h,.) h1b, At 1 ma for a design center 2Nl414, the input resistance would
be 45 X 29 or about 1300 ohms.
The a-c voltage gain eout is approximately equal to hRL For the circuit shown, this
e1n lb
5000 .
would be ~ or approximately 172.
The frequency at which the voltage gain is down 3 db from the 1 Kc value
depends on ri:. This frequency is given approximately by the fonnula
1 + h, ..
Iow f a,1b .,._, 6.28 (ri:C1)
113
AUDIO AMPLIFIERS
Figure8.2
The load resistance for the first stage is now the input impedance of the second
stage. The voltage gain is given approximately by the fonnula
RL
A"= h ,.-h lb
More exact fonnulas for the perfonnance of audio amplifiers may be found in
Chapter 4 on small signal characteristics.
Figure8.3
The voltage divider consisting of RI and R2 gives a slight forward bias of about
.14 volts on the transistors to prevent cross-over distortion. The 10 ohm resistors in the
emitter leads stabilize the transistors so they will not go into thermal runaway when
the ambient temperature is less than 55°C. Typical collector characteristics with a load
line are shown below
:IMAX.
COU£CTOR CURRENT
NO SIGNAL OPERATING
POINT
Ecc
COLLECTOR VOLTAGE
Figure8.4
114
Aumo AMPLIFIERS
It can be shown that the maximum a-c output power without clipping using a push-
pull stage is given by the formula
Pout= I run
2
VcB where VcE =
collector to emitter voltage at no signal.
Since .1_ is equal to the current gain, Beta, for small load resistance, the power gain
La
formula can be written as
p G -{J' Rc-c (Sb)
. .- Rb-b
where Re-e =collector to collector load resistance.
Rb-b =base to base input resistance.
f3 = grounded emitter current gain.
Since the load resistance is determined by the required maximum undistorted output
power, the power gain can be written in terms of the maximum output power by com-
bining equations (Sa) and (Sb) to give
(Sc)
CLASSA OUTPUT
STAGES
A Class A output stage is biased as shown on the collector characteristics below
IMAX.~
COLLECTORCURRE~ c •- • -- DC OP£RATINGPOINT
1
I •
I
v.,. zvc,
COLLECTORVOLTAGE
Figure8.5
The operating point is chosen so that the output signal can swing equally in the posi-
tive and negative direction. The maximum output power without clipping is equal to
pout---_ Vcv.- Ir
2
115
AUDIO AMPLIFIERS
DESIGN CHARTS
Figures 8.6 through 8.15 are design charts for determination of transformer imped-
ances and typical power gains for Class A driver stages, Class A output stages, and
Class B push-pull stages. The transformer-power output charts take into account a
transformer efficiency of 75 % and therefore may be read directly in terms of power
delivered to the loudspeaker. Power gain charts show the ratio of output power in the
collector circuit to input power in the base circuit and therefore do not include trans-
former losses. Since the output transformer loss is included in the one chart and the
design procedure used below includes the driver transformer loss, it can be seen that
the major losses are accounted for.
The charts can best be understood by working through a typical example. Assume
a 300 mw output is desired from a 12v amplifier consisting of a driver and push-pull
output pair. Also the signal source has an available power output of 30 mµw
116
AUDIO AMPLIFIERS
--
' r--.. IN CUSS 8 PUSIMI\U.
AUDIOAIIPUf'ERS ,...,.
"' '
·"'
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"r--.., ' "I'." r---,
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IO 100 200 !!00
117
AUDIO AMPLIFIERS
a,
~-
I:;
~~ 200
400
300 j-....;;:: - -~
...........
--
............
..........
...........
r-,:::::__-
r-....
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---- - ----
..........
....""-r--....
- ._M~X_!R
ACTICALPOWER
-i----
j.= .
2Nl4I3
~o: ........... ...... ..... - L--
-"....... -
Ir::? 100 r---.... ~ - l"'C'"
-
I
2Nll75
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•
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10 12 14 16 18 20 22 24 26 28 30 32 34
POWERGAIN-DECIBELS
..........
,-
....
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.... ....
--
i-
MAXRATEDPOWER
-r-
2Nl413
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10 12 14 16 18 20 22 24 26 28 30 32 34
:~
I
POWERGAIN-DECIBELS
i;
E
d
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600
400
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~
-
- - - -- - -.........
..__
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r--...
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r-
MAX RATEDPOWER
2Nl41'3
" '- -
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14 16 18 20 22 24 26 28 30 32 34 36 I
POWER GAIN- OEaea.s
118
AUDIO AMPLIFIERS
1ggg -- -- - -
--
600
._ -- ._ --._ ~-.__
.........
......
.......
........
....
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!!_AX RATED POWER
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400
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14 16 18 20 22 24
POWERGAIN-DECIBELS
1000
850
600
400
-- -' I'..
....... .......
....
'"...
'
I
100
80
60
\
I
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I-.......
......
40 I I I
"-- "'-- I
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20 22 24 26 28 30 32 34 36
POWER GAIN-DECIBELS
119
AUDIO AMPLIFIBRS
"' "'" I\
I\..
...
' I\
...,
'
'\.'rt"'~)-
r-..~,..
'\.p ~"'
"' ......
r'I,
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50K
COLLECTOR
LOADRESISTANCE-OHMS
·~
di=
::10:
10
\ \ \ ..\ - /" ,_
.. - --
2N322
I I
~=
8 I
2Nl413
6 '1
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•
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.... v-2,23
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I 'I I I I
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26 28 30 32 34 36 38 40 42 44
POWERGAIN-DECIBELS
120
AUDIO AMPLIFIERS
efz
100
70
60
40
20
--
-- 1---
-.... --
--'- -~--~
......-- ...
l"<C'-
'
"'\
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MAX RATED POWER
------,-- -.----
MAX RATEDPOWER
-------- -
_/✓
-r
2Nll75
T
2
G. \ \ \\'
1
1.0
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0.8 \ \ ' ,,
0.6 '\ '\ '
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26 28 30 32 34 36 38 40 42 44 46
POWERGAIN-DECIBELS
-r
Figure 8.14
-- --
100 --..:- --
-- ~- -- --.--r-- MAX RATED
r..- ...
.....
---
POWER
/
/
V
.v-2Ni22
--L.,,-2Ni23 I
I
2Nl413
\
'
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/
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r \ \ v1" \ I/
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VT
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0.4
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0
2a 30 32 34 36 38 40 42 44 46 48
POWER GAIN- DECIBELS
121
AUDIO AMPLIFIERS
TRANSISTORS LISTED IN THE TOP ROW ARE PREFERRED TYPES AND SHOULD BE
USED IN ALL NEW DESIGNS. THEY CAN BE SUBSTITUTED FOR TYPES LISTED
BELOW THEM IN THE SAME COLUMN.
PREFERRED
TYPES AND SUBSTITUTION CHART
Figure 8.16
INPUT
SW IZV
I O:.liMt
I
I I
L - - - - - - _J
122
G.E.RELUCTANCE
HI LEVEL CARTRIDGE
TO SPEAKER
'-I..:~-----'"--' 9 VOLTS
'- - -
.___ ..... c_3_.,._ ___ RV7'\f'.,.---4.,_ _ _.,__..._..J\.IV\--_.,_A."V'.__.i~..._
-
___
__ J
-_
SW
:::J
FREQUENCY RESPONSE Ri,-5000 OHMVOLUME ~TROL
OF FOUR TRANSISTOR AMPLIFIER 1/2 W AUDIO TAPER R13,---47 OHM MAXIMUM POWER OUT AT 10% HARMONIC
R2,--uso,ooo OHM R14,Ris,-- 8.2 OHM OISTORTION-400MW
MAXIMUM BASS POSITION DISTORTION AT 100 MILLIWATTS
MAXIMUM TREBLE POSITION---------• R3,--470,000 OHM C1,C3,C7,Ce,-50~fd, 12V AT 100 C/S - 5-,,.
+5------------ R.4,--10,000 OHM C2,C6,--1501&fd 1 3V AT 1000 C/S-2%
R6,R9 1 -4700 OHM C4,----i 5,-dd, 12V
1
AT5000C/S-!5%
R7,--1000 OHM C5,---.021&fd
Re,--33,000 OHM TR1,TR2,-G.E.2N323
Ru,--25,000 OHM L1NEAR TR3,TR4,-G.E 2Nl415
R12,--220 OHM Ti,--- 5K/3K CT
-1!!,1---__._ __ __...___ _ ___, R51R10.-470 OHM T2,---2oon c.T.,v.c. ALL RESISTORS1/2 W
R14 TR4
R10 t-V'A--, ~ I 0
i
t-C
+lei a=
CA
~RI
CRYSTAL
CARTRIDGE
INPUT
Transistors are ideally suited for high fidelity amplifiers since there is no problem
with microphonics or hum pick-up from filaments as there is with tubes. Transistors
are inherently low impedance devices and thus offer better matching to magnetic
pick-ups and loudspeakers for more efficient power transfer.
Transistor circuits with negative feedback can give the wide frequency response and
low distortion required for high fidelity equipment. In general, the distortion reduction is
about equal to the gain reduction for the circuit to which negative feedback is applied.
The input and output impedances of amplifiers with feedback are either increased or
decreased, depending on the form of feedback used. Voltage feedback, over one or
several transistor stages, from the collector decreases the output impedance of that
stage; whereas current feedback from the emitter increases the output impedance of
that stage. If either of these networks are fed back to a transistor base the input im-
pedance is decreased, but if the feedback is to the emitter then the impedance is in-
creased. The feedback can be applied to the emitter for effective operation with a low
generator impedance, whereas the feedback to the base is effective with a high imped-
ance (constant current) source. If the source impedance was low in the latter case then
most of the feedback current would How into the source and not into the feedback
amplifier. The feedback connections must be chosen to give a feedback signal that is
out-of-phase with the input signal if applied to the base, or in-phase if it is applied to
the emitter of a common emitter stage.
Care must be used in applying feedback around more than two transistor stages to
prevent high frequency instability. This instability results when the phase shift through
the transistor amplifiers is sufficient to change the feedback from negative to positive.
The frequency response of the feedback loop is sometimes limited to stabilize the cir-
cuit. At the present time, the amount of feedback that can be applied to some audio
power transistors is limited because of the poor frequency response in the common
emitter and common collector connections. The common collector connection offers the
advantage of local voltage feedback that is inherent with this connection. Local feed-
back (one stage only) can be used on high phase shift amplifiers to increase the fre-
quency response and decrease distortion.
PREAMPLIFIERS
Preamplifiers have two major functions: (1) increasing the signal level from a
pick-up device to about 1 volt rms, and (2) providing compensation if required to
equalize the input signal for a constant output with frequency.
The circuit of Figure 9.1 meets these requirements when the pick-up device is a
magnetic phono cartridge (monaural or stereo), or a tape head. The total harmonic
or I.M. (inter-modulation) distortion of the preamp is less than ½ % at reference level
output (1 volt).
This preamp will accommodate most magnetic pick-up impedances. The input im-
pedance to the preamp increases with frequency because of the frequency selective
negative feedback to the emitter of TRI. The impedance of the magnetic pick-ups will
also increase with frequency but are below that of the preamp.
125
SWITCHPOSITIONS
7Q__q~y3 °7...
-=..9V
2 ±~
I TUNER OR MICROPHONE
19V
+
2 TAPE - 7 112• /SEC 0.01±.10°1.
3 TAPE - 3 3/4• /SEC
4 PHONO- RIAA
TAPE HEAD
OR
MICROPHONE
r-- 0.7 HENRY
1
I
I
~tr,:
OECODER 22K
OUTPUT
I 3V
L- ----'-----6
GE
VR-1000
STEREO
CARTRIDGE
PHONO-TAPEPREAMPLIFIER
Figure9.1
HIGH FIDELITY CIBCUITS
The first two stages of this circuit have a feedback bias arrangement with R3
feeding bias current to the base of TRI that is directly proportional to the emitter
current of TR2. The output stage is well stabilized with a 5K emitter resistance. TR4
is used to stabilize the circuit bias conditions from 25° to 55°C (130°F) ambient and
also with variations in hn for TRI and TR2. Thus TR4 is not used as a signal ampli-
fier, but as a collector load resistor for TRI. Its resistance will decrease with either
increasing ambient temperature or increasing collector current from TRI. The increas-
ing collector current of TRI may be a result of either higher ambient temperature or
higher hn transistors. The collector to emitter resistance of TR4 will also decrease due
to the leakage current (loo) of TR4 itseH with increasing ambient temperature. The
stabilizing circuit (R2, R5, and R6) for TR4 was selected so that TR4 (as the collector
load for TRI) would have the desired temperature characteristic to stabilize the col-
lector voltage of TRI, with increasing ambient temperature up to I30°F. The collector
voltage of TRI is the base bias voltage for TR2, and TR2 biases TRI as indicated above.
TR4, in addition to its role as a temperature sensitive resistance, acts as a current
sensitive resistance and thus automatically adjusts its resistance for hn variations of
TRI and TR2 to maintain the collector voltage at TRI between .75 and 1.6 volts.
The AC negative feedback from the collector of TR2 to the emitter of TRI is
frequency selective to compensate for the standard NAB recording characteristic for
tape or the standard RIAA for phonograph records. The flat response from a standard
NAB recorded tape occurs with the Treble Control (R4) near mid-position or 12K
ohms (see Figure 9.2). There is about 5 db of treble boost with the Control at 25K and
approximately 12 db of treble cut with R4 =
0. Mid-position of the Treble Control
also gives Hat response from a standard RIAA recording. This treble equalization
permits adjustment for variations in program material, pick-ups, and loudspeakers.
+-10
-REFERENCE
I I
LEVEL (IVOLT)
----
r- R4• 25K
i
---...... R4~12K-
~-20
"' ~ R4• 0
-50
The RIAA feedback network (with Treble Control at mid-position) has a net feed-
back resistance of 7 .5K to decrease the gain because of the higher level input. This
resistance has a .01 µf capacitor in parallel for decreasing the amplifier gain at the
higher frequencies in accordance with RIAA requirements. This eliminates the need to
load a reluctance pick-up with the proper resistance for high frequency compensation.
If it is desirable to build the preamplifier for phonograph use only, the compensating
feedback network would consist only of a .04 µf feedback capacitor in series with a
7.5K resistor (or a I0K Treble Control) which has a .01 µf capacitor in parallel.
127
HIGH FIDELITY CIBCUITS
128
HIGH FIDELITY CIRCUITS
INPUT
0.7 HENRY
son o.c.
II MAXIMUM
5K
OUTPUT
portion of the audio spectrum as the overall sound level is decreased. This is to com-
pensate for the non-linear response of the human ear as shown in the Fletcher-Munson
curves that are often referred to in the audio industry. The ear requires a higher level
for the low frequency sound to be audible as the frequency is decreased and also as
the overall spectrum level is decreased.
Figure 9.4 shows the frequency characteristics of this bass boost circuit. With the
level control set for zero attenuation at the output there is no bass boost available, but
as the output level is attenuated, the available bass boost increases.
0 OdbLEVEL-
'.a
!, -10 t------
ww
~~
:..Ji-
g 5 -20 ~ -------- - r---.... MAX] BASE BOOST
MIN.
AT-20db
LEVEL -
~
I- >
:::::,I-
Q. :::::,
~ ~ -30
-........_____
o-
-40
-- J
MAX
MIN.
BASE BOOST
AT-40db
LEVEL -
Figure9.4
Figure 9.4 shows the frequency response (lower dashed curve) when the output is
attenuated 40 db and the Bass Boost Control is set for minimum (50K ohms). The solid
curve immediately above represents the frequency response when the Bass Boost Con-
trol is set at maximum (zero ohms). Thus a frequency of 30 cycles can have anything
129
ffiGH FIDELITY CIRCUITS
from zero to 27 db of boost with respect to 1 KC, depending on the adjustment of the
Bass Boost Control.
The Fletcher-Munson contours of equal loudness.level show most of the contour
changes involve a boost of the bass frequencies at the lower levels of intensity. There-
fore, this circuit combination fulfills the requirements of level control, bass boost and
loudness control. The Bass Boost Control may be a standard SOKpotentiometer with a
linear taper. The desired inductance may be obtained by using the green and yellow
leads on the secondary of Argonne transistor transformer #AR-128 (Lafayette Radio
Catalog).
POWERAMPLIFIERS
It is difficult to attain faithful reproduction of a square wave signal with a trans-
former amplifier. A high quality transformer is required and it must be physically
large to have a good response at the low frequencies. Thus, a great deal of effort has
gone into developing transformerless push-pull amplifiers using vacuum tubes. Prac-
tical circuits, however, use many power tubes in parallel to provide the high currents
necessary for direct-coupling to a low impedance load such as loudspeakers.
The advent of power transistors has sparked new interest in the development of
transformerless circuits since the transistors are basically low voltage, high current
devices. The emitter follower stage, in particular, offers the most interesting possibili-
ties since it has low inherent distortion and low output impedance.
Figure 9.5 is a direct-coupled power amplifier with excellent low frequency re-
sponse, and also has the advantage of D.C. feedback for temperature stabilization of
all stages. This feedback system stabilizes the voltage division across the power output
transistors TR4 and TR5 which operate in a single-ended Class B push-pull arrange-
ment. TR2 and TR3 also operate Class B in the Darlington connection to increase the
current gain. Using an NPN for TR3 gives the required phase inversion for driving
TRS and also has the advantage of push-pull emitter follower operation from the out-
put of TRI to the load. Emitter follower operation has lower inherent distortion and
low output impedance because of the 100% voltage feedback.
,-----4....,,tJVV-~---.,._---------0-411V
10-WATT AMPLIFIER
Figure9.5
130
mGH FIDELITY cmCUITS
131
HIGH FIDELITY CIRCUITS
This ampli6er is capable of about 8 watts of continuous output power with I volt
r.m.s. input, or 10 watts of music power into 8 or 16 ohms when used with the power
supply of Figure 9.6. This power supply has diode decoupling which provides excellent
separation (80 db) between the two stereo amplifier channels.
STANCOR
IA
I.. o--.--u-----. RT-201--o------.
8
II
ll7VAC
-=
Cl,C2, 8i C3-1500~f, 50V.
The power transistors TR4 and TRS should each be mounted on an adequate heat
radiator such as used for transistor output in an automobile radio, or mounted on a
3" x 3" x %2" aluminum plate that is insulated from the chassis.
STEREOPHONIC
SYSTEM
A complete semiconductor, stereophonic playback system may be assembled by
using the following circuits in conjunction with a stereophonic tape deck or phono
player.
10 WATT
PREAMP POWER a OR,sn
TRACK FIG. 9.1 AMP
FIG.9.5
STEREO
TAPE POWER
DECK
OR
PHONO
.--±11!~11-
_J_ 1
9V 9V
SUPPLY
FIG.9.6
PLAYER
10 WATT
#2 PREAMP POWER 8 OR16Sl
TRACK FIG. 9.1 AMP
FIG.9.5
132
HIGH FIDELITY cmCUITS
SILICON POWERAMPLIFIERS
Some of the transistor power amplifiers to date have been lacking in their high
frequency performance and their temperature stability. The diffused junctions of the
2N2107 and 2N2196 permit good circuit performance at high frequency. Silicon tran-
sistors are desirable for power output stages because of their ability to perform at much
higher junction temperatures than germanium. This means smaller heat radiating fins
can be used for the same power dissipation. On the negative side, silicon has higher
saturation resistance which gives decreased operating efficiency that becomes appre-
ciable when operating from low voltage supplies.
The power handling capability of a transistor is limited by both its electrical and
thermal ratings. The electrical rating limit is a function of the transistor's voltage
capability, and its maximum current at which the current gain is still usable. The
themml rating is limited by the transistor's maximum junction temperature. Therefore,
it is desirable to provide the lowest thermal impedance path that is practical from
junction to air. The thermal impedance from junction to case is fixed by the design
of the transistor; thus it is advantageous to achieve a low thermal impedance from
case to the ambient air.
The 2N2107 and 2N2196 are NPN diffused silicon transistors. They will be
limited in their maximum power handling ability by the thermal considerations for
many applications unless an efficient thermal path is provided from case to air.
These transistors are constructed with the silicon pellet mounted directly on the
metal header, and therefore it is more efficient to have an external heat radiator in direct
contact with this header than to make contact with the cap of the transistor package.
ALUMINUM FIN
(ORl/16'1COPPER)
~13/64
DIA HOLES
FIN ONLY
Figure 9.8 shows a practical method for achieving a maximum area of direct con-
tact between the metal header and an aluminum fin for efficient heat transfer to the
surrounding air. A plain washer with two holes drilled for the mounting hardware is
133
mGH FIDELITY cmCUITS
simple but quite adequate for securing the transistor header to the fin. Since air is a
relatively poor thermal conductor, the thermal transfer can be improved by applying
a thin layer of G-E Silicone Dielectric Grease #SS-4005 or equivalent between the
transistor and the radiating fin before assembly. The fin may be anodized or flat paint
may be used to cover all the surface except for the area of direct contact with the
transistor header. An anodized finish would provide the insulation needed between
the base and emitter leads and the sides of the feed-through holes in the aluminum
fin. Figure 9.9 shows a thermal rating for the 2N2107 as assembled on the radiating fin.
,,
.'
I THERMAL RESISTANCE
I
R1 11 25°C/WATT
'
I
I
I
I"-
I
'r-....
I
I
I
',
' I"
I
I
.
I
I ,
.........
I
I
i
',
20
I
40 60
AMBIENT
80 100
TEMPERATURE - °C
120
'
140 160
THERMAL
CHARACTERISTIC
Figure9.9
+~v
[email protected]
112A
I TYPE AGC DR 3AG)
111'1
LOAD
RIZ
UK
10-WATTAMPLIFIER
Figure 9.10
134
IDGH FIDELITY cmcurrs
The circuit of Figure 9.10 is very much like that described for Figure 9.5. The
opposite polarity is used for transistors, capacitors, and supply voltage. The 1N91
connected to the emitter of TR4 gives additional stabilization for this stage for varia-
tions in transistor beta and temperature. The forward voltage drop of this germanium
diode must be offset by D4 to minimize cross-over distortion. The 1N91 diode at the
base of TRS has a leakage current which increases with temperature in a manner
similar to the lco of TR3. D3 can thus shunt this temperature sensitive current to
ground, whereas, if it were to flow into the base of TR5, it would be amplified in the
output stages.
This circuit has about 20 db of overall negative feedback with Rl2 connecting
the output to the input. The higher hFEof the two output units should be used for TR4.
The silicon power ampliner of Figure 9.10 has an output impedance of .50 for
good speaker damping. The square wave response shown in Figure 9.11 is indicative
of an amplifier with a good transient response and also a good bandwidth. The band-
width is confirmed by the response curve of Figure 9.12. The power response at
5 watts output is Hat within ¾ db from 30 cycles to 15 Kc. The amplifier exhibits good
recovery from overload, and the square wave peak power output without distorting the
waveform is 12 watts.
2 KCSQUAREWAVE RESPONSE
Figure9.11
+2
I I I
I
Odb • 1/2 WATT
- r---....
~-2
~
0
' " :'
I\.
a:-4
•
"'
0
Q.-6
I
3~b
I'
I
J.,
~
:::
T
10 20 100 IKC IOKC 67KC IOOKC
FREQUENCYRESPONSE
Figure9.12
The 2N2107 output transistors, TR4 and TR5, were mounted on heat dissipating
fins as shown in Figure 9.8 and the amplifier operated successfully delivering 1 watt
rms 400 _, continuous power to the load with no increase in total harmonic distortion
135
IDGH FIDELITY cmcurrs
from room ambient of 75°F to 175°F (approx. 80°C). At 175°F the DC voltage across
TR5 had decreased less than 15% from its room ambient value. Operation at higher
temperatures was not attempted because of TR3 being a germanium transistor which
has a maximum operating junction temperature of 85°C.
When operated with the 2N2107 heat radiator assembly, this amplifler can safely
deliver up to 10 watts rms of continuous power to the load at room temperature. When
driving a loudspeaker with program material at a level where peak power may reach
10 watts the rms power would generally be less than 1 watt. This amplifier, when
operated with 2N2196's in the outputs, can be mounted on a smaller 2" x 2" fin because
of its increased power capabilities. The 2N2196 has a case that simplifies the mounting
on a heat radiator, and it has electrical characteristics that equal or excel the 2N2107
for this application.
The 1.M. and total harmonic distortion of this amplifier is less than ½ % at power
levels under 3 ½ watts. The total harmonic distortion measured at 50 cycles, 400 cycles,
and 10 Kc is still under 1% at 6 watts output and the I.M. distortion under 2½ %. An
nns input signal of 1 ¼ volts is required for 8 watts continuous output with a supply
furnishing 350 ma at 48 volts. This amplifier has a IO-watt music power rating when
used with the power supply of Figure 9.13. The amplifier operates with an efficiency
of 47 to 60% and has a signal-to-noise ratio of better than 98 db.
IN91
49V AMPLIFIER#2
+
C2 22K
l/2W
Cl,C2,8 C3-l~l,!50V
The above performance tests were with a 160 resistive load. The performance
near maximum power output will vary slightly with transistors of different beta values.
Varying values of saturation resistance for the output transistors TR4 and TR5 also
affect the maximum power output.
--
...
-- -i-...
' -Pc,VS:RL
'r-,....
~
r--
-- r-
-- ~
136
IDGH FIDELITY CIRCUITS
Figure 9.14 shows the load range for maximum performance. It indicates that for a
varying load impedance such as a loudspeaker, the most desirable range is 16 to 400.
A 16!2speaker system is in this range. A 20 to 6000 auto-transformer should be used
for driving a 6000 line.
12-WATTAMPLIFIER
The amplifier of Figure 9.10 is limited in its maximum power output by the supply
voltage and the saturation resistance of the output transistors, TR4 and TRS. The
supply voltage can not be increased much beyond 50 volts at maximum amplifier signal
swing without making the Vct: rating for TRI marginal. Under these conditions the
saturation resistance becomes the limiting factor for obtaining increased power output.
The circuit of Figure 9.15 uses two transistors in parallel for each of the outputs.
This enables the saturation resistance to be reduced in half and gives 12 watts output.
The .47 ohm resistor used in the emitter of the paralleled transistors gives a more
uniform input characteristic for sharing of the input currents. These emitter resistors
also give increased bias stabilization. The rest of the circuit is the same as Figure 9.10
except the 1N91 (D4) is not used in the collector of TRI since there is no diode voltage
to offset in series with output emitter.
+50V (ii)358ma
1/2 A (TYPE AGC OR 3AG)
C3 +
2O,,.f TR4 a TR6
50V - 2N21O7'S
cs
1500,if
50V
r--.---1)---1-----+-----+--;;.;;...--+-----I+ t--------o 1sn
LOAD
Cl
2Opf
20V 22
RII
o---l t--"V\.rv--.---+---t-1 TRS BTR7
2N21O7'S
Rl6 .2
.47 C6
Rl2
33K
12-WATT AMPLIFIER
Figure 9.15
137
HIGH FIDELITY CIRCUITS
The performance of the 12-watt circuit is like that given previously for the circuit
of Figure 9.10 except for the distortion vs.: power output. Figure 9.1 indicates the
increased power output and also the lower distortion which is a second advantage of
parallel operation of the outputs. Lower distortion results from parallel operation since
the signal current swing in each transistor is approximately half ed and thus confined
to the more linear portion of the transfer characteristic.
I I I I
HARMONIC
z 1.5 INTERMODULATION - - -
0
j::: {6KC
AND
a: /. 60~_
~ 1.0
fl) IOKC~/
0
50~
~ 0.5 ~ / IKC-
-=-=-- -~
0
--1- -~
2 3 4 5 6 7 8 9 10 II 12
POWER OUTPUT (WATTS)
DISTORTIONVS. POWEROUTPUT
Figure9.16
The amplifier of Figure 9.15 operates at maximum power output with an efficiency
of 67%. This circuit can be packaged with a minimum volume and weight without
component crowding, see Figure 9.17. One of the paralleled output transistors uses
the technique described in Figure 9.8 and the other makes for simplified mounting
using the 2N2196 that was discussed previously. All four of the output transistors
could be 2N2107's or all 2N2196's. Each mounting fin is %2" x 1½" x 4½" aluminum.
12-WATTAMPLIFIER
Figure9.17
138
HIGH FIDELITY cmCUITS
If the amplifier is powered by the supply of Figure 9.13, it will provide 10 watts
of continuous output or 12 watts at Music Power Rating.
Either one of the amplifiers described will give superb performance in a stereo
system when used to drive a 16fl speaker that has at least moderate sensitivity.
NPN PREAMPLIFIER
The preamplifier of Figure 9.18 is similar to that of Figure 9.1 except NPN tran-
sistors are used and the first stage does r.ot have a compensating collector load. This
first stage does not require a temperature sensitive resistance for the collector load since
a planar - passivated transistor is used which inherently has very low leakage current
(lcBo).This preamplifier will operate at even higher ambient temperature than that of
Figure 9.1 and has equivalent overall performance including 55 db S/N. 1.2 millivolts
of input signal gives 1 volt output at 1 Kc. The input impedance is approximately
39K at 1 Kc. The equalized output from an NAB recorded tape at 71/z"/sec. is within
± 1 db from 50 cycles to 15 Kc using a .4 henry tape head. The higher input imped-
ance of this preamp gives the best equalized output for a tape head in the .4 to 1 henry
range. The value of R3 is selected or adjusted to give approximately 1¼ volts D.C. at
the base of TR2 to accommodate the production spread of hn for transistors used in
the first two stages. A switch can be added to give other equalized functions as in
Figure 9.1.
20J&f +
20VI
TR3
2Nl304
0,7 HENRY
5oQMAX.D.C.
20Pf 11
20V
OUTPUT
TAPE PREAMPLIFIER
Figure 9.18
139
IDGH FIDELITY CIRCUITS
12 WATT
PREAMP POWER
AMP 1&n
TRACK FIG. 9.18
FIG.9.15
STEREO
TAPE POWER
DECK SUPPLY
FIG.9.13
Ii? WATT
#2 PREAMP POWER 1&n
TRACK FIG. 9.18 AMP
FIG.9.15
REFERENCES
Jones, D.V., "Class B Power Amplifier Performance with Silicon Transistors," Audio Engineering
Society Convention Paper, presented October 1960.
Geiser, D.T., "Using Diodes as Power Supply Filter Elements," Electronic Design, June 10, 1959.
Jones, D.V., "All Transistor Stereo Tape System.'' Electronics World, July 1959,
140
RADIO RECEIVER
AND TUNER CIRCUITS
AUTODYNE CONVERTERCIRCUITS
The converter stage of a transistor radio is a combination of a local oscillator, a
mixer and an IF amplifier. A typical circuit for this stage is shown in Figure 10.1.
15K'.500O
AUTOMATIC 725
llC=l90.6)1pF r- - - -1
I
Figure10.2
The operation of the oscillator section (10.2) is as follows:
Random noise produces a slight variation in base current which is subsequently
amplified to a larger variation of collector current. This A.C. signal in the primary of
L2 induces an A.C. current into the secondary of L11tuned by Cs to the desired
oscillator frequency. C:i then couples the resonant frequency signal back into the
emitter circuit. If the feedback (tickler) winding of L, is properly phased the feedback
will be positive (regenerative) and of proper magnitude to cause sustained oscillations.
The secondary of L2 is an auto-transformer to achieve proper impedance match be-
tween the high impedance tank circuit of L2 and the relatively low impedance of the
emitter circuit.
141
RADIO RECEIVER AND TUNER cmcUITS
Ci effectively bypasses the biasing resistors R2 and Rs to ground, thus the base is
A.C. grounded. In other words, the oscillator section operates essentially in the
grounded base configuration.
The operation of the mixer section (10.3) is as follows:
The ferrite rod antenna L1 exposed to the radiation field of the entire frequency
spectrum is tuned by CAto the desired frequency (broadcast station).
The transistor is biased in a relatively low current region, thus exhibiting quite
non-linear characteristics. This enables the incoming signal to mix with the oscillator
signal present, creating signals of the following four frequencies:
1. The local oscillator signal.
2. The received incoming signal.
3. The sum of the above two.
4. The difference between the above two.
The IF load impedance T 1 is tuned here to the difference between the oscillator
and incoming signal frequencies. This frequency is called the intermediate frequency
(I.F.) and is conventionally 455 KC/S. This frequency will be maintained fixed since CA
and Co are mechanically geared (ganged) together. ~ and Ca make up a filter to pre-
vent undesirable currents flowing through the collector circuit. C2 essentially bypasses
the biasing and stabilizing resistor R1 to ground. Since the emitter is grounded and
the incoming signal injected into the base, the mixer section operates in the "grounded
emitter" configuration.
IF AMPLIFIERS
A typical circuit for a transistor IF amplifier is shown by Figure 10.4.
+9V
Figure10.4
The collector current is determined by a voltage divider on the base and a large
resistance in the emitter. The input and output are coupled by means of tuned IF
transformers. The .05 capacitors are used to prevent degeneration by the resistance
in the emitter. The collector of the transistor is connected to a tap on the output
transformer to provide proper matching for the transistor and also to make the per-
formance of the stage relatively independent of variations between transistors of the
same type. With a rate-grown NPN transistor such as the 2N293, it is unnecessary
to use neutralization to obtain a stable IF amplifier. With PNP alloy transistors, it
is necessary to use neutralization to obtain a stable amplifier and the neutralization
capacitor depends on the collector capacitance of the transistor. The gain of a tran-
sistor IF amplifier will decrease if the emitter current is decreased. This property
of the transistor can be used to control the gain of the IF amplifier so that weak
stations and strong stations will produce the same audio output from a radio. Typical
142
RADIO RECEIVER AND TUNER CIRCUITS
circuits for changing the gain of an IF amplifier in accordance with the strength
of the received signal are explained in the A.V.C. section of this chapter.
A.V.C. is a system which automatically varies the total amplification of the signal
in a radio receiver with changing strength of the received signal carrier wave.
From the definition given, it would be correctly inferred that a more exact term
to describe the system would be automatic gain control (A.G.C.).
Since broadcast stations are at different distances from a receiver and there is a
great deal of variation in transmitted power from station-to-station, the field strength
around a receiver can vary by several orders of magnitude. Thus, without some sort
of automatic control circuit, the output power of the receiver would vary considerably
when tuning through the frequency band. It is the purpose of the A.V.C. or A.G.C.
circuit to maintain the output power of the receiver constant for large variations of
signal strengths.
Another important purpose of this circuit is its so-called "'anti-fading" properties.
The received signal strength from a distant station depends on the phase and amplitude
relationship of the ground wave and the sky wave. With atmospheric changes this
relationship can change, yielding a net variation in signal strength. Since these changes
may be of periodic and/or temporary nature, the A.V.C. system will maintain the
average output power constant without constantly adjusting the volume control.
The A.V.C. system consists of taking, at the detector, a voltage proportional to the
incoming carrier amplitude and applying it as a negative bias to the controlled amplifier
thereby reducing its gain.
In tube circuits the control voltage is a negative going DC grid voltage creating
a loss in transconductance (Gm).
In transistor circuits various types of A.V.C. schemas can be used.
EMITTER CURRENT CONTROL
As the emitter current of a transistor is reduced (from 1.0 ma to .1 ma for instance)
various parameters change considerably (see Figure 10.5).
IO
v~ • !I• I
.·
11...__
, ........ ,, ' I
I/ I I I
2
' ', /
/
I
i
I
":-..
', / -1---' .... m1!
... --...'
I
..__ .,. ...,
..,..,,.,.,_
..,,
__.,,,,
I
' r-...
GND ....._
[lllffUt-
.5 I 2
I,o
UIITTUII OIAS,IIA.
C•,UACTERISTICS VS. EMITTIII CIIRRl • f
143
:R uIO RECEIVER AND TUNER CIBCUITS
db
34
32
_i---- .....- Vc1•9v
--I'--..
30
28
/ v -- Ve1 .15v I'-, C\
26
V/ \
~v
24
//
...
...
22
17
GE 2NI087
AGC CURVE
I 20
%
~ 18
// POWER GAIN VS EMITTER CURRENT
INPUT MATCHED AT IE • Ima
a:
~ 16
II OUTPUT TUNED AT 455 KC
ZLOAO• ISl<J\;V, r • 5 VOLTS
D. 14 I/
12
IO
.04 2 .4 .6 B I 4 6 8
EMITTER CURRENT- ma
Figure10.6
On the other hand, as a result of Ico (collector leakage current) some current always
flows, thus a transistor can be controlled only up to a point and cannot be "cut-off"
completely. This system yields generally fair control and is, therefore, used more than
others. For performance data see Figure 10.7.
EMITTER CURRENT
PLUS AUXILIARY A.V.C DIODE
+6
+4 ~/
I
+2 .i
IDEAL CURVE ,✓•
0
..... .,,,,-•-"
-16
-18
0.0001 0.001 0.01 0.1 1,0
Figure10.7
AUXILIARY A.V.C. SYSTEMS
Since most A.V.C. systems are somewhat limited in performance, to obtain im-
proved control, auxiliary diode A.V.C. is sometimes used. The technique used is to
shunt some of the signal to ground when operating at high signal levels, as shown by
Figure 10.8.
144
RADIO RECEIVER AND TUNER CIRCUITS
CR
Tz
0 0
nd ~,
---"\/V\,-----OA,V-C
FROMDETECTOR
½c
Figure10.8
In the circuit of Figure 10.8, diode CR1 is back-biased by the voltage drops across
R1 and R2 and represents a high impedance across T1 at low signal levels. As the signal
strength increases, the conventional emitter current control A.V.C. system creates a
bias change reducing the emitter current of the controlled stage. This current reduction
coupled with the ensuing impedance mismatch creates a power gain loss in the stage.
As the current is further reduced, the voltage drop across R2 becomes smaller thus
changing the bias across CR1. At a predetermined level CR1 becomes forward biased,
constituting a low impedance shunt across T1 and creating a great deal of additional
A.V.C. action. This system will generally handle high signal strengths as can be seen
from Figure 10.7. Hence, almost all radio circuit diagrams in the circuit section of this
manual use this system in addition to the conventional emitter current control.
DETECTOR
STAGE
In this stage (see Figure 10.9), use is made of a slightly forward biased diode in
order to operate out of the square law detection portion of the I-E characteristics. This
stage is also used as source of AGC potential derived from the filtered portion of the
signal as seen across the volume control (R9). This potential, proportional to the signal
level, is then applied through the AGC filter network C4, R7 and CS to the base of the
1st IF transistor in a manner to decrease collector current at increasing signal levels.
RS is a bias resistor used to fix the quiescent operating points of both the 1st IF and the
detector stage, while C6 couples the detected signal to the audio amplifier. (See
Chapter 8 on Audio Amplifiers.)
AVC Rg TO AUDIO
AMPLIFIER
TO COLD SIDE OF 1st LF.
TRANSFORMER
Re
Figure 10.9
145
RADIO RECEIVER AND TUNER CIRCUITS
REFLEX CIRCUITS
"A reflex amplifier is one which is used to amplify at two frequencies - usually
intermediate and audio frequencies,"*
The system consists of using an I.F. amplifier stage and after detection to return the
audio portion to the same stage where it is then amplified again. Since in Figure 10.10,
two signals of widely different frequencies are amplified, this does not constitute a
"regenerative effect" and the input and output loads of these stages can be split audio
-1.F. loads. In Figure 10.11, the I.F. signal (455 Kc/s) is fed through T2 to the detector
circuit CRI, C3 and RS. The detected audio appears across the volume control RS
and is returned through C4 to the cold side of the secondary of Tl.
• -
Figure 10.11
..r AUDIO
OUTPUT
D Pl.US
Since the secondary only consists of a few turns of wire. it is essentially a short
circuit at audio frequencies. Cl bypasses the I.F. signal otherwise appearing across
the parallel combination of RI and R2. The emitter resistor R3 is bypassed for both
audio and I.F. by the electrolytic condenser C2. After amplification, the audio signal
appears across R4 from where it is then fed to the audio output stage. CS bypasses R4
for I.F. frequencies and the primary of T2 is essentially a short circuit for the
audio signal.
The advantage of "reflex" circuits is that one stage produces gain otherwise
requiring two stages with the resulting savings in cost, space, and battery drain. The
disadvantages of such circuits are that the design is considerably more difficult,
although once a satisfactory receiver has been designed, no outstanding production
difficulties should be encountered. Other disadvantages are a somewhat higher amount
of playthrough (i.e. signal output with volume control at zero setting), and a minimum
volume effect. The latter is the occurrence of minimum volume at a volume control
setting slightly higher than zero. At this point, the signal is distorted due to the
• F. Langford-Smith, Radiotron Designers Handbook, Australia, 1953, p. 1140
146
RADIO RECEIVER AND TUNER cmcurrs
balancing out of the fundamentals from the normal signal and the out-of-phase play-
through component. Schematics of complete receivers will be found at the end of this
chapter and in Chapter 20.
FMTUNER
The FM tuner shown in Figure 10.I 7 is especially suited to the home constructor
because it does not require an elaborate alignment procedure. In fact, only the local
oscillator is tuned and the only likely adjustment is either to stretch or squeeze the
local oscillator coil to give the correct coverage of the FM band. It works in the follow-
ing manner: See Figure 10.17.
A tunnel diode oscillating at approximately one-half the input signal frequency
is inductively coupled to the antenna input. When correctly tuned, the very stable
tunnel diode oscillator acts as a second harmonic mixer producing a stable inter-
mediate frequency centered at 200 Kc/sec. The intermediate frequency is amplified
by two simple amplifiers, each consisting of two transistors giving a total voltage gain
of around 100,000. The signal is then limited to give a square-wave which is being
frequency modulated in the same manner as the transmitted signal. The square-wave
is used to charge a capacitor-resistor-diode combination having a short time-constant
producing a standard-sized pulse every time the square-wave goes positive. Pulse-
minded readers will recognize this circuit as being a differentiator with the diode
clipping the negative spike produced by differentiation. There is, at this point in the
circuit, a string of similarly shaped pulses keeping step with the frequency modulated
input signal.
The average value of these pulses can be shown to be the audio originally modu-
lating the FM carrier. This average is obtained by allowing the pulses to charge a
capacitor through a resistor (an integrating circuit) the combination having a fairly
long time ronstant. The resulting output is amplified by the final transistor which
incorporates de-emphasis in its feed-back loop.
The sensitivity is only 50 µ.V/20 db quieting and the receiver, as it stands, is only
useful for receiving local stations. Addition of an RF stage would be a significant
improvement.
The tuner compares very favorably with circuits using more conventional forms
of discrimination because distortion is not dependent on the accurate alignment of
many tuned circuits. Harmonic distortion after limiting is excellent, being better
than 1%.
AMTUNER
The tuner shown in Figure 10.18 is useful for high quality reception of local AM
broadcast stations. A tuned RF stage is used to drive a Class B emitter-foJlower
detector. The natural base-emitter voltage drop of the emitter-follower is overcome
by providing a small amount of bias from a conducting germanium diode. This also
compensates for any change in the base-emitter voltage drop with temperature.
The two tuned circuits are aligned by equalizing inductance at the low frequency
end of the tuning range ( tuning capacitors at maximum value ) and trimming capacity
at the high frequency end in the conventional manner of aligning T.R.F. receivers.
Bandwidth at 6 db is approximately 25 Keis. Owing to the wide-band capability of
the tuner, difficulty might be experienced in adequately separating stations close to
one another in frequency. For this reason, a directional antenna (L1) is used in the
design so additional rejection of unwanted signals may be obtained by rotating the
antenna.
147
L1
.,, ~0
i C,
0
AC1 3:
REFLEX
CONVERTER r-
TR1 !!I ~
n
AUDIO
'" t'fj
:-::.::.-~
---...,--,,
...
O<J :::u
~
OUTPUT *T3
450..n./V.C. J>
C, ~
0
:::u ~
'"
C,
~
'"
< ~
'"
:::u
C,
~
n
'""4
RI Rs 9v :::u
C, ~
d
C:
THREE TRANSISTORREFLEXRECEIVER
Figure 10.12
Tz
RAa0 ltllUSTRIES
IN64G #8222 OR
C A AUTOMATIC
BS•725G
SW
+
I
I
I
I
I
I
~---------------~
I
R1,Ra,·---10,ooo OHM
I
c,,-------.02,.td.
Rz, ----15,000 OHM Cz,C:s,C5, Cs, C7, C9, - .01,. fd.
R3, 1500 OHM C..,C10,·------6,.td. -6V
R4,----270 OHM Cg,-------.05,.fd. NOMINALSENSITIVITY: 200 MICROVOLTS/METER
R5,----47,000 OHM C11,C12,C13,----50,.fd.-12V CM£ASUR£DWITH50 MII.U.TTS REFatfNCE POWER)
Rs,----220 OHM C14, _____ .2,.td. MAXIMUM POWEROUTPUT: 200 MW
R7,R9, --- 2200 OHM CRl,CR2, IN64G OR EQUIV SELECTIVITY
AT-6 db : 8.0 Kc/5
R10, 1000 OHM TR1, G.E.2NI087 SELECTIVITY
AT-60 db: 6D.0Kc/S
Ru, R14,--- 4700 OHM TRz, ------G.E.2N293 ZEROSIGNAL
BATTERYDRAIN:8 M!LLIAMPS
Riz,---- VOUJMECONTROL TR5,------G.E.2Nl69 OR 2N1121
10,000 OHM112WAUDIOTAPER TR4,------G.E.2N324
R13, 68,000 OHM TR15,Tff&-----G.E. 2Nl415
R15,::_:_:_:_::=
470OHM * f.t •:5600A/2000ACT
R1t,. IOOOHM * \ •360ACT/VC
R17,Rl8,---8,2 OHM
R19, 330HM * FORFURTHURINFORIW'IONSEE PAGE154
SIX TRANSISTOR SIX VOLT BROADCASTRECEIVER
Figure 10.14
RADIOINDUSTRIES
.v8222 OR PUSH PULL
AUTOMATIC
BS725G AUDIO OUTPUT
TR5 * T2
R1,--- 6800 OHM R19, R19, -- 8.2 OHM * LI --- 435ph ~IOo/.
Rz, --- 27,000 OHM C1,---,021'fd * L2 --- 250,uh :tl0%
R3, --- 1500 OHM C2,C3, --.Olpfd CR11 CR2,- DRll7,IN64G, OR CK706A OR EQUIV,
R4,R10,R15,- 470 OHM C4,Cs,C7,Ce 1 -.05pfd
C5, C10, -- 6pfd, 12V
** ~Cl, - l90. 6l
~c2-89.3J
RIC MODEL 242
R5, --- 68,000 OHM
R5, --- 330 OHM Cg, --- .05pfd
R7, --- 3300 OHM C11, --- .003pfd
R9,--- 10,0000HM C12,C13,C14,- 50pfd,l?V
R9, --- 82,000 OHM TR1, --- G.E. 2Nl087 CONVERTER
TR2,-- G.E. 2N293 1ST I.F. NOMINAL SENSITIVITY• 200 MICROVOLTS/ METER
R11, --- 2700 OHM
TR3,--- G.E. 2Nl69 OR 2Nll2I2NDI.F (MEASURED WITH 50 MILLIWATTS REFERENCE POWER OUTPUT)
R12, --- VOLUME CONTROL
10,000 OHM l/2W AUDIO TAPER TR4, --- G.E. 2N324 DRIVER MAXIMUM POWER OUTPUT .6 WATTS.
TR5,TR5,- G.E. 2N1415 AUDIO SELECTIVITY AT -6db : 8.0 KC/S
R13, --- 4700 OHM
* T1, --- 5,000/ 26000CT SELECTIVITY AT -60db'. 60.0KCIS
R14, ---
R16, ---
56,000 OHM
220 OHM
* T2,--- 2500CT/V.C. ZERO SIGNAL BATTERY DRAIN 7.0 MILLIAMP$.
R17,--- 33 OHM
* FOR FURTHERCOMPONENT INFORMATION SEE PAGE 154
SIX TRANSISTOR NINE VOLT BROADCASTRECEIVER
Figure 10.15
RAOIOINDUSTRIES PUSH-PULL
41t8223 OR AUDIO OUTPUT
AUTOMATIC AUTOMATIC AUTOMATIC I
EX05460 EX05460
E.X0-3015 OR ,.- I
BS614G
2::: 12V
J+
l SW
R1, Ru,--6800 OHM C1,----.02pfd * Ti,----2000/2600 CT.
-·
R2, ---33,000
R3,---1500
OHM
OHM
C2, C3,--.0lpfd
C4,C6,C7,C9,-. lpfd
* T2,----200Q CT/VC
L1,----435phi 10%
R4, R10,R15,-470 OHM C5,----6pfd, 12V Lz,----250phi 10"•
R5,---100,ooo OHM Cg,---.05pfd ti.c 1,-19o.s1.
R6,---330 OHM c,0 .---6ptd, sv ti.c 2 ,-89.3 JRIC MODEL 242
R7, R13,--4700 OHM C11,---.003pfd
R9,---2200 OHM CR1,CR2--IN64 OR IN295 OR EQUIV.
C12,C13,C14,-50pfd, 12V
Rg,---2, 700 OHM C15---.2pfd
R12,---VOLUME CONTROL TR1,--- G.E. 2Nl087
10,000 OHM 1/2W AUDIO TAPER CONVERTER NOMINAL SENSITIVITY; 150 MICROVOLTS/METER
R14,---15,000 OHM TR2, ---G.E 2N2931ST IF. (MEASURED WITH 50 MILLIWATTS REFERENCE
R15,---220 OHM TR3 1 ---G.E. 2N169 OR 2NJl212111>l.F. POWER OUTPUT)
R17, ---2700 OHM TR4, ---G.E. 2N324 DRIVER MAXIMUM POWER OUTPUT : I WATT
R19,R19,--IO OHM SELECTIVITY AT -6db : 8.0 KC/S
TR5,TR6,--G.E.2Nl415 AUDIO SELECTIVITY AT-60db : 38.0 KC/S
R20,---33 OHM WITHCLIP-ON HEAT SINK ZERO SIGNAL BATTERY DRAIN: 10 MILLIAMPS
(BIROiER 3AL635-2R OR EQUIV.I
* FOR FURTHERCOMPONENTINFORMATION SEE PAGE 154
SIX TRANSISTOR, 12 VOLT 1 WATT RECEIVER
Figure 10.16
,-- -,----i
3.2pf-l5pf
AFC
101(
LlfllTER
CONVERTEROSCILLATES
I 1ST LF.AMPLIFER 2ND LF.AMPI..FIER I --~
AT ONE-HALF SGNAL II 200KCIS 200KC/S -------"~
150il I
FREQUENCY .CENTER FREQUENCY CENTERFREatENCY
I +
200,-.t115V I
I I /
L_ -- _J___ ,----__ I/
_L ___
NOTE: DOTTED LINES INDICATE SUGGESTED IIOOULARISREAKOOWN I
I
/
,,,
....,.:t==={] ZOO,-.f/15V
+
I
I
I -IZV I
I
L___ POWER-SUPPLY-12VOL TS
------------
__ _J
FM TUNER
Figure 10.17
RADIO RECEIVER AND TUNER CIBCUITS
EXTERNAL ANTENNA
r~A~~g:WN•w.~-----41.,..____,.l------41--
.... --,._-------e-12v
~{DOTTED.
I
I
L-lL-------1-t
II
47pf
IOK
Cl - 2 GANGCAPACITOR L1 - LOOPSTICKMILLER
BOTH SECTIONSl0pf- CAT.NO.2000, OR
36Spf MILLER CAT.NO. EQUIVALENT
2112,OR EQUIVALENT
L2 -ADJUSTABLE 22OJ'H-275J'H
MILLER PART N0.42A224
CBI, OR EQUIVALENT
AM TUNER
Figure 10.18
ADDITIONALCOMPONENTINFORMATION
TRANSFORMERS
The audio transformers used in these diagrams were
wound on laminations of 1o/s"by 1% " and a ½" stack
size, and having an electrical efficiency of about 80%.
Smaller or less efficient transformers will degrade the
electrical fidelity of the circuits.
OSCILLATORCOIL
Ed Stanwyck Coil Company #1265
VARIABLECONDENSER
Radio Condenser Company Model 242
154
BASIC COMPUTER CIRCUITS
ZN!ll!I
SATURATED FLIP-FLOPS
Figure 11.1 (A) Figure 11.1 (B)
155
BASIC COMPUTER CIRCUITS
transistors respectively. For stability, the circuit depends on the low collector to
emitter voltage of the saturated on transistor to reduce the base current of the off
transistor to a point where the circuit gain is too low for regeneration. The 2200
emitter resistor can be removed if emitter triggering is not used. By adding
resistors from base to ground as in Figure 11.l(B), the off transistor has both junctions
reverse biased for greater stability, While the 33K resistors divert some of the formerly
available base current, operation no longer depends on a very low saturation voltage
consequently less base current may be used. Adding the two resistors permits stable
operation beyond 50°C ambient temperature .
2N396A 2N396A
SATURATEDFLIP-FLOP
Figure11.1 (C)
The circuit in Figure 11.l(C) is stabilized to 100°C. The price that is paid for the
stability is (1) smaller voltage change at the collector, (2) more battery power con-
sumed, (3) more trigger power required, (4) a low lco transistor must be used. The
capacitor values depend on the trigger characteristics and the maximum trigger repeti-
tion rate as well as on the flip-Hopdesign.
By far, the fastest way to design saturating flip-Hops is to define the collector and
emitter resistors by the current and voltage levels generally specifled as load require-
ments. Then assume a tentative cross-coupling network. With all components specified,
it is easy to calculate the on base current and the off base voltage. For example, the
circuit in Figure 11.l(B) can be analyzed as follows. Assume Vaz= .3 volt and Vci::=
.2 volt when the transistor is on. Also assume that VEB = .2 volts will maintain the off
transistor reliably cut-off. Transistor specifications are used to validate the assumptions.
I. Check for the maximum temperature of stability.
R..Vcc 220
V& = R1+ It = 2200 + 220 (25) = 2.3 volts
Ve on= VE+ Vcmon= 2,3 + .2 = 2.5 volts
Assuming no lco, the base of the off transistor can be considered connected to
a potential,
V' a = Vcon Rt! Ra through a resistor R' a =
(2.5) (33K)
V' a = (42K + 33K) = 1.1 volts
R's -- (33K)
75K
(42K)
= 18.SK
156
BASIC COMPUTER CIRCUITS
The Ico of the off transistor will flow through R' a reducing the base to emitter
potential. If the loo is high enough, it can forward bias the emitter to base junction
causing the off transistor to conduct. In our example, VE = 2.3 volts and Vza = .2 volts
will maintain off conditions. Therefore, the base potential can rise from 1.1 volts to
2.1 volts (2.3 - .2) without circuit malfunction. This potential is developed across
R'8 by Ico = ·!;;,i·
2 1
54 µa. A germanium transistor with Ico = 10 µa at 25°C
will not exceed 54 µ.a at 50°C. If a higher operating temperature is required, R2 and Ra
may be decreased and/or R. may be increased.
II. Check for sufficient base current to saturate the on transistor.
Va on= Vz + VBEon= 2.3 + .3 = 2.6 volts
The dissipation in the off transistor resulting from the maximum Ico is
(25) (55)
Vcslco ~ IO" = 1.4 mw
Generally the dissipation during the switching transient can be ignored at speeds
justifying saturated circuitry. In both transistors the junction temperature is within 1°C
of the ambient temperature if transistors in the 2N394-97 or 2N524-27 series are used.
A saturated Hip-Hop using 2N994 germanium epitaxial transistors is shown in
Figure 11.1(0). This flip-flop is capable of 30 mes operation with a typical transition
time of 10 nanoseconds. In this circuit Qi and Q2 form the usual flip-flop configuration.
However, the trigger input is steered through either Q:i or Q, whose gain is used to
quickly saturate Qi or Q2, whichever is in the "off" state. Simultaneously it is ensured
that the cross-coupling capacitors are discharged to their rest potentials in the shortest
possible time. For those Hip-flop circuit applications not requiring the speed of the
2N994 circuit, 2N781 transistors may be used.
157
BASIC COMPUTER cmCUITS
,....________________ .,..__ ,.____ ~-sv
H
l.5KQ @
NEGATIVE
IKQ l.5Kil .lpF
TRIGGER
+3V
30 MEGACYCLE
SATURATEDFLIP-FLOP
Figure11.1 (D)
NON-SATURATEDFLIP-FLOP DESIGN
The abundance of techniques to prevent saturation makes a general design pro-
cedure impractical if not impossible. While it is a simple matter to design a flip-flop
as shown above, it becomes quite tedious to check all the worst possible combinations
of component change to ensure manufacturability and long term reliability. Often the
job is assigned to a computer which calculates the optimum component values and
tolerances. While a number of flip-flop design procedures have been published, they
generally make simplifying assumptions concerning leakage currents and the voltages
developed across the conducting transistors.
Figure11.2 {A)
158
BASIC COMPUTER CIBCUITS
The design procedure described here is for the configuration in Figure ll.2(A). No
simplifying assumptions are made but all the leakage currents and all the potentials
are considered. The design makes full allowance for component tolerances, voltage
fluctuations, and collector output loading. The anti-saturation scheme using one resistor
(R3) and one diode (D1) was chosen because of its effectiveness, low cost and
simplicity. The trigger gating resistors (RS) may be returned to different collectors to
get different circuit functions as shown in Figure 11.3. This method of triggering offers
the trigger sensitivity of base triggering and the wide range of trigger amplitude
permissible in collector triggering. The derivation of the design procedure would
require much space, therefore for conciseness, the procedure is shown without any
substantiation. The procedure involves defining the circuit requirements explicitly then
determining the transistor and diode characteristics at the anticipated operating points.
A few astute guesses of key parameters yield a fast solution. However, since the
procedure deals with only one section of the circuit at a time, a solution is readily
reached by cut and try methods without recourse to good fortune. A checking pro-
cedure permits verification of the calculations. The symbols used refer to Figure
ll.2(A) or in some cases are used only to simplify calculations. A bar over a symbol
denotes its maximum value; a bar under it, its minimum. The example is based on
polarities associated with NPN transistors for clarity. The result is that only E:1 is
negative. While the procedure is lengthly, its straightforward steps lend themselves
to computation by technically unskilled personnel and the freedom from restricting
assumptions guarantees a working circuit when a solution is reached. A circuit designed
by this procedure is shown in Figure 11.2(B).
-16V
1.2K 1.2K
220""'
T +16V T220""'
NON-SATURATEDFLIP-FLOP
Figure11.2 (B)
159
BASIC COMPUTER CIRCUITS
The same procedure can be used to analyze existing flip-Bops of this configuration
by using the design check steps.
----------------- - IO V
IN191 INl91
2N396A
A 8
C E D
A 8 A 8 A a-~--
C E D C E D C E D
160
NON-SATURATING FLIP-FLOP DESIGN PROCEDURE
22b Estimate the maximum base to collector forward bias volt- Ve Let Ve= 0.1 volt
age that can be tolerated
23a Calculate V1 + V1 V10 2 + 0.2 = 2.2 volts
23b Calculate V1 + Vo Vu 2 + 0.8 = 2.8 volts
24a Calculate Va + V1 Vu C.,.l+ 0.2 = 0.3 volt
STEP DEFINITION OF OPERATION SYMBOL SAMPLE DESIGN FOR 2N396 TRANSISTOR
24b Calculate Va + Vo Vu 0.1 + 0.8 = 0.9 volt
25 Calculate Vs + Vr1 Vu 0.1 + 0.1 = 0.2 volt
(B) Cut and Try Circuit Design
1 Assume E2 Es Let Es= -16 volts± 5%; Es= -15.2 v; Es= -16.8 v
(I+
Ar) 1.o7
2a Calculate
(1 - Ar) Ki 0.93 = 115
.
(1 + Ae)
2b Calculate Ka ~:~: = 1.105
(1 - Ae)
2c Calculate -/-
min
Ka i1;:= 1 1.117 ma
2d Calculate I2+ Io+ 2L ~ 0.1 + 1.0 + 0.08 = 1.18 ma
Vo-Vr1 0.8 - 0.1 0 4 54 1
2e Calculate V Ka 0.1 + 0.1 + 15.2 = .0
a+ Vr1- Es VO ts
1 [ 2.2- 0.35
3 Calculate -R. < L1 [V10KiKa
- V1 - K1(V1- ~) ] 1.117 (1.15) (0.0454)
1.15 (0.35 + 16.8) ] = 14.03 K
4 Choose R. R. Let R. = 13K ± 7%; R. = 13.91 K; R. = 12.09 K
5 Calculate Ra> KaR. (0.0454) (13.91K) = 0.632 K
6 Choose Ra Ra Let Ra=0.68 K ± 7%; Ra=0.7276 K; !!: = 0.6324 K
R. (V10- V1) (12.09 K) (2.2 - 0.35)
7 Check Raby calculating Ra< V1- Es+ KaR. 0.35 + 16.8 + (1.117) (12.09)
0.730 K; choice of
Rasatisfactory
R. 13.91 K
8 Calculate
-Vr.- Es- LR.
Ko
-0.5 + 15.2 - (0.14) (13.91)
= 1.091 K/V
NON-SATURATINGFLIP-FLOP DESIGN PROCEDURE (CONTINUED)
12.09 ( 4.173 ) ( )
- 16.8 + 16.99. 1 + 12.818 13.683 + 16.8
3i V'BE= E 2 + ~ ( 1+ :: ) (E'i- E2) 12.09 ( ) 12.09
- 12.818 13.683 - 2.2 - 0.831 16.99
Ra ( ~ ('4.173) (12.09)
- -=-
It
Re
( E'\ - V10) - L -=-
Re
RAR.
Re
- - )
RA- Ra V'uE
12.818
4.173- 0.7276) = .55V
.55V is greater than V1 = .35V, therefore the design is
satisfactory.
BASIC COMPUTER CIRCUITS
TRIGGERING
Flip-Hops are the basic building blocks for many computer and switching circuit
applications. In all cases it is necessary to be able to trigger one side or the other into
conduction. For counter applications, it is necessary to have pulses at a single input
make the two sides of the Hip-flop conduct alternately. Outputs from the Hip-Hop must
have characteristics suitable for triggering other similar Hip-flops. When the counting
period is finished, it is generally necessary to reset the counter by a trigger pulse to
one side of all Hip-flops simultaneously. Shift registers and ring counters have similar
triggering requirements.
In applying a trigger to one side of a Hip-Hop,it is preferable to have the trigger
tum a transistor off rather than on. The off transistor usually has a reverse-biased
emitter junction. This bias potential must be overcome by the trigger before switching
can start. Furthermore, some transistors have slow tum on characteristics resulting in
a delay between the application of the trigger pulse and the actual switching. On the
other hand, since no bias has to be overcome, there is less delay in turning off a
transistor. As tum-off begins, the Hip-flop itself turns the other side on.
A lower limit on trigger power requirements can be determined by calculating
the base charge required to maintain the collector current in the on transistor. The
trigger source must be capable of neutralizing this charge in order to tum off the
transistor. It has been determined that the base charge for a non-saturated transistor is
approximately Qa = 1.22 Ic/271'fausing the equivalent circuit approach, or Tc le using
charge parameters. The tum-off time constant is approximately hv1d271'faor Ta. This
indicates that circuits utilizing high speed transistors at low collector currents will
require the least trigger power. Consequently, it may be advantageous to use high
speed transistors in slow circuitry if trigger power is critical. If the on transistor was in
saturation, the trigger power must also include the stored charge. The stored charge is
given approximately by
Q. _ _!_ (l l) (
- 2,r fa
+ fal 1 - ICINCII) (is,__.k_)
hvE
using the equivalent circuit approach. Using charge parameters the stored charge is
approximately
Q. -::J
= Tb (101
where the symbols are defined in the section on transient response time.
Generally, the trigger pulse is capacitively coupled. Small capacitors permit more
frequent triggering but a lower limit of capacitance is imposed by base charge con-
siderations. When a trigger voltage is applied, the resulting trigger current causes the
charge on the capacitor to change. When the change is eq~al to the base charge just
calculated, the transistor is turned off. If the trigger voltage or the capacitor are too
small, the capacitor charge may be less than the base charge resulting in incomplete
tum-off. In the limiting case C =~; . The speed with which the trigger turns off a
transistor depends on the speed in which Qa is delivered to the base. This is determined
by the trigger source impedance and rb'.
In designing counters, shift registers or ring counters, it is necessary to make
alternate sides of a Hip-Hop conduct on alternate trigger pulses. There are so-called
steering circuits which accomplish this. At low speeds, the trigger may be applied at
the emitters as shown in Figure 11.4. It is important that the trigger pulse be shorter
166
BASIC COMPUTER CIRCUITS
than the cross coupling time constant for reliable operation. The circuit features few
parts and a low trigger voltage requirement. Its limitations lie in the high trigger
current required.
At this point, the effect of trigger pu1se repetition rate can be analyzed. In order
that each trigger pulse produce reliable triggering, it must find the circuit in exactly
the same state as the previous pulse found it. This means that all the capacitors in the
circuit must stop charging before a trigger pulse is applied. If they do not, the result
is equivalent to reducing the trigger pulse amplitude. The transistor being turned off
presents a low impedance permitting the trigger capacitor to charge rapidly. The
capacitor must then recover its initial charge through another impedance which is
generally much higher. The recovery time constant can limit the maximum pulse rate •
.-------------------o+6V
2N708 2N708
90pf
------+-----1~--........i{-o lflr
CT ~~~~i
EMITTER TRIGGERING
MAXIMUM TRIGGER RATE EXCEEDS 2MC WITH TRIGGER
AMPLITUDE FROM 4V TO 12V.
Figure11.4
Steering circuits using diodes are shown in Figures 11.5 and 11.6. The collectors
are triggered in 11.5 by applying a negative pulse. As a diode conducts during trigger-
ing, the trigger pulse is loaded by the collector load resistance. When triggering
is accomplished, the capacitor recovers through the biasing resistor RT. To minimize
2N708
Cy
----1----o"V'V"
90pf PULSE
INPUT
COLLECTOR TRIGGERING
MAXIMUMTRIGGERRATE EXCEEOS511CWITH TRIGGER
AMPLITUDE FROM4V TO 12V. DASE TRIGGERING
MAXIMUM TRIGGERRATE EXCEEDS !SMC
WITHTRIGGERAMPLITUDE FROM 0.75 TO
Z VOLTS.
167
BASIC COMPUTER CIRCUITS
bigger loading, RT should be large; to aid recovery, it should be small. To avoid the
recovery problem mentioned above, RT can be replaced by a diode as shown in 11.7.
The diode's low forward impedance ensures fast recovery while its high back im-
pedance avoids shunting the trigger pulse during the triggering period.
Collector triggering requires a relatively large amplitude low impedance pulse but
has the advantage that the bigger pulse adds to the switching collector waveform to
enhance the speed. Large variations in trigger pulse amplitude are also permitted.
In designing a counter, it may be advantageous to design all stages identically the
same to permit the economies of automatic assembly. Should it prove necessary to
increase the speed of the early stages, this can be done by adding a trigger amplifier
as shown in Figure 11.8 without any change to the basic stage.
.,..;....~---~ Cy
90pf
2N708 2N70B
36pf
~.n.n..
PULSE
INPUT
Figure11.7 Figure11.8
Base triggering shown in Figure 11.6 produces steering in the same manner as
collector triggering. The differences are quantitative with base triggering requiring
less trigger energy but a more accurately controlled trigger amplitude. A diode can
replace the bias resistor to shorten the recovery time.
9.IK Rr
IOK
IN3605 IN3605
..._ ___ _.,_-4~t-- .... -----
22Opf \ i I 220pf
BASE TRIGGERINGWITHHYBRIOGATE Cy
Figure11.9
168
BASIC COMPUTER CIRCUITS
SPECIAL PURPOSECIRCUITS
SCHMITT TRIGGER
A Schmitt trigger is a regenerative bistable circuit whose state depends on the
amplitude of the input voltage. For this reason, it is useful for waveform restoration,
signal level shifting, squaring sinusoidal or non-rectangular inputs, and for DC level
detection. Practical circuits are shown in Figure 11.10.
INPUT
01 ALWAYS CONDUCTS IF INPUT
IS MORE NEGATIVE THAN -5V
02 ALWAYS CONDUCTS IF INPUT
IS MORE POSITIVE THAN -2V
AMBIENT TEMPERATURE -55°C
TO 71-C
(A)
.----------o • ~V
FREQUENCY RANGE O TO I MC
OUTPUT OUTPUTAT COLLECTOR HAS 2V
MINIMUM LEVEL CHANGE
0 I ALWAYS CONDUCTS IF INPUT
INPUT
EXCEEDS 6.BV
02 ALWAYS CONDUCTS IF INPUT
IS BELOW 5.2V
AMBIENT TEMPERATURE o•c
TO 71°C
( B)
SCHMITT TRIGGERS
Figure 11.1O
169
BASIC COMPUTER CIRCUITS
ASTABLE MULTIVIBRATOR
The term multivibrator refers to a two stage amplifier with positive feedback. Thus
a flip-flop is a bistable multivibrator; a "one-shot" switching circuit is a monostable
multivibrator and a free-running oscillator is an astable multivibrator. The astable
multivibrator is used for generating square waves and timing frequencies and for
frequency division. A practical circuit is shown in Figure 11.11. The circuit is sym-
metrical with the transistors DC biased so that both can conduct simultaneously. The
cross-coupling capacitors prevent this, however, forcing the transistors to conduct
alternately. The period is approximately T = CT !oIOO microseconds where CT is
measured in pf (µp.f). A synchronizing pulse may be used to lock the multivibrator to an
external oscillator's frequency or subharmonic.
ASTABLE MULTIVIBRATOR
Figure11.11
MONOSTABLEMULTIVIBRATOR
On being triggered a monostable multivibrator switches to its unstable state where
it remains for a predetermined time before returning to its original stable state. This
makes the monostable multivibrator useful in standardizing pulses of random widths
or in generating time delayed pulses. The circuit is similar to that of a flip-flop except
that one cross-coupling network permits AC coupling only. Therefore, the flip-flop can
only remain in its unstable state until the circuit reactive components discharge. Two
circuits are shown in Figure 11.12 to illustrate timing with a capacitor and with an
inductor. The inductor gives much better pulse width stability at high temperatures.
170
BASIC COMPUTERCIBCUITS
INDICATORLAMP DRIVER
The control panel of a computer frequently has indicator lamps to permit monitor-
ing the computer's operation. The circuit in Figure 11.13 shows a bistable circuit
which pennits controlling the lamp by short trigger pulses.
A negative pulse at point A turns on the lamp, which remains on due to regenera-
tive feedback in the circuit. A positive pulse at A will turn off the lamp. The use of
complementary type transistors minimizes the standby power while the lamp is off.
•12V
(A)
OUTPUT AT COLLECTORHAS
5 VOLT LEVEL CHANGE
OUTPUT PULS£ DURATIONAPPROX
600 MICROSECONDS
MAXIMUM INPUT PULSE REQUIRED
3 VOLTS
AMBIENT TEMPERATURE-55•C
TO 71°C
( B)
MONOSTABLEMULTIVIBRATOR
Figure 11.12
PULSEGENERATOR
Frequently, in computer circuits a clock pulse is required to set the timing in an
array of circuits. A pulse generator is shown in Figure 11.14 which delivers a very
fast rise time (25 nsec.) pulse of high power. The circuit is basically composed of two
parts. A multivibrator is formed by Qi and Q2 and their associated circuitry and triggers
the pulse generator formed by Qa and Q•.
171
BASIC COMPUTER cmCUITS
6.8K
6.8K
GE-E24 LAMP
IK
GE 2.N994
02.
IOOK 47012 47.Q RL !50.Q
2.2.0pf OUTPUT
470pf
+ +
-=-9V 2.!5V -=-_
GE 2.N2193
01 100.n
100n
GE 2.N2.193
04
47.Q 2.2.0pf
!5J1,h 22.on
172
BASIC COMPUTER CIBCUITS
RING COUNTER
The circuit of Figure 11.15 forms a digital counter or shift register with visual
readout. The circuit operates from a 12 volt source and uses six components per stage.
The counter and indicator functions are combined to insure low battery drain. The
.22 µfd capacitor ensures that the first stage turns on after the reset button is released.
No current is drawn by the stages except when a lamp is on. As many stages as desired
may be included in a ring.
RESET N.C.
INl692
INl692
RECTIFIERS
PROVIDEBIAS
VOLTAGESFOR
TEMPERATURE
STABILITY.
IOK IOK
OJ µfd
INPUTo---j 1------ ..
IN1692
OUTPUT
IN1692
r-o1iui\~1
O.lµfd RING
FIRST STAGE__) SECOND STAGE LAST STAGE
OF RING COUNTER
173
LOGIC
Large scale scientific computers, smaller machine control computers and electronic
animals all have in common the facility to take action without any outside help when
the situation warrants it. For example, the scientific computer recognizes when it has
completed an addition, and tells itself to go on to the next part of the problem. A
machine control computer recognizes when the process is finished and another part
should be fed in. Electronic animals can be made to sense obstructions and change
their course to avoid collisions. Mathematicians have determined that such logical
operations can be described using the conjunctives AND, OR, AND NOT, OR NOT.
Boolean algebra is the study of these conjunctives, the language of logic. A summary
of the relations and operations of Boolean algebra follow the example of its use below.
Transistors can be used to accomplish logic operations. To illustrate this, an example
from automobile operation will be used. Consider the interactions between the ignition
switch, the operation of the motor and the oil pressure warning light. If the ignition is
off, the motor and light will both be off. If the ignition is turned on, but the starter is
not energized the warning lamp should light because the motor has not generated oil
pressure. Once the motor is running, the ignition is on and the lamp should be off.
These three combinations of ignition, motor and lamp conditions are the only possible
combinations signifying proper operation. Note that the three items discussed have
only two possible states each, they are on or off. This leads to the use of the binary
arithmetic system, which has only two symbols corresponding to the two possible states.
Binary numbers will be discussed later in the chapter.
I M L Result
I =IGNITION
I 0 0 0 V
M=MOTOR
2 0 0 I X L=LAMP
3 0 I 0 X R =RESULT
4
I =ON
0 I I X O=OFF
5 I 0 0 X V= ACCEPTABLE
6 I 0 I V X =UNACCEPTABLE
7 V N =3 =NO.OF VARIABLES
I I 0
8 I I I X 2N=e
To write the expressions necessary to derive a circuit, first assign letters to the
variables, e.g., I for ignition, M for motor and L for lamp. Next assign the number one
to the variable if it is on; assign zero if it is off. Now we can make a table of all possible
combinations of the variables as shown in Figure 12.1. The table is formed by writing
ones and zeros alternately down the first column, writing ones and zeros in series of
two down the second; in fours down the third, etc. For each additional variable,
double the number of ones or zeros written in each group. Only 2N rows are written,
175
LOGIC
where N is the number of variables, since the combinations will repeat if more rows
are added. Indicate with a check mark in the result column if the combination repre-
sented in the row is acceptable, For example, combination 4 reads, the ignition is off
and the motor is running and the warning light is on. This obviously is an unsatisfactory
situation. Combination 7 reads, the ignition is on and the motor is running ~d the
warning light is off. This obviously is the normal situation while driving. If we indicate
that the variable is a one by its symbol and that it is a zero by the same symbol, with
a bar over it and if we use the symbol plus (+) to mean "OR" and multiplication to
mean "AND" we can write the Boolean equation IML+ IML + IML =
R where R
means an acceptable result. The three terms on the left hand side are combinations 1, 6,
and 7 of the table since these are the only ones to give a check mark in the result
column. The plus signs indicate that any of the three combinations individually is
acceptable. While there are many rules for simplifying such equations, they are beyond
the scope of this book.
INPUTS
11 M
ii 1f
A PICTORIAL PRESENTATION
Figure12.2 Figure12.3
To express this equation in circuitry, two basic circuits are required. They are
named gates because they control the signal passing through. An "AND" gate generates
an output only if all the inputs representing the variables are simultaneously applied and
an "OR" gate generates an output whenever it receives any input. Our equation trans-
lated into gates would be as shown in Figure 12.2. Only if all three inputs shown for an
"AND" gate are simultaneously present will an output be generated. The output will
pass through the "OR" gate to indicate a result. Note that any equation derived from
the table can be written as a series of "AND" gates followed by one "OR" gate.
It is possible to rearrange the equation to give a series of"OR" gates followed by one
"AND" gate. To achieve this, interchange all plus and multiplication signs, and remove
bars where they exist and add them where there are none. This operation gives us,
(I + M + L) (I+ M + L) (I+ M + L) = R
In ordinary language this means if any of the ignition or motor or lamp is on, and
simultaneously either the ignition is off or the motor is on or the lamp is off, and
simultaneously either the ignition is off or the motor is off or the lamp is on, then the
result is unacceptable. Let us apply combination 4 to this equation to see if it is accept-
176
LOGIC
able. The ignition is off therefore the second and third brackets are satisfied. The first
bracket is not satisfied by the ignition because it requires that the ignition be on.
However, the motor is on in combination 4, satisfying the conditions of the first bracket.
Since the requirements of all brackets are met, an output results. Applying combination
1 to the equation we find that the third bracket cannot be satisfied since its condi-
tions are the opposite of those in combination 7. Consequently, no output appears.
Note that for this equation, an output indicates an unacceptable situation, rather than
an acceptable one, as in the first equation. In gate form, this equation is shown in
Figure 12.3.
Table 12.1 summarizes the definitions used with the Boolean equations above and
indicates some of the rules which were used to convert the equation represented in
Figure 12.2 to that of Figure 12.3. The more conventional symbols a, b, c are used in
place of I, M, and L.
DEFINITIONS
a, b, c, etc.
ab or a• b or (a)(b) ..
Symbols used in equations
Reads as a and b ..
.!+ b Reads as "a orb ..
a Reads as "not a..
1 Reads as "true .. or "on ..
0 Reads as "false" or "off..
LAWS
RELATIONSHIPS
1=0 0=T
a+a=a a•a=a
a+l=l a•l = a
a+a=l a•a=0
a=a =
a + ab a(l + b) = a
Table 12.1
Methods for using transistors in gate circuits are illustrated in Figure 12.4. The base
of each transistor can be connected through a resistor either to ground or a positive
voltage by operating a switch. In Figure 12.4(A) if both switches are open, both tran-
sistors will be non-conducting except for a small leakage current. If either switch A or
switch B is closed, current will flow through RL, If we define closing a switch as being
177
LOGIC
synonymous with applying an input then we have an "OR" gate. When either switch is
closed, the base of the transistor sees a positive voltage, therefore, in an "OR" gate the
output should be a positive voltage also. In this circuit it is negative, or "NOT OR".
The circuit is an "OR" gate with phase inversion. It has been named a "NOR" circuit.
Note that if we define opening a switch as being synonymous with applying an input,
then we have an "AND" circuit with phase inversion since both switch A and switch B
must be open before the current through RL ceases. We see that the same circuit can
be an "AND" or an "OR" gate depending on the polarity of the input.
---------1-------------+1ov
IOK
+1ov--------------------
8
--~OUTPUT
178
LOGIC
The circuit in Figure 12.4{B)has identically the sanie input and output levels but
uses PNP rather than NPN transistors. If we define closing a switch as being an input,
we find that both switches must be closed before the current through RL ceases. There-
fore, the inputs which made the NPN circuit an "OR" gate make the PNP circuit an
"AND" gate. Because of this, the phase inversion inherent in transistor gates does not
complicate the overall circuitry excessively.
Figure 12.S(A) and (B) are very similar to Figure 12.4(A) and (B) except that the
transistors are in series rather than in parallel. This change converts "OR" gates into
"AND" gates and vice versa.
Looking at the logic of Figure 12.3, let us define an input as a positive voltage; a
lack of an input as zero voltage. By using the circuit of Figure 12.4(A) with three
transistors in parallel, we can perform the "OR" operation but we also get phase
inversion. We can apply the output to an inverter stage which is connected to an
"AND" gate of three series transistors of the configuration shown in Figure 12.S(A).
An output inverter stage would also be required. This is shown in Figure 12.6(A).
179
LOGIC
By recognizing that the circuit in Figure 12.4(A) becomes an "AND" gate if the
input signal is inverted, the inverters can be eliminated as shown in Figure 12.6(B)•
0
• NOR.GATE INVERTER NOTM0°GATE INVERTER
(A)INVERTERS COMPENSATEFOR PHASE INVERSION OF GATES
,------------+--------O+IOV
• TO OTHER NOT"AND"
"NOR"GATES GATE
IOK
(B)PHASE INVERSIONUTILIZED TO ACHIEVE "AND•AND"oR• FUNCTIONSFROM THE SAME CIRCUIT.
CIRCUITS REPRESENTING
(I + M + L) (T+ M + () Ci+ M + L) = R
Figure12.6
If the transistors are made by processes yielding low saturation voltages and high
base resistance, the series base resistors may be eliminated. Without these resistors the
logic would be called direct-coupled transistor logic DCTL. While DCTL offers ex-
treme circuit simplicity, it places severe requirements on transistor parameters and
does not offer the economy, speed or stability offered by other logical circuitry.
The base resistors of Figure 12.6 relax the saturation voltage and base input voltage
requirements. Adding another resistor from each base to a negative bias potential
would enhance temperature stability.
Note that the inputs include both "on" and "off" values of all variables e.g., both
I and I appear. In order that the gates function properly, I and I cannot both be posi-
tive simultaneously but they must be identical and oppositely phased, i.e. when I is
positive T must be zero and vice versa. This can be accomplished by using a phase
inverter to generate T from I. Another approach, more commonly used, is to take I
andTfrom opposite sides of a symmetrical flip-Hop.
180
LOGIC
+20V
27K
-10
IF A OR B OR C IS RAISEDFROM ZERO TO
12 VOLTS THE TRANSISTORWILLCONDUCT.
"NOR" logic is a natural extension of the use of resistors in the base circuit. In the
circuit of Figure 12.7, if any of the inputs is made positive, sufficient base current
results to cause the transistor to conduct heavily. The "OR" gating is performed by
the resistors; the transistor amplifying and inverting the signal. The logic of Figure
12.3 can now be accomplished by combining the "NOR" circuit of Figure 12.7 with
the "AND" circuit of Figure 12.S(A). The result is shown in Figure 12.7. In comparing
the circuits in Figure 12.6(A) and 12.8, we see that the "NOR" circuit uses one-fourth
as many transistors and one-half as many resistors as the brute force approach. In fact if
we recall that the equation we are dealing with gives R rather than R, we see that
we can get R by removing the output phase inverter and making use of the inherent
inversion in the "NOR" circuit. In the circuit of Figure 12.7 two supply voltages of
+20 and -10 volts are used. The -10 volt supply is to insure that the transistor is
held off when Ico increases at elevated temperatures. If silicon transistors (such as the
2N708, 2N914, or 2N2193A) are used in NOR logic circuits the hold off supply may
not be necessary. Since VBEis larger for silicon devices and Ieo is very low a resistor
returned to the emitter reference may result in sufficient circuit stability .
.--------zov
ALL TRANSISTORS
2N63llA
IINERTER
181
LOGIC
Because of the fact that a generalized Boolean equation can be written as a series
of "OR" gates followed by an "AND" gate as was shown, it follows that such equations
can be written as a series of "NOR" gates followed by a "NOR" gate. The low cost
of the resistors used to perform the logic and the few transistors required make "NOR"
logic attractive.
DEFINITIONS
IK =MINIMUM CURRENT THROUGH RK FOR
TURNING TRANSISTOR ON
IB =MINIMUM BASE CURRENT FOR
TURNING TRANSISTOR ON
Ir =BIAS CURRENT TO KEEP TRANSISTOR
OFF AT HIGH TEMPERATURES
M :::i MAX. NUMBER OF INPUTS PERMITTED
N 1r MAX. NUMBER OF OUTPUTS PERMITTED
VBE=MAX. BASE TO EMITTER VOLTAGE WHEN
THE TRANSISTOR IS ON.
VcE = MAX. COLLECTOR TO EMITTER VOLTAGE WHEN
THE TRANSISTOR IS ON.
182
LOGIC
where Icou is the maximum Ico that is expected at the maximum junction temperature.
The second equation indicates the manner in which IK is split up at the base of the
transistor.
Is:= Is+ M (VcE11 ±
- VcEN Vs~: VEB)- (VBE- Vce:N)+ lcou (12b)
where V cENis the minimum expected saturation voltage, Vce:11is the maximum expected
saturation voltage and VEB is the reverse bias required to reduce the collector current
to Ico.V EB is a negative voltage. The third equation ensures that VEB will be reached
to turn off the transistor.
l0011+ (Vceu ;KV e:u)M IT (12c)
INPUTS
1
Ir
CLAMPING DIODE REDUCES STORAGE CAPACITORS
REDUCE
STORAGE
TIME TO INCREASESPEED TIME TO INCREASE
SPEED
(A) (8)
Figure12.10
Circuit speed can also be enhanced by using a diode as shown in Figure 12.IO(A)
to prevent severe saturation or by shunting R1tby a capacitor as in 12.IO(B).The capac-
itors may cause malfunction unless the stored charge during saturation is carefully
controlled; they also aggravate crosstalk between collectors. For this reason it is pref-
erable to use higher frequency transistors without capacitors when additional speed
is required. Table 12.2 lists the characteristics of common logic systems employing
transistors.
183
LOGIC
TYPICAL CIRCUIT
NAME DESCRIPTION
( Positive signals are defined as 1 )
DCTL
Direct
coupled
transistor
logic
a
b
=t~ a
-=- -
+
a+b
Logic is performed
transistors. VcE and VoE,
measured with the tran-
the two logic levels. Vcs
must be much less than
by
Logic is performed by
DL
Diode
logic
:3-r+b+c :~••c diodes. The output is not
inverted. Amplifiers are re-
quired to maintain the cor-
rect logic levels through
several gates in series.
Logic is performed by
diodes. The output is in-
LLL verted. The dioae D iso-
lates the transistor from
the gate _permitting R to
Low turn on the collector cur-
level rent. By proper choice of
logic voltage changes occur.
This method is also called
current switching diode
logic.
184
LOGIC
SUITABLETRANSISTORS SUITABLE
DIODES
FEATURES GERMANIUM SILICON SILICON
Low?ieed High~eed Low~eed High~eed High Speed
(fa<I mes,) (fa>I mes.) (fa<l mes.) (fa>I mes.)
Table 12.2
185
LOGIC
Logic is performed by
transistors which are biased
CML from constant current
sources to keep them far
Current out of saturation. Both in-
mode verted and non-inverted
logic outputs are available.
Logic is performed by
DTL
:-.r f_,..:--='7 1--= diodes. The output is in-
verted. The transistor acts
as an amplifier. This is
-~
Diode essentially an extension of
transistor
logic -~ the diode logic discussed
above.
Logic is performed by
cores and transmitted by
CDL diodes. Transistors act as
drivers to shift informa-
Core tion. Each transistor can
diode • drive many cores but not
logic successive cores in the
logic line.
Logic is performed by
silicon controlled switches
;;'"ft=rf+ ott • t which are triggered on at
4 Layer o b C the gate lead. The gates
----+IIJU can be actuated by pulse
Device or DC levels. The gates
logic have a built in memory
and must be reset.
Logic, is performed by
tunnel diode switchins
TDL bo-lW\.--e--------o
obc
OR
from low voltage to high
voltage state. Whether
circuit represents AND or
Tunnel o+b+c OR gate depends on bias
diode current through resistor R.
logic Tunnel diode biased neai
peak current for OR gate,
and close to ground fo1
AND.
SUITABLETRANSISTORS SUITABLE
DIODES
FEATURES GERMANIUM SILICON SILICON
Low~eed High~eed Low~eed High~ed
(fa.<l mes,) (fci>l mes.) (fci<l mes,) (fa.>l mes.) High Speed
SUITABLEDEVICES
These gates are pulse or
de actuated and the input
need not be maintained.
High output power capa-
bility is available. In gen-
eral, in the presence of
radiation, units will tum
3N58
3N59 I SiliconSwitches
Controlled
l
Current Bowing through
input resistors determines
logic. Circuit is basically TD-IA Germanium
simple and very high TD-2A
TD-3A Tunnel Diodes
speed is obtainable. TD-311B
•Military types
Table 12.2 (Continued)
187
LOGIC
BINARYARITHMETIC
Because bistable circuits can be readily designed using a variety of components
from switches to transistors, it is natural for counters to be designed to use binary
numbers, i.e., numbers to the base, or radix, 2. In the conventional decimal system, a
number written as 2904 is really a contraction for 2 X !OS+ 9 X 102 + 0 X 101 + 4 X 1.
Each place refers to a different power of 10 in ascending order from the right.
In the binary system, only two symbols are permitted, 0 and 1. All numbers are
constructed on the basis of ascending powers of 2. For example, 11011 means
1 X 2' + 1 X 2• + 0 X 21 + 1 X 21 + 1 X 1. This is 27 in the decimal system.
This notation applies also to decimal fractions as well as integers. For example, the
number 0.204 is a contraction of 2 X 10-1 + 0 X 10-• + 4 X 10-a.Similarly, the binary
number 0.1011 is a contraction of 1 X 2-1 + 0 X 2-1 + 1 X 2..a + 1 X 2_.. Using this
construction, a table of equivalent binary and decimal numbers can be obtained as
shown below.
Binary Decimal Binary Decimal
0 0 0.000 0.000
1 1 0.001 0.125
10 2 0.010 0.250
11 3 0.011 0.375
100 4 0.100 0.500
101 5 0.101 0.625
110 6 0.110 0.750
111 7 0.111 0.875
During addition, the digits in a column are added to the carry from the previous
column. The result is expressed as a sum digit which is recorded and a carry digit
which is applied to the next column. The term digit generally refers to the figures in a
decimal number; the term bit (an abbreviation of binary digit) is used with binary
numbers. If the digit being subtracted is the larger of the two in the column, the
techniques used to handle this situation in decimal subtraction are also applicable in
the binary system.
Multiplication Division
42 101010 1.35 1.0101
21 10101 5\/6.7500 101 '/ 110.11000
~ 101010 5 101
84 101010 17 111
882 101010 15 101
1101110010 ~ 1000
25 101
110
Multiplying a binary number by two is equivalent to adding a zero to its right hand
188
LOGIC
Flip-Bops can be connected in series so that the first Bip-Hop will alternate states
with each input pulse, and successive Hip-Bopswill alternate states at half the rate of
the preceding Hip-Bop. In this way the Hip-Hopsassume a unique configuration of
states for a given number of input pulses. The Hip-Hopsactually perform the function
of binary counting. A practical circuit of a binary counter is shown in Figure ll.3{B)
The count in a binary counter can be determined by noting whether each stage is in
the 1 or O condition, and then assigning the appropriate power of 2 to the stage to
reconstruct the number as in the examples above.
If it is required to count to a base other than 2, a binary counter can be modified
to count to the new base.
The rules for accomplishing the modification will be illustrated for a counter to
the base 10.
Rule Example
1) Determine the number of binary stages M=lO
{N) required to count to the desired 23 < 10<2'
new base (M) N=4
2) Subtract M from 2N 2' - 10 6=
3) Write the remainder in binary form 6=ll0
4) When the count reaches 2N·1, feed 2N-l = 23 = 1000
back a one to each stage of the counter Feedback added gives
having a one in the remainder shown in 3) 1 110
As additional pulses are added beyond the count 2N·1, they will count through to M
and then recycle to zero. This method is based on advancing the count at the point 2N-1
to the extent that the indicated count is 2Hwhen M input pulses are applied. The feed-
back is applied when the most significant place becomes a one but it is imperative that
feedback be delayed until the counter settles down in order to avoid interference with
the normal counter action.
189
UNIJUNCTION TRANSISTOR
CIRCUITS
THEORYOF OPERATION
The construction of the unijunction transistor is shown in Figure 13.2. Two ohmic
contacts, called base-one ( Bl) and base-two (B2) are made at opposite ends of a
small bar of n-type silicon. A single rectifying contact, called the emitter ( E), is made
on the opposite side of the bar close to base-two. An interbase resistance, Ruu, of
between 5K and lOK exists between base-one and base-two. In normal circuit opera-
I92
4
IE
82
VBB OHMIC
Bl CONTACTS
191
UNIJUNCTION TRANSISTOR CIRCUITS
tion, base-one is grounded and a positive bias voltage, VBB, is applied at base-two.
With no emitter current flowing, the silicon bar acts like a simple voltage divider
(Figure 13.3) and a certain fraction, 7J of VBa will appear at the emitter. If the emitter
voltage, VE, is less than 7J VBB, the emitter will be reverse-biased and only a small
emitter leakage current will flow. If VE becomes greater than 7J VBa, the emitter will be
forward biased and emitter current will flow. This emitter current consists primarily
of holes injected into the silicon bar. These holes move down the bar from the emitter
to base-one and result in an equal increase in the number of electrons in the emitter
to base-one region. The net result is a decrease in the resistance between emitter and
base-one so that as the emitter current increases, the emitter voltage decreases and a
negative resistance characteristic is obtained (Figure 13.5).
The operation of the unijunction transistor may be best understood by the repre-
sentative circuit of Figure 13.3. The diode represents the emitter diode, RB1represents
the resistance of the region in the silicon bar between the emitter and base-one and
Rm represents the resistance between the emitter and base-two. The resistance RB1
varies with the emitter current as indicated in Figure 13.4.
B2 IE Rat
(MA·) (OHMS)
0 4600
E I 2000
2 900
5 240
10 150
20 90
Bl Bl 50 40
\/
I
\ \
!
I
-- -v ,I
.,,/
Jr:•IOMA
,,,..
,,,,,.
,.. -
' \ I I/ --- ~~--
... ,o ...
·,'
\ \
I\. " /
I/,/'
L.,,,,,,,,.
----
---~~- Ir:•'!.'
--~--
" ......_ ,, ,......-
" ' ' ......_
~
/
....,
......
II..
r--..
'
~r-,...
...~;.:;;
..ITT
·-·~· I
j
i...-1--~
1.,.,..,,.,..
i--...-
.
I
~ 1 1...-
..._ va'LLn,ouns
io ta ao n ,o n 40
I I I 4 I e
I I I
f I I 10 U II II .. lliltlll:IAH Y01.fAll•Y11•V0t.TI "'
lttnn• CUCCWT• 11 • IULLIAll"l;qa
192
UNIJUNCTION TRANSISTOR cmCUITS
two current for fixed values of emitter current. On each of the emitter characteristic
curves there are two points of interest, the peak point and the valley point. On each of
the emitter characteristic curves the region to the left of the peak point is called the cut-
oJf region; here the emitter is reverse biased and only a small leakage current Hows.The
region between the peak point and the valley point is the negative resistance region.
The region to the right of the valley point is the saturation region; here the dynamic
resistance is positive and lies in the range of 5 to 200.
0.2
193
UNIJUNCTION TRANSISTOR CIRCUITS
4. VP - Peak Point Emitter Voltage, This voltage depends on the interbase voltage
as indicated in (2). VP decreases with increasing temperature because of the change
in Vo and may be stabilized by a small resistor in series with base-two.
5. VE (sat) - Emitter Saturation Voltage. This parameter indicates the forward
drop of the unijunction transistor from emitter to base-one in the saturation region.
It is measured at an emitter current of 50 ma and an interbase voltage of 10 volts.
6. Ie2 (mod) - Interbase Modulated Current. This parameter indicates the effective
current gain between emitter and base-two. It is measured as the base-two current
under the same condition used to measure VE (sat).
7. ho - Emitter Reverse Current. The emitter reverse current is measured with
60 volts between base-two and emitter with base-one open circuit. This current varies
with temperature in the same way as the Ico of a conventional transistor.
8. Vv - Valley Voltage. The valley voltage is the emitter voltage at the valley
point. The valley voltage increases as the interbase voltage increases, it decreases
with resistance in series with base-two and increases with resistance in series with
base-one.
9. Iv - Valley Current. The valley current is the emitter current at the valley
point. The valley current increases as the interbase voltage increases and decreases
with resistance in series with base-one or base-two.
RELAXATIONOSCILLATOR
The relaxation oscillator circuit shown in Figure 13.9 is a basic circuit for many
applications. It is chiefly useful as a timing circuit, a pulse generator, a trigger circuit
or a sawtooth wave generator.
,-----+-0+V1
BASIC RELAXATIONOSCILLATOR
WITH TYPICAL WAVEFORMS
Figure13.9
The maximum and minimum voltages of the emitter voltage waveform may be
calculated from:
VE (max)= VP= 71Vaa + .67 volt
VE (min.) ~ 0.5 Vs (sat)
The frequency of oscillation is given by the equation:
f =:!! 1
R,C In ( 1 ~ )
71
and may be obtained conveniently from the nomogram of Figure 13.10.
194
•~7~•
UNIJUNCTION TRANSISTOR CIRCUITS
RESISTANCE-RI - KILOHMS
~~ 2 ~ ~ ~ ~~ ~:J~ ~ g ~ ....
0
~• 1 I ...........__._i I 1
0
2
MINIMUM
NOMINAL FREQUENCY TYPES 2N 493, 2N494
NOMOGRAM
FOR CALCULATING
FREQUENCY
OF RELAXATION
OSCILLATION
Figure 13.10
The emitter voltage recovery time, tvs, is defined as the time between the 90%
and 10 % points on the emitter voltage waveform. The value of tn: is determined
primarily by the size of the capacitor C in Figure 13.9 and may be obtained from
Figure 13.11.
_ 100
:g
z 50 MAX 80°/o
0
~ 30 1/MEAN -
~ 20
a: ,,,,,
MIN 80"/,;
u
! 10
- ..,"' -..,.~
I
--- -
\:!
... 5
- -- - 2fvE
i:,
::E
3
2
I .. ~•
---
...--
----
:l I
.
~
.001 .01 0.1 1.0 10
CAPACITANCE -C-(MICROF'ARAOS)
RECOVERY
TIME OF UNIJUNCTION TRANSISTORRELAXATION
OSCILLATORVS. CAPACITY
Figure 13.11
The pulse amplitude at base-one or base-two may be determined from the equations:
.
1f., = [VP - 1/2 VE(sat)] C
.....1.1 -
I B2(pealt> e!
tn:
IRS(mod) _ ~
'J ls<poalt>
Units are ma,
volts, mµf, µsec.
l.
7
195
UNI)UNCTION TRANSISTOR cmCUITS
ULTRA-LINEARSAWTOOTHWAVE GENERATOR
The circuit of Figure 13.12 may be used as a linear sawtooth wave generator. The
NPN transistor serves as an output buffer amplifier with the capacitor C, and resistor ~
serving in a bootstrap circuit to improve the linearity of the sawtooth. R1 and C1 give
integrator type feedback which compensates for the loading of the output stage. Opti-
mum linearity is obtained by adjusting R1, Linearity is 0.3% or more depending on
hrE of the NPN transistor.
+2ov
IK
N'\J'
OllTPUT
6V P-P
2N167
2N336
l/v1,
OUTPUT
c, RL IOV P-P
0.05 2K IKC
SAWTOOTH
GENERATOR
WITHHIGHLINEARITY
Figure13.12
196
UNIJUNCTION TRANSISTORCIBCUITS
pensation so that the drift in firing voltage is within ±2 millivolts from 0°C to 55°C.
After the temperature compensation is completed it will normally be necessary to reset
R1. The long term stability of this circuit is normally better than ± 10 millivolts and
the hysteresis is normally less than 1 millivolt. The change in firing voltage with a
change in the supply voltage (~V.) will be less than 0.7 t:,.Yi/V1.The voltage stability
can be improved by adding two silicon diodes in series with R,.
3300,
INl692
+
SIGNAL
INPUT
ll
~v
~PS
24V
l/4A
VOLTAGE
SENSINGAND TRIGGERCIRCUIT
Figure13.13
STAIRCASEWAVE GENERATOR
Figure 13.14 shows a simple staircase wave generator which has good stability and
a wide operating range. The unijunction transistor Q1 operates as a free running oscil-
lator which generates negative pulses across R,. These pulses produce current pulses
from the collector of Q2which charge capacitor C in steps. When the voltage across C1
reaches the peak point voltage of Qa this transistor fires and discharges C..
Resistor R1 determines the frequency of the steps and resistor Rt determines the
number of steps per cycle. The circuit shown can be adjusted for a step frequency
.----.1..--e--------~---------.0+2ov
3300 3300
03 I A
0, 2N491 l_r lr
2N491 STAIRCASE
OUTPUT
IOV P-P
STAIRCASEWAVEGENERATOR
(FREQUENCY DIVIDER)
Figure 13.14
197
UNIJUNCTION TRANSISTOR cmCUITS
from 100 cps to 2 KC and the number of steps per cycle can be adjusted from one to
several hundred. This circuit can also be adapted to a frequency divider by cascading
stages similar to the stage formed by Q2 and Qa,
TIME DELAYRELAY
Figure 13.15 shows how the unijunction transistor can be used to obtain a precise
delay in the operation of a relay. When the switch SW! is closed, capacitor Cr is
RELAY
CONTACTS
Rr 'o-o+v,
3K-500K SWI ( 24-32V)
2N491
2N492 3300
2W
+ Cr RELAY GE A38
1001' fd 1500 S279IG200
25V DPDT
charged to the peak point voltage at which time the unijunction transistor fires and the
capacitor discharges through the relay thus causing it to close. One set of relay contacts
hold the relay closed and the second set of contacts can be used for control functions.
To be used in this circuit, relays must have fast operating times, low coil resistance
and low operating power.
The time delay of this circuit is determined by RT, about one second of delay is
obtained for each lOK of resistance, RT, The time delay is quite independent of tem-
perature and supply voltage.
MULTIVIBRATOR
Figure 13.16 shows a unijunction transistor multivibrator circuit which has a fre-
quency of about 1 Kc. The conditions for oscillation of this circuit are the same as for
+ v,
I I I
+25V ,..,2it,-i
I : /1·- + 12.5V
VE LV L_ +3V
WITH TYPICALWAVEFORMS
UNIJUNCTIONTRANSISTORMULTIVIBRATOR
Figure 13.16
198
UNIJUNCTION TRANSISTOR cmcurrs
the relaxation oscillator. The length of time during which the unijunction transistor is off
(no emitter current flowing) is determined primarily by R1. The length of time during
which the unijunction transistor is on is determined primarily by R2. The periods may
be calculated from the equations:
t2 = R2Cln[V t ~~VE]
1
Where VE is measured at an emitter current of Iii:= Vi (~ii R:i) and may be obtained
from the emitter characteristic curves.
An NPN transistor may be direct coupled to the multivibrator circuit by replacing
the diode as shown in Figure 13.17. This circuit has the advantage that the load does
not have any effect on the timing of the circuit.
RELAY
OR
LOAD
199
UNIJUNCTION TRANSISTOR CIRCUITS
The basic hybrid timing circuits in Figures 13.18 and 13.19 can be adapted to
perform desired functions by connecting resistors or potentiometers between the points
in the circuit (Ci, Ct, E, G) as indicated below.
(A) Symmetrical Multivibrator-Square Wave Generator
RT
E o----V\/\,----oG (FIXED)
Vo ____JL__JL
,---<JG (VARIABLE)
Connecting the resistor between points E and G in the basic circuits gives a square
wave generator which has perf.ect symmetry. By the use of a 2 megohm potentiometer
the frequency may be varied continuously from 1 cps to 500 cps. The frequency is
f = l/2RTCr,
(B) One-Shot Multivibrator
Rr
c,o~--f\/V\, ........
-------oE (FIXED)
'--'----oE (VARIABLE)
The collector of Qi will be positive in the quiescent state. A positive pulse at the
base of Qi in Figure 13.18 or a negative pulse at the base of Q1 in Figure 13.19 will
trigger the circuit, At the end of the timing interval, the unijunction transistor will fire
and cause the circuit to revert to its quiescent state. This circuit has the advantage of a
fast recovery time so it may be operated at a high duty ratio without any loss of
accuracy.
200
UNIJUNCTION TRANSISTOR CIRCUITS
11~(RTI +R1) Cr
t2~lRTZ+R1l Cr
----nE (FIXED)
The timing capacitor Cr will be charged through the resistor RTl or RT2which is
connected to the positive collector. The diodes will isolate the other resistor from the
timing capacitor. The two parts of the period (t1, ta) can thus be set independently by
Rn and Rn and may differ by as much as 1000 to 1.
(D) Non-symmebical Multivibrator - Constant Frequency
:~:: ::-~: o E
201
FEEDBACK AND SERVO
AMPLIFIERS- TRANSISTOR
CHOPPERS
C G _ I ( GH \
- H i+GH
R =i+GH 1
€" R-B
B= HC
H Cc G~
FEEDBACK
OUTPUT
SERVO-TYPEFEEDBACKSYSTEM
Figure14.1
A convenient method for evaluating the external gain of an amplifier with feedback
is the single loop servo-type system as shown in Figure 14.1. (The internal feedback
of transistors can be neglected in most cases.) The forward loop gain of the amplifier
without feedback is given by G and it includes the loading effects of the feedback
network and the load. H is the feedback function, and is usually a passive network.
In using this technique, it is assumed that the error current or voltage does not affect
the magnitude of the feedback function. The closed loop gain is then
C
~ = 1 +GGH = H1 ( GH )
1 + GH
where C is the output function and R is the input. If GH is made much larger than
one, the closed loop response approaches 1/H and becomes independent of the ampli-
fier gain. Thus, GH determines the sensitivity of the closed loop gain to changes in
amplifier gain.
203
FEEDBACKAND SERVO AMPLIFIERS- TRANSISTORCHOPPERS
ZF
z, z,
Z1n=-1+GH i:::
(A) BLOCK DIAGRAM l+A 1 y ZL
Zon
Zo~----
1+ Ai Z 0 n
ZF
GH• AjYZL
y y' Zt+YZL
z
on IL
l RL Y=~
I
Zon
CONDITIONS'..!!,_« I·
z9 •
Z1
( B) SIMPLIFIED EQUIVALENT CIRCUIT --«GH+I
ZF
VOLTAGEFEEDBACKAMPLIFIER
Figure14.2
Figure 14.2 shows a voltage feedback amplifier where both the input and output
impedances are lowered. A simplified diagram of the amplifier is shown in 14.2(B),
which is useful in calculating the various gains and impedances. Z1 is the input im-
pedance of the first stage without feedback, and Zoais the output impedance of the last
stage without feedback. Ai is the short circuit current gain of the amplifier without
=
feedback (the current in the load branch with RL 0 for a unit current into the base
of the first transistor). Any external resistors, such as the collector resistor which are
not part of the load can be combined with Zoa• The gain and impedance equations
shown are made assuming that the error voltage (ibZi) is zero which is nearly correct
in most cases. If this assumption is not made, the loop gain of the amplifier can be
204
FEEDBACK AND SERVO AMPLIFIERS - TRANSISTOR CHOPPERS
derived by breaking the loop at y-y' and terminating the point y with Z1o<2> The loop
gain is then itlib1 with the generator voltage set equal to zero. Since the loop is a
numeric, the voltage and current loop gains are identical. The loop gain is then
A· ( Zt' ) ( Zsr ) (14a)
I Zt' + ZF + Zi' z. + z.
where
ZL, = Zt Zon
-z--z-
L + on
=z
t'Y, an
d
Zi' = z, Z1
z,+Z1
Notice that if Z1 > > Z1and ZF > > Z1,then the loop gain is very nearly equal to GH
as given in Figure 14.2.
The input impedance of the amplifier is reduced by 1 + GH, while the output im-
pedance is also decreased.
Figure 14.3shows a current amplifier where both the output and input impedances
are increased. The loop is obtained by breaking the circuit at y-y' and terminating
points y-a with Z1.The loop gain is i,/ib and is approximately equal to
-yAiZv (14b)
z,+z.
.,
RELATIONSHIPS
A1 yz 9
lg !L. z 9 +Z1
ig l+A1YZF
z1+z9
OL A1YZL
(A) BLOCK DIAGRAM o;• l+A1YZF
z1+z 9
z,n• z1\+A1[ ZF)
1
CURRENTFEEDBACK
AMPLIFIER
Figure 14.3
205
FEEDBACK AND SERVO AMPLIFIERS - TRANSISTOR CHOPPERS
-------------a Eee=45V
C1n
~.....0---
20µ.f
lin
22K
01 =02 =G.E. 2N335,4C30,
4C31,OR 2N336
.:-i~~FOR,!!!,_«I.
ljn Rf R4
Because the feedback remains a current, the input impedance of this circuit is quite
low; less than 100 ohms in most cases. This preamplifier will work well where current
addition of signals is desired and "cross-talk" is to be kept to a minimum.
206
FEEDBACK AND SERVO AMPLIFIERS- TRANSISTORCHOPPERS
conditions of maximum input. For designs which must operate in wide tempera-
ture environment, the bias currents and voltages (IE and VcE) of Q 1 and Q2
should be approximately equal to those used by the manufacturer for specifying
= =
the "h" parameters. (For the 2N335, IE1 IE2 1 ma and VcE 5 to 10 volts.) =
___ ....,. _____ .,_ ___ 0E1111
Figure14.5
2. For good bias stability, lt:1 R1 should be five to ten times VEn1,i.e., 3 to 5 volts;
thus, knowing lt:1, R1 can be found. Ir. should also be five to ten times larger
than Ia1.
3. R _ Ebb - V CF.I - lv.1Rt
(14e)
IE1+ la1
2
-
where
J = h-h:2 + Icuo2, I 01 = h-
IE1 + Icu01, (14f)
82
FE2 FEt
and where hFi-:1and hn2 are the typical D.C. current gains at the particular bias
conditions. Iceo is the collector-base leakage current at the temperature and
collector-base voltage being used.
4. R -
~-
IEt Rt +
Is
VF.BI
(14g)
1. It = Eun - Ra
l1-:2 (14j)
2 li-:2
8. (14k)
where G1 is the desired closed loop a.c. current gain. (The emitter by-pass
capacitors are selected to present essentially a short circuit impedance at the
lowest frequency of interest.)
207
FEEDBACK AND SERVO AMPLIFIBRS - TRANSISTOR CHOPPERS
Figure 14.6 shows a three stage, 400 cycle direct-coupled preamplifier with good
bias stability from -55 to 125°C. If the de conditions shown in the figure are met,
the collector voltage of Q3 is approximately
Vea= [(R1+Re+ R11)
~] (Ee - Vm) + (R1+Re+ R11)
Vu, (! 4 1)
CltR1Ra Rt
where Vu1 is the breakdown voltage of the first avalanche diode. The various ac gains
and impedances can be calculated from the equations of Figure 14.1 with the exception
that the ac feedback is now approximately
( ~·) ( !: ) (14m)
where I/Rt' =
1/Rt + 1/Roa + l/R1, and Roais the output impedance of Q3. This
assumes that the input impedance of Q 1 is much less than R, and Ro. The value of R,o
determines the closed loop gain, while the values of C.1, C.2, ft., and Ro are used to
bring the magnitude of the loop gain to unity before the phase shift reaches 180°. The
values required for these capacitors and resistors are dependent upon the maximum
expected loop gain.
Eeo•45V
~-----~
.
1,•
Oz
16V
01 •Oz• 0 3 • GE 2N335, 4C 30
Re
WHERE :R1IR9+R9I
Al2 Al3 • .!..£!..
WITHOUT FEEOBACK
Ioz
Rx• R1 + Re+ Rg Icoa • MAXIMUM IcoOF 01
V131• BREAKDOWN VOLTAGE OF 01
Bz• h FE2
I( 1 • h FOi
208
FEEDBACK AND SERVO AMPLIFIERS - TRANSISTOR CHOPPERS
However, since the output impedance of the transistor can be quite large, the phase
shift can be large if the transformer shunt inductance is small, or if the load resistance
is large as shown in Figure 14.7. The inductance of most small transformers decreases
very rapidly if a de current flows in the transformer. Therefore in transformer coupling,
the phase shift of the carrier is reduced to a minimum if the de current through the
coupling transformer is zero, or feedback is used to lower the output impedance of
the driver.
I ---. I r,s , T
IL, a <l'.S+I•y.1.0
I IL' I I
! IILp "''! Ta
I
_L_
yRt
Ro
I - - I ya Ro+Rt
L!~~F~M.!~ S "LAPLACE
8 REFLECTED TRANSFORM.
LOAD
Lp• PRIMARYSHUNT L
I\:•LOADREFLECTED
TO PRIMARY
Figure 14.8 shows a modified ..long tail pair" driver. In this case QI and Q2
operate Class A, and the quiescent collector current of QI and Q2 cancel magnetically in
the transformer. Transistor Ql operates grounded emitter, while Q2 operates grounded
base. Separate emitter resistors R1 and Ri are used rather than a common emitter re-
sistor in order to improve the bias stability. The collector current of QI is approximately
hr.1 ibt, while the emitter current of Q2 is (hra1+ I) ib1,Since Q2 operates grounded
base, the collector current of Q2 is -hrb2/(hro1 + I) ib1or -hro ib1if the current gain
of QI and Q2 are equal. Thus push-pull operation is obtained.
C3 • TRANSFORMER
TUNNING CAPACITOR
01 • 02 a G. E. i:~i~
2N2108
209
FEEDBACK AND SERVO AMPLIFIERS - TRANSISTOR CHOPPERS
"STABLE"400 CYCLEDRIVER
Figure14.9
In order to stabilize the driver gain for variations in temperature and interchange-
ability of transistors, another transistor can be added to form a stage pair with Q 1 as
shown in Figure 14.9. The gain of the driver is then very stable and is given approxi-
mately by
(14n)
OUTPUT STAGE
The output stages for servo amplifiers can be grounded emitter, grounded collector
or grounded base. Output transformers are generally not required because most servo
motors can be supplied with split control phase windings. Feedback of the motor con-
trol phase voltage to the driver or preamplifier is very difficult if transformer coupling
is used between the driver and output stages. If a high loop gain is desired, the motor
and transformer phase shifts make stabilization of the amplifier very difficult. One
technique which can be used to stabilize the output stage gain is to use a grounded
emitter configuration where small resistors are added in series with the emitter
and the feedback is derived from these resistors. The motor time constants are thus
eliminated and stabilization of the amplifier becomes more practical.
A second technique which results in a stable output stage gain and does not require
matched transistor characteristics is the emitter follower (common collector) push-pull
amplifier as shown in Figure 14.10. Also it offers the advantage of a low impedance
drive to the motor. A forward bias voltage of about 1.4 volts is developed across DI
and D2, and this bias on the output transistors gives approximately 20 ma of no signal
current. At lower levels of current the cross-over distortion increases and the current
gain of the 2N2202 decreases. D3 and D4 protect the 2N656A's from the inductive
load generated voltages that exceed the emitter-base breakdown. The efficiency of this
circuit exceeds 60% with a filtered DC voltage supply and can be increased further
210
FEEDBACK AND SERVO AMPLIFIERS - TRANSISTOR CHOPPERS
where PL is the dissipation due to leakage current during the half-cycle when the
transistor is turned off, a is the fraction of maximum signal present and varies from
0 to 1, R. is the saturation resistance, RL is the load resistance, and Ec11: is the peak
value of the unfiltered collector supply voltage. If PL is negligible and R./RL 1,<<
then maximum dissipation occurs at a =
1/2 or when the signal is at 50% of its maxi-
mum. Thus for amplifiers which are used for position servos, the signal under steady-
state conditions is either zero or maximum which are the points of least dissipation.
211
FEEDBACK AND SERVO AMPLIFIERS - TRANSISTOR CHOPPERS
CONTROL
PHASE
TO
DRIVER
TRANSISTORS Np
2
0
MOTOR
01•O2•GE ,~~203
D1 •GE IN676
Np
-» I
OR RI
1_M/\/\
Ee
0
[1LINE
N5
C IS ADJUSTED FOR MAXIMUM
STALLED TORQUE
+
WEeM
Ee T
GROUNDED
BASESERVOOUTPUT
STAGE
Figure 14.11
The peak current which each transistor must supply in Figure 14.11 is given by
. 2W
lm=-- (14p)
EcH
where Wis the required control phase power. The transistor dissipation can then be
written in terms of the control phase power
(14q)
~(~)
Cl NP1
(14r)
212
I
PREAMPLIFIER DRIVER OUTPUT
~
+GOV
0 i
~
fl
SIK =--::
~
t:,
Cl)
tz1
TO
+sov PEAK ~
UNFILTERED 0
FULL WAVE
RECTIFIED400 CYCLES ~
INPUT <>-i ~
----•
6µ.f
TO -SOV PEAK
UNFILTERED FULL
WAVE 400v
a
~
I
T1, -12.5:1 STEP DOWN(TURNS RATIO}
01, - GEIN676
;
-
w
w
3 WATT 400 CYCLE SERVO AMPLIFIER FOR -55 TO 125°C OPERATION
Figure14.12
gJ
Cl)
FEEDBACK AND SERVO AMPLIFIERS - TRANSISTOR CHOPPERS
~~Wc'ls C
i-,
+ A.C.SWITCHING
VOLTAGE
l
.lR
to
+
~
IA)
REFERENCE+
A.C.OT\.
.vvA
+1-----
Es 0----------------- Es0-----------------
eR +~.r:::Lel_. -1-----
'R~LJD"
O:"S____r:::,_ __ l
-,121=:.:r---c:::r
WAVEFORMSFOR WAVE FORMSFOR
SWITCHIN POSITION
I SWITCHIN POSITION
2
IBI CCI
HALF-WAVECHOPPER
Figure 14.13
Figure 14.14 shows a single transistor replacing the mechanical chopper. When the
base voltage is made positive with respect to the collector (NPN transistor), the tran-
sistor behaves as a closed switch, and the d.c. input voltage is connected to R. During
the half cycle of the reference voltage when the base is made negative with the supply,
the transistor behaves as an open switch, and the voltage across R is zero. However,
the transistor is not a pedect switch, and an error voltage and current are respectively
superimposed on the d.c. source. During the half cycle that the switch is closed, the
error voltage introduced by the transistor is
VEc = .026 ln ciN + Is Re' {14s)
where ciN is the normal alpha as defined in Chapter 5, and Re' is the collector bulk or
214
-~
FEEDBACK AND SERVO AMPLIFIERS - TRANSISTOR CHOPPERS
o.c.
11s-7
T
R
IOK._____.i
A.C,
REFERENCE
0 1=G,E, 2N2193
OR 2N2195
Ee= 5 VOLTS PEAK
SINE OR SQUARE
WAVE.
body resistance. The error current which is introduced when the transistor is an open
switch is
I Pl= lcso e&1 (1 - e&s) (14t)
C&N (1- C&s e&1)
where ci, is the inverse alpha and lcso the leakage current as defined in Chapter 5.
The error voltage introduced by the transistor during the "on" half cycle can be
minimized by using two transistors whose offset voltages cancel one another as shown
in Figure 14.15. The transistors must not only be matched at room temperature but
must track over the required ambient temperature extremes. This is no problem with
the G-E 2N2356 planar epitaxial transistor where two transistor pellets are both
mounted in the same TO-5 package. Initial offset voltage matches of 50 microvolts or
less, and drifts of less than ±100 microvolts over an ambient of -55 to 125°C are
easily obtainable. For the G-E 2N2356A the maximum offset between -55°C and
125°C is 50µv. For many applications the drift due to leakage current can be eliminated
by using diode D1 and resistor RAto prevent the collector-base junctions from being
reverse biased. This will eliminate any leakage current due to the base drive from
Howing in the load. As will be shown below, the emitter-collector impedance will still
be quite high.
II~ REF~ENCE
NOTE:
I. QIA QIB -GE 2N2356 OR 2N2356A (TWO MATCHED TRANSISTORS
IN ONE TO-5 PACKAGE)
2. ELECTROSTATIC SHIELDING BETWEEN PRIMARY AND SECONDARY
WINDINGS OF TRANSFORMER T MAY BE REQUIRED.
3. RealOK, Ee 11 IO VOLT PEAK (SINE OR SQUARE WAVE).
215
FEEDBACK AND SERVO AMPLIFIERS - TRANSISTOR CHOPPERS
..
Oz R
NOTES:
I.R 8 •10K
2,Ea • 7.5V PEAK SINE OR SOUAREWAVE FOR
2N2193, 2N2194 OR 2N23!16.
3.E8 •l.5V PEAK SQUARE WAVE FOR 2Nl279
SERIES-SHUNTCHOPPER
Figure14.16
A chopper configuration 14• 5> which can be used to advantage for a low source
impedance input is shown in Figure 14.16. During the half cycle when Q1 is "on," Q2
is turned "off' because its collector-base junction is reverse biased, and R is tied to the
d.c. input. On the next half cycle when Qi is turned "off," Q, is turned "on," shorting R.
The leakage current due to Qi does not How through R during this half cycle since Q,
essentially short circuits R. During the alternate half cycle when Q2 is turned "off," its
0
leakage current will flow primarily through Q. (its turned "on° and the input circuit )
if R is made much larger than the source impedance. Thus, the drift due to leakage
current is minimized. In addition, the offset voltages of the two transistors effectively
cancel, even though they occur on separate half cycles. The reason for this is that they
form a d.c. voltage which is not chopped and which is not passed by the capacitor, C.
An advantage this circuit has over the chopper circuits discussed above is that it is less
sensitive to noise pickup because the load always looks back into a low impedance.
Figure 14.17 shows a transistor chopper used for high source impedance applica-
tions or those where the d.c. input cannot be loaded. Although R. is shown as part of
the chopper circuit, it can be the d.c. source impedance.
11],.f RL to
2K
NOTES:
I. R5 CAN BE SOURCE IMPEDANCE OF 50K TO SEVERAL MEGOHMS.
2. Ee •10 VOLT PEAK SINE WAVE FOR GE 2N2195, R9•IOK
3. Ee •IOVOLT PEAK SQUARE WAVE FOR GE 2Nl279, Re•IOOK
4. 0 1 •GE 2N2195 OR 2N1279
216
FEEDBACK AND SERVO AMPLIFIERS - TRANSISTOR CHOPPERS
Operation of this chopper is basically one of shorting node A to ground each half
cycle when the base of the transistor is made positive with respect to ground (the
collector). A zeroing adjustment for removing the transistor•s offset voltage is pro-
vided by Di, Rz. and Rawhich causes a current to flow during the half cycle from
collector to emitter [see equation (5g) in Chapter 5]. In some applications where the
2N2195 is used. the offset voltage is small enough (less than a millivolt) so that the
balance network can be eliminated.
On the half cycle of the supply which would normally reverse bias the collector-
base junction of Q, the diode D1 prevents this from occurring. The collector-base poten-
tial is then zero; however, Chaplin and Owens<0 > have shown that the emitter-collector
impedance is given by
rEc =0Icao
-026 (1 + a.~da.,- 2 a.s) (14u)
Thus the dynamic impedance is approximately 26 mv. divided by the Iceo. For silicon
transistors (even at high temperatures) this impedance can be made larger than the
load impedance so that the current at node A due to the input d.c. voltage flows into
the load during this half cycle. The maximum value of the load is then determined by
the minimum value of ro obtained from equation (14u). Also, any drifts which normally
would have been caused by the transistor leakage currents have been eliminated.
For the condition that rEc> >R,,, the peak to peak load current is given by
I _ 2 Eo.c. (14v)
p-p - R.+ 2 RL
The equivalent input current drift due to drift in transistor offset voltage (.iV) is
shown to be
Io =~v
R. for R, > > RL (14w)
A second component of the chopper drift is due to transient current spikes which
occur when the transistor switches "on.. and "off... The net area (charge) of the tran-
sients develops a potential on the capacitor C which, to the circuit, appears as an input
signal. In order to zero the output, a d.c. input current (integrated over one-half cycle)
must be provided.
Temperature drift tests made using 2N2195•s and 2Nl279•s show that with the
entire chopper of Figure 14.17 exposed to temperature, the required d.c. input neces-
sary to zero the output is less than 10-s amperes from -55 to 125°C. This is equivalent
to 1 mv of drift referred to the input for R. = 100 K.
REFERENCES
m Hurley. Richard B.• "Designing Transistor Circuits - Negative Feedback for Transistor Amplifiers:•
Electronic Equipment Engineering, Feb. 1958.
<2 > Hellerman, H., "Some Stability Considerations in the Design of Large Feedback Junction Transistor
Amplifiers.'' Conference Paper #CPSB-87, presented at the 1958 AIEE Winter General Meeting.
<3 > Blecher. F.H., "Transistor Circuits for Analog and Digital Systems," Bell System Technical Journal,
Vol. 35, March, 1956.
m Kruper, A., "Switching Transistors used as a Substitute for Mechanical Low Level Choppers.''
AIEE Transactions, Vol. 74, pt. I. March, 1955.
<5 > Giorgis, J .• and Thompson, C.C •• "Silicon Transistor Performance in a Chopper Application, ..
Applications and Industry, #37, July 1958.
<0> Chaplin, G.B., and Owens, A.R., "Some Transistor Input Sta~es for High-Gain D.C. Amplifiers,"
The Proceeding, of the I.E.E., Vol. 105, pt. B, No. 21, May, 1958.
217
TRANSISTORMEASUREMENTS
INTRODUCTION
Accurate measurements demand a thorough knowledge of measurement principles
and pitfalls. To simplify these measurements, such that they are non-discretionary
go-no go types, requires in addition, prior information about the device characteristics
and their probable distribution. Transistor measurements in particular, due to the
extreme power sensitivity of signal transistors and the active amplifier nature of the
device, impose great demands on the skill and ingenuity of the test-equipment
designer.
To obtain precision and accuracy in transistor measurements, not only must the
definition, meaning, and limits of each test be considered ( as well as the actual meas-
urement methods), but attention must also be given to the effect of the measurement
upon the device. To illustrate: the transistor is a non-linear device and under normal
D.C. bias conditions the Emitter-Base voltage drop in a Germanium transistor is about
250 millivolts. If linear (small-signal) measurements are to be made, it becomes
obvious that the rapid curvature of the forward-biased diode characteristic precludes
the usual "one order of magnitude less" argument normally applied to signal/bias
relationships for small-signal measurements and demands even smaller peak-to-peak
signal excursions.
In addition, the transistor is a current amplifier and the effect of the input signal
on the output current must be considered. Thus, prior knowledge of probable input
impedance and device current gain becomes necessary. For example, assuming an
ideal transistor at low frequency and neglecting parasitics, in measuring h,.
h •• = ~bl
lb
and h,. =~, lb
e.,=0 e.,=0
then,
eb
-h an d.1.,
••
= h r. .
lb
from the theory (see any basic transistor text) h,. = (1 ~ ao) ~ hr .. r.,
, h h .
( smce re = (l _ao ao) ) so t at 1., = reb• ;
a lso, r. = qL~
kT (see any b as1c
· transJStor
· text) wh ere k = Bo1tzmann 's Const an,t
kT
q = 26. X 10-a volts at room temperature; and, assuming
le = It: ( within 10% )
26 X 10-a
r., = le
i" is very much less than le, (say i.. = .1 le) for small signal measurements.
219
TRANSISTORMEASUREMENTS
Then,
or,
1
26
e; :
0
-a =0.1 le whence eb ;a 26 x 10~
so that the maximum signal swing, eh, should be in the order of 2.5 millivolts and is
largely independent of gain or collector current.
However, when the transistor is driven from a current source it is seen that since
Here a knowledge of the probable range of hr. expected is quite important. Thus,
depending upon whether a current source or a voltage source is used in small signal
measurements, care must be exercised to insure that small signal conditions truly exist.
REVERSEDIODE CHARACTERISTICS
General
Ieo or ho are the leakage currents within the safe operating region of reverse
voltage and are intended to yield comparative, evaluative information as to permissible
operation, surface condition and temperature effects on operation.
The breakdown voltage tests are indicative of the maximum voltage that can be
applied to the device and serve to indicate the voltage at which "avalanche-breakdown"
and "thermal-runaway" take place.
The curves of Figures 15.1 and 15.2 are arbitrary but representative ones for tran-
sistors and are included to explain what some of the reverse diode characteristic tests
mean, and the points at which they are taken. In Figure 15.1, the collector to base
reverse voltage of a transistor versus the leakage current is displayed; the points of
interest are point A, the leakage current ( leso in this case) at a specified collector to
base junction voltage, and point B, the breakdown voltage ( BVeso in this case ) at a
specified leakage current. Figure 15.2 illustrates some points which must be considered
when accurate breakdown voltage measurements are desired. The two transistors
shown have different reverse voltage characteristics. The load line of the measuring
instrument which is to approximate a constant current source may give slightly or
grossly erroneous readings if care is not exercised in measurement technique. The true
values of breakdown voltage are shown at points A. The slightly erroneous readings
are at points B on the two characteristic curves while the grossly erroneous data is at
points C.
220
TRANSISTOR MEASUREMENTS
( EMITTER OPEN)
DESIREDBREAKDOWN
@ VOLTAGEINFORMATION
REPRESENTATIVECOLLECTOR-BASE
JUNCTION REVERSECHARACTERISTICS
Figure 15.1
BVceo CHARACTERISTICS
Iceo
BVcno MEASUREMENTTECHNIQUES
Figure 15.2
D. C. TESTS
The following abstracts include the definitions of particular tests and the associated
simplified circuits. The current measuring ( lcso, l•:110,etc. ) circuits are discussed in
more detail in the next section.
221
TRANSISTORMEASUREMENTS
1. Icao, commonly called Ico, is the de collector current which Bows when a speci-
fied voltage, Vcao, is applied from collector to base, the emitter being left open
(unconnected). The polarity of the applied voltage is such that the collector-
base junction is biased in a reversedirection. (Collector is negative with respect
to the base for a PNP transistor.)
lcao MEASUREMENT
Figure15.3
IEBO MEASUREMENT
Figure15.4
3. lcEo is the de collector current which flows when a specified voltage is applied
from collector to emitter, the base being left open (unconnected). The polarity
of the applied voltage is such that the collector-base junction is biased in a
reverse direction. (Collector is negative with respect to the emitter for a PNP
transistor.) lcEo is greatly dependent on temperature and the operator should
use gloves when handling transistor before measuring.
lcEo MEASUREMENT
Figure15.5
222
TRANSISTORMEASUREMENTS
4. lcEs is the de collector current which Hows when a specified voltage is applied
from collector to emitter, the base being shorted to the emitter. The polarity
of the applied voltage is such that the collector-base junction is biased in a
reverse direction. (Collector is negative with respect to the emitter for a PNP
transistor.)
lcF.s MEASUREMENT
Figure15.6
5. hes is the de emitter current which Hows when a specified voltage is applied
from emitter to collector, the base being shorted to the collector. The polarity
of the applied voltage is such that the emitter-base junction is biased in a
reverse direction. (Emitter is negative with respect to the collector for a PNP
transistor.)
h:c11MEASUREMENT
Figure15.7
6. BVcETests-BVc1m, BVcER,BVcEs,BVcEv
A BVcE test is a measurement of the breakdown voltage of a transistor in
the common emitter configuration. For the measurement to be meaningful, a
collector current must be specified.
Figure15.8
223
TRANSISTORMEASUREMENTS
j ~Ic-~vc•
_____
___________
r
..,_
,----
J:
IL-
l _
-- --- ----,
----
CONSTANT-CURRENT:
GENERATOR
________
I
I
__,
BVcso MEASUREMENT
Figure15.9
224
TRANSISTORMEASUREMENTS
8. VaT (reach through). Reach through voltage is that voltage which, when ap-
plied from the collector to base, causes the collector space charge layer to
expand into the emitter junction.
In Figure 15.10, if, when switch .,S" is closed, le does not increase, the
punch through voltage is greater than Vcc. Punch through may also be meas-
ured by the use of the circuit shown in Figure 15.11.
VTVM
INPUT
R >10 MEG VTVM
If Vt:a is less than 1 volt, then VaT > (Vee -1) volts.
The above VaT tests are go-no go in character. By making Vee variable
actual values may be determined; for example, in the circuit shown in Figure
15.12 one can adjust Vee until the VTVM reads 1.0 volt, then VaT equals
Vcs -1 volts.
+
VTVM
VaT MEASUREMENT
Figure 15.12
225
TRANSISTORMEASUREMENTS
CURRENT
MEASUREMENTS
I. General
In this section the elaboration of the basic circuit into actual test equipment
(both qualitative and quantitative) is delineated. The necessity of saving time
in measurement is considered of importance; and means that constant voltage
and constant current techniques will be used. (Constant within the accuracy
requirements desired.)
Certain problems arise concommitant with constancy. A voltage source, by
definition, makes it difficult to limit the current through the ammeter in the
event of device failure; and current sources have large open-circuit voltages prior
to test, which can be damaging to the operator; and, due to circuit capacity, if
the device has an extremely short thermal time constant, the unit under test
may be damaged from the large instantaneous currents that can flow.
For the above reasons voltage and current "clamps .. are resorted to in
order to have the required constancy and are discussed, with their limitations,
in conjunction with each class of test.
2. Clamp Circuits
In the circuits shown in Figures 15.13 through 15.16, the measurement of
lcso is accomplished. In Figure 15.13, the basic form of the circuit is shown.
There is some error in this simple arrangement in establishing the test voltage
conditions since there is a small voltage drop across the meter. Also, if a unit
is shorted or has an excessively high leakage current, the microammeter may
be damaged. For meter protection the circuit of Figure 15.14 is used. The
diode used here is a large area diode which has a reverse leakage current
greater than that which is intended to be measured. If a 1N91 is used the
maximum leakage current which could be measured would be approximately
10 µa since this is the maximum reverse current which the 1N91 will conduct
when a small reverse voltage is impressed across it. To avoid this current
limitation and still protect the microammeter the circuit shown in Figure 15.15
is used. This circuit is basically a form of bridge so that if the drop through
the limiting resistor is not enough to bring the reference point (the collector)
below the clamp voltage, current flows through the diode and the voltage
at the reference is that of the clamp supply less the forward drop in the diode.
226
TRANSISTORMEASUREMENTS
When the drop through the limiting resistor exceeds the allowed value, the
current through the diode tries to reverse; thereupon, the diode becomes
back biased and the reference point is driven by a current source, where
Jlimit= Vprote.-tloll
Rrefer,mo
( h' h lS• cons1'der ed a fau }t con d"1tlon,
W IC
• but meter protection
•
VTEST-
OR
CLAMP
SUPPLY I
- CLAMP
VOLTAGE
R
COMPLETE lcso GO-NOGO lcuo
TEST CIRCUIT TEST CIRCUIT
Figure 15.15 Figure 15.16
227
TRANSISTOR MEASUREMENTS
LARGE-SIGNAL(DC) TRANSISTORCHARACTERISTICS
The large-signal transistor characteristics may be divided into two categories with
the line of demarcation being the difference between high-frequency pulse response
and the DC parameters useful in control-circuit and some computer applications. The
pulse response characteristics are discussed in a later section.
In the following curves Figures 15.17 and 15.18, the significant points of interest
are described on the transistor family of curves where le vs. VCE is plotted for various
Is values.
RANGE
EXPANDED
TO ILLUSTRATE
POINTS
SPEC. Ic
l VARIOUS
VALUES OF
Ia
VcE (SAT)
SPEC Ic
VcE
IctMAXl
le (MAX) STEADY STATE IS AT
POINT OF INTERCEPT OF
VcE(SAnKNEES AND ALLOWED
DISSIPATION CURVE.
le cuAX> STEADYSTATE
Figure 15.18
228
TRANSISTORMEASUREMENTS
Vee
hFE MEASUREMENT
Figure15.19
The collector voltage, VcE, and the collector current, le, must be specified. A
Go-No Go test for hFF:may be used, as shown in Figure 15.20.
,--
1
____ _____
_. I_c_-ir--...,- --- - - -7
I
I I
I I
I CONSTANT CONSTANT
CURRENT
I
CURRENT ~
I GENERATOR ~ GENERATOR I
I I
I I
I I
L-------.J L-------- _J
GO-NOGO hFE CIRCUIT
Figure15.20
In the method shown in Figure 15.20, Ia is adjusted to give the base current
required for an hn of the required value, le is adjusted to the specified value:
le
Is=-
hn
If VCE as read on the meter is less than that given in the test specifications,
then the hFE for the transistor is greater than that required. If VCEis greater
than the value specified, then h.,.Eis less than the required value.
2. VcE <BAT>is the voltage from collector to the emitter, VcE, for a given le and Is
while biased in the collector saturation region. The test is very similar to that
for hrE in Figure 15.20. le and Ia are adjusted to their specified values and VcE
as read on the meter connected from collector to emitter is VcE <sAT>·
229
TRANSISTORMEASUREMENTS
II~POWER L,~
\ VARIOUS
\ \ I '
\\ '
' '- NOTE: DRIVING POWER IN THE
'- '' (C) MW BASE MAY NEED TO BE
, SUBTRACTED FROM MAXIMUM
/ , .__(B) MW ALLOWED POWER (DEPENDING
....._ ON PERCENTAGE OF TOTAL)
/ ......_
(A) MW IN ORDER TO PLOT POWER
/ \ .I MAX "STEADY STATE" CURVES AT LEFT.
/ C
le aux CHARACTERISTICS
Figure15.21
130
TRANSISTORMEASUREMENTS
l
VTVM
(NULL) IN hFE (HELIPOTI
,___---4 J' DETECTOR
R3>>R2
01FFERENTIAL R1 MAYBE SOME MULTIPLE
MILLIVOLTMETER LOW
CURRENT AND SENSITIVE OF R2 AND ACT AS
MULTl PLIER OF hFE
READ ON R3
231
TRANSISTOR MEASUREMENTS
:Cc=SPECIFIED
CONSTANT
CLASSIFIES hFE BY
VCE INDICATION
hv1: CLASSIFIER
Figure 15.23
3. The VcE <11AT> measurement, Figure 15.24, is often made by applying a speci-
fied le to the transistor and increasing Ia until an abrupt change in VcE indi-
cates that the collector voltage has dropped below the knee of the collector
curve; however, in specifications both le and In are specified. In is usually
sufficient to saturate the device; and, in Go-No Go testing, noting that VcE is
below some specified voltage, or that it is within certain specified limits is
normal procedure. The latter being of particular importance in computer
applications where maximum and minimum VcE <RAT> values are relied upon.
Two circuits in which measurements can be performed are shown in
Figure 15.24.
ONEORMORE
I.e's MAYBE
SPECIFIED
IN91'S
FOR METER PROTECTION t
20µ.A
CENTER-ZERO
METER
Ve-.:<SAT> MEASUREMENT
Figure 15.24
232
TRANSISTORMEASUREMENTS
JUNCTION TEMPERATUREMEASUREMENTS
THERMAL IMPEDANCE
Once a means of measuring T, has been developed, the measurement of thermal
impedance is readily accomplished. The simplest means of measuring the case tem-
perature - such as a thermocouple or large heat sink - may be used, and different
powers are fed into the transistor while measuring T,. By defining thermal resistance as
the input power required to raise TJ to some arbitrary temperature, (say 70°C) and
233
TRANSISTORMEASUREMENTS
measuring this power at different ambients, sink or case temperatures, we may write
the following definition:
if X watts= 70°C T1 from 25°C T.1nk
and y watts= 70°C T1 from 45°C T.1nk
Then,
45° - 25° 20 oc
Rt hum a I = x-ywa tt s -x-y per watt
we can draw a derating curve through these intercepts as shown in Figure 15.25
I?
01?
lox
11!'"
------- I
POWDI / T[lll'[UIVII[
~•-- : llERATING CU11V1:
~ y !
o:
- - - - - -:-
I
- - - - I
I
151.0Pf • Kl
l
_
I
I
I
I
POWERVS. TEMPERATUREDERATINGCURVE
Figure15.25
----==-=----~,-,,....------<le,..a:1"'\
R4 I 2 \~../ 3
3
,R3 0 '14N.O. *E I
SCOPE
_
IN495 I
I
R6
IOK,l/2W
I II
.
IE SUPP2LY
~
1""
I I
7 !1
W.E.2758 [lrK_2
__________ R_2
___ KI.....,, W.E.2758
8 3K,5W,WW 8
CRI IS USED TO
R5 ,.__...,__, SUPPRESS OSCILLATIONS
IIOV 601'\J 15K,5W,WW.
CR2
IN93
R3
2K,5W,W.W.
234
TRANSISTORMEASUREMENTS
T_I I I I
t 1 - K2
12 -Kl
13 -KI
CLOSES
OPENS
CLOSES
t4-K2 OPENS
OSCILLOSCOPE
PATTERN
Figure15.27
235
TRANSISTORMEASUREMENTS
236
TRANSISTORMEASUREMENTS
then eJA _
149-24
834
= 0
.149 C/mw
4. Procedure for Determining Thermal Resistance from Junction to Sink
The thermal resistance from junction to sink is a useful parameter for com-
puting operating junction temperature of a sink mounted transistor from the
input power and sink temperature. Junction to sink thermal resistance can be
calculated using the same procedure as used for eJA with the exception that
sink temperature is now used instead of ambient temperature. The heat sink
will be more efficient if it is placed in contact with the surface on which the
pellet is mounted. For instance, units which have the pellet mounted on the
header (such as the 2N657) should have the heat sink placed in contact with
the header, giving an excellent thermal path. The contact between the sink
and the transistor header could be achieved by holding the unit tightly against
a 2" x 2" x % " piece of copper by a steel washer clamped down on the tran-
sistor flange. Holes are only large enough so that the insulated transistor
leads can pass through. Silicone grease is spread over all contact surfaces to
provide a better thermal path between the transistor header and the copper.
The sink temperature can now be measured by placing the thermocouple
between the bottom of the copper £in and the nut as indicated in Figure 15.28
TRANSISTOR
THERMOCOUPLE
THERMOCOUPLE
PLACEMENT
Figure 15.28
237
TRANSISTORMEASUREMENTS
measurement show where errors may be introduced and indicate what conditions must
be established for measurements to be of desired accuracy.
COMMON BASE CONFIGURATION
8 9 +&noise
VTVM
t----ozv
o
Vee
t
CURRENT
SOURCE
l h1b MEASUREMENT
Figure 15.29
238
TRANSISTOR MEASUREMENTS
hrb = e,~
z, SHIELD
rJWv,,
____ fr',...''.____,
.._'+.. __ __, l Zo
C ,,.(
l_z. l
.........
* l\~:·:::r~R
r ,I T
rl
-½ ~ Rz I
lE L _j
CURRENT
SOURCE
v••
hrb MEASUREMENT
*
Figure15.30
JUMPER FOR
CALIBRATION
OF hp, • 1.0
,----7
I / I
1 f
IE
CURRENT
SOURCE
hrb MEASUREMENT
Figure15.31
239
TRANSISTOR MEASUREMENTS
. V-i
12=RL
For the desired accuracy use the same considerations as for h1b and,
wC>>Rl >> I,
hob MAX
(RL is normally less than or equal to 1000 average)
zgZ,' ~ (DPA)- 1 R
zg+ z.,:'- L
i, <<Ic
4• h ob(h22b
) h ob =-egi" ;. Ir ~
e.. smce
-R
L
. . . 11
le IS sma .
SHIELD
6
---------, 89
~+-J- VTVM
hob MEASUREMENT
Figure15.32
For the desired accuracy use the same considerations as for hrb and,
e, hob llJN RL > >enohe
z.>> -h 1 ~ (DPA)- 1 RL
ob MIN
240
TRANSISTOR MEASUREMENTS
h,e MEASUREMENT
Figure 15.33
Coils used are high Q toroids in which D.C. saturation must be considered
when certain bias conditions are used.
For the desired accuracy,
iir<<-hro1-"- MAX
IaR1 <<V.,"
Z.,ZpZ, > (DPA)-i h 1
Zvz, + Zvz, + zpz, = " MAX
l <<re at specified IE
"'
C1
where re~ klT ~ 26 n at IE= 1 ma (see Introduction this chapter)
Q E
wC1>>
hoe
enol •e <<h,. MIN ia
The press-to-read switch is incorporated to prevent charging C1 to VE
when no transistor is in the socket. Otherwise, the discharge of the capacitor
may destroy a unit as it is inserted into the socket for test.
2.
z,
9
I
-=-
PUSH TO
READ
Vee
-!-
hre MEASUREMENT
Figure 15.34
241
TRANSISTOR MEASUREMENTS
3. h (h )
fe :t•
h
re = ici:z; • =Rte2
b
~02+0 .....
RL Zv ~-VTVM
~~
h,., MEASUREMENT
Figure15.35
For the desired accuracy, use the same considerations as for h,. and,
C1101u <<ic Rt
1
Rt<<-h--, oe MAX
RL is generally about 50 0
_,9
r-
1
I L
I
Zp •OwL
I
I
: R1
IL __
hoe MEASUREMENT
Figure15.36
242
TRANSISTOR MEASUREMENTS
COMMON COLLECTORCONFIGURATION
Common Collector Parameters may be calculated from measurements of common
base and common emitter. Notice that the two parameters not identical to those in
common emitter configuration are in one case almost equal to h,. and in the other
almost equal to 1.
1. h,.,=h,.
2. h,., (hurr}
- PRESS-TO-READ
h.. MEASUREMENT
Figure15.37
Driving conditions are the same as for h ••; however, ee < <V Ee, also
h •• ~ 1.0 and deviations from unity are difficult to measure.
i2 • e,
3. h ,.,=-:-;12=R-
1, L
Vee
SIGNAL
GENERATOR -i
VTVM
~+Ono111
Zp•QwL
hr.. MEASUREMENT
Figure15.38
243
TRANSISTOR MEASUREMENTS
zpDriving
~
considerations are the same as for hr. if RL
(DPA)- (R. + RL)
hrc hro
1
~
is kept small; otherwise,
1
hrc =1+ htb
4. hoc= hoo
GENERAL
Some of the parameters mentioned are particularly difficult to measure, the
terminal requirements difficult to obtain, or particularly sensitive to temperature.
When measuring hrb it is found that as this parameter approaches unity, the difference
is increasingly hard to detect. Instead, hre could be measured and hrb calculated; or an
attempt to measure 1 + hrb could be made instead. A circuit for measuring 1 + hrb
is shown in Figure 15.39.
i1 • e2
1 + h fb =--:-, 11 =RL
lr
CALIBRATE lthJb = 1.0
WITH JUMPER
Vee
SIGNAL r-, ~
GENERATOR::r
r ! e 2 +enolu
VTVM
+ hrb MEASUREMENT
l
Figure15.39
zp (DPA)- RL
~ 1
244
TRANSISTORMEASUREMENTS
up to 1000, one would have to insert a base signal current of 10-7 amps; and calibrating
by inserting this signal into the 500 resistor, it develops that only 5µ.v of signal are
available and the permissible noise background is less than 0.5 µ.v.
To illustrate a method whereby most of these difficulties may be eliminated by a
different technique of measuring, the circuit of Figure 15.40 is considered.
STEP
TENTHS
ALTERNATEhro MEASUREMENT
Figure15.40
In this instance a constant signal voltage (say lOV) and a Unit of resistance are
used that will limit the signal current to that permissible in the collector circuit. At
500 and 0.1 ma a reference signal of 5 MV exists, which is readily measurable. The
Unit of resistance is 100 K. Now units of resistance are inserted in the base circuit (AC)
until the collector current returns to the Reference level. The number and fractions
thereof of Units of resistance will read h,. directly; and the result is that a calibrated
decade resistance box is used to read hro. At 1 KC accuracy is not limited by the
resistors, but rather by the ½ to 1 % resetability of the VTVM pointer. By using a
selective VTVM with an expanded scale, such as the Hewlett-Packard 415B,
(V.S.W.R. indicator) resetability and accuracy can be improved to better than 0.2%.
The limitation now is the accuracy with which the temperature of the unit under test
can be maintained since h,o is temperature sensitive.
245
TRANSISTOR MEASUREMENTS
246
TRANSISTORMEASUREMENTS
2. 1 to 100 mes:
At higher frequency the small signal terminal requirements of h param-
eters (viz. Open and Short circuits) are progressively more difficult to obtain.
In general, the input impedances are lower due to decreasing current gain
and shunt reactance effects. The requirements of low driving signal voltage
and the detector sensitivity demanded are even more stringent.
The Wayne-Kerr Model 701B Admittance Meter is used with a Halli-
crafter SX-62A receiver as the null detector. Mathematical conversion from
the parallel admittances to the required series R. ± jX. will be necessary. The
generator used here is a Measurements Corp. Model 80 with a 2 me to 420 me
frequency range. Since the Wayne-Kerr Model 701-B bridge has a 3: 1 step-
down fransformer built in, the signal input to the bridge is limited to 10 mv
maximum. The circuits used in measurements are shown in Figure 15.41(B).
~TUT COICIC[CTOllt
(A) UP TO 5 MC/S
""'t.~:iaT[JI
l)(T(Cl'OOI ___F°'~IIMT
~-:,_.
1111
TUIIIIC&I.
O.Dl! '=
4.111 - ~
11.1•
111>1
••YJC--•ut• ()ltECTOII
···~[
IICLGUt. 1101 Q.R. CQ SOIIC
TIKTAOlfll AOIUTTIJI« UNIT'Lr-.
e1,o •llc&-A
( B) UP TO 100 MC/S
247
TRANSISTORMEASUREMENTS
~
~
350KC-IMC
248
TRANSISTOR MEASUREMENTS
shunt-feed problems are alleviated somewhat, and the entire bias supply is
"Boated" with respect to the bridge as follows:
THE ho1,/ Yob SWITCH IS A SELECTED
LOWLOSS,LOWC ,LOWL TOGGLE TYPE
HI LO
1 1
RX METER
_________,.
1--::i... Vee
+
0.05,a. fd 0.05,a.fd ~
+
Vee
+
COMPARISONOF hob TEST CIRCUIT WITH THAT OF AN OSCILLATOR
Figure15.44
3. 30 Mes and Up:
The Rohde and Schwartz Oiagraph is also used on output measurements
at higher frequencies. However, since the diagraph is a 50 n system, the reso-
lution above 2.5 kn is difficult; thus, on some devices the real part of hob
and hH may be difficult to determine except to say that it is less than ~ 0
25 0
or .4 millimhos.
249
TRANSISTOR MEASUREMENTS
FORWARD
CURRENTRATIO(hfb, hre ANDfhfb)
Maintaining a high impedance, broad band current source in the presence of
capacity is difficult. The problem arises in determining what signal current is being
injected into the transistor, i.e., in calibrating the unity input current. It is convenient
to assume that when the current is jumpered into the collector reading resistor to
calibrate the set, this current will then How into the transistor too. However, even
5 p.p.fof capacity of the emitter socket has a capacitive reactance of only 1.5 k ohms
=
at 20 mes, which is not a good current source if RL 25 ohms and h1b 2000. This =
can cause a 10% current change, and much larger errors in frequency when meas-
40
uring fbtb, (the slope of hrb with frequency is relatively small) since a. -
l+j_!_.
f11tb
Another factor rises which must be considered. The input impedance of the tran-
sistor looks inductive below fbtb, and at some point becomes resonant with the
terminal capacity. If the real part of h1b is larger than the reactive part, then the
Q of the circuit exceeds unity and more current Hows in the emitter. At this juncture,
the current gain appears to exceed unity. It is the nature of hrb to return to unity at
high enough frequency, as an examination of the equivalent circuit will show. Of
course, hrb could be measured at many frequencies while resonating out the terminal
capacity for each step. This is done for h,. and f11th,but is time-consuming. Time
consuming, too, is the recalibration operation in fbtb measurements, but this time has
been reduced as much as possible in the circuit shown in Figure 15.46. The switch-
ing is made automatic, and the gain is changed to correct for the difference between
hrb-o (low frequency) and unity. This too is automatically switched between calibrate
and measure positions. With a flat 3 db pad (General Radio type), the detector
becomes a reference indicator. Now the frequency is found where both readings
are equal.
The phase of h,b at any frequency may be found by using a parallel (and as
nearly identical as possible- but without the transistor) channel as a reference. The
two channels are amplitude and phase balanced without the transistor. The transistor
is then inserted, amplitudes rebalanced, and the peak vector voltage between the
190
SIGNAL
GENERATOR
REFERENCE
METER
PENTODE
AC
CURRENT
SOURCE WIDEBAND
'~-----'-' AMPLIFIERS
2000
250
TRANSISTORMEASUREMENTS
"DISTRIBUTED"
WIDE-BAND
AMPLIFIERS
50.0.
(D
SIGNAL
GENERATOR
MODEL 80
fs~ ~
~R
fc
l
VE Ve
NULL
SIGNAL
SPLITTER
CURRENT
SOURCE PHASE
50.0. t
,------41~-- .. COAX.
,~-----7•--_
ATTENUATOR
''-'-----~· AMPLIFIER
DIODE
TRAIN
5o AS ABOVE VOLTMETER
50
CHANNEL2
NOTE:CALIBRATE OUTPUT NULL WITH COAXIAL RELAYS IN POSITION (D ,MEASURE IN POSITION @
i---+ 0--------00
251
TRANSISTORMEASUREMENTS
Signal generators used are either the Tektronix Model 190, up to 50 mes,
or the Measurement Corporation Model 80 up to 100 mes, and beyond. The
distributed amplifiers used are the Hewlett-Packard Model 460A or the
Spencer-Kennedy Model 201, the latter having a 200 mes cut-off frequency.
Detectors are the Hewlett-Packard Model 401-B or the Boonton Electronics
Company Model 91-B. The "Vectrolizer" has already been described.
Finite termination trans£er constants can be measured on the diagraph
which when coupled with a knowledge of the other h parameters measured
will yield the hrh, hrb, hre or hre, The computation involved is somewhat long
and tedious and with any large number of measurements would almost require
a computer. In the measurement of h,. at high frequencies another test facility
has been developed which will perform this measurement at certain fixed
frequencies. 20, 40, 100, and 200 mes are currently used. This measurement
is essentially used to determine the ft of a device where f, is equal to h,. times
the frequency of measurement if the h,. vs. frequency characteristic is de-
creasing at 6 db/ octave at the frequency of measurement. f, is defined as the
frequency at which h,. = 1.
a. ft Measurement
In a high frequency mesa transistor, the ft point or the frequency where
h,. = 1, usually occurs at a frequency in the order of several hundred
megacycles which makes measurement of this quantity quite difficult. This
is in addition to the. device parasitics interfering with the measurement.
To avoid such difficulties, hr.,· (the short circuit current gain of a transistor),
is measured at a fixed frequency somewhat below the hr. = 1 value. The ft
point can then be very closely approximated by applying the relationship
of ft = (h,.) (fmmur.d) as mentioned. In the particular test set described
provisions were made to check hre at two fixed frequencies an octave apart.
This, in effect, tells:
1. If the particular transistor under test has any useful gain at these
frequencies.
2. If the transistor is following the theoretical 6 db/octave slope.
3. If the second condition holds, what the value of ft is.
For example, two sets of similar design will be described for two dif-
ferent types of mesa transistors. The fixed frequencies of one are 100 and
200 mes, and the other, 20 and 40 mes.
Problems which must be avoided in the measurement off, are:
1. The signal level applied to the base must not be too high for a small
signal measurement.
2. The signal fed into the base must be a suitable current source.
3. The output reading load must be well defined.
To illustrate where these problems arise, consider the errors in calibration
in the input circuit of Figure 15.48, and in the output circuit of Figure 15.49
when the transistor is inserted. Combining these two terms results in Figure 15.50
where the total relationship of measured hr. as compared to actual hr. is shown.
The object of this measurement is to get the measured value of hre to equal
or to approximately equal the actual hr. :value. Therefore, both the input and
output error terms must be minimized; i.e., the variation of the input loop
impedance when changing from the calibrating load to the input impedance
252
TRANSISTOR MEASUREMENTS
--=
ib lz11 + zLI 1,+ !~I
ical
iz,+ ··1. 1,+ ;;: I
BASE
ERROR C' ~~ I )
+
TERMS
Figure15.48
ib = ical
11+ ~1
Z11
IF h ..,....!£..
( I !~I)
fo jb
I+
ic =(ib) (h,,)= (ical)
II+- Ihie
211
h,,
I I = ic
(YL;
h,.)
i1
t
i1 = ic
(1,+I ~71)
-
( II+{;-I) I h ) h (ACT.)
COLLECTOR
I ~i:
I+ I (
I,+;z\ 10
ERROR h
i,
(MEAS.) • -. -
1o
TERMS 1cal
I ~~ I ) (
I+ )
I + z•:I I + ~: I
i1
~=h, (MEAS.)= ( h I hfe (ACT.)
, cal o I I
253
TRANSISTOR MEASUREMENTS
hfe (MEAS.)=
of the transistor under test must be minimized and the magnitude of the output
admittance, hH, as compared to the load must be minimized. In other words,
h,. d hoe b <
Z« an YL must e 1.
The signal current generator uses a 10 K ohm series resistor to the base of
the transistor and is placed through a double sided copper clad shield which
tends to reduce the shunt capacitance across the resistor since at high fre-
quencies shunt or stray capacities lower the impedance of a current source. To
compensate for the residual capacitance in the test set described and therefore
raise the current source's effective impedance at the base of the transistor
socket, a high Q parallel resonant circuit is placed to ground. (One of the
methods which can be used to tune the resonant circuit is to install it physically
in the test circuit and then connect an RX Bridge as closely as possible to the
base terminal of the transistor socket. Set the CP dial on the RX meter to O pf.
Tune the capacitor in the test set and the RP dial on the RX meter until the
meter on the RX bridge nulls. Then read the RP dial. This is the effective
impedance which normally is from 4 to 8 K ohms depending upon the fre-
quency of the test set.)
Some mesa transistors tend to exhibit an output impedance, 1/hoe, in the
order of from 50 to 100 ohms at high frequency. Therefore, in order to measure
this type of transistor with accuracy the magnitude of the load admittance
terms, YL, must be greater than 100 millimho (or RL < 100). In order to
realize this condition, transmission line techniques are applied. Not only does
the transmission line transform the 3 KO resistance of the R.F. millivoltmeter
used as a detector to approximately 1 ohm, but the standing wave voltage
transformation permits operation at lower signal levels. Effectively a quarter
wave transmission line is placed from the collector of the transistor socket to
the R.F. millivoltmeter. In practice, it is found much easier to cut a piece of
cable shorter than the actual quarter wave length and use a variable ceramic
capacitor at the R.F. voltmeter end of the cable to ground. When adjusted,
this capacitor electrically extends the line to exactly a quarter wave length.
With mesa transistors in a psuedo-grounded emitter configuration which
is used in this circuit, a mesa transistor may break into oscillation. Therefore,
a series RC circuit, using a 10 ohm resistor, is placed from collector to ground.
This effectively lowers the collector impedance at frequencies other than the
frequency of interest and discourages unwanted oscillations.
Figure 15.51 is the diagram of the test set. High frequency construction
techniques are used. Shielding is of utmost importance, and the input circuit
must be isolated from the output circuit to avoid leakage of signal which
could cause a calibration error. (In this case, the base from the collector.) In
154
TRANSISTOR MEASUREMENTS
p
BNC
~
BNC
?
- R1
VEE
constmcting this test circuit, double sided copper-clad board is used. Com-
ponents are physically placed such that lead length is kept to a minimum.
To eliminate lead inductance of the transistor under test, a socket is used
which allows close connection of the circuit to the transistor header. A rectifier,
CR-1, is connected from emitter to ground to insure that C-2 does not
charge-up when the test socket is empty. This prevents destroying the next
transistor to be tested. In Figure 15.51 the circuit is connected for PNP opera-
tion of the test set. A switchable attenuator box is used instead of the range
switch of the R.F. millivoltmeter. The R.F. millivoltmeter used in this test
set has about a 1 db non-linearity from scale to scale and within a scale. To
avoid this error and still use the instrument, an alternate method is required
using a single point on the voltmeter (say full scale on the 3 mv scale) and
working around that level with a switchable attenuator.
255
TRANSISTOR MEASUREMENTS
I
6db I I0db 1 20db
\-----\ I \------\ I \-----\
(Y.o¼o ~ ~ ~
I a---,,,v"'~ I
31.2 I I
1so 150 I I s1.2
I I
ATTENUATOR
BOX
Figure 15.52
Figure 15.52 shows the attenuator box. Three switchable pads are incor-
porated enabling any combination of the three pads to be used. This in effect
keeps the R.F. millivoltmeter on the same scale (3 mv scale) and within that
scale, the pointer is always no less than % of full scale. The design formulas
for these pads were taken from Reference Data for Radio Engineers using
unbalanced 7f' networks keeping the input and output impedances equal to
50 ohms.
256
TRANSISTOR MEASUREMENTS
degree of unilaterality. Gain may also be defined with certain boundary conditions,
or stability criteria, for example, when gain is measured with only that feedback
required to make the output driving-point impedance appear infinite. This will be
discussed later.
Problems of gain measurement break down into three specific phases:
a. Means of measuring input and output powers of the transistor.
b. Determining the effects of the circuit on the device.
c. Determining the effects of the device upon the circuit.
To be still more specific: in (a.) the generator and load impedances are adjusted
to match (either resistively or complex conjugate) the transistor for maximum power
gain. It must also be insured that the device is not over-driven either current or
voltage-wise. In other words, assurance must be maintained that small signal condi-
tions apply. Due to the extreme signal sensitivity of the usual low-power transistor,
the measuring of A.C. powers in the order of 1 to 10 microwatts (A.C. currents in the
order of microarnperes and A.C. voltages of a few millivolts) is of concern. As a result
the measurement problem is more complex than may be immediately apparent.
In (b.) spurious paths or parasitic strays can introduce unwanted feedback, and the
particular terminations used must not permit the transistor to operate in a region where
internal feedback can cause potential unstability. This is the "gain" of an oscillator
paradox. The ideal way to guarantee that the above conditions do not exist is to
measure the two port impedances when terminated at the other end by the apparent
required match, to see that no signs of negative-resistance exist. This latter condition
leads to (c.).
In any circuit with R, L, and C components, a basic loaded Q is present. Assume
that this circuit is the complex conjugate match for a transistor. When this transistor
is inserted, its output conductance appears across the circuit and the circuit Q should
decrease to half the original value. Now consider what would happen were the
device to have positive feedback. With enough feedback the output of the transistor
has a negative resistance component which absorbs some of the circuit losses and the
Active Q now increases. Even if this feedback is internal, rather than caused by
unknown and uncontrolled strays, it is difficult to state with confidence the true gain
of the transistor. However, a means of using the bandwidth of the circuit as a criterion
of stability is available. Thus, the Active Q may be made less than that of the circuit
Q alone. This approach will not suffice for negative feedback where the solution
relies on the neutralizing techniques which are to be discussed shortly.
MEASURING POWERGAIN
Power Gain depends on the particular definitions used and the frequency or band
of frequencies being considered. These definitions are as follows:
2
1. G = ( ~2 ) RL or G =Pout; where ~=current amplification gain
h R1 Pin h
This is the low frequency case and is the actual gain between R1rea and
lnblt'= J:-2.L_
R1o• d and is maximum when Rir..n = Rtnputand R1.= Ruut1m1,Pnvnl
where Eo = open circuit generator voltage. 4 "" 0
257
TRANSISTORMEASUREMENTS
This is the gain of the transistor with only the real part of its input and
output impedances matched to the load and generator.
4. Gmazlmum aYal labJe,!
The real parts are matched and the reactances are tuned out, that is, the
same impedance but of opposite phase. This is the complex-conjugate match
and is the most true gain obtainable. Close attention is required to distinguish
between this and Pseudo gains which may appear larger due to positive
feedback.
All of the above definitions, with the possible exception of (1) may be considered
as classes and are often divided into sub-classes as determined by the considerations
mentioned earlier when discussing the phases of the measurement problem. As to the
particulars of each measurement set: while it may be possible to measure the
current amplification gain in (1) and (3), it is usually easier to have switchable Ro and
RL so arranged that the available generator power is kept constant and an output volt-
age is obtained proportional to the power in the load. It should be noted that this circuit
is also applicable to (2) as long as a resistive generator is desired or necessary. The
device, potentially unstable if complex-conjugate matched, may be usably stable if
only one terminal is complex matched and the other resistively terminated. For prac-
tical reasons the generator is usually the resistive match as shown in Figure 15.53.
TKtN~~,f'"l\
GEIERATOR
POWER GAIN
MEASUREMENTCIRCUITS
IIMlly
Figure 15.53
258
TRANSISTOR MEASUREMENTS
Measurement of (2) often takes the form of the circuit shown in Figure 15.54.
This is a Functional I.F. Test.
I.F. TRANSFORMER
(B1-FILAR WOUND)
FUNCTIONALI.F. POWERTEST
Figure15.54
To reproduce the measurements from set to set, the transformer loaded imped-
ances, losses, and bandwidth must be specified. The layout is standardized and pre-
cision resistors and meters are used to establish the D.C. bias conditions. Since gain
varies with temperature, means of controlling or at least monitoring temperature
should be included. The use of attenuators to set relative levels on the VTVM is
encouraged, rather than relying on the linearity and accuracy of the VTVM.
For complex-conjugate matching, and also for a simple method of measuring high-
frequency gain, the .,,.network has proven very useful as an impedance transformer.
With care, the losses in the network can be kept low (in the order of 1 db). It should
be remembered that this network acts as a filter, and bandwidth measurements
should not be made. Where bandwidth is important the use of variable link coupling
networks will prove more satisfactory.
In the following circuit, Figure 15.55, the detector is coupled into the generator
at the calibrate jack. The network is then adjusted for a maximum reading. Assuming
the losses of the input network are constant with small variations of match, and the
input impedance of the transistor is close to the 50 ohms of the detector, the output
will be the zero db reference setting, and only the losses in the output network are
important. By keeping these losses small with proper network design, the losses can
then be considered as part of the transistor's gain.
NEUTRALIZATION
The need for neutralization arises when internal feedback exists. The device is not
unilateral and variations of load affect the input impedance. This fact enables one to
devise methods of determining when neutralization has been accomplished. There are
two accurate measuring techniques. One uses a resonant load and sweeps the input
259
TRANSISTOR MEASUREMENTS
HIGH FREQUENCYMATCHINGNETWORKS
CALIBRATE
with a variable frequency signal current source. As the signal goes above and below
the resonant frequency, the load becomes first capacitive and then inductive. If a high
impedance sensitive detector is used to look at the input voltage, the changing
impedance is seen at the input due to reflected load changes. At frequencies up to
5 or 10 mes such detectors are available, but in the VHF range a different approach
is used. The second approach, applicable at most frequencies, is to measure the feed-
back voltage appearing at the input when a signal is applied at the output. This is
precisely what is done in measuring hrb,
In both methods some out of phase feedback is applied in parallel with the device,
so as to cancel either impedance changes or feedback voltage. Means of amplitude
and phase control will need to be incorporated in the neutralizing network to avoid
over-compensation. Simplified circuit diagrams are illustrated in Figure 15.56 to show
some of the various feedback schemes used. The feedback networks are lumped-
constant types at lower frequencies and transmission line types at VHF.
COMMON BASE
WHICH
WHEN
REDRAWNIS:
INPUT
------ .......
,
R'
L ___ L~
J __ JI
RIC FEEDBACK, NEUTRALIZING
NETWORK
SOMETIMESR/L
USED INSTEAD
COMMONEMITTER
NOTE:
FEEOBACKMAY OFTEN
BE TAKEN FROMA "TERTIARY"
WINDINGOR LINK COIL.
OUTPUT
NEUTRALIZATIONMEASUREMENTS
Figure 15.56
260
TRANSISTORMEASUREMENTS
To check the true gain of a transistor, unilateral amplifiers are used in the feedback
path to supply the power consumed in the feedback (neutralizing) network, thereby
not loading the transistor's output, as shown in Figure 15.57.
+-
VARIABLE LINE STRETCHER
GAIN TO ADJUST PHASE
AMPLIFIER
B=i;i~(f)df (15b)
0
By measuring the gain with frequency, integrating and dividing by the maximum
gain, the equivalent rectangular power pass-band is found. Since noise-power at the
output consists of two parts, and one of these may be predicted, this may be used
to specify the noisiness of an amplifier. The index used for this purpose is called the
noise factor and is defined
Total Noise Power Out
F
Power gain X Noise Power due to Source Resistor (15c)
261
TRANSISTOR MEASUREMENTS
or,
PN
F= G • Pn
.
Bu t smce, =
G (Ps)out h p . . al
(Ps)in , w ere s 1ssign power
(Ps)tu ( Signal)
F= PN - Pn - Noise In
(Ps)out p - (Ps)out - ( Signal) (15d)
(Ps)1n • u PN Noise out
Noise Figure (NF) = 10 log F
Expressed in terms of voltage and resistance, the available noise-power can be
written
En1 -
Pn= 4 R« =kTB (15e)
or,
En= ✓ 4kTBR, (15£)
At room temperature, 4 kT = 1.6 X 10-20 joules.
262
TRANSISTOR MEASUREMENTS
263
TRANSISTORMEASUREMENTS
or,
2q Inc BR,G
M-1 =--4 ___ (S)
kTB G + N •: = N out
(15r)
and since,
(Ns) = In kTB
(15s)
we have,
~) 2q Inc B R11
(
F =~
~)
-- 4
M-1
(15t)
( N out
=
But at T 290°K (l7°C),
4
\\=
20 (volts)-'
So equation (15t) can be written as
_ 20 Inc Rii
F (15u)
- M-1
Usually Mis chosen to be equal to 2
therefore the noise factor is,
=
F 20 Inc R11 (15v)
Rg NOISY NOISELESS
AMPLIFIER AMPLIFIER
264
TRANSISTOR MEASUREMENTS
then,
F-1 et? WRir {15x)
- + 4 kTB R, + 4 kTB
1
B = effective bandwidth =-GlJAxJo
f ~(f)df
where,
G{f) = gain as function of frequency
=
GY,.x maximum gain
Defining,
e:1?
R...... 4kTB =
(15y)
i:.-.2
J.,qv = --.....=-
2qB
equation (15x) will be,
F - 1 + R..11v + 2q l1111v
{15z)
- R 11 4 kT
and since,
2
4
=
~T 20 (volts)-1 at T 290°K, =
F =
1 + _!lR:v
+ 20 lo,1v Ric (15aa)
In Figure 15.58 the noise-voltage source may be thought of as a lossless resistor R,.,1.,,
and the current source as a parallel shot noise generator due to an equivalent DC
current l.q...
To find the optimum value on the noise factor the derivative of F equation {15x)
is taken with respect to R", and this optimum noise factor is found to be
From equation (15bb) it is seen that the optimum noise factor can be found analytically
if e:./'and i:-.2 are known. This is also the noise factor which will be measured if a meas-
urement is made with a source resistance R..p,,
Combining equations (15x) and (15bb).
F = l + F ..pa2-1 [_&_
pt
+ Ropt]
R.. Ric
{15dd)
Therefore, if Fnpt and R..11t arc given, the noise factor can be found for any source
resistance Ri:,
'
Defining a factor k, as
k = _!_
2
[~
R..pt
+ R..,,, ]
R11 4
equation (15dd) becomes k
F = 1 + (F .. 1,1 -1) k
(15cc) 2
265
TRANSISTORMEASUREMENTS
For example, the optimum noise figure (NF)opt is given as 1.5 db or Fopt =
1.4. The
optimum source-resistance is 10000. What is the noise factor in a circuit where
Rg = 8 kO. The ratio RRir
npt
= 8, and from the Figure 15.59, k is found to be 4.
Therefore, the noise factor will be ·
F = l + (Fopt -1) k = l + (1.4 -1) <4 = 2.6
NF= 4.1 db
METER
TRANSISTOR NARROW
---ATTENUATOR.-.--. UNDER BANDPASS
TEST FILTER
SET UP TO MEASURE(er.S)'lz
Figure15.60
Roqv>>Re or Rr<< ~
The measurement-procedure is as follows:
a. The back-ground noise-level is noted.
b. The signal generator is connected through a suitable attenuator, and the level
of the generator is adjusted until the device output level is 20 db above back-
ground level.
c. The required input level is measured from which en can be determined.
To measure the equivalent noise-current, an almost identical circuit is used. The
only difference being Re replaced by a high resistor inserted in series as shown in
Figure 15.61.
r ATTENUATOR
TRANSISTOR
UNDER
NARROW
BANDPASS
METER
t Rg
V
TEST FILTER
GENERATOR
266
TRANSISTORMEASUREMENTS
~
J4 kTB
R,/
<< 4. /
\J
ry
ls
If the background noise level is Vn and the input voltage V gives E volts out, then
equivalent noise-current is
. V VN
b,= Re •y
It should be strongly emphasized that eN and 6 must be measured under the same
operating conditions to have any practical significance, and also the necessary correc-
tion must be made for the lower meter reading on noise.
v=:r
,n
267
TRANSISTORMEASUREMENTS
NOISE CURRENTEQUIVALENTCIRCUIT
Figure15.63
The relationships between currents and voltages are,
- -e• - -e 2 - -.
i•- ir •j•-__!_•j•-~
ir - Rirll , s - Rg2 , In - Rial
The total current flowing into the parallel combination of Rir and R1n
2
p
T
=
e/ +1 es2+ (i0 ')ll + e1n1
Rir R1n
(15££)
(15jj)
F=il[R~R;J
=et[R~i•RJ
268
TRANSISTOR MEASUREMENTS
(15kk)
e"
2
(R,n + R")2 eT 2
Substituting the identity,
eo1 eo1 es"
e/
==-=-.-=-
es1 e, 1
and equation (15kk) into equation (15ii), and solving for F,
eT
es2
2
( l +~)'Z
R,n
F=l-------'- (1511)
2
l + eo (Rr)
es" R,n
2
Ropt= ~
and since,
vw
e1l = el
and,
(15mm)
Ropt (15nn)
Ropt= R1n
eo
g
R,n = input resistance of transistor.
Thus, the measurement of noise factor is accomplished without the use of a noise
generator or diode.
269
TRANSISTORMEASUREMENTS
Example:
Transistor 2Nl23
VcF.=-5V
IF. =1 mA
Equivalent short-circuited noise voltage ~ =
1.8 X 10-0V/ V cycle
=
Equivalent open-circuited noise current I; 2.5 X 10-12 A/ v cycle
(measured at 1 Kc)
This gives
1.8 X 10-e
= =
Ropt 2 _5 X 10_12 720 fl
and
_ eN is _ 1.8 X 2.5 _
F opt - + 2 kT - + 8 - 1.564
=
Optimum noise figure 1.94 db.
CHARGECONTROLPARAMETER
MEASUREMENT
The measurement of the charge parameters (described in Chapter 7) are discussed
in this section. The four parameters which are currently specified on G.E. specification
sheets are measured in the manner shown in the following paragraphs. NPN configura-
tion is used for circuit layouts, but PNP measurements can be accomplished by revers-
ing the polarity of Vin and Vee, One consideration which should be mentioned before
the actual circuits are introduced is that of measurement accuracy. In any measure-
ment of switching speed, determination of the pulse voltage magnitudes and the bias
voltages is extremely critical. In these parameter measurements, an attempt was made
to minimize the number of critical pulse and bias voltage measurements necessary.
Ta,THE EFFECTIVE LIFETIME IN THE ACTIVE STATE
The circuit used to measure r. is shown in Figure 15.64. Inasmuch as the circuit
contains no dissipation limiting resistor, extreme caution should be used to assure that
Vcc • le does not exceed the dissipation limits of the device.
Vee
RUTHERFORDPULSE
GENERATOR,
MODELB-7
"-IOK
-~
, .., ..
TEKTRONIX
CURRENTPROBE
P6016
Ta TEST CIRCUIT
Figure 15.64
270
TRANSISTORMEASUREMENTS
3. A Tektronix Type 131 Amplifier and Tektronix Type 545 Oscilloscope (or
equivalent) are set up so that the collector current at which measurement is
desired produce a scope deflection equal to 3 cm. The current at which the
measurements should be made is that le for which the device dissipation rating
is approached by the Vcc • le product. This point is used for the measurement so
that the Ta obtained will be the true minimum and be accurate for "worst-case"
design techniques.
4. The device is now inserted into the test socket. CAUTION: If the base lead
accidently touches the collector lead during insertion, the device may be
destroyed, unless an electrically current-limited power supply is used.
5. The input voltage is now increased until the le deflection is 3 cm (or the desired
Io value).
6. Ta is the time constant of the resulting pulse waveform as shown in Figure 15.65.
It is NOT necessary to record the input pulse amplitude.
I
TURN ON__J
OF v,N 1
Ta MEASUREMENTWAVEFORM
Figure15.65
RUTHERFORD
PULSE
GENERATOR,
MODEL8-7
Tb TEST CIRCUIT
Figure 15.66
271
TRANSISTORMEASUREMENTS
'Tb MEASUREMENT
WAVEFORM
Figure15.67
Ca£,THE AVERAGEEMITTERJUNCTIONCAPACITANCE
Figure 15.68 is circuit used to measure CeE, It should be noted that the input pulse
used is to reverse bias the base emitter diode and is not of the polarity which would
tum the base-emitter diode on. To obtain the actual value of C,n~,the following steps
are taken
LOW CAPACITANCEPROBE
PULSE WIDTH=.I USEC __ ,._ __ .,TO TEKTRONIX
REP.RATE:: 2 KC 545
OPEN
:.:u-
RUTHERFORD
MODEL B-7
CumTEST CIRCUIT
Figure 15.68
272
TRANSISTORMEASUREMENTS
TIME (p.S)
=
VaE
J (OFF)
C BE dV
COMPOSITECIRCUIT
Figure 15.70
TRANSISTORMEASUREMENTS
TO TEKTRONIX 545
(OR EQUIVALENT)
Qa• is a function of collector voltage variation and collector current. Thus, meas-
ments are made for various Vcc and Rr. combinations. The following steps are taken
to obtain Qs • data.
1. Vcc is determined first. Several values of Vcc will be necessary to determine the
full Qa* picture; however, data is taken for one Vee value and various Rt values.
Vcc values of interest range from BVcEo value to a value of 1 or 2 volts.
2. The unit is now inserted into the test socket.
3. The product C(V an - VnE) is the charge which is placed into the transistor to
bring it to the edge of saturation. A value of Vanis chosen which is sufficient to
permit enough charge to pass into the base of the transistor to bring it to the
edge of saturation. This, of course, will also depend upon the range of capaci-
tance available. Van is normally between 5 and 20 volts, so that Van> >VnE,
The capacitor used should be carefully chosen for large variation so as to render
the test set more valuable.
4. With Vee and Van adjusted, data can be taken. Record the values of Vee and
VIn, A typical oscilloscope pattern is shown in Figure 15.72.
Vee------
274
TRANSISTORMEASUREMENTS
00•,o~
00*9ojvcc2
00*,oo\_
00*9ojVcc1
0990
09• f (COLLECTOR CURRENT)
Oc• f IVOLTAGE)
Ics tMA)
These plots are generally linear over a wide collector current and voltage
range for alloy and diffused transistors. The intercept on the Qe• axis is called
Qc and is the part of Qu• which varies with collector voltage. The part of Qe•
which varies with lcs is called Qe. Thus, Qo• Qu + Qc.=
Qe and Qe can also be plotted separately if desired.
0
o---------vt----------41------"'.I SOCKET
CAPACITORCALIBRATION
Figure 15.74
275
TRANSISTORMEASUREMENTS
or,
C = (2,r f Xc)- 1
I
-271' f Vin
If V 1n = 1 volt RMS and f = 1.59 me, then,
C =(I) 10- 1
C
B o
o- .... ,._ ___ -ut- ___ ...,.,__ __ --u +--INPUT I VOLT RMS
1.59 MC/S
ADD E
SHORT--+ 47k
H.P. MODEL
400C VTVM
NEWREFERENCE
-
STRAY CAPACITANCEMEASUREMENT
Figure15.75
If it is desirable to know the stray capacitance from the base to emitter in the
test circuit, a similar measurement can be made as shown in Figure 15.75. The variable
capacitor is set at a known value, say Ci, so
Cetra:r = Va ( 10-8) - C1
Note that in this determination of stray capacitance the normal circuit reference
has been changed. Care must be taken to insure that the old reference is not shorted to
the new test reference.
276
REGULATED DC SUPPLY
AND INVERTER CIRCUITS
REGULATED
DC SUPPLY
The regulated supply of Figure 16.1 is a conventional circuit using a series regu-
lating element. With QI mounted on a 2" x 2" x %2" aluminum fin the circuit can
operate in an ambient temperature up to 70°C. At higher ambient temperatures a heat
radiator should be used on Q2, or a higher Zener regulating voltage could be used to
decrease the dissipation in Q2.
TRIAD
IA F-92A
REGULATEDDC VOLTAGESUPPLY
Figure16.1
Q 1 requires a V ct:a capability equal to the unregulated output voltage of the bridge.
The voltage rating for Q2 must be equal to the difference between the regulated out-
put and the Zener voltage.
Figure 16.2 shows equal regulating ability for all load currents to 350 ma, and
2 % voltage regulation at 400 ma. Improved regulation can be achieved by using a
Darlington connection for either, or both, QI and Q2.
The peak-to-peak output ripple of the circuit in Figure 16.1 is approximately .24
volts at 400 ma load current and decreases to .01 volts at no load. The output imped-
ance is less than 3 ohms from DC to 20 cycles and then decreases to less than 1h ohm
at 200 cycles and beyond. The output voltage has no overshoot with step load functions.
u~ =Ii-----+--
0
I ~______,________1
I
100
1~._______.__...1
1~____.____.1
200
~~_______._____
300 400 500
LOAD CURRENT(MILLIAMPERES}
OUTPUT VOLTAGE VS. LOAD CURRENT
Figure 16.2
277
REGULATED DC SUPPLY AND INVERTER CIRCUITS
PARALLEL
INVERTERS
The parallel inverter configuration shown in Figure 16.3 provides an output that is
essentially a square wave. By rectifying the output voltage, the circuit makes an
efficient DC to DC converter in applications such as power supplies. An AC input can
be rectified to provide the primary power for the inverter, in which case it will func-
tion as a frequency changer. A square wave drive to this inverter causes Ql to conduct
half the time while Q2 is blocking, and vice-versa. In this manner, the current from
the supply will flow alternately through the two sides of the transformer primary and
produce an AC voltage at the load.
DC TO AC (SQUAREWAVE)INVERTER
Figure16.3
278
REGULATED DC SUPPLY AND INVERTER CIRCUITS
16.4V
33
1500 1500
+
+24 TO 32V
(SOMA AT
2e voe>
47fi
279
REGULATED DC SUPPLY AND INVERTER CIRCUITS
INVERTER
OUTPUT
VOLTAGE
(VERTICAL SCALE 50 VOLTS/CM)
Figure16.5
DCTO DC CONVERTER
A full wave bridge (1N538's) between the secondary and the 500 ohm load of
Figure 16.3 will rectify the 3200 cycle square wave shown in Figure 16.5(b) to give
90 volts DC output. With 100 µ.f electrolytic capacitor across the load, the ripple is
less than ½ volt peak-to-peak. The overall DC to DC efficiency is about 80% with
16 watts output.
REFERENCES
"General Electric Silicon Controlled Rectifier Manual.'' 2nd Edition ( 1961 ).
"Notes on the Application of the Silicon Unijunction Transistor," G-E Application Note 90,10.
280
SILICON SIGNAL DIODES
Semiconductor diodes are used extensively in all types of electronic circuitry. The
various application chapters in this manual illustrate many of the applications in which
diodes are used, from detectors in radio receivers to gating and logic elements in com-
puter circuits. The first semiconductor diodes, made before the invention of the tran-
sistor, were silicon point contact diodes used as detectors in radar receivers. Later,
germanium point contact diodes and gold bonded diodes were introduced which
could be used in a variety of applications. The demand for high operating tempera-
tures and low leakage currents led to the development of the silicon alloy junction
diode and the silicon diffused mesa diode. The reliability and superior electrical char-
acteristics of the silicon diode together with declining prices has caused it to be used
in place of germanium diodes in an increasing number of applications.
CUT AWAYVIEWOF
PEP SILICON DIODE
Figure17.1
281
SILICON SIGNAL DIODES
The cross-section and mechanical structure of a PEP silicon diode in a glass package
is shown in Figure 17.1. Fabrication of the diode starts with a wafer of low resistivity
single crystal silicon. A thin epitaxial layer of high resistivity silicon is grown on the
wafer. A layer of silicon oxide is formed over the entire wafer and the oxide is removed
from small circular "windows" by means of photographic techniques. The planar
junctions are then diffused through the windows in the oxide. Gold is plated on the
back of the wafer and diffused into the wafer at a temperature determined by the
required reverse recovery time. The wafer is cut into pellets each forming a complete
diode, and contacts are made to the front and back of the pellets. Each pellet is then
mounted in a glass package and the package is sealed.
Formation of the junction under a stable silico~ oxide layer results in a passivated
diode which is immune to contaminants which plague other types of silicon diodes.
The effectiveness of the passivation is substantiated by a tight distribution of reverse
leakage current, a parameter which is usually very sensitive to surf ace conditions, and
by the close correlation between the measured values of the electrical parameters and
the theoretical values. The use of an epitaxial structure reduces the bulk resistance of
the diode and thus makes it possible to achieve simultaneously a high conductance
together with a low capacitance and a low reverse recovery time.
DC CHARACTERISTICS
The characterization of the PEP silicon diode is greatly simplified by the close
correlation between the theoretical and the actual parameters. The d-c characteristics
are generally specified by means of the following parameters and characteristic curves.
1000
--- I
SHADED AREAINDICATES
25° C GUARANTEEDLIMITSOF
CONTROLLEDCONDUCTANCE .....
- TYPES IN3605
IN3606
,,V
~
Vi'
_/ ,_
100
- IN3608
IN3609
V'
/
.I
V
,,/ ,,
,,
/ ;/ I
10 I
/ tAlv I
f
I
'f
/
)
). F II
~
I
,
I
I ~ J
) J ~ I
0.1
, I
I Ji I
I
I
J I
/1sooc /2s 0
c j -55°C
I
QOO
V V I
0.2 0.4 0.6 0.8 1.0 1.2
FORWARDVOLTAGE-VF-VOLTS
1. Forward Voltage. The maximum value of the forward voltage, VF, is generally
specified at one or m~e values of forward current, IF, For controlled conductance
diodes such as the 1N3605, 6, 8, and 9 both the minimum and maximum values of
forward voltage are specified at six values of forward current. The relationship between
the forward voltage and forward current for a typical PEP silicon diode is shown in
Figure 17.2 at three values of ambient temperature. The shaded area indicates the
guaranteed range of forward characteristics for the controlled conductance types at
25°C. The tight control of forward conductance is very desirable in the design of
diode logic circuits where it permits greater design margins or additional logic stages
(see Reference 1).
The forward d-c characteristics of the PEP silicon diodes closely follow the theo-
retical equation
I
F
=I s
[ exp q (VF - 1•. Rs) - 1]
.,,KT (17a)
where
Is =
diode saturation current
=
Rs diode series ohmic resistance
q =
electronic charge (1.60 X 10-•ecoulomb)
K =
Boltzmanns constant (1.38 X 10-ta watt sec/°K)
T =
absolute temperature ( °K)
The parameter .,.,in the equation is dependent upon the impurity gradient in the junc-
tion and the carrier lifetime in the semiconductor material. At low values of forward
current, carrier recombination in the junction depletion layer is the predominant
factor in determining the relationship between forward voltage and current and .,.,e! 2.
At high values of forward current the relationship between forward current and voltage
is determined primarily by minority carrier diffusion and .,.,~ 1. The characteristics of
the PEP silicon diode can be approximated with reasonable accuracy by assuming that
.,.,= 2 over the entire current range. At 25°C this gives .,.,KT/q = .052 volt. The
dynamic resistance, ro, of the diode at a forward current, IF, is given by the equation
KT + R
r D -- 71 (17b)
q IF 8
283
SILICON SIGNAL DIODES
AC CHARACTERISTICS
1. Capacitance. The capacitance normally specified for a diode is the total capaci-
tance which is equal to the sum of the junction capacitance and the fixed capacitance
of the leads and the package. The capacitance, Co, is specified at a frequency of 1 me
with zero applied bias. Since the typical capacitance of the PEP silicon diode is less
than 1 pf it is necessary to use a three terminal bridge configuration to achieve an
accurate measurement. The junction capacitance is inversely proportional to the square
root of the reverse voltage and increases linearly with temperature.
2. Rectification Efficiency. The rectification efficiency, Rt:, is defined as the ratio
of DC load voltage to peak rf input voltage to the detector circuit, measured with 2.0
volts rms, 100 me input to the circuit. Load resistance is 5K and the load capacitance
is 20 pf. The rectification efficiency is determined primarily by the conductance, reverse
recovery time, and capacitance, and provides an indication of the capabilities of the
diode as a high frequency detector.
3. Transient Thermal Resistance. The transient thermal resistance of a diode is
presented by a curve showing the instantaneous junction temperature as a function of
time with constant applied power. This curve permits a determination of the peak
junction temperature under any type of pulsed operation. By means of a simple
analytical procedure, described in Reference 2, this curve can be used to determine
the peak junction temperature under any type of transient operation and hence pro-
vides a valuable method of insuring the reliable operation of diodes in pulse circuits.
4. Forward Recovery Time. If a large forward current is suddenly applied to a
diode, the voltage across the diode will rise above its steady state value and then drop
rapidly, approaching the steady state value in approximately an exponential manner.
This effect is caused by the finite time required to establish the minority carrier density
on both sides of the junction. The forward recovery time is the time required for the
diode voltage to drop to a specified value after the application of a step of forward
current. The forward recovery time increases as the lifetime or the resistivity of the
semiconductor material is increased. For a given diode the forward recovery time
increases as the magnitude of the forward current step is increased, and decreases as
the forward current flowing prior to the current step is increased. If the amplitude of
the forward current step is sufficiently small the effect of the junction capacity will
predominate and prevent the diode voltage from overshooting its steady state value.
For most diodes, particularly the PEP silicon diodes, the forward recovery time is much
smaller than the reverse recovery time and can be neglected in most applications.
lal APPllED
VOLTAGE
·:1
...
_____
_
lb) DIODE v, --===---==-
VOLTAGE
:._________
C
le) DIODE
CURRENT
284
j
5
\
\
2
~
\~ '
,......ta,
VS Ir1 /It
H°
'
H
----"4--- \
\
''\'
-\--
\
...
,,
0.5
\ \ \ r--....
. y ...........
\ '\
~"
\
\ \
\
'"
0.2 I\ \ \ i\ r------.....
~
r--.. r--....
\
~ '~ \ \
0.2
CURVEFORDETERMINING
T\ME UNDERVARIOUS
REVERSE
RECOVERY
DRIVECONDITIONS
"' 0.4
~
0.6
~
0.8
t/T
~ i\..
1.0 1.2
Figure 17.4
285
SILICON SIGNAL DIODES
IF
12 50 MA
~ 40 MA
30 MA
/ ~ ~/ 20MA
V
./ ~ v/
:::::::
/ v ... /
.,,,,,....
--: c::::
t::--- 10 MA
--
./
i-
_,.,,,,,. ~ ~
:::::
-- c:::: V
i---- i--
i---
-- ~
--
----
i--- ~
:::::
l.....-"
i-- / ....
/
----
~
-
--- ---- --
i,..--
---
~
--
i---
i---
- ----
2
0
-50 -25 0 25 50 75 100 125 150
JUNCTIONTEMPERATURE-TJ-DEGREESCENTIGRADE
However, for most design requirements an accurate estimation of the reverse recovery
time can be obtained by use of a quantity called the effective lifetime, T, and the
ratio of the forward and reverse currents. Figure 17.4 can be used for this purpose
together with Figure 17.5 which gives the typical effective lifetime of the PEP silicon
diode as a function of temperature for various values of forward current.
The use of Figures 17.4 and 17.5 in estimating the reverse recovery time of a PEP
silicon diode can be best described by means of the following design example.
Problem: Estimate the typical recovery time to 5 ma reverse current (1112) when
the forward current is 20 ma (Iv) and the initial reverse current is 15 ma
(Ir1) at a temperature of 75°C.
Solution: Enter the left side of Figure 17.4 at Ir1/Ir 15/20 0.75 and follow= =
horizontally (dotted line) until the t. vs. I,1/Ir line is reached. From the
t/T scale on the horizontal axis, it is seen that t. 0. 31T. The tb portion =
of the curve is estimated by moving downward parallel to the general
contour lines until reaching the line corresponding to Ir2/Ir 5/20 = =
0.25. The total switching time is thus 0.44T".From Figure 17.5 the effec-
tive lifetime at Iv= 20 ma and T, = 75°C is 6.0 nsec, hence the calcu-
lated values are:
constant current phase t,. (0.31) (6.0) = 1.86 nsec. =
reverse recovery time trr =
(0.44) (6.0) 2.64 nsec. =
For additional material on the reverse recovery time of diodes see References 3 and 4.
286
SILICON SIGNAL DIODES
DIODE ASSEMBLIES
The PEP silicon diodes are available in matched pairs and matched quads for use
in applications where close matching in the forward characteristics is required. These
units are sealed in small epoxy packages to preserve the identity of the diodes and
minimize temperature differentials between diodes. The diodes used in these assem-
blies have all the high performance capabilities of the standard PEP silicon diodes
and in addition are matched to within very close limits for VF over a range of forward
current fi:om 100 µa to 50 ma and over a range of temperature from -55°C to +12s 0 c.
These assemblies are used in discriminators, gating circuits, choppers, ring modula-
tors and ring demodulators where the highest performance and reliability are required.
REFERENCES
m Kvamme, E.F., "Controlled Conductance Applications," G-E Application Note 90.40.
12 > Gut.1:willer, F.W., Sylvan, T.P., "Power Semiconductor Ratings Under Transient and Intermittent
Loads," G-E Application Note 200.9.
<1 > Chen, C.H., "Predicting Reverse Recovery Time of High Speed Semiconductor Diodes," G-E
Application Note 90.36.
<oKo, W.H., "The Reverse Transient Behavior of Semiconductor Junction Diodes," IRE Trans. ED-8,
March 1961, pp. 123-131.
287
SEMICONDUCTOR
RELIABILITY
Of the many advantages which arise from the use of semiconductor devices in
place of vacuum tubes, probably the most fundamental has been their long, reliable
life expectancy. Early in semiconductor device development this was more anticipation
than realization; but, by now, average failure rates of less than 0.01 % per 1000 hours
have been demonstrated in actual usem and life tests of longer than 40,000 hours (see
Figure 18.9 - F and G) have shown that "wear-out" in semiconductors, if it actually
exists, does not occur in the normal useful life of most electronic equipments.
Reliability is a measure of how well a device or a system can be expected to satisfy
a set of performance requirements for a given period of time under a specified set of
operating conditions. To be exact, this measure is the probability of successful perfor-
mance. The basic reliability problem consists of two essentially different, but related,
subproblems. This fact is frequently overlooked in current reliability thinking. The
first, and by far the most important of the subproblems is that of designing, producing,
and applying the device so that it actually will have the required reliability. The
second subproblem, and the one which frequently receives all the attention, is the
measurement of the reliability. It is not implied that measuring reliability is not im-
portant; but it is necessary to realize that the measurement of reliability in itself does
not increase reliability. This difference becomes particularly important when the eco-
nomic feasibility of lot acceptance tests to demonstrate extremely low failure rates is
considered.
In both the achievement and measurement of reliability, there are major differences
between systems and devices. In general, the system or equipment has to perform a
somewhat narrowly defined function under a relatively narrow set of conditions for a
relatively fixed period of time. For devices such as semiconductors which are mass
produced, the ranges of applications, operating conditions, and required length of
life are extreme. One transistor type in one application may be employed as a small
signal i-f amplifier in a missile whose useful life is measured in minutes, and in another
application may be employed in an air conditioned well maintained computer in a
high level flip-flop where years of life are required. This diversity necessitates extreme
care in the design, production, and evaluation to assure that the device will provide
the required performance.
It is the purpose of this chapter to explain the factors which determine semicon-
ductor reliability, and the techniques used in its measurement and to illustrate these
with typical device reliability characteristics.
ACHIEVING RELIABILITY
The achievement of reliability can only be realized through the proper application
of devices which have been properly designed and properly 1>roduced. Any attempt to
make one or two of these elements bear all the burden will result in higher costs and
less than optimum performance. For example, placing excessive reliance on safety
factors in application will result in heavier, bulkier, and more costly equipment which
frequently will be slower in operation or be marginal in some other operational char-
acteristic. Similarly, in device design, the specifying of a critical process in order to
289
SEMICONDUCTORRELIABILITY
obtain high performance will be paid for by uncertain yield and reliability. One
aspect of the interdependence of these three factors in reliability which frequently is
not sufficiently appreciated is the importance of feedback, feedback from the users of
components to the producers and feedback from the production organization to the
design organization. Most manufacturers have quite tight feedback paths between
production and design. However, feedback from the "field" is generally much more
difficult. A characteristic of many General Electric semiconductor devices is the means
of permanent lot identification of each unit - which means that if at any time a unit
should fail or exhibit unusual behavior, production records can be analyzed to deter-
mine possible causes. As this type of feedback continues, "field" experience can be
factored into both production and design.
Surface Protection
Surface protection is one of the most critical factors in the design and production
of semiconductor devices. General Electric device designs make use of one of two
basic principles of surface protection - encapsulation in an inert atmosphere with a
getter to maintain a satisfactorily low partial pressure of moisture; and passivation
which is a process of deactivating and isolating the silicon or germanium surface with
a chemically bonded protective film which shields the active surface from the influence
of the gaseous environment and any contaminants which might come in contact with
the surface. The first of these - internal atmosphere control - provides stability by
initially establishing an internal atmosphere which gives satisfactory performance and
then maintaining this condition by means of the getter. The getter is a material whose
selective absorption characteristics have been chosen to provide maximum capacity
for the removal of water vapor. The actual internal gaseous environment and getter
must be selected specifically for each semiconductor design to optimize performance
and reliability.
Passivation protects the surface of the semiconductor device by deactivation and
by isolation. <3 > Deactivation is the satisfaction of the unsaturated bonds of the semi-
290
SEMICONDUCTORRELIABILITY
conductor surface atoms by the formation of stable chemical bonds with a surface
protecting film. The satisfaction of these unsaturated bonds greatly reduces the effect
that electric fields have on the semiconductor behavior.
Isolation provides further stability by reducing the intensity of the electric fields
reaching the semiconductor from charges residing on the outer surface. The thicker
this passive layer or film, the greater the isolation. Furthermore, the passivation film
will reduce the field intensity at the outer surface caused by the voltage across the
junction depletion layer. This will reduce the tendency for surface contaminants to
ionize and thus lead to still further device stability. Even in the case of passivated
surfaces, the surrounding environment will exert some small influence and so for
maximum stability it is desirable to provide a hermetic encapsulation.
In the case of the controlled environment method of surface protection it is obvious
that hermetic encapsulation is essential. For these reasons, almost all transistors are
hermetically sealed. Matched coefficient oxide seals give maximum assurance of a
hermetic seal over wide temperature ranges. Although the use of copper leads and
compression seals reduces the likelihood of lead breakage under severe installation
conditions, it appreciably increases the danger of seal leakage and early failure
caused by the influx of moisture and other contaminants. The cap to header weld,
another important element of the seal, must be designed through proper shaping of
cap, header, and welding electrode to give further assurance of a hermetic seal while
eliminating the harmful effects of weld splash in internal contamination.
Post Fabrication Processing
The factors brought out so far have dealt with the construction of the device.
Certain elements of the design involve post fabrication processing. The most important
of these is the stabilization performed on each unit. This is usually a high temperature
bake for a period of days, the length of time depending on the device type.
The most important results of the high temperature bake is bringing the surface
and the internal environment into equilibrium. In the case of devices using internal
atmosphere control through getters, it is important to bring the internal surfaces of
the device, the getter, and the internal gas itself all into equilibrium. Even though
caps and headers may be prebaked at very high temperatures prior to fabrication,
there is a certain amount of moisture and other gases that will be gradually evolved
after fabrication. Furthermore, the getter will start acting on the gases in the unit as
soon as it is welded. It is important to complete these changes and reach equilibrium
prior to final testing so that the finished product will be stable. High temperature
baking will in most cases accomplish this in a matter of a few days or a week.
In the case of devices where surface protection is provided by passivation, the
stabilization bake is of much less importance. However, even well passivated units
responds to a small degree to changes in internal atmosphere. A high temperature bake
accelerates this process to give the ultimate in stability to the finished product.
Reduction of Critical Processing
One of the responsibilities of product design when considering reliability is to
reduce the critical nature of the manufacturing operation. When fabrication operations
are critical, the vigilance of inspectors and quality control personnel must be increased
and even then, some marginal units will slip through. By designing the product so
that normal production tolerances will not produce early failures, the likelihood of
marginal or poor units being delivered to the customer is greatly reduced. Poor units
. can then only be produced when the process is out of control and this situation can
be readily monitored by the quality control function.
291
SEMICONDUCTOR RELIABILITY
Many of the factors previously mentioned in connection with design for reliability
also are important in connection with reducing the critical nature of manufacturing.
For example, matched coefficient oxide seals are more easily produced without leaks
than are compression bonds, resistance welding of the cap to header seal produces a
more consistent seal than solder seals. The shaping of cap, header, and electrodes
reduces the probability of weld splash contaminating the surface, the use of hard
solders eliminates the need for fluxes and thus greatly reduces the chances of surface
contamination. Gettering and passivation reduce the criticalness of many steps in
production providing a major reduction in the probability of fabricating faulty units
which could fail in operation.
Workmanship
Of all these, workmanship in the broad sense is the most important since the skill
and attitude of every operator, maintenance man, inspector, and foreman contributes
to the overall quality. Even in those cases of high level mechanization where need
of human judgement and skill are greatly reduced in the direct fabrication steps, main-
tenance and control personnel, incoming material inspectors, and many others require
high levels of skill to achieve reliability in the product. Factors which contribute to a
high level of workmanship are morale, careful selection and training of personnel,
managerial attitude toward quality (for example in General Electric Semiconductor
Products Department, there are no piece rates; the emphasis is on making transistors
right rather than making them fast), and performance feedback. This last point will
be amplified in the section on quality control.
Materials
The quality of the materials going into the finished product can be maintained at
a high level through a combination of vendor control and incoming inspection. Vendor
control starts with an evaluation of the vendor's product and of his facilities for con-
sistently producing a high quality material. The second step is to maintain a rating
on his performance combining price, service, and quality. This affords a factual basis
for the selection of the best source for each material and a measure of the consistency
of performance.
Most materials, particularly the direct materials can be subjected to an incoming
inspection in the normal manner. A random sample of each lot can be taken and
tested for the required characteristics. Failure to meet the requirements is cause for
lot rejection. In those cases where screening is practical, failed lots may be screened
to eliminate the faulty material and then resubmitted.
There are certain materials where this normal method is not applicable. Such situ-
ations arise in connection with the ultra-pure water used for cleaning and with gases
292
SEMICONDUCTOR RELIABILITY
used in flushing and capping. The most appropriate manner by which to control the
quality of these materials (in addition to adequate "vendor control") is to monitor the
appropriate characteristics as the materials arc used. This can be done in most cases
by automatic recording monitors which have out-of-range warning indicators which
forcibly bring to the attention of the production personnel that the material is out of
limits. Typical characteristics which may be monitored are gas purity, dew point, and
water resistivity.
Environment
One of the most important factors in the manufacture of reliable semiconductors
is the manufacturing atmospheric conditions, particularly humidity and dust. To
reduce the effects of these factors to a minimum, snow-white and dry-box areas should
be used for most operations, especially those after the device has been etched and
cleaned.
The snow-white areas are rooms within rooms designed for the minimum tendency
to collect dust and maximum ability to be cleaned. All air entering the areas should
be filtered and a positive pressure should be maintained in the snow-white room so
that any airflow is outward. All entrances into the rooms should have special shoe
cleaning facilities. These areas should be vacuum cleaned regularly to remove what
dust inevitably will leak in. To assure that the snow-white facilities are in order, dust
count, temperature, and relative humidity should be monitored and recorded continu-
ously with provisions for out-of-limits warning signals.
The dry-box is a further means of controlling the atmosphere in which manufac-
turing operations are performed. This technique is used where relative humidities are
required which would be detrimental to operator health or where inert cover gases
are required. The dry-box is an enclosed chamber completely sealed with trap doors
for loading and unloading, and built in rubber arms for the operators to use for han-
dling the devices.
Tools
Another important factor in manufacturing reliable semiconductor devices is the
tooling - both design and maintenance. Important characteristics of the tooling are
that it requires little or no judgement on the part of the operator, that it be able to
be set up readily and repeatably, and that it facilitate preventative maintenance.
.293
SEMICONDUCTORRELIABll.ITY
Screening
However, as the mechanisms of failure for each type of semiconductor device
become known, means can be developed to screen out potential early failures. It must
be emphasized that no two types of transistors necessarily have the same failure
mechanisms, that no two products made by two different manufacturers, even though
the same type, necessarily have the same failure mechanisms, and that no two products
made at different times, even though the same type and made by the same manufac-
turer, necessarily have the same failure mechanisms. Therefore, reliability screening
procedures must be determined separately for each product for each manufacturer
for each period of time. The screening techniques generally are combinations of
mechanical and environmental stresses utilizing device electrical parameter pedorm-
ance as criteria of quality. Almost all semiconductor products manufactured have
passed through a reliability screen to some extent, but those products for use where
the ultimate in reliability is required have very extensive screens. This subject will be
covered in detail in a later section.
Finished Product Quality Appraisal
It is not enough to set up a production line that can make a reliable product. It is
necessary to provide some means of assuring that it has made a reliable product. That
is one of the purposes of the quality control function in most semiconductor device
manufacturing operations. This can be accomplished by properly sampling each pro-
duction lot. The production lot may be defined as anything from a part of a day's
production to a full month's production, but is most often considered as a week's pro-
duction. The samples should be tested for conformance to the specified electrical,
dimensional, and workmanship characteristics. In addition, they should be subjected
to the specified mechanical and environmental and life test stresses. Certain of these
sample tests should be restrictive, that is, if the sample fails the established criteria the
lot should be rejected. Others of these tests may be for informational purposes only,
used for optimizing the line pedormance or ascertaining the degree of safety factor
between the product capabilities and the specification requirements.
A frequent characteristic of such testing is the use of failure criteria which are
unrealistically tight compared to the normal use requirements (such as allowing only
small percentage shift of the transistor current gain, or a failure definition of leakage
current one or two orders of magnitude less than which would cause ordinary circuits
to fail). This is done to provide a more sensitive control of production line performance.
Quality Control
In most semiconductor manufacturing operations the quality control function not
only carries out the end-of-line acceptance tests outlined above, but audits the many
inspection and control operations in the incoming material and in-process areas as
well, to make certain that they are being properly carried out. This provides an inte-
grating means of tying together the great number of reliability factors important in
production. A feature of General Electric transistors which makes this integration
more effective is the date coding of each unit. Each transistor has embossed in its cap,
just prior to main seal weld, a symbol which permanently identifies the time of pro-
duction. This identification can be used to relate reliability problems with the many
variables which are monitored at the various points in production. As has been pre-
viously mentioned this can also help to identify causes of failure in the field.
APPLICATION FOR RELIABILITY
A pedect semiconductor device can exhibit very poor reliability if it is misapplied.
294
SEMICONDUCTOR RELIABILITY
295
SEMICONDUCTORRELIABILITY
best able to withstand these stresses as well as to protective measures which may be
taken to reduce the level of the stresses.
The most important environmental factors which must be considered in reliability
design are associated with temperature. Over the useful operating range, the higher
the temperature the higher the failure rate is a safe rule. Furthermore, temperature
cycling will tend to increase the failure rate relative to temperatures within the cycling
range. (This will be discussed in detail in the section on failure mechanisms.) Once
again, therefore, it is necessary to balance requirements on the system such as ambient
temperature control or cooling against the improvement in failure rates to be obtained.
Circuit Configuration
The recommendations so far have dealt primarily with the impact of the device on
the system. Let us now consider the circuit design itself. A basic concept that should
be followed for the design of reliable equipment is to make use of circuit configura-
tions which have prime dependence upon the most stable semiconductor device char-
acteristics and least dependence upon those characteristics which are least stable.
Those transistor electrical characteristics which are most stable for most transistor
types, both over temperature and time, are common base forward current gain (hrb,
hvo), the common base breakdown voltage (BVceo), the input V-1 characteristic - either
common base or common emitter (V•:n, V ov.),and the output V-1 characteristic in the
"on" condition - either common base or common emitter (Vcn1KAT), VcEcKn1).The least
stable characteristics are the leakage currents (Icno, lcF.o,Ic1m,etc.), the common emitter
breakdown voltage (BVcF.o),and the common emitter forward current gain (h, .., hFE).
Consideration of this list points to the advantage of digital or on-off circuits which
are primarily dependent upon the Vn•: and VcE1KAT> and must only be designed for a
minimum value of hFEand a maximum value of leakage current. Where analog circuits
are required, biasing methods which place most emphasis on hFn and a minimum on
hvt: and Icoo should be used. (See Chapter 7 on Biasing.) Feedback can frequently be
advantageously employed, both within a single stage and around several stages, to
minimize the effect of current gain variations and essentially reduce the requirement
on this parameter to being above some minimum value.
Operating Biases
A second circuit consideration for reliability is the choice of operating bias condi-
tions. This is a very confused and uncertain area for two reasons:
1. The effect of voltage, current, power (temperature gradient within the device),
and junction temperature on reliability depend considerably on the failure
mechanisms to which the various devices may be susceptible
2. The ratings, which are usually used as the reference point for operating condi-
tions for any particular device, are not consistently established relative to reli-
ability either from device to device, manufacturer to manufacturer, or even
stress to stress. It is obvious from this that blanket derating rules are of little
value.
If we look at rating practices for the individual stresses we would find that
1. Voltage ratings usually are established as the breakdown voltage in one or more
configurations leaving no margin of safety (furthermore, in some cases BVct:Kor
BVcE11,which are always larger than BVct:o, are specified and thus the ratings
are not always applicable to all circuit conditions)
2. Maximum collector current is sometimes rated at a level at which the forward
current gain drops to a uselessly low level, completely unrelated to reliability
296
SEMICONDUCTORRELIABILITY
3. Storage temperature is usually rated at the low end on the basis of what the
customer would like to see (-65°C or· -55°C), but sometimes at the lowest
value where internal moisture condensation will not cause malfunction. At the
upper end it is usually rated on the basis of life tests although the expected
failure level may vary widely.
4. Power is almost always rated on the basis of life test but with a wide range of
expected failure level.
Because of the variation in susceptibility of different failure mechanisms to the
different stresses, because of the variations of the existence of different failure mecha-
nisms in different device types, and because of the inconsistencies existing in the estab-
lishment of device ratings, derating should be applied with discrimination.
Caution should be applied in the matter of transients. Even though the average
voltage, or the average current, or the average power are well within ratings, extreme
care should be exercised to insure that voltage spikes (particularly important in con-
nection with inductive loads) and excessive peak currents do not occur. Either of these
can cause local hot spot temperatures which when repeated over a period of time can
cause irreversible shift of parameters and ultimately outright failure.
Considering derating generally, there are several ways in which it can improve
equipment reliability. If we assume we are concerned only in the area well away from
voltage breakdown and hot spots due to excessive current, then we can say, further,
that reducing the voltage while increasing the current has the advantages of lowering
the impedance level so that surface effects are of much less importance.
Keeping the total power low will keep the junction temperature to a minimum and
thus reduce the total junction temperature swing for which the circuit must be de-
signed. These advantages will exist independent of improvement in failure rates which
in the usual range of conditions will decrease with a decrease in stress.
Circuit Margins
A third factor in the design of reliable circuits involves circuit margins - the limit-
ing values of critical parameters at which the circuit will cease to perform satisfac-
torily. The wider the limit, obviously, the less likelihood there is that a parameter will
exceed the limit and cause an equipment failure. On the other hand, wider limits
usually result in lower performance which may decrease overall equipment reliability
through a smaller system safety factor or through added complexity of more stages.
An optimum must be established in determination of circuit margins.
A variation of this same problem of optimization has to do with the circuit per-
formance considering all components simultaneously. One approach has been to assume
that all components have their limit values in the worst direction simultaneously and
design for adequate performance on this basis. Since the likelihood of this extreme
combination happe9ing in practice is infinitesimal, it is clear that this is too conserva-
tive for circuit reliability and may result in a less than optimum reliability design for
the equipment and the system. Since the actual distribution of parameter values in
temperature and time are rarely if ever normally distributed, the formal regression
techniques cannot be applied. However, techniques have been developed which make
more realistic assumptions than the "worst case" design. 161
Device Selection
This section describes the selection of the proper device for the application. The
first step is to determine which devices have the electrical characteristics required. An
297
SEMICONDUCTORRELIABILITY
important rule to be followed is not to permit any parameter to have a critical role in
circuit performance unless it is controlled by the specification. Reliance on typical,
nominal range, or the observed distribution of small samples may be found to have
been misplaced when production quantities are ordered.
If the distribution of a parameter is important it should also be specified by such
means as a median control or by the use of dual min-max limits such that at least
x percent fall within a tight set of limits and y percent fall within a looser set of limits
(y>x). An example for hFE might be that 80% fall between 45 and 74 and that 99%
fall within 30 and 90. The importance of specifying all critical parameters has been
mentioned. It is equally important that parameters which are not important not be
specified since this will only increase cost and reduce availability.
The selection of a device must also he based on its anticipated performance under
the anticipated operating conditions. The first guide to this is the set of ratings for
each device. However, it has been clearly pointed out that ratings are not at all con-
sistent. Therefore, prior to even a preliminary selection, reliability data should be
obtained. Since the user rarely, if ever, has time or money to obtain this information
from his own testing, the device manufacturer must be able to furnish it. An evaluation
of this data should be performed considering the life test conditions and end of life
limits vs. the operating conditions and circuit margins anticipated in the circuit design.
The derating factors which are to be used here, of course, should be based on as much
factual data as the device supplier and the equipment designer have available to them
and should consider the failure mechanisms to which the device is susceptible. Further-
more, mechanical and environmental test data ·should be obtained to ascertain that the
device has sufficient safety factor to withstand those stresses to be encountered in
the equipment.
It has been mentioned previously that the matching of device to function is a trial
and error process since each step influences every other step. Thus, having made the
first selection based on the above considerations the process should be repeated, re-
evaluating each compromise in the light of succeeding decisions.
Manufacturing Precautions
An extremely important aspect of application which has not previously been men-
tioned does not have to do with the equipment design, but its manufacture. Some of
the most severe abuse that a semiconductor device encounters is received in the
handling during acceptance, installation, and testing in the users plant. Semiconductor
devices are mechanically rugged but the accelerations experienced when they are
dropped even a little distance onto a hard surface can run into the thousands of G's
and can harm units which are far stronger than necessary for the actual use conditions.
Handling procedures for semiconductor devices should include provisions for prevent-
ing such drops and, in areas where the chances are still high, for cushioning the fall
(such as foam rubber on a bench top where considerable handling is carried out).
Another means by which mechanical damage sometimes can be inflicted is the
cutting of leads with a V shape cutting edge. At the time of separation of the portions
of the leads, there is a high axial acceleration which is transmitted up the leads of the
device proper. Tools for cutting leads should have a pure shearing action. Ideally
there are no axial forces - in practice, very little. Machine shears are usually of this
design. Cutting pliers which have one face vertical should be used for hand work;
the vertical face of the pliers should face the semiconductor device.
Ultrasonic cleaning in the past has caused much trouble. When high energy ultra-
sonic vibrations are applied to semiconductors in the usual cleaning apparatus, the
298
SEMICONDUCTORRELIABILITY
probability is very high that a resonant frequency within the device will be excited.
The accelerations which are then induced in the resonant portion of the device may be
tens or even hundreds of times higher than the acceleration at the point of contact to
the cleaning bath. Precautions which should be taken are to use the lowest level of
excitation that provides satisfactory cleaning (3 psi average has been found satisfactory
in many applications), and to monitor the pressure level over all the useful area of the
bath since in most installations there are wide variations from point to point and time
to time. It is also beneficial to use mass loading of the circuit board by the holding
fixture to reduce the amount of acceleration transmitted to the device, to select an
operating frequency as far removed as possible from any important internal resonant
frequencies of the components on the circuit board, and to provide maximum stabili-
zation of the exciter.
Another important manufacturing step which requires care is soldering. Damage
to semiconductor devices by machine soldering is no problem since the temperatures
and times which provide satisfactory soldering will not raise the internal temperatures
above safe values. However, with hand soldering irons, particular care must be taken
since the soldering iron temperature is much higher than most semiconductors can
withstand. Precautions must be taken to prevent the device from coming to equilibrium
with the soldering iron. This can be done by holding the device lead with a pair of
pliers between the body and the point of application of the soldering iron and by
keeping the soldering time to a minimum.
In handling semiconductors particular attention should be given to minimizing
lead bending near the body of the device. Two types of damage may be caused -
fatiguing of the leads themselves and cracking of the glass seal. Repeated insertion of
devices into test equipment sockets, lead straightening, and mounting in the final
equipment are operations which should be particularly guarded in this respect.
One of the most insidious forms of damage that devices suffer is that from tran-
sients in test equipment. These transients can cause instantaneous failure or they may
cause performance degradation. If the transient occurs at the beginning of the meas-
urement cycle, the device will appear as a failure or as having changed characteristics
from previous measurements. If, on the other hand, the transient occurs at the end of
the measurement, the damage may not be detected until further measuremnts are
made or until the device is installed in an equipment. Whenever possible, all device
leads should be short circuited during test equipment function switching, during card
or tape punching (for automatic readout equipments), and at the time of application
of biases.
MEASURINGRELIABILITY
The previous section was devoted to the achievement of reliability; this section
will present information on how reliability can be measured.
The measurement of reliability can only be made, in the strict sense, by observing
the performance of devices of interest in the finished equipment in actual use. For
most purposes this is, of course, impractical as the information would be available
too late to do anything if performance were unsatisfactory. Therefore, measurement of
reliability must be carried out in some other way - but always it should relate to the
ultimate measurement, performance in the finished equipment in actual use. How and
when the measurements should be made depends upon what specific objectives are
most important. Short of the final use test, the most appropriate method of measure-
ment would be by simulated use conditions in actual circuits and for the length of time
299
SEMICONDUCTOR RELIABILITY
that operation is required. This is still not practical for many purposes, particularly
from the standpoint of the semiconductor device manufacturer. He must measure the
reliability of his products when he doesn't even know in what circuits they will be
used and when he only knows generally what the operating conditions will be.
The device manufacturer has three reasons for measuring reliability. He needs a
knowledge of this characteristic for the control of his production line as it is just as
important that he knows what the product failure rate is as that he know the produc-
tion line yield. Since almost all vendor-buyer contracts have either an explicit or an
implicit reliability requirement for lot acceptance, measurements must be made to
determine eligibility for product shipment. Finally, circuit and systems designers need
information on levels of reliability as a function of time, as a function of stress level,
and as a function of circuit margins. Reliability measurements made in standard life
test racks will not provide exact information but will give strong guidance for those
who must convert this information into design decisions.
300
SEMICONDUCTOR RELIABILITY
3. Usually the definition of failure is tighter than the value of the parameter
which would really cause malfunction
4. Usually the stresses - power, voltage, etc. - are more severe than in actual
equipment
5. Whereas in actual application there is a significant probability that, if a
parameter degrades, the other components in the circuit or in the system will
have enough margin of performance to compensate for it, in life testing no
compensation is considered.
To summarize, what is needed for measurement of reliability for applications
guidance are long term, low stress, multi-level life tests spread out over a large pro-
duction period. The data thus gathered must be analyzed (by attributes) to obtain the
most possible information relating failure rate to stress level, definition of failure,
and time.
301
SEMICONDUCTORRELIABILITY
techniques but the broad principle is the same. One safeguard required in using
product history is assurance of production homogeneity.
In practice, acceptance tests are designed by compromising on these five factors.
Expected failure rates are set in the range of 0.1 % to 10% in 1000 hours by selection
of test conditions and definition of failure. Recently, use of product history has been
incorporated for the lower failure rates to reduce testing costs. One practical method
which has been employed to reduce testing costs for small lots without sacrificing
reliability assurance has been the establishment of a Bonded Warehouse. Instead of
performing life test and mechanical and environmental tests for each purchase order
of 10 or 100 or even 1000 units to a particular specification, large lots, determined by
production considerations, are accepted or rejected based on a single sample. Tests
are performed under the surveillance of a government inspector or other surveillance
agency as appropriate. Accepted lots are placed in a separate segregated warehouse.
Shipments are then made to the particular specification directly to the customer. The
customer receives the test report if requested.
MEASUREMENTOF RELIABILITY FOR CONTROL
This type of reliability measurement has a lot in common with measurement for
acceptance. It must be performed on a lot basis (production lot), to be effective the
results must be known in a very short time, and the stress conditions should be care-
fully tailored to the prevalent failure mechanisms so that the most physically significant
conclusions can be reached. In the case of measurement for control, attribute analysis
is not necessary since the main requirement is to be able to ascertain whether the
product reliability is remaining constant, improving, or degrading. Direction and rate
of change of the parameter, rather than magnitude, is important.
PAST PRACTICE,FUTURE TRENDS
In the past the three -objectives of measurement of reliability have usually been
combined into a test most closely related to the acceptance requirements with test
conditions selected to protect the maximum ratings. This, of course, did not satisfy
the control requirement because the time required for decision (125 hours for first
read-out and 1000 hours for final decision} was too long for useful line control. The
average number of failures usually was 0, l, or 2 which meant that product reliability
could change radically without showing as a significant change in the test results, and
the tests were general purpose tests which were not specifically related to the prevail-
ing failure mechanism. From the standpoint .of application guidance, the test was not
long enough (10,000 to 50,000 hours would be more reasonable), the stress levels were
too high (users couldn't live with, in general, the failure rates expected at these levels),
and the test conditions were not selected so as to permit regression analysis to relate
failure rate to stress.
The trend for future measurement of reliability is to separate the three objectives,
or at least use two sets of tests in place of one. Each of these would be optimized to
achieve its particular objectives. The one set of tests would be for acceptance and
control with test conditions selecte<;lto highlight the most important failure mecha-
nisms. The analysis techniques and criteria of performance would be chosen as either
attribute or variables, dependent upon the typical device performance, so as to max-
imize the sensitivity of the test to product change. The duration would be chosen to
be one or at most a few days. The second set of tests would be directed to the prob-
lems of the user, optimized to provide application guidance. The form would be a
small scale response surface (multi-level) test designed for maximum analysis efficiency.
The stress levels would range from full rating downward. Small samples would be put
302
SEMICONDUCTOR RELIABILITY
on test from each production interval and continued on for an extensive period of time.
Analysis would be performed periodically (such as every six months).
This approach to the reliability measurement problem would result in the manu-
facture of more reliable equipments because of the improved feedback for control of
device manufacture and because of the improved guidance provided to circuit and
systems designers.
FAILURE MECHANISMS
Frequently in the preceding discussion reference has been made to failure mecha-
nisms, the physical and chemical processes which cause semiconductor devices to fail.
An understanding of failure mechanisms is essential for the design, production, and
application of semiconductors if the maximum reliability is to be obtained. Figure
18.1 shows the major failure mechanisms which affect semiconductor devices and also
shows the stresses which are most likely to indicate their presence in a device.
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• •
STRUCTURALFLAWS
-WEAKPIUITS • • • • • • •
-WEAK CONNECTIONS
• • • • • • • • •
-LOOSE PI\RTICLES
• • • •
-THERMAL FATIGUE
• • •
ENCAPSULATIONFLAWS
• • • • • • •
INTERNAL CONTAMINANTS
-ENTRAPPED FOREIGNGASES • •
-OUTGASSING
• •
-ENTRAPPED IONIZADLE
CONTAMINANTS • •
- BASE liANOAITY
CARRIERTRAPPING • •
•IONIC CONDUCTION
• • • • •
-CORROSION
MATERIALELECTRICALFLAWS
• • • •
-JUNCTION IMPERFECTION • • •
METALDIFFUSION
SUSCEPTABILITYTO
• •
RADIATION •
FAILURE MECHANISMSAND ASSOCIATEDSTRESSES
Figure18.1
STRUCTURALFLAWS
The Structural Flaws classification includes weak parts such as cracked pellets and
nicked base or emitter leads, weak connections such as poor base lead welds, loose
particles either conducting or non-conducting, and thermal fatigue. The failures in-
- eluded in this group may be due to design weakness, to production faults, or to
misapplication. The weak parts and connections and loose particles terms are self
explanatory. These can best be stimulated and detected by monitoring the device in
an operating circuit either under shock or in vibration. The latter would be particu-
larly effective if run at a resonant frequency for that portion of the device which is
weakest. This is not easy to do, however, in most devices because of the high resonant
frequencies involved, therefore a shock test is preferred. For applications encounter-
ing extreme levels of mechanical stress, static force (centrifuge) may be the only means
303
SEMICONDUCTOR RELIABILITY
ENCAPSULATIONFLAWS
The second major classification of failure mechanisms is encapsulation fiaws. These
may consist of poor cap welds~ cracked lead feed-throughs, permeability of plastic
encapsulant, or imperfect passivation. The primary way in which these flaws may affect
device performance is through the effect that moisture and oxygen which may leak in
have on the device surface performance (see Figure 18.2).m Other gases which might
penetrate may affect device performance but the fact that these two are so universally
present gives them prime position. Since the parameters which are most affected by
the surface changes are leakage current (Icao is generally most important) and common
emitter current gain (hFt: or h,.), these are usually monitored as indicators of the
presence of this class of failure mechanism. However, other specialized measurements
are required to pin point the actual mechanism as being a particular type within
this class.
Leak Detection
Humidity cycles (such as found in MIL-STD-202) and detergent pressure bomb
tests are useful to detect flaws of this nature regardless of the type of construction.
However, for certain types of construction, there are more sensitive (and more quanti-
tative) measurement methods. m The best known is the Radiffo* which makes use of
krypton 85 as a tracer gas. It is claimed that this is sensitive down to a leak rate of
10-13 cc/sec at standard temperature and pressure. However, in production, testing
time limits the useful sensitivity to about 10-11 cc/sec. There are certain other limita-
tions. The device must not retain any radioactivity when there are no leaks (this rules
out most potted devices); if there are very large leaks in the hermetic enclosure, the
tracer gas which has been forced in during exposure will escape prior to measurement
and the very bad will appear good. This situation does not exist if there is a material
within the hermetic seal which will retain any tracer gas which is forced in. In the
majority of General Electric' s gettered products, this is the case. Thus, General Electric
is able to use Radiffo for 100% screening of most of its products - detecting gross
leakers as well as marginal seals. For those cases where it does not detect gross leakers,
Radiffo must be supplemented by a detergent pressure bomb test using Ic,m, Ifmo, or
junction to cap leakage current as a detector of moisture penetration. This supple-
mentary test has a sensitivity which overlaps the Radiffo sensitivity.
•Manufactured by the Consolidated Electrodynamics Corporation, Analytic and Control Division,
Pasadena, California.
304
.r
SEMICONDUCTOR RELIABILITY
Vee
PNP GERMANIUMTRANSISTORWITH EXCESSIVE MOISTURE
11
Iceo PRESENCEOF AN N+SURFACERESULTSIN
LOW CARRIERGENERATION,CURRENT
SATURATES.
Vee
Vee
PNP GERMANIUMTRANSISTORWITH EXCESSIVE OXYGEN
Iceo
RELATIVE HUMIDITY
LEAKAGE CURRENTAS FUNCTIONOF RELATIVE HUMIDITY
A caution should be expressed here that detergent pressure bomb is not a satis-
factory method of leak detection when grease or oil is used to provide temporary
protection to the junction.
Two other methods of leak detection that have been used for hermetically sealed
devices make use of helium. In one method helium is sealed into the unit at the time
of encapsulation and then the units are tested for leakage of helium from the inside
of the unit. The second method is a form of pressure bomb. The units are subjected
to a helium environment at high pressure. If leaks exist some helium will be forced in.
Then the units are tested for leakage of helium from the inside of the unit. The sensi-
tivity of this method is reportedly about 10-h cc/sec standard. Both of these methods
suffer from the weakness that gross leaks will tend to release helium before the sensing
instrument can be applied and so gross leakers will not be detected. Thus something
similar to detergent pressure bomb is required here also.
305
SEMICONDUCTORRELIABILITY
INTERNAL CONTAMINANTS
One of the most important of the classifications of failures mechanisms is that of
internal contaminants. They can be roughly classified as moisture, other foreign gases,
and ionizable materials. They affect device operation through the induction of inver-
sion layers in the semiconductor material itself, through modification of the surface
oxides which may alter recombination center densities and rates of recombination,
through irregularities at the junctions themselves, and through ordinary surface
conduction.
Entrapped Foreign Gases
One form of failure mechanism of this general classification is that of entrapped
foreign gases. This is of most importance in greased units since the grease will protect
the junction for a time. Thus, at the time of manufacture a unit will appear to be good.
Later as the moisture penetrates through the grease to the juncion, it will affect the
unit's performance. Greases which are not penetrated by moisture eventually do not
exist. Leakage current (Icno particularly), and current gain (hn and h,.) are normally
the most sensitive parameters for the entire class of internal contaminant failure mecha-
nisms. Failure caused by entrapped foreign gases is most rapidly brought about by
high temperature storage. Even on non-greased units, high temperature operation or
storage may cause slow changes in the surface conditions resulting in shifting of
parameters.
One other factor should be considered here. Even though units work well at room
temperature and at elevated temperatures, they may fail at or below freezing because
of condensation of internal moisture. This can be detected by low temperature leakage
current measurements. Extreme care should be taken in this measurement since con-
densation external to the device may produce misleading data.
Outgassing
Outgassing is probably the most important failure mechanisms for non-gettered,
non-passivated devices. All surfaces have absorbed moisture and other gases. Under
the influence of high temperatures, these gases will gradually be released until the
concentration of gas within the enclosure is in equilibrium with gas in the surface.
Experience with ungettered units has shown that this equilibrium point, even with
processes which use very high temperature bake prior to capping, is high enough to
produce semiconductor device failure through excessive leakage current. High tem-
perature storage is the most useful stress in this case.
Entrapped lonizable Contaminants
Entrapped ionizable contaminants is a term describing a class of failure mecha-
nisms in which ionizable materials in the presence of moisture and voltage ionize at a
rate which is a function of temperature. These ions migrate under the influence of the
voltage and may set up inversion layers. 181 Figure 18.3 is a pictorial representation of
this action. Bar type devices generally are more susceptible to this migration failure
than alloys or mesa types because of the narrow base at the surface (collector to emitter
short). In rectifiers this inversion layer may short the junction to one of the ohmic
306
SEMICONDUCTORRELIABILITY
307
SEMICONDUCTORRELIABILITY
the surface treatment (degree of oxidation, etc.) and on gases in the enclosure. Initially
the fast surface states act to keep the current gain low through high surface recombi-
nation. However, if a bias current is passed through the base continuously for a period
of time the fast surface states will become filled and will remain filled. To maintain
charge neutrality the slow surface states within the oxide layer, will slowly be emptied.
Once this has been brought about, the current gain will be raised appreciably because
the fast surface states are now maintained in a filled condition by the charge in the
slow surface states. The stress which brings this about is primarily current. An increase
in temperature will increase the rate at which this action takes place. However, if the
temperature is raised beyond a critical point the amount of degradation will decrease
due to the increase in speed of response of the slow surface states. If current is re-
moved the slow and fast surface states will re-establish the original equilibrium and
the unit is essentially as it was originally. The higher the temperature the faster the
original equilibrium is re-established. The most critical parameter to monitor for this
mechanism is current gain (hFE,h, ..) although Icno is also informative.
MATERIAL ELECTRICALFLAWS
A fourth major failure mechanism category is material electrical-flaws.These flaws
consist principally of junction imperfections. The junction imperfections may consist
of two types, those which produce failure at high currents and those which produce
failures at high voltages (Figure 18.4). Alloy or diffusion may result in an unequal
penetration of the semiconductor by the doping agent resulting in the base having
one or more relatively narrow separations between emitter and collector. These points
will receive higher than average current densities which will generate local hot spots.
As total current is increased, these local hot spots may reach temperatures where further
diffusion or alloying will occur, resulting ultimately in a shorted base (collector to
emitter). In some device designs, currents above ratings, such as under pulse condi-
tions, can cause this same type of failure, even with no junction imperfections because
of the distribution of current in the base region.
INDIUM
COLLECTOR
HIGH CURRENTDENSITIES
Go
CURRENTSENSITIVEJUNCTIONIMPERFECTION
HEAVYMETAL
:tlolPURITIES
OlfFUSEOTRANSISTOR
308
SEMICONDUCTORRELIABILITY
If the resistivity of the semiconductor material near the collector junction is not
uniform, the depletion region will expand irregularly, as voltage is applied, giving
rise to differences in voltage gradients in this region. 111> Differences in voltage gradients
in turn will affect the collector multiplication factor producing unequal current distri-
bution. This will only be important at high voltages approaching BVcEo or above.
Below that point, the multiplication factor is so close to unity that variations in it
would have no detrimental effect. However, near breakdown, the high local currents
and high voltages can generate local hot spots which can lead to cumulative degrada-
tion and ultimate failure.
High current operation and high voltage operation at room temperature are respec-
tively the best means of detecting the current and voltage sensitive junction imperfec-
tions. When these faults exist and are strongly stimulated, the results are usually
catastrophic so that monitoring for opens and shorts should normally be adequate.
If life test racks are used which do not allow burn out (through protective circuits)
monitoring should be for changes in current gain (h.,.,.)or breakdown voltage (BVcw,).
METAL DIFFUSION
Another failure mechanism classification is metal diffusion. Whenever two metals
are in intimate contact, whether compression bonded, alloyed, diffused, or welded, a
disequilibrium is established. In accordance with the general laws of diffusion, the
metals on each side of the interface will diffuse so as to establish an equilibrium condi-
tion. The rate at which this takes place is a function of temperature and the diffusion
constants in the metals involved. Two general types of problems may exist; diffusion
of dopants and ohmic contact material into the semiconductor material, and diffusion
of ohmic contact materials and lead materials into each other. In the first type this
may cause a decrease of base width with a resulting reduction in reach-through volt-
age (for some abrupt junction types) or a change in the resistivity profile which might
result in a change in avalanche breakdown or other parameters. In the second type,
changes which have been observed are weakening of base or emitter leads by the
creation of brittle alloys and increases in ohmic resistance through the forming of high
electrical resistivity alloys. In general these types of failures are of minor concern
since even if the failures could occur, the rate of diffusion is so low that it would not
occur in the useful life of most equipment.
SUSCEPTIBILITY TO RADIATION
A failure mechanism which is only important in special applications - but then is
vital - is that of susceptibility to radiation. There are two modes of failure
1. Temporary malfunction caused primarily by transient gamma radiation pulses
2. Permanent degradation resulting primarily from the total fast neutron
dosage. no.,1,
The temporary degradation is due to both volume and surface ionization resulting
in excessive leakage currents. These leakage currents may in some circuits produce
permanent damage through thermal nm away. Some decrease in current gain is some-
times observed during the transient burst.
Gamma radiation may cause permanent degradation as well as temporary if the
total dosage becomes high enough. However, in the usual case, the fast neutron total
dosage reaches the degradation level first. Degradation in this case is the result of
decrease in the base minority carrier lifetime which in turn causes the current gain
to decrease. Since this is a volume phenomenon, it is relatively predictable as opposed
309
SEMICONDUCTORRELIABILITY
to the transient leakage current effects which, because of the surface contribution,
are relatively unpredictable. Exposure to a radiation environment is the only sure
means of determining the ability of a device to perform in a particular radiation
environment. Since this is extremely expensive and available time on appropriate
reactors is so limited, a reasonable approach to this failure mechanism problem would
be a unified, industry wide, semiconductor device evaluation program. Up to the
present, no such program exists.
FAILURE ANALYSIS
Both in the production of semiconductors and in their use, it is important that
failures be carefully analyzed. Failure analysis when it is correlated with use (or test)
conditions and with manufacturing variables can be the most powerful tool in improv-
ing reliability. It normally will indicate whether the failure was due to misapplication
or operating abuse (screwdriver mechanics), to poor workmanship or materials, or to
inadequate device design. This obviously is a start on the road to correction.
Since failures are relative rarities and since they are so vital in learning how to
improve reliability, it is important that failure analyses be performed by properly
trained personnel carrying out a thoroughly thought-out plan. Otherwise, not only
may the real reason for failure be obscured but incorrect conclusions may be drawn
which may lead to much wasted effort or even to a decrease in reliability. The subject
of failure analysis is too complex to cover here in any detail. The most important areas
of analysis that may be used to isolate the causes of failure are
1. Complete summary of operation and production history (as complete as
possible)
2. Measurement of electrical parameters, including static characteristic curves
3. Special tests, more than one of which may be run in a sequence, such as
(a) low temperature lcRo
(b) non-operating high temperature storage
(c) high temperature with back bias
(d) high temperature with forward current
4. Radiflow leak detection (where appropriate)
5. Gas analysis (mass spectrometer)
6. Special tests on the opened unit, more than one of which may be run in a
sequence such as those listed above in number 3
7. Visual examination
8. Reprocessing and testing; such as rewash, re-etch, etc.
9. Metalographic Analysis.
Of course only those steps need be performed which are meaningful and only enough
of them to draw a conclusion.
FAILURE DISTRIBUTIONS
Reliability, as defined at the beginning of this chapter, is the probability of satis-
factory performance for a specified period of time. If an appropriate statistical model
of this probability as a function of time can be found, it can be used to advantage in
improving reliability. Systems and circuit designers can take advantage of this to esti-
mate reliability when optimizing their designs; it can also be used in planning main-
tenance systems and in determining the logistics requirements. Device manufacturers
can use this reliability model to optimize life test acceptance plans, to screen produc-
310
SEMICONDUCTORRELIABILITY
tion so as to weed out potential failures, and to provide clues to failure mechanisms
whose elimination will ultimately lead to product improvement.
Relationships such as these are only useful if the observed probability of survival,
R(t), or the more commonly used term, instantaneous failure rate, Z(t), can be
expressed in mathematical terms and if the product characteristics are consistent
enough to make calculations meaningful. Extensive testing by many semiconductor
manufacturers have resulted in three mathematical models being found applicable
over certain portions of the useful life of the devices. These are the Weibull, <12 •13 • 10 the
exponential,<111•1111 and the lognormaJ.07 • 1R> Figure 18.5 shows these three distributions
in the form of the density function, f(t), and the instantaneous failure rate, Z(t). It will
be noted that the exponential distribution is the same as the Weibull with the shape
factor, fJ, equal to unity and the mean life, 0, equal to the scale factor ci. For the case
of the exponential distribution the instantaneous failure rate, Z, is constant in time
and equal to the reciprocal of mean life ( Z(t) = X =¾).
For the Weibull distribution, the failure rate is decreasing continuously for values
of Pless than unity and increasing for values of fJ greater than unity. In some situations
it may permit a better fit of the model to the data if a delay time, t, is introduced. This
means that no failures occur until after a time, t. This delay is usually symbolized by
-y. This changes the equations for the Weibull in Figure 18.5 to
311
SEMICONDUCTOR RELIABILITY
.......
---
TIME (t) TIME (t)
f(t)
~.,a-07 exp rt fa]
•r---a-j Z(t)::
J3t<a-1)
-a--
Z(t)
R(tl•I-F(t)
LOG NORMALDISTRIBUTION
mean, µ.. In practice, the practical parameters used are rr and elL. This latter is the
median life, the time by which one-half the units are expected to have failed. For the
lognormal distribution, the median life is a more convenient measure of central ten-
dency than the mean life because, unlike the latter, the median is independent of the
312
SEMICONDUCTORRELIABILITY
standard deviation. The lognormal differs from the other distributions in that over one
portion of time the failure rate is increasing while over another portion the failure rate
is decreasing. In fact, the instantaneous failure rate, Z(t), is zero both at time zero
and at infinity.
1111
~ wo;:.~::;1P
------ j •
..__________oESIGN (WEAROUTI
TIME TO r--- FAILURES
FAILURE
PROBABILITY
OENSITY
FUNCTION
TIME TO FAILUREIll
GENERALFAILUREPROBABILITY
DENSITYFUNCTION
Figure18.6
The delay (A) is due to the fact that the definition of failure almost always incorpo-
rates a safety factor beyond the initial parameter values and it takes some finite time
for any units that are initially good to degrade to this end point limit. Of course, the
lower the stress level, the longer this would be. At high stress levels this might be so
short that it might not be seen. Region B is the transition region as the first units begin
to degrade beyond the design margin. Region C covers the time that failures due to
workmanship faults drop out. This generally is a decreasing failure rate and has been
so observed in transistors, vacuum tubes, and other components. Two distributions
have been found to fit regions A, B, and C very well. They are the Weibull distribu-
tion with a shape factor, {J, less than unity and a delay term, 'Y, and the lognormal
distribution. On transistor data, it has been found that these two can be equally well
fitted to large quantities of data on many transistor types.
In Region D the failure rate appears to be essentially constant and relatively low.
It can be hypothesized that this constant failure rate condition occurs because of the
overlap of the decreasing failure rate of the workmanship failures and the increasing
failure rate of the wearout failures of Region E and F. These overlapping distributions
are shown by the dotted lines.
This generalized failure distribution model assumes that eventually everything
wears out. In some component parts such as batteries or light bulbs the wearout
mechanism is the exhaustion of a non-replaceable material. In transistors it is not so
clearly defined. However, it may be the eventual leakage into the encapsulation of
enough moisture to degrade this surface (even for well passivatd units this is possible)
or it may be mechanical fatiguing of leads or mountings, or diffusion of doping mate-
rials or impurities into the semiconductor material. From the physical laws associated
with these possible failure mechanisms, it is likely that the failure distribution in
313
SEMICONDUCTOR RELIABILITY
2
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FAILURE RATE OBSERVATIONS
Figure 18.7
314
SEMICONDUCTOR RELIABILITY
regions E and F follow a lognormal distribution. un Considerable data from high stress
level life tests show this pattern. Based on this, region E is the increasing failure rate
portion of the lognormal distribution whereas region F has a decreasing failure rate.
Figure 18.7 presents four sets of failure rate observations which illustrate various
portions of the general failure distribution model. Curve A shows regions A, B, and C
for a germanium PNP alloy transistor life tested at shelf storage (25°C). Curve B
shows the failure rate of an NPN silicon grown diffused transistor operated at full
power rating (500 mw). Here the delay is so short that it is not observed in the opera-
tion of the life test. Curve C shows the long term performance of a PNP germanium
allow transistor tested at rated storage temperature (I00°C). This illustrates regions
A, B, C, and D. The final curve, D, illustrates wearout, region E. The data was obtained
from storage life tests at conditions well beyond the ratings on the same PNP ger-
manium alloy type as that in curve A. The storage test was run at 135°C compared to
a maximum rating of 100°C.
PUTTING FAILURE DISTRIBUTIONSTO WORK
It has been pointed out that in regions A, B, and C both the Weibull and the log-
normal distributions can usually be fitted to transistor life test data equally well. From
a physical standpoint, the lognormal distribution appears to be more reasonable in
that discontinuities such as those introduced by a delayed Weibull are not likely in
nature. On the other hand, from the standpoint of the development of screening tech-
niques and of improving sampling plans, the errors introduced by the use of the
Weibull are small. The advantages of the Weibull as a working tool are primarily the
completeness with which the shape factor, fJ, describes the rate at which the failure
rate changes and the simplicity of the equations relating probability of failure to
average failure rate, instantaneous failure rate, and mean life. ua,
In the next section, consideration will be given to bum-in for the improvement of
reliability. An important factor in selecting the stress conditions for burn-in is the
Weibull fJ, the set of burn-in conditions with the lowest fJ (less than unity) will bring
about the greatest improvement in failure rate in the least time. On the other hand,
a fJgreater than unity indicates an increasing failure rate in which case a burn-in actu-
ally will make the resulting product less reliable.
In the matter of sampling plans, the knowledge of the Weibull parameters of the
failure distribution can lead to savings in testing costs if the distribution has a fJ
appreciably less than unity (and no appreciable delay). For example, if the beta is 0.5
which is typical, testing time can be cut to one-half by increasing the sample size by
only 40% without changing the basic sampling plan. The result is a savings of 30%
in the number of socket hours required. On the other hand, if the distribution has a
delay, 'Y, or an increasing beta, this is a clear warning that reduced hour testing is
dangerous and should be avoided. Much work is presently being directed, industry-
wide, to greater use of the knowledge of failure distributions, particularly in the field
of life test sampling plans.
ACCELERATION
FACTORAND MODULUSOF FAILURE
Frequently through this chapter there has been mention made that high stresses
generally will cause more failure than low stresses. It has also been pointed out that
the definition of failure also determines the probability of failure. The subject of this
section is the relationship between the probability of failure, stress level, definition of
failure, and time. Much must be learned before this relationship can be based on solid
theory; but a start has been made in its empirical determination.
315
SEMICONDUCTORRELIABILITY
DEFINITIONS
Before continuing, two terms must be defined: accelerationfactor and modulus of
failure. In the past the term acceleration factor, has been used to mean the ratio of
failure rates at two stress levels or the ratio of times to obtain the same cumulative
failure at two stress levels or the ratio of cumulative failure at a particular time at two
stress levels. This one term can unambiguously mean all three of these ratios if - and
only if - the instantaneous failure rate is constant over all time and if we are only
concerned with low cumulative failure levels (say less than 10%). However, as has
been shown in the previous section, constant failure rates are not the general rule.
Therefore, more generally applicable definitions of terms relating failur~, time, and
stress level are needed if they are to be meaningful. Consider, first of all, the ratios of
the failure rates. Referring to the generalized failure probability density function
shown in Figure 18.6, it can be seen that the multi-valued nature of the instantaneous
failure rate (increasing, decreasing, increasing, decreasing) would lead to an ambigu-
ous and generally meaningless factor if ratios of instantaneous failure rates were related
to stress levels. For this reason no such term should be used.
Next let us consider acceleration factor. Acceleration is generally regarded as the
speeding up of a process or action. For this reason it is logical to apply the term,
acceleration factor (A) to the ratio of the time of occurrence of a specified cumulative
failure level at one stress level to the time of occurrence of the same cumulative failure
level at a higher stress. Figure 18.8 shows hypothetical cumulative failure distribu-
tions for two life tests at different stress levels. These are the cumulative distributions
associated with the general failure distribution model of Figure 18.6 with different
time scales. The two equations for A below Figure 18.8 illustrate how the accelera-
tion factor is determined. It is seen that, as the name implies, it is the factor by which
the time to observe a particular level of failure is speeded up or accelerated with the
increase of stress. From the illustration, it can be seen that this is not necessarily a
constant factor as the level of cumulative failure is changed. The third ratio which
has been loosely called acceleration factor concerns the ratio of cumulative failure
levels at a particular time. A new term should be used for this. It is the modulus of
failure (M) and is defined as the ratio of the probability of failure prior to a specified
time at one stress to the probability of failure prior to the same time at a lower stress.
The two equations for M below Figure 18.8 illustrate how the modulus of failure is
determined. It is the factor by which the level of failure is increased with the increase
in stress. The curves illustrate that this too is not a constant factor as time is varied.
A question which might be raised is why we need two different terms. To answer
this let us first consider how the two might be applied. The first example is an equip-
ment design problem where there is a specified operating time. The question to be
answered is how operating stresses affect the failure level. Since we have a fixed time,
the factor we need is the modulus of failure, M. In a second example, a device manu-
facturer is interested in performing an accelerated life test for lot acceptance purposes.
He is interested in observing in one week the same level of failure that normally
would take 3 years to occur. Here the failure level is fixed, the factor we need is the
acceleration factor, A. Since in general neither A nor M is constant over all time and
all levels of failure for a given device type and pair of stresses, it is clear that they
are not generally equal nor related by a constant factor. Therefore, we must have the
two factors for use in the different kinds of problems.
So far only stress vs. failure rate and time have been mentioned. The same kinds
of relationships would hold if instead of two stress levels, we used two levels of defini-
tion of failure, the more stringent definition of failure taking the place of higher stress.
316
SEMICONDUCTOR RELIABILITY
IOOr-------------------------------.
I
I
I
I
I
I
-------•----- ---- - ---
1
LOW STRESS (SL)
LL.
F1 M::=---~---......,.i------,L---------------~----'
t3 t4 t5
TIME TO FAILURE ( t)
t5(F4,SL) F504,SH)
A( F4 'SH ,SL)•------- M(t4,SH ,SL )a__,_ ____ .;...
t2 (F4, SH) F3(t4, SL)
ACCELERATION
FACTORAND MODULUSOF FAILURE
Figure18.8
RESPONSESURFACE RELATIONSHIP
Figure 18.1 showed that there are many stresses which induce failure. It would be
highly desirable, particularly from the circuit designer's viewpoint to know not only
how each stress alone affects the probability of failure but also how the stresses in
combination affect it. The response surf ace relationship provides the answer to this
question. A response surface relationship can be considered as a multi-dimensional
"surface" relating the probability of failure to many stresses at a given time. F(t1) is a
function of voltage, current, power, ambient temperature, junction temperature, cycling
rate, etc., at time (t1). A response surface can also be solved for the time to observe a
given percent failure as a function of the stresses but since the first form is generally
more applicable to the user's needs, that is the one most commonly solved.
To determine the relationship mentioned above requires considerable testing and
analysis. This is particularly true when the stresses near those the circuit designer
might employ are considered. If the device is worth using, the failure level will be so
low at the use condition that extremely large sample sizes are required. Furthermore,
limitations on testing accuracy and reliability provide a limit of significance inde-
pendent of the sample sizes. Investigations are currently underway to determine means
of making use of stability data under these circumstances; however, at present the
solution is to test at high levels and to extrapolate the relationship down to the low
levels. There is, of course, a major weakness in this approach in that there is no assur-
ance that the failure mechanism which is accelerated at high stress levels is the one
317
SEMICONDUCTORRELIABILITY
that is important at low stress levels. For example, it is possible that at high power,
the failure mechanism may be the excessive shift in current gain brought about by
minority carrier trapping. At low power, failures may be caused by moisture leaking
into the case through faulty seals. Although this type of risk exists with extrapolations
there is presently little alternative within the realm of economic feasibility.
One important safeguard which should be included within response surface evalua-
tion program is a field service performance feed back. Long term service in actual
equipment with comprehensive reporting on failures and failure mechanisms can pro-
vide the cross check on the extrapolated estimations that is needed. Such information
over a period of time can build up an understanding of the relationships between high
and low performance that can make extrapolations very useful.
SCREENING
The constantly increasing transistor reliability requirement is imposing a more
and more severe responsibility on transistor manufacturers to eliminate not only poor
designs and poor workmanship but even the so called freaks. Freak transistors may be
considered to be the result of unusual combinations of factors which elude ordinary
detection but will in use fail relatively early in life relative to most of the units. On
large scale production lines, it is unreasonable to expect that this freak rate will be
reduced to a level acceptable for some of the more severe reliability requirements.
Even in those cases where the reliability requirements are no more severe than good
production techniques can satisfy (for example 0.1 % to 0.01 % failure in 1000 hours),
the assurance of this quality on either a lot basis or on a production history basis is
not generally economically feasible. An approach to this problem which both increases
the likelihood of detection of freaks and at the same time provides an indirect means
of measuring reliability is screening (or post fabrication processing). Broadly, this con-
sists of performing a sequence of inspections, measurements, and tests on all units,
each with a set of criteria for rejection, then submitting all of the units remaining to a
low level operating bum-in. This last provides final screening and, simultaneously, a
measurement of the quality of the product.
In setting up the screening sequence, it is important to keep in mind what is being
sought - freaks. Since these are generally unpredictable it is necessary to provide a
screen that will stand a very good chance of detecting the freaks regardless of the form
they take. Of course an understanding of the product can lead to an optimization
through the knowledge of tendencies for one type of freak or another to occur, but too
much reliance should not be placed on this knowledge. The screen should consist of
inspections, measurements, and tests. Inspections and measurements are screening
operations which do not affect the individuals but merely measure some significant
characteristic. Tests are screening operations which apply a stress to the units in order
to determine the unit's strength. In applying these stresses, it is important not to
destroy units which would provide satisfactory performance in ordinary use and, even
of more importance, not to damage good units in such a way that they appear satis-
factory but have a reduced life expectancy. A knowledge of the product including
data on long term life tests at high stress conditions provides guidance in this respect.
Below is a general outline of a screen sequence which might be used. (Steps 1
through 7 are primarily inspections and measurement).
I. Visual inspection - lead condition, critical dimensions (an example is misalign-
ment of cap and header leading to greater tendency for development of leaks), paint
or plating, etc.
318
SEMICONDUCTORRELIABILITY
319
SEMICONDUCTORRELIABILITY
348 mw and compared on the same test to units not subjected to the screen, there was
found a reduction in cumulative failure of 8 to 1. The tests are continuing to strengthen
the measure of product improvement for long life operation.
320
SEMICONDUCTOR RELIABILITY
For those who would wish to plot the data on cumulative probability paper (such
as Weibull or lognormal), the following formula can be used
321
SEMICONDUCTOR RELIABILITY
0
~
--------------+
3 ______________ .,.LIMITS:
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TOP NO.: NO. OF FAILURES
BOTTOM NO.• NO. OF UNITS
322
SEMICONDUCTOR RELIABILITY
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324
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325
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_J
--
0 4 6 10 0 4 6 8 10
© THOUSANDHOURS
OF TEST ® THOUSANDHOURSOF TEST
327
SEMICONDUCTORRELIABILITY
Graph C - The data shown on this graph is on early production units. This cycled
operating life test data indicates that out to 10,000 hours there is a decreasing
failure rate.
Graph D - More recent production showed a marked reduction in failure level. This
graph shows this for the first 1000 hours. Even more recently, the rating on this
type has been increased to 200 mw. Based on a sample size of over 400 units,
there have not been sufficient failures to establish a failure pattern. The average
failure rate for the latest product at 200 mw is compared on this graph to the
average failure rate on earlier product at 150 mw. The improvement is evident.
Graph E - The back bias life test data shown here consists actually of two life tests
combined, one at 55°C and the second at 75°C. There were approximately equal
sample sizes in each and approximately the same percent failure. The failure
rate decreases very rapidly indicating the possibility of this test as a reliability
screen.
Graphs F through I - As in previous stability data, most change occurs in tl1e first few
thousand hours with a high degree of stability beyond. Icao is the most common
source of failures; but as can be seen from the medians, the bulk of the distribu-
tions are remaining constant or even decreasing their leakage current.
7
4/1000
6 2N705 FAMILY
PRODUCTIONPERIOO:3RO QUARTER1960
OYENSTORAGE@)1oo•c
5 SHADEDAREA•80% CONFlDENCE
Cl) TOP NO.• NO.OF FAILURES
a: BOTTOM
NO.•NO.OF LNTS
~ 4
2/996
LIMITS: INITIAL END OF LIFE
0 hFE @Ic•IOMA ~• -0.3V 0.8 INT VALUE
~ Icao@5V MAXs,.a
1.3 INT VAWE
IOp.a
ij
a:
3
!
i'f
2
.ft
14/970
10/980
6K OK IOK
® HOURS
6,--..--...,..........,...-,----,----,-...-..---r---r-"""T""--r---r--ir--..--r---r--.----,---,--,
2N705 FAMILY
PRODUCTION PERIOD: 1960-1961
w 51--+-+--+----t---t-t--+--t--r OVEN STORAGE @ 150° C
12: SHADED AREA -eo•,.
CONFIDENCE
S4 g;~~~~:Es
JgiT~~:~8: NO.
~ LIMITS: INITIAL ENO OF LIFE
g 1ceo@5V 3p. o MAX 6,- o MAX
;5 3 hFE@)]:c•IOMA
~ YcE•0.3V 30 MIN. 20MIN.
@ HOURS
328
SEMICONDUCTOR RELIABILITY
2N705 FAMILY
~
l,l,,>,il"1--~-----
8 ~~-+---+-+--+---i PRODUCTIONPERIOD:3RD QUARTER1960
CYCLEDLIFE PW 150MW VclOV. TA 2s•c
SHADEDAREA• 800/e CONFIDENCE
::, 7
0
J:
~~-+-+~1--+---i ~g;T~
•N~~ <:a.
~L~:i~i
~a--+---+----,~+--1 LIMITS: INITIAL END OF LIFE
0 ti,,~• IOMA't£•0.3V
0 0.8 INT.VALUE
~ 6 ~~-+--+~1--+---i l.31NT.VAWE
..... Icao (ii) 5V. MAX. IOJ&O
II.I
~ 5
a::
II.I
a::
::,
..J
er
LL.
4
~
4K 6K IOK
HOURS
PT• 200MW
Vc 11 IOV
CYCLE• 50/10
TA =25°C
PRODUCTION PERIOD
2nd HALF 1961
DISTRIBUTIONNOT SHOWN
0.47%
800 1000
@ HOURS
3.29
SEMICONDUCTOR RELIABILITY
2N705 FAMILY
PRODUCTION
PERIOO:
1960-1961
OL-...1....-L..---1.-L-..L..-L.--'----L..-...1.--"
200 400 600 800 1000
® HOURS
_1_ ..
I
10
V V' 95 TH PERCENTILE
..,.,,
-/
8
I- Lo.-" - - 90 TH PERCENTILE
V
/
2N705 FAMILY
6 t-----+--+---i------+--t----t--t--+ PNP GERMANIUMMESA
0
m -----------+--+-+- ~i~~g:~~f/;029223
u
H ---1-+---+--+----t-t-----+--+--+ P~~~~~rl=~~IOD: THIRD
---1-+---+--+----t-t-----+--+---+ OVEN STORAGE • __
__________ _..,--+ TEST CONDITIONs:100°c
MEASUREMENT OVEN- - -
CONDITIONS:
4
l:cao®VcE•ISV
2-----+---+--+--+--l---+---+--+----t-+-- ________ _
5 TH PERCENTILE
O.._.....___I._K
__ 2._K_._
___3._K__.___,4K---...__.5K_,.___.6K-,.__7...,K_..._8...,K_..._9...,K---'--IOK...,_...,
© TIME IN HOURS
330
SEMICONDUCTOR RELIABILITY
200 I I I I
I
95th PERCENTILE
I I I
I I I I I I I I I I
180
2N705 FAMILY
PNP GERMANIUMMESA
LOT: 029222- 029223
160 AMT:93 UNITS
PRODUCTIONPERIOD:
THIRD QUARTER1960
140 OVEN STORAGE
TEST CONDITION IOO• C OVEN
MEASUREMfNTCONDITIONS:
hFE 0 \t• 3tN Ia •IMA
120
~ !!Dth p~..,..,."1'11 ~
80 .,,,,,..
....
60
5th PERCENTILE
40
20
0
IK 2K 3K 4K 5K 6K 7K 8K 9K IOK
@ TIME IN HOURS
10 "
V/
~
/" I
V
95 TH PERCENTILE.., /
/" /90
1
TH PERCENTILE
8
,~ / ,I
'\ / j 2N705 FAMILY
-
6
.'\ V
/
V PNP GERMANIUM MESA
LOT: 029205-029204
AMT: 87 UNITS
PRODUCTION PERIOD:
--
J
V
I THIRD QUARTER
INTERMITTENTLIFE
TEST CONDITIONS:
1960
-
,__
--
TA"25°C PW•ISOMW
0
CD
u
I Ve ••7.5V,Io a20MA
H MEASUREMENTCONDITIONS:
4
Iceo @) VcE= I5V
------
50 TH PERC£NTILE
2
- i-- r-
I I I I
- 5 TH PERCENTILE
I I
0
IK 2K 3K 4K 5K 6K 7K 8K 9K IOK
® TIME IN HOURS
331
SEMICONDUCTOR RELIABILITY
200
180
,,/
I I
95TH PE~EN~
I I I
-- -
2N705 FAMILY
V PNP GERMANIUM MESA
160 LOT: 029205-029204
AMT: 87 UNITS
PRODUCTIONPERIOD:
THIRD QUARTER 1960
140 INTERMITTEN LIFE
TEST CONDITION:
TA•25 •c,
PW• 150MW,
120 V1 •7.5, I 1=20MW
MEASUREMENTCONDITION:
hFE@Vc•3V,.Ia•IMA
...
...,oo
.&! I I I I I
50TH PERCENTILE
80
V
V
60
1/v r--,..r-,...._
40
r--,..
r---. 5TH PERCENTILE
~
-
20
0
IK 2K 3K 4K 5K 6K 7K BK 9K IOK
® TIME IN HOURS
0.5K IK I.SK
® HOURS
332
SEMICONDUCTOR RELIABILITY
5
4
,__ - 2Nl613 FAMILY
--
~
I ...,...i.,
-
>
.
0
U>
>~ 10
90TH%
I
1-.,..
,/
V
I,-"...-
@
0
i7 - nyw
I 0
---
i" 6
~ 5
0 MEDIAN -
B4
t-t
'3 I '
20TH%
-
2
IOntO/a
I
IK 2K '3K 4K
@ HOURS
I I
40
-90TH%
--1---'l I
- - --- -
-----
80TH%
~
~- ~
~
r-
30 ....MEDIAN
I I
l&I
I&.
s::. -20TH%
r--i--.
~<2!!:!.!c-
20
2Nl613 FAMILY
INT OP LIFE'@ 800MW GOV- -
hFE VS TIME
--
'a) Vc=IOV ICal50MA
LOT NO. 126404 --
QUANTITY-27
IK 2K 3K 4K
@ TIME IN HOURS
RELIABILITY DATA FOR A SILICON DIFFUSED
PLANAR PASSIVATED TRANSISTOR
Figure 18.12
333
SEMICONDUCTOR RELIABILITY
REFERENCES
m Peck, D. S., Semiconductor Reliability Predictions from Life Distribution Data, Semiconductor
Reliability, p. 62, Engineering Publishers, Div. A. C. Book Co,, Elizabeth, N. J., 1961.
<:nGutzwiller, W., Thermal Fatigue and the G.E. 1N2154-60 Medium Current Silicon Rectifier,
Semiconductor Products Department, General Electric Co., Syracuse, N. Y., ( 1961 ).
c:o See Reference ( 8 ) .
w Battelle Memorial Institute, "Task 511, Leak Detection," Battelle Memorial Institute Report,
Signal Corps Contrnct DA-36-039-sc-13212.
<11> Hangstefer, J. B. and Dixon, L. H. Jr., Transistor Reliability, Electronic Equipment Engineering,
March '59 (p. 91-94), April '59 (p. 37-40), May '59 (p. 44-48), and June '59 (p. 69-72).
<11> Vezean, Waldo A., Some Applications of Monte Carlo Methods to.Failure Prediction, Proceedings
of the 6th Joint .Military Industry Guided Missile Reliability Symf}osium, Vol. 2, Feb., 1960,
pp. 22-31.
m de Mars, G., Some Effects of Semiconductor Surfaces on Device Operation, Semiconductor
Products, April '59, p. 24.
<"1 Atnlla, M. M., Bray, A. R., and Linder, R., Stability of Thermally Oxidized Silicon Junctions in
Wet Atmosphere, Proceedings of the Institute of Electrical Engineers, Vol. 106, Part B, Supp.
No. 17, pp. 1130-1137, March 1960.
10> Shockley, W., Problems Related to p-n Junctions in Silicon, Solid State Electronics, Jan. '61, p. 35.
00 > Bilinski, J. R. and Morill, R., Selecting Transistors for Radiation Environments, Electronics,
Dec. 25, 1959.
<m Miller, B., Industry Probes Nuclear Pulse Radiation, Aviation \Veek a11d Space Technology,
Aug. 8, 1960.
0 2 > Jones, L. F., Determination of Short Term Life Test Distributions, Semiconductor Reliability,
Vol. II, Engineering Publishers, Division A. C. Book Co., Elizabeth, N. J.
1131 Blakemore, G. J.; On the Use of Weibull Sampling Plans; Semiconductor Reliability, Vol. II.,
Engineering Publishers, Division A. C. Book Co., Elizabeth, N. J.
cu, Kao, J. H. K., A New Life Quality Measure for Electron Tubes; Transactions of the Professional
Group on Reliability and Quality Control of the IRE, Vol. PGRQC-7, p. 11, April 1956.
0 111 Philco Corp., Transistor Lot Acceptance Specification Based on a Constant Failure Rate, Specifi-
cation Number 43-028A, Lansdale Division, Philco Corp., 1961.
081 Epstein, B. and Sobel, M., Some Theorems Relevant to Life Testing From an Exponential Distri-
bution, Proceedings of the American Mathematical Society, Vol. 25, p. 373-381, 1954.
m, Peck, D. S., The Uses of Semiconductor Life Distributions, Semiconductor Relial,ility - Vol. II,
Engineering Publishers, Division A. C. Book Co., Elizabeth, N. J,
11" 1 Goldthwaite, L. R., Failure Rate Study for the Lognormal Lifetime Model, Proceedings of the
Seventh National Symposium on Reliability and Quality Control, Jan., 1961.
cu,, Bowker, A. H. and Lieberman, G. J., Engineering Statistics, Prentice-Hall, Inc., Englewood
Cliffs, N. J., Chapter 11, p. 372.
334
SILICON CONTROLLED
SWITCH
WHAT IS IT?
• silicon 4 layer PNPN structure ANODE
• all layers accessible
• T0-5 electrically isolated case
• military reliability
• industrial prices
• available in production quantities
l
TYPICAL
• NPN silicon transistor A JUNCTION
• PNP silicon transistor BREAKDOWN
VOLTAGES
• N type negative resistance (Trigistor, Tran-
switch) p
• S type negative resistance (Binistor) N
• four layer diode (Shockley Diode) Ge
• zener diode
C O O A
• ring counter
• shift register
• relay driver BASING- BOTTOM VIEW
• indicator lamp driver
• low level SCR
• low level complementary SCR
335
SILICON CONTROLLED SWITCH
INTRODUCTION
The General Electric 3N58 series device (formerly ZJ93) is a silicon controlled
switch {SCS) designed for use in industrial and military digital computer and control
applications. It is a four layer (PNPN) device with all four layers accessible. It can
therefore be used as a PNPN controlled switch, NPNP controlled switch, NPN tran-
sistor, PNP transistor, N type negative resistance device, S type negative resistance
device (negative conductance), four layer diode, and zener diode. It is characterized
specifically as a PNPN and a NPNP device with designations 3N58 and 3N59.
Its TO-5 isolated case package, extremely high firing sensitivity, and forty volt
rating make it suitable for applications including sensitive voltage level detectors,
bistable memory elements, binary counters, shift registers, ring counters, telemetry
oscillators, time delay generators, pulse generators, tone generators, relay drivers, indi-
cator lamp drivers, SCR trigger generators, low level SCR and low level complemen-
tary SCR. The IRE semiconductor symbol for this device is shown in Figure 19.1.
A= ANODE
C = CATHODE
GA= GATE ADJACENT
TO ANODE
Ge= GATE ADJACENT
TO CATHODE
( B)
This symbol offers a clear picture of the semiconductor structure of the device. In
circuit applications, however, the alternate symbol suggested by current silicon con-
trolled rectifier usage may be of help in visualizing the significance of the gates.
ALUMINUMWIRE FROM
TAB ON HEADER THE ANODE
CATHODE GATE GA
CERAMIC DISC
METHOD OF CONSTRUCTION- TOP VIEW
Figure 19.2
336
SILICON CONTROLLED SWITCH
CONSTRUCTION
The SCS is essentially an NPN diffused base transistor with a third junction to
form a PNPN device. The transistor structure is a bar approximately 10 mils in cross
section and 10 mils effective length. For mechanical strength, low thermal resistance,
electrical case isolation, and manufacturing ease, the bar is mounted on a ceramic disc
or fixed-bed mounting. This method of construction is shown in Figure 19.2 below.
A wafer of non-porous ceramic material which has the same coefficient of thermal
expansion as the pellet forms the base of the mechanical structure. Gold is deposited
on the disc in four areas to form electrical contacts. Header wires projecting through
holes in the disc are bonded to the disc with a gold-tin alloy. The transistor bar is
mounted across a narrow slot in the disc with the diffused base region over the slot.
The bar is alloyed into gold areas on either side of the slot. Aluminum wires alloyed
into the bar make the remaining two connections. The aluminum wire to the diffused
base forms the cathode gate (G,.). The other wire forms the anode (A) junction. Header
leads are made of kovar with a coating of 24 carat gold of 0.04 mil minimum thickness.
To ensure stability with life all parts are outgassed prior to capping in a nitrogen
atmosphere. Two gettering materials "molecular sieve" and fiber glass, used to absorb
any possible outgassing materials after capping, are firmly held at the top of the cap.
They absorb water vapor as well as many organic vapors. The case meets the T0-5
outline and has all leads electric-ally insulated from the case. The lead locations and
packaged dimensions are shown in Figure 19.3.
DIMENSIONS WITHIN
JEDECOUTLINE
r
,260MAX .ISOMIN
T0-5
.2SOMIN INOTEI)
j_
I01I h Thiszoneis a,ntrolled!or Iulo,
matichandling.
Thevariation in actual
1.s~ a~ I dizmeWwithinthiszoneshallIIGImud
.010.
4 LEADS ~370MAX__.,j
I01I :t1 Musuredtrcmmu.diamdircl
.017 !·is~OIA .360MIN theactualdeYiat.
INOTE3) 11111111 Thespecifiedleaddiameterap.
pliesin thezonebet'fflll .050and.250
fromthe baseseal 8etffln .250and.5
maximum cl .021diameterisheld.Outside
cflheseZ1111eSlheleaddiimetetisnot
controlled.
I 1
-1.200t.010 ~
THERMAL CHARACTERISTICS
Since PNPN devices tend to turn on more readily at high temperatures the silicon
control switch is characterized to remain non-conducting, i.e., "block" current at its
maximum rated voltage while at its maximum rated junction temperature. Its dissipa-
tion rating is designed to avoid exceeding this maximum junction temperature. The
transient thermal resistance curve in Figure 19.4 permits calculation of the maximum
junction temperature for pulsed input power.
337
SILICON CONTROLLED SWITCH
0.24
0.22 ,,,,..- -
0.20
/
~
2
.....
!-> 0.18
/_
:/
I
... /
r
.., 0.16
zu
.!
0.14
/
Cl)
in 0.12
I
V
IIJ
a:
.J 0.10
ct
2
a:
II.I
~
0.08 I
I-
z..... 0.06
I
iii
z 0.04 /
! ./"I.I'
0.02
-- -L-----
TIME- SECONDS
10 100
338
SILICON CONTROLLED SWITCH
A
A
p
N o,
NPN
C
PNPN NPN-PNP TRANSISTOR
STRUCTURE EQUIVALENT ANALOGUE
PARAMETERSCONTROLLING
hr ..
Figure 19.6
The rise in hr .. with Vct: is the result of approaching the breakdown voltage of the
collector junction. As h,., increases it causes le to also increase. Therefore, raising the
anode voltage near breakdown results in unity loop gain and the device turning on.
The usual method of turning on the device is to increase le by applying a base current
to either transistor. In this manner the device may be turned on when the junction
voltages are well below breakdown. It is also possible to tum on the device by apply-
339
SILICON CONTROLLED SWITCH
FORWARDBIAS
( BLOCKING DIRECTI ON)
VAC +
ANODE TO CATHODE BLOCKING CHARACTERISTICS
Figure19.7
It is seen that only a small leakage current exists for low blocking voltages. As volt-
age is increased until it approaches the center junction breakdown, h, .. increases due
to its dependence on voltage. Unity loop gain is reached and VAc no longer increases.
It does not drop, however, until the loop gain can be unity due to h,., dependence on
current alone. As L. builds up to meet the above criteria V"c is essentially constant.
Unity gain may also exist with various combinations of I" and V.,c. This generates
plateaus in the "negative resistance" region between the breakdown voltage and the
forward conducting region, leading to partial switching if the chosen load line inter-
I
sects a plateau. Partial switching is avoided by turning the device on by a gate input
or by using a lower impedance load.
I: GATES FORWARD
BIASED
HIGH AGATE CURRENTS'
GATE ZERO I GATES REVERSE
CURRENT I i+-
I
v ✓
I I
I
---✓
BIASED
I
VAC +
BLOCKING CHARACTERISTICS
Figure19.8
Reverse biasing the gates raises the collector junction breakdown. Applying forward
bias to either or both emitter junctions lowers the breakdown voltage until in the limit
the characteristic resembles that of a forward biased diode. Once turned on the PNPN
switch stays on until the "holding current" is reached. At this current, loop gain falls
below unity and the switch turns off.
To tum off the SCS, the anode current must be reduced below the holding current.
This can be achieved either by actually reducing I., or by increasing lH, The usual
techniques for reducing I-' include reverse biasing the anode, diverting I., by a shunt
current path or incorporating the SCS in an under-damped tuned circuit.
340
SILICON CONTROLLED SWITCH
To raise the holding current, loop gain is reduced by reverse biasing the gates.
Because of the inherent regeneration in a PNPN device, reverse bias is not easily
attained. In fact while the voltages seen on the device leads may show reverse bias,
because of resistance in series with the leads, the junctions may remain forward biased.
If, as is the case with the SCS, the PNP analogue transistor has much lower gain than
the NPN, the SCS can be turned off by diverting only a fraction of the anode current
through the NPN base lead (G,.). (For reasons discussed later this only applies to low
anode currents.) On the other hand, very nearly the full anode current is required by
G., to turn off the SCS.
When the anode is negative with respect to the cathode, the middle junction is for-
ward biased; the other two junctions reverse biased. The reverse biased junctions will
share the voltage on the basis of their breakdown voltages or leakage currents. Should
one of these junctions be shunted by a resistor as is common in many biasing circuits,
the full reverse voltage would be applied to the other junction. Figure 19.9 shows the
breakdown voltages that can be expected under various conditions of emitter junction
shunting.
RESISTOR '
SHUNTING /
I
0 2 EMITTER //
'v/
/
/
0 1 EMITTER
t
BOTH
SHORTED Q EMITTER
2
SHORTED \ BOTH
GATESOPEN
EMITTERS
SHORTED
REVERSEANODE TO CATHODECHARACTERISTICSAS A FUNCTION
OF GATE CIRCUIT
Figure19.9
341
SILICON CONTROLLED SWITCH
ODE GA(NOCONNECTION)~NODE
G~E GAT
~
Ge CATHODE CATHODE
scs SCR
CORRESPONDENCE
BETWEENSCS AND SCR SYMBOLS
Figure19.10
The SCS, being designed for low level logic and general industrial control and
computer switching, is characterized by low leakage current, anode currents below
0.5 amperes, voltage ratings below 60 volts, low holding currents, sensitive well defined
firing conditions and small physical size. Within these constraints both devices can
perform the same functions.
Some SCR applications apply a reverse bias to the gate junction. Generally the
gate must be clamped to avoid excessive dissipation. The SCS maximum gate current
ratings apply to the reverse bias on the gates as well as forward bias to fire. The SCS
firing sensitivity permits a high resistance to be connected in series with the gate to
minimize dissipation without the necessity for clamping diodes.
A 40 volt reverse bias can be applied to GA. To take advantage of this the SCR
circuitry can be adapted to a "complementary" configuration as suggested in the next
section.
COMPARISONWITH COMPLEMENTARYSCR
A PNPN structure always blocks in one direction only, i.e., when the P end is
biased positive. The complementary SCR therefore also blocks in the same direction
as the conventional SCR. It diHers from a conventional SCR in that the gate is adjacent
to the anode and fires the SCR when a negative pulse is applied to it.
ANODE ANODE
ALTERNATE
G SERIES DIODE
• --k" _ ..., GATE
(GATE)1 ..,-
( NO CONNECTION)
CATHODE CATHODE
S]_REVERSE
SERIESDIODEENHANCES
b
-,- VOLTAGECAPABILITIES
(SEE TEXT)
34.2
SILICON CONTROLLED SWITCH
GA and A, it is in parallel with the anode junction and appears as a reverse leakage
current. This is shown in Figure 19.9. This leakage current through the load can be
avoided by connecting a diode in series with the cathode as shown in Figure 19.11.
An alternate method is to connect a diode in series with the gate as shown. In this
case the gate can be used to tum off the SCS while Ge is used to tum it on.
COMPARISONWITH TRIGISTOR,TRANSWITCH
The trigistor and transwitch are similar in that they are PNPN devices capable of
stable blocking or conducting states without a maintaining input being required. They
can be switched to either state by an appropriate input. In SCR terminology the SCR
can be turned on and off from the gate. A positive pulse turns it on; a negative, off.
( COLLECTOR)
ANODE COLLECTOR
(BASE)
CATHODE EMITTER
(EMITTER)
SC S TRIGISTOR,TRANSWITCH
CORRESPONDENCEBETWEEN SCS AND TRIGISTOR, TRANSWITCH SYMBOLS
Figure19.12
The SCS can also be turned on and off by gates as indicated in Figure 19.12 above.
Ge will only tum off anode currents below about 4 ma. For anode current up to 50 ma
the load may be connected to cathode and GA used for tum off.
Ge
(NO CONNECTION)
CATHODE
343
SILICON CONTROLLED SWITCH
A diode of any desired breakdown voltage within the ratings of the SCR can be
synthesized as shown in Figure 19.13(c) by adding a voltage divider across the SCS.
When the anode voltage reaches the desired breakover voltage the divider is arranged
to supply the required gate firing input. Better stability with temperature and voltage
transients will result from returning the cathode end of the divider to a negative bias
voltage. In some applications it may be more convenient to connect the divider to
CArather than Cc.
(EMITTER)
ANODE
BASE I
SC S EQUIVALENT UNIJUNCTIONTRANSISTOR
CORRESPONDENCE
BETWEENSCS AND
UNIJUNCTION
TRANSISTOR
Figure19.14
COMPARISONWITH BINISTOR
The binistor is very similar to the SCS in that both devices have leads connected
to all four semiconductor layers. The binistor is characterized specifically as a tran-
sistor with an extra control lead. While this characterization leads to many useful and
novel circuits it does not suggest to the circuit designer the SCR, trigistor, transwitch
and unijunction transistor applications of which the device is capable. Figure 19.15
shows the one-to-one correspondence between the binistor and SCS.
344
SILICON CONTROLLED SWITCH
(INJECTOR)
INJECTOR
ANODE
COLLECTOR
(BASEi
CATHODE EMITTER
scs BINISTOR
CORRESPONDENCE
BETWEENSCS AND BINISTOR
Figure 19.15
In general, circuits designed for the binistor will operate with the SCS without
any circuit modification. SCS circuits, however, are capable of higher voltage, higher
dissipation operation.
A
f
:r
t--' v,
(HOLDING)
4>··
I VH
-v
Yao (BREAKOVER)
Xao
Ge VaoslSTATIC)
C Nt~~E- -P=E VeoolDYNAMIC)
REVERSECHARACTERISTICS FORWARDCHARACTERISTICS
Ge
N
>---Va
)---Vcu:
~
REVERSE~ AT !!fil
!CATHODE
GATE)
.
Ia----------V,VHIFtH
Ioc- - - - - - - --Vo,e
VOLTAGE
lGFC
ATGA: E TO FIRE
7ci'f"l4C>OEGil'El -
345
SILICON CONTROLLED SWITCH
MAXIMUM RATINGS
Anode Blocking Voltage - With the anode forward biased, the anode blocking
voltage is the minimum static voltage at which the SCS will remain non-conducting. It
is the maximum voltage at which the SCS leakage current will not exceed a specified
value indicated in the anode blocking current rating.
Anode Reverse Voltage - With the anode reverse biased the anode reverse voltage
is the maximum voltage at which the SCS leakage current will not exceed a specified
value. The gates are generally biased as in the Anode Blocking Voltage Test. Where
the biasing resistors mask the true voltage breakdown of the junctions additional data
is supplied.
Gate to Cathode Reverse Voltage - The maximum voltage at which the gate leak-
age current will not exceed a specified current. All other leads are open circuited.
Continuous D.C. Forward Current -The forward current is the maximum anode
to cathode current when the device is turned on and is primarily limited by the dissi-
pation rating of the SCS. Gate current ratings are defined separately. This current can
be exceeded as is implied by the peak current forward current rating if precautions
are taken to limit the maximum junction temperature.
Peak Recu"ent Forward Cu"ent - Maximum forward anode to cathode current
when the device is on with specified time and temperature conditions. Peak current is
recurrent at 400 cps unless otherwise specified. For shorter duration peak currents
such as are characteristic of capacitor discharge the thermal mass rating determines
the permissible peak current.
Peak Gate Current - Maximum gate current with same time temperature and
recurrence as peak recurrent forward current. The same rating applies whether the
gate is forward or reverse biased.
Average Gate Cu"ent- Average gate current rating applies to both forward and
reverse gate current and is limited primarily by dissipation.
Operating Temperature Range-The operating temperature range is the range in
which the SCS will exhibit blocking characteristics under specified biasing conditions.
Life tests are used to ensure no failure mechanisms or degradation characteristics over
this temperature range.
Storage Temperature Range - Storage temperature range defines the temperature
range in which life tests have shown no failure mechanisms or degradation char-
acteristics. The SCS will not necessarily exhibit its blocking characteristic over the
whole range.
Dissipation -The maximum total power dissipation in an ambient of 25°C. The
rating applies to operation with free air cooling unless otherwise specified.
ELECTRICAL CHARACTERISTICS
Anode Blocking Cu"ent (I a) - Is is the anode current in the forward biased anode
while blocking voltage at a specified junction temperature and specific gate biases.
Gate Reverse Cu"ent (la lac laA)- Io is the leakage current in a reverse biased gate
with other electrodes connected as specified. Ioc is the leakage of the cathode junction;
IoA of the anode.
Gate Cu"ent to Fire (la, Ia,c Ia,A)- lov is the gate current required in the direc-
tion of forward gate bias to turn on a blocking anode under specified circuit conditions.
Gate Voltage to Fire (V aF V a,c V arA) - Vov is the gate voltage at which the SCS
turns on under specified circuit conditions.
346
SILICON CONTROLLED SWITCH
Anode Forward Voltage (V ,) - Voltage from anode to cathode after SCS has fired
with specified gate biases and temperature.
Anode Holding Current (111)- lu is the minimum anode current at which SCS will
not turn off under specified circuit conditions and temperature.
DEFINITIONS
Fire - Undergo the transition from forward blocking to saturation. This is the
"turning on"of the SCS.
Static Voltage -A voltage which is applied gradually. Specifically a voltage applied
at a rate that if the rate were doubled there would be no change in the measurement
under test.
Dynamic Voltage - A voltage applied rapidly enough to induce changes in meas-
urements made under static conditions. Specifically, the breakover voltage is a func-
tion of the rate of rise of anode voltage.
GATE CHARACTERISTICS
The SCS has two gates: Ge and GA,Ge is the gate adjacent to the cathode and GA
is the gate adjacent to the anode. Both of these are effective in firing the SCS, therefore
it is essential that the conditions of both be specified in defining firing sensitivity.
Ge CHARACTERISTICS
Since the SCS is fabricated from an NPN transistor structure, Ge characteristics are
identical to common emitter input characteristics. The characteristics are shown in
Figure 19.17.
Ge CHARACTERISTICS GACHARACTERISTICS
Figure19.17 Figure19.18
When Ge is forward biased rh' shows the variation common to transistors. Minority
current How modulates the base resistance decreasing it at high currents. When Ge is
reverse biased modulation ceases and rb' increases. The reverse current out of Ge is
limited to about 1 ma before the gate is clamped to the cathode via the 5 volt emitter
breakdown voltage. This reverse current will tum off the SCS when IA<2 ma and G ...
is open, or IA<4 ma when GAis shorted to A.
GA CHARACTERISTICS
GA is the collector of the NPN transistor and therefore has a series "saturation"
resistance. Its characteristics are shown in Figure 19.18.
While reverse biasing G" readily turns off anode currents of 50 ma, turn off gain is
unity. The 2000 effective series resistance requires approximately 10 volts of reverse
bias to develop a 50 ma gate current. The tum off gain is essentially unaffected by
opening or shorting Ge.
FIRING CHARACTERISTICS
Four limit combinations of gate biasing are possible as shown in Figure 19.19.
347
SILICON CONTROLLED SWITCH
BREAKOVER VOLTAGE
0 TO 20 70 50 80
Vao VOLTS
REV£RSE VOLTAGE
80 80 4 0.5
VR VOLTS
10 TO 60
IoFc MA (TO FIRE) -To1,.A
,.A
0.2 TO
IoFA MA(TO FIRE) 0 TO e,.A I.OMA
It is significant that shorting out an emitter junction does not destroy the PNPN
characteristic. Figure 19.20 shows the location of Cc and A wires on opposite sides of
the bar. Anode current can readily forward bias Cc due to the cross-base resistance.
Similarly GA can be forward biased due to the ohmic "saturation resistance .. inherent
in this structure.
~
GOLD
REGION
348
SILICON CONTROLLED SWITCH
1.5 I I I I I I
3N58--- ..............
3N59-
~ 1.0
..J
0 - ........
>
I
r-""'... ,_..._
~
~0.5
-i- ..
,.. i,..,,_
"""'~ -........
i.....__
.. ....
I"" ,._
1.0
....
t
(/)
........ I
""- ~~tvs9
~
iii 0.5
0
~'~) 1""'-
0:: ,...,
;
0::
3N58 (µ.A)
......_
0
0
u.
I&.
0
t-1
-0.5
-50 0 50 100 150
FIRING CURRENT
349
SILICON CONTROLLED SWITCH
the holding current, and reverse leakage are relatively independent of gate biasing.
The dV /dt or rate-of-rise of anode voltage problem, speed of turn-on, and recovery
time during turn-off will also be discussed in this section.
RATE EFFECT- dV/ dt
When anode blocking voltage is applied the capacitance of the middle junction
becomes charged. If the voltage is applied slowly the charging current is small and
can be ignored. If the anode voltage is applied rapidly, the charging current, as it flows
through the emitter junctions, may raise h,,. sufficiently to cause turn-on. Figure 19.22
indicates the middle junction capacitance is under 5 picofarads.
5.0 ,---.----------~----r---r--
SCS CENTER JUNCTION
.....
CAPACITANCE
4.0 ~- .......
--.----.----y----.---1----t---+---t---t
~
0. 90-TH PERCENTILE
~ 3.0 MEDIAN
6 10-TH PERCENTILE
2.0
CENTERJUNCTIONCAPACITANCE
Figure19.22
w
C>
.:!
.J
0
i----
>
a: ....... __ !J_=~_12s
c
0
w
>
i4
w
a:
m.__ __________ _
dV 8 /dt-VOL TS/ SECOND
350
SILICON CONTROLLED SWITCH
emitter junction increasing its tolerance to dV/ dt. At high temperatures the device is
more sensitive therefore the dV/ dt charge introduced is more effective in lowering
the breakover voltage. The typical data in Figure 19.24 illustrates the above facts.
The breakover voltage shown is the plateau value using a 1 nanosecond risetime
voltage source.
MINIMUM DYNAMIC BREAKOVER
VOLTAGE IN
I....
~
I I I I I I I I I I 1.5 I I I I I I
I I
3N58 .l.J...L 3N59 l.LL
90th PERCENTILE
"" .. I
90 th PERCENTILE
I.0
MEDIAN
,~10th PERCENTILE <t 1.0
' ......... ,, " MEDIAN
,10th PERCENTILE
717 ~ .... ,,
.... /V I:r .... . / "' ---....
....
~
'/ .... ~ ........
..._ H ....
... ....
... -....
7' ....c
0.5""' ,..._
/
- ... -~ - 0.5 ....
....~
,
--
-- -- ~
...._
351
SILICON CONTROLLED SWITCH
3.0
~ 2.0
.J
0
>
IF= I00MA
I
I
I
..
I I I I
--
I
IF=50MA
~ 1.0
~10
w J
a: I
a: J
::> 1,/
0
90th PER~ENTILE
C) 5 ,,.j
z ~I"--,..._
.: ,.
~
u MEDiAN~
r-..._ ~
g 1 I I I
,;...._
m I.J.oot"""" , .... -
-50 0 50 100 150
TEMPERATURE - °C
BLOCKINGCURRENTVS. TEMPERATURE
Figure19.27
TURN-ON TIME
While fab is approximately 30 mes for the effective NPN transistor, the PNP is
significantly slower, fabbeing about 1 me. Delay and rise time of anode current depend
both on the gate and load currents. Figure 19.28 shows typical waveforms seen as the
currents are varied.
352
SILICON CONTROLLED SWITCH
✓VBB
~ ~ IG ~ O_.
O VA~ \, ____~F
;
::c
I
I
'~;;;o Ge
? ~--sc_s___3_N_5_a
o I
__
z
a::
::,
-----------
TIME--+
I- ( a) ( bl
CIRCUIT DEPENDENCEOF TURN-ON TRANSIENT
Figure19.28
At low anode currents and high gate currents the SCS equivalent circuit is an NPN
transistor with its collector coupled to the load by a diode as shown in Figure 19.28(b).
The fast response time of the NPN drives it into saturation before the PNP transistor
becomes effective regeneratively. A gate current barely adequate to turn on the SCS
will result in a long delay time prior to a rapid turn on. For intermediate gate and load
currents the 3N58 may exhibit partial tum on followed by rapid regenerate tum on.
The 3N59 is fired by turning on the PNP section. Since it is inherently slow a large
gate current is necessary to minimize delay before firing. However, once the PNP
section becomes active, loop gain increases rapidly resulting in a tum-on time of less
than 20 nanoseconds. Figure 19.29 tabulates tum-on time to final load current for the
3N58 as a function of load current, gate current and temperature.
353
SILICON CONTROLLED SWITCH
30 ,,
0
l&J
en
::l..
--
--
--
I
_ scs 3Nsa
_ IA=IOOMA
- ffo=IOK
I I
~~
,,
90th PEI cENTIL E
,, ~.,
t!J20 ~Iii""'"
:E ~.,,,,.
... L..oo.,,,,. ,,,,.
>-
~
~i-- ...
,,,,..... ~""""
--
-- --
___..
~ 10 MEDIAN .........
--
0 ~ J.-
0
l&J ·10th PERCENTILE
~ I I I I I I . .
-50 0 50 100 150
TEMPERATURE-DC
30
0
---- I I I I •
---
l&J SCS 3N58
en
::l..
~ 20
:E
---
----
IA=IOMA
R6 =1OK
I I I I I
"
..,.,.
,
---
I
.:: 90th PERCENTILE I.,.,
>-
~
L.K'
--
i.,,,,...-
~ 10 MEDIAN ~I •"
I I I~
0 -i--
0
l&J -- i- ... ~
1.-1-"r'I
~
i,-1""""
-
L.-
~ 1
10th PERCENTIL.E
I I I I I I • I
• 1-1-
30
90th PERCENTILE
0
l&J
en \ ~ --MEDIAN
::l..
I
l&J 20
_ SCS3N5A
\\ ~10th PERCENTILE
"
:E
I- - IAc:IMA \
\
'\
' "
>-
~
l&J
- Rt; =IOK
\ \
\
' \
10
~
> \ \ \ ~.,,,,.
0 \ ~i-- .....
---
0 .,,,
l&J S• "" 7
~
-50 0 50 100
"
---... ...-
150
TEMPERATURE-DC
RECOVERY
TIME
Figure 19.30
354
SILICON CONTROLLED SWITCH
MEASUREMENTOF ELECTRICALCHARACTERISTICS
The test conditions given in defining and specifying the electrical characteristics
suggest appropriate test circuits. It is possible, however, to perform semi-quantitative
measurements on the Tektronix 575 Curve Tracer rather than construct the special
test circuits. In particular the holding current, breakover voltage, forward voltage drop,
gate voltage and current, and junction breakdown voltages can be measured in this
manner. The appropriate control settings on the Tektronix 575 and the resulting typical
traces are discussed below.
The remaining electrical characteristics should be measured with special circuits
in order to obtain the necessary accuracy. For example, leakage currents are too low
in value to obtain desired accuracy on the Tektronix 575. Thus a Keithley ammeter and
associated circuitry may be used.
MEASUREMENTSON TEKTRONIX575
The control settings to measure the various characteristics on the Tektronix 575
are given in Figure 19.31. These suggested settings should be suitable for most units
at room temperature. Typical waveforms corresponding to these settings are shown in
Figure 19.32.
TEST SOCKET
COLLECTOR SWEEP BASE STEP GENERATOR SENSITIVITY
CONNECTIONS
a: l&I l&I
UNIT TEST •I- • 0::
~~
~;
0 0:: 0 l&I 0 ..J
I- UJ C, UJ Ill Z I-
~ <> zO
0 UJ
Ill I- ii: "'
I- z
C, ~~ ii: 4.
UJ 0
4. 0
UJ 0:: ~o 2~
UJ
0
..J
..J "'
m
I-
iLI.I "'
.J
0
4.
0 Ill
..l(i;
LI.I
g
.J "'
0::
0:: Ill
l&I -
111111
LI.I
"'
.J
0
4.
I- l&I
1/1..J
l&I
Ill
I- l&I
I/IN
I- ....
0:: •
1&1°' -~
> :::E o::o
0 0:: a: ~>
3N5B
VGe Ge
NO
CONN.
C - 2K 0-20 0.01 1.0
FULL
IGFIVGF Ge A C + IK 0-20 IOK + 10 CLOCK- 0.01
WISE
0.1
3N59 NO
VGA GA CONN. A + IOOK 0-200 0.01 10
FULL
lGFIVGF GA Ge-C A - IK 0-20 IOK - 10 CLOCK-
WISE
0.5 0.2
Figure 19.31
355
~ rn
~
°'
WAVEFORMSFOR :CH
SCS-3N58
VERTICAL SCALE-0.1 MA/ DIV
,.- WAVEFORM FOR VF
SCS-3N58
VERTICAL SCALE-10 MA/DIV I
j
I
r~ ....
i
(a) HORIZONTAL SCALE-IOVOLTS/DIV , (d) HORIZONTAL SCALE-0.2 V/DIV n
v80 .. a2v
I
VF (:IF a SOMA )"l.2V
I
I
~i-..
i
~
IH,. 0.24 MA VF (IF1:IOOMA)=l.4 V
~
/
0
WAVEFORMFOR VGFa :CGF rn
~=
SCS- 3N59 SCS- 3N58 I
VERTICAL SCALE- 0.2 MA/DIV I VERTICAL SCALE-0.01 MA/DIV '
(b) HORIZONTALSCALE-10 VOLTS/DIA
v80 1188V
• (e ) HORIZONTAL SCALE -0.1 V / DIV
I
•J
,
VGF "0.52V
,_.-,
:IH "0.48 MA IGF 11 0.0 MA
WAVEFORMFOR VGC
SCS-3N58 SCS-3N59
VETRICAL SCALE-0.01 MA/DIV VETRICAL SCALE-0.5 MA/DIV
(C) HORIZONTAL SCALE-1.0 V/DIV
,Jr-. (f ) HORIZONTAL SCALE -0.2 V / DIV
'/
I
V6c•5.9 VOLT VGF"0.8 V j
(READINGAT I 6 c• 201'A) IGF"0.8 MA I .,
I
'
WAVEFORMSFOR ELECTRICALTESTS ON TEKTRONIX 575 CRO
Figure 19.32
SILICON CONTROLLED SWITCH
LEAKAGE
CURRENT
MEASUREMENTS
The fundamental circuit for making leakage current measurements is shown in
Figure 19.33. In particular the case of blocking current measurement is illustrated.
One simply adjusts the power supply until the VTVM reads 40 volts. The voltage must
be increased slowly to 40 volts to avoid firing the unit in the blocking condition. For
the same reason one may wish to set the meter initially in the "short-circuit., position
since only the lOK resistor limits the load current for the "on .. condition.
VTVM
SET TO
40V
KEITHLEY
METER
-=-LEAKAGE
CURRENTUsIn) MEASUREMENTS
Figure19.33
For measurements on the 13Al Rn= lOK. For the 3N59 unit Rn= 0. To measure
the reverse leakage current simply reverse the battery polarity from that shown in
the circuit.
DYNAMIC
BREAKDOWN
VOLTAGE
MEASUREMENTS
For these measurements a step voltage input with 800 n impedance is applied to
the SCS. This voltage was applied by means of a mercury relay switch with a rise time
of about LO nanoseconds. The basic circuits employed are shown in Figure 19.34.
s, s,
(bl
(al
CRO
CRO
DYNAMIC
BREAKOVER
VOLTAGE MEASUREMENTS
Figure19.34
357
SILICON CONTROLLED SWITCH
In Figure 19.34 S1 is the mercury relay switch, Rn is lOK for both the 3N58' and
3N59. With no bias applied, the potentiometer, the lOK series dropping resistor, and
the 22.5 volt battery are removed for the 3N58. For the 3N59 Rn is also removed. The
CRO is a Tektronix 545 and a 0-100 volt regulated power supply was used to obtain
the anode to cathode voltages. The operation of the circuit is as follows. The voltage
from the power supply is increased until the unit conducts. The voltage applied to the
unit is a rectangular pulse. The power supply voltage is then decreased until the unit
just blocks again (this may be as low as 1/10 of the upper conduction voltage). This
value is then the "true" dynamic breakover voltage. The difference in the two values
is due to the fact that the collector capacitance develops and holds a charge while the
voltage is "slowly" increased. This charge minimizes the dV / dt effect.
TURN-OFFTIME MEASUREMENTS
In order to measure the tum-off time of the 3N58 one may use the circuit shown in
Figure 19.35. The operation of the circuit is as follows. When the switch touches the
upper position (that shown in the figure) capacitor C:i charges. At the same time C1
(which was previously charged to 10 volts) drives the anode to -10 volts and then
begins to discharge. If the SCS turns off, the anode voltage will rise to + 10 volts. C1 is
adjusted to the minimum value for turn-off and the tum-off time is measured.
•
HORIZON'mL SCALE• O.&,.stC/DMSION
To •0.9,.S
,-------------.----0+1ov
c1
.01Mf
IOIC
-6V
When the switch touches the lower position, C2 discharges driving the unit into
conduction again. At the same time, C1charges again so that the cycle may be repeated.
Note that the turn-off time, to, is defined as that time when the anode voltage
reaches zero or ground potential. This is illustrated in the waveform accompanying the
circuit. For precision one must use a decade capacitor with small incremental steps as
C1. As an example of suitable values, the following were found to give adequate results.
IA= 1 ma, RL = lOK: C1 = 0 - 200 µµf
IA= 10 ma, RL = lK: C1 = .009 - 0.015 µf
IA= 100 ma, RL = 10012: G, = 0.1 - 0.25 µf
358
SILICON CONTROLLED SWITCH
SCS APPLICATIONS
680K
L
3N58
I0-14V
RMS
(NC)
(u~ ,,,,.
L
3N58
,o~;v
(NC)
1(
A' A A
A A
220K
- 220K
-
ALTERNATE ALTERNATE
INPUT INPUT
ON /liTOV OFF AT OV
OFF AT-6V ON AT-6V
NOTE - Connecting A or A' to the appropriate gate permits lamp control by positive
or negative inputs. Lamp #344, 10 volts, 15 ma - Lamp #330, 14 volts, 80 ma.
LAMP DRIVER
(INCANDESCENT LAMP OPERATE ON AC WITH 3DµA MAXIMUM INPUT LOADING)
Figure 19.36
----1-----------1---------u + 12V
ALARM
RELAY
200Sl
ALTERATE
INPUT
A
IOOK Ge
IK TOIM
SET
359
SILICON CONTROLLED SWITCH
Any of several inputs pulls in common alarm relay with lamps giving visual indication
of triggering input. Low resistance lamps decrease input sensitivity. (See Figure 19.19.)
MULTIPLE
ALARMCIRCUIT
Figure 19.38
3.9K
0.2r1f
C
OUTPUT
220pf 220pf
IOK 22K
T SYNC 22K
SQUAREWAVEGENERATOR
Figure19.39
360
SILICON CONTROLLED SWITCH
IOK
3-40V
SUPPLY VOLTAGE
Amplitude and frequency are variable with potentiometer setting. Frequency alone is
variable with supply voltage.
SAWTOOTHGENERATOR
Figure 19.40
-----------------~+24V
IOK
IOK
vo-f INPUT
2.0V
1.5MA
Positive or negative pulses are amplified without inversion. Low anode current is used
to ensure tum off.
PULSE AMPLIFIERS- STRETCHERS
Figure 19.41
361
SILICON CONTROLLED SWITCH
l.f"~0.01
i•o~•
3.0V
I.OK
470K
-6V
Short negative pulse initiates delay. When Ge becomes forward biased by voltage
divider connected to timing network RC the SCS fires terminating the delay. R, C, or
-6V bias can be varied to modulate delay. Replacing lM resistor with zener diode will
minimize dependence of delay on bias voltage. A transient free output is available
at GA,
TIME DELAY GENERATOR - PULSE ACTUATED
Figure19.42
,------------------ .... ----n+12v
IOK
47K
Lf
A negative gate to NPN transistor permits C to charge through R. When the' anode
becomes forward biased C discharges yielding negative and positive outputs. The 10
megohm resistor connected to Ge insures firing regardless of how large R is. Maximum
R is determined only by delay stability requirements with temperature.
362
SILICON CONTROLLED SWITCH
IN3606
12V RMS
INPUT
IMEG
IN3606
The switch is normally closed charging C and causing the SCS to block. Delay is
initiated by opening the switch and discharging C through R. Since R is connected for
only half of each cycle the delay is lengthened beyond the RC time constant. Follow-
ing the delay the SCS conducts alternate half cycles.
INPUT
( NC)
=
SCS conducts when input exceeds +lV. It stays on if l1n 0.1 ma. It turns off when
= =
l1n 0. On turning on, VA is approximately -0.25V for 6.8K load. VA -3V for lK
load.
SCHMITT TRIGGER
(OUTPUT IS IN PHASE WITH INPUT)
Figure 19.45
363
SILICON CONTROLLED SWITCH
orr--,v
-
-7.r=,v
OFF
3.9K
(NC)
WV ..fl.
(NC)
IK
The resistor divider connected between Qa and Q2 supplies In to Qa after input A trig-
gers it. It also prevents input B from triggering Q:iuntil Qa conducts. Consequently the
first B input pulse after input A is applied will supply current to Rr,.
PULSE SEQUENCEDETECTOR
Figure 19.47
364
SILICON CONTROLLED SWITCH
2.ov
IL
.f1.
PULSECOINCIDENCEDETECTOR
Figure19.48
+24Va-------------------------
1,1
SL 2N2193A
INPUT IOK
Low input power triggers counter. During normal counting the common anode voltage
never exceeds 3 volts. When the last stage turns off the anode rises towards +24 volts
turning on the first stage. The zener also resets the counter.
RING COUNTER
- INCLUDINGRESET
Figure19.49
365
SILICON CONTROLLED SWITCH
2N525
ltl
...n.. IOK
0.01
(NC) (NC)
Two independent load resistors R,. and R,.' are available at each stage. The output at
R,.' is free from commutating transients. The input pulse provides a dead band equal
to its width.
RING COUNTERWITH INDEPENDENT
OUTPUTSPER STAGE
Figure19.50
2N525
INPUT
l•I
Jl_
366
SILICON CONTROLLED SWITCH
.--------------41-----~+ 15 V
o-~.-------------t-----t11--------~1-----a1----0+12v
INPUT
PULSE
3N59
IN3606 IN3606
STAGEPULSE INPUTS
+121-..I
+6
The bistable input stage drives the first shift register stage. The charge on the cou-
pling capacitor determines which of the coincident shift pulses triggers the SCS pro-
ducing a shift to the right. Load resistors have a common ground.
367
EXPERIMENTERS
CIBCUITS
2000.n.
MILLER HEAD
LOOP PHONES
STICK
#6300
OR
EQUIV.
220K
ONE TRANSISTORRADIORECEIVER
Figure 20.1
MILLER 2K./\.
LOOP PHONES
STICK
*6300
OR
EQUIV.
TI-PRI 200KO
SEC. I K.n.
ARGONNE
3V ARIOO OR
+ ~- ......
,___Eo_u_iv_.
_,
2NI07
'--------------4~+3
THREE TRANSISTOR RADIO RECEIVER
Figure 20.3
369
r=
t!j
~ ~
~
I
I
;z
25µ.f I
6V I ;1
ti TO 5µ. f
I 6V
=
en
n
r ;
I
n
c::
.-c
I ~
68K ~, PHONE I
JACK
I en
(CRYSTAL I
PHONES} I
• • • BUILD RECEIVER
• TO THIS •POINT
•IF I • • • +•
FOR RELAY OPERATION IN REMOTE CONTROL
ONLY SPEECH RECEPTION IS DESIRED...., APPLICATIONS ADD THIS RELAY CIRCUIT.
c,-.021.dd(FOR 1300 C.P.S. TONE SELECT) I
R,-15 TO 47K (ADJUST TO OPTIMUM SENSITIVITY)
T-LAFAYETTE TR-98 INTERSTAGE TRANSFORMER OR TELEX
T-42 (PART#C-8642)DRIVER TRANSFORMER,OR EQUIVALENT.
L 1- 25 TURNS~ .26 WIREON CTC (CAMBRIDGE THERMIONICS CORP.)
TYPE LS6 (114" DIA.) CEAAMIC FORM WITH RED AND WHITE DOT CORE.
L 1-50p.h RF CHOKE. NATIONAL CO. TYPE R33-50
z
L:,-TYPE U50-21 TOROID COIL. (TOROTEL, INC., 5512 E. 110TH. c,
KANSAS CITY 37, MO.)
NON- TONE-
SELECT SELECT
2000.n..
G.E. 2Nl07 HEAD
AUDIO PHONES
iUT -T+
3V
-
SIMPLE AUDIO AMPLIFIER
-
Figure 20.5
1µ.fd(3V) 2N107
2000.n
INPUT+ -
I 2Nl70
HEAD
J
PHONES
- 330K
R +3V
KEY
2NI07
+
1.5V
.47 100
3.0, I\.,
SPEAKER~ PHONES
CODE PRACTICEOSCILLATOR
Figure 20.7
---------------------- 371
EXPERIMENTERS CIRCUITS
[
-=.45V
KEY
TO i~:~~
SPKR,iJ:i-- 100.ll ....__
____ ~--~-~IK_:_.n
_ _,
.~.
POS.I PHONES
POS.2 PHONES-SPEAKER
POS.3 SPEAKER
-
P-S
WIRINGDETAILS OF SW (BACK VIEW)
2
(MALLORY TYPE 3123J)
25VDC
I20V NOMINAL
601'\J
<a)APPROX.4MA
372
EXPERIMENTERS CIRCUITS
J
I2v~
GE 1485
U2.3V Ca (12.3V@
0.5 AMP) 0.5AMP)
METER 0- .5 MA
CALIBRATED
0-6000 RPM
GE-4JZ4 X 8.28
e av NO.OF
IW CYLINDERS
4 6 8
CI (SEE C I IN ,,_fd. FOR 2
33 22 15
CYCLE ENGINE • •
CHARTS)
CI IN ,,_fd. FOR 4
CYCLE ENGINE .6B ·47 ·33
373
EXPERIMENTERS CIRCUITS
IOK
+
-=-sv
+
~6V
22K
+
-=-Gv
374
EXPERIM£NTERS CIRCUITS
EVEREADY + ,,...,_
- __ .,.
itt:724 OR
EQUIVALENT 6V
SHURITE METER
0-3MA. F.S.760n
( J.B.T.INSTRUMENTS,
INC. NEW HAVEN 8,
CONNECTICUT}
BATTERb
0
wefts INSERT 560 OHM RESISTORBETWEEN E AND C (EITHER SOCKET). IF METER
N T READ FULL SCALE, REPLACE BATTERY ( EVEREADY TYPE 724 OR
EQUIVALENT)
LEAKAG~ TEST: INSERT TRANSISTOR IN APPROPRIATE SOCKET. METER READING INDICATES
ONDITION WITH RESPECT TO LEAKAGE.
GAJN
TEST'DEPRESS GAIN BUTTON AND NOTE INCREASE IN METER DEFLECTION. AN IN-
CREASED DEFLECTION TO THE RIGHT EQUAL TO AT LEAST ONE DIVISION ON THE
GAIN SCALE COMPARED TO THE DEFLECTION DURING LEAKAGE TEST INDICATES
ACCEPTABLE CURRENT GAIN.
OPENSAND ~~~ tE~t) A SHORTED TRANSISTOR WILL BE INDICATED BY A FULL SCALE
MET L7!T N IN LEAKAGE TEST. AN OPEN TRANSISTOR WILL BE INDI-
CATED BY NO METER DEFLECTION IN BOTH LEAKAGE AND GAIN TESTS.
TRANS.ISTORTEST SET
Figure 20.13
375
EXPERIMENTERS CIRCUITS
.ee!!!l
Sl-3 POLE 6 POSITION NON-SHORTING S3-S4 NORMALLY OPEN PUSH-
SELECTOR SWITCH SWITCHES
M - IOOaA FULL SCALE METER
S2-4 POLE 2 POSITION SWITCH
RM-METERS INTERNAL RESISTANCE
ADJUST
TO SELECTOR
WHEN RESULT
TEST SWITCH SI
TO POSITION
Ico VcR • 6V I READ METER DIRECT
Ic Ia• 20,,_A 2 READ METER DIRECT
Ic Ie•IOO,,.A 3 READ METER DIRECT
IcEO VcE• 6V 4 READ METER DIRECT
IcES VcE• 6V 5 READ METER DIRECT
:IEo VEo•6V 6 READ METER DIRECT
CALCULATE:
:IC
hr£ I. 9 •20,,.A 2 hFE •re• METER READING
20"1
CALCULATE:
CALCULATE: WHERE:
Ic1 - Ic2 :Ic1 • METER READING
h,, :t 8 •20,,.A 2 hh • 6 I.c2•METER READING
4x10-
WITH S4 CLOSED
CALCULATE:
h • I.c1 -:Ic2
h,- Ie•IOOp.A 3
" 2ox10- 1
376
EXPERIMENTERS CIRCUITS
The 100 µa meter is in a network which results in a nearly linear scale to 20 µa,
a highly compressed scale from 20 µa to 1 ma and a nearly linear scale to full scale at
10 ma. The network permits reading Ico, I.:o, Ict:11,and Ic•:o to within 10% on all tran-
sistors from mesas to power alloys without switching meter ranges or danger to the
meter movement.
By making Rm + R, equal to 12K the scale will be compressed only 1 µa at 20 µa.
Potentiometer R:1should be adjusted to give 10 ma full scale deflection. The scale can
then be calibrated by comparison with a standard conventional meter.
If the NPN-PNP switch is in the wrong prsition, the collector and emitter junctions
will be forward biased during the Ico and L-:otests respectively. The high resulting cur-
rent can be used as a check for open or intermittent connections within the transistor.
The test set also pleasures hF•:with 20 µa and 100 µa base current. Depressing the
h,.. button decreases the base drive 20% permitting hto to be estimated from the cor-
responding change in collector current. The tests are done with a 330f? resistor limiting
the collector current to approximately 12 ma and maximum transistor dissipation to
approximately 20 rnw. Therefore, this test set can not harm a transistor regardless of
how it is plugged in or how the switches are set.
"Battery test" has been designed to give full scale meter deflection of 10 ma when
the battery voltage is 6 volts. This is achieved by connecting 150 ohms from C to E
of the test socket. This test assumes precision resistors.
TONE-FREQUENCY
SENSITIVITYCONTROL
SELECTIVE
CIRCUIT
G-.x
11Lx'
I. WAVEMETER I. KEYINGMONITOR NOTE:
2.PARASITIC 2, CODEPRACTICEOSC. AN8 OR16OHMLOUDSPEAKER MAYBE USED.
DETECTOR BUTFOROPTIMUMSOUNDOUTPUTA HIGHER
SPEAKERIMPEDANCEIS NEEDED.
377
EXPERIMENTERS cmCUITS
+12V
(AUTO FRAME)
330
+ 50 MFD
25V
0.33 + SMFD
sov
- 25V
AMPLIFIER
2N32I
330
6.2K
11 11
IN9I
NOTE:11 RIGHT
11 11 11
AND LEFT -I2V RIGHT
TAPPED OFF FROM RIGHT -I2V
AND LEFT FLASHER 11 11
LIGHTS ON AUTO DASH- LEFT
-I2V
BOARD. DIODES PREVENT
SHORT CIRCUIT. (A)
11 11
LEFT
+I2v
330 11
RIGHT
11
+I2v
IN9I
0.33
sov 4.7K
+ 50MFD
25V
330
6.2K
-12V
(AUTO FRAME)
NOTE: "RIGHT" AND ( B)
11 11
LEFT +12V TAPPEDOFF
FROM RIGHTAND LEFT FLASHER
LIGHTSON AUTO DASHBOARD.
DIODESPREVENT SHORTCIRCUIT.
Provides audible tum signal indication to insure signals are off after turn. Allows
driver to keep attention on road at all times. Dash indicator lights need never be
consulted.
AUDIBLE AUTO SIGNAL MINDER
Figure20.16
378
READER'S LIST
379
READER'S LIST
380
READER'S LIST
381
READER'SLIST
382
READER'S LIST
DIRECTORYOF PUBLISHERS
Academic Press, Inc. Essential Books, Inc.
111 Fifth Avenue 1600 Pollitt Drive
New York 3, New York Fair Lawn, N. J.
Addison-Wesley Publishing Co., Inc.
Reading, Massachusetts (Ungar) Frederick Ungar Publishing Co.
131 East 23rd Street
American Electronics Co. New York 10, New York
1203-05 Bryant Avenue
New York 59, New York Gernsback Library, Inc.
154 West 14th Street
(Roy) A. N. Roy Publishers New York 11, New York
30 East 7 4th Street
New York 21, New York Holt, Rinehart & Winston, Inc.
383 Madison Avenue
Bernards (Pub.) Ltd. New York 17, New York
77 The Grampians (Sams) Howard W. Sams Co., Inc.
Western Gate, 1720 East 38th Street
London, W.6 Indianapolis 6, Ind.
(See Bobbs-Merrill Co., Inc.)
Bobbs-Merrill Co., Inc.
1720 East 38th Street Iliffe Books Ltd.
Indianapolis 6, Ind.
(see Howard W. Sams Co., Inc.) Dorset House
Stamford Street
British Book Service Ltd. London, S. E. 1
Kingswood House Interscience Publishers, Inc.
1068 Broadview Avenue 250 5th Avenue
Toronto 6, Canada New York 1, New York
383
READER'SLIST
AdditionalBookListings:
Basic Transistor Course
Kenian, P. R.
Gemsback
Fundamentals of Semiconductors
Scroggie, M. G.
Gemsback $2.95
How to Fix Transistor
Radios and Printed Circuits- 2 Vols.
Lane, L. C.
Gemsback $3.20 per Vol.
or $5.90 both.
Servicing Transistor Radios
D'Airo, L.
Gernsback $2.95
Simplified Analysis and Application
of the Junction Transistor as a
Circuit Element
Crib, B. F.
Philamon Laboratories, Inc.
(Westbury, L. I., N. Y.) (1957) $ .50
384
TRANSISTOR
SPECIFICATIONS
INTRODUCTION
This chapter consists of three parts:
Part 1 - G.E. TRANSISTOR AND DIODE SELECTION
CHARTS ................................... Beginning on page 386
Part 2 - G.E. TRANSISTOR AND DIODE OUTLINE
DRAWINGS ............................... Beginning on Page 406
Part 3 - REGISTERED JEDEC TRANSISTOR TYPES WITH
INTERCHANGEABILITY INFORMATION ..... Beginning on page 412
Part 1 begins with a numerical type index of the more than 280 General Electric
transistors and diodes as described in the Selection Charts that follow. The index gives
the page where more complete electrical specifications can be found. Mechanical and
physical specifications of any General Electric transistor or diode herein listed will be
found in Part 2, Outline Drawings. Outline drawing numbers appear either directly
under Selection Chart titles, or directly following the type number.
Part 3, the Registered JEDEC (Joint Electron Devices Engineering Council)
Transistor Types Section has been completely revised and brought up to date. The
chart contains over 1200 transistors numerically listed with pertinent electrical data
given for each transistor. Comparable General Electric replacement type numbers along
with outline drawing numbers will be found in the far right column.
Additional electrical and physical information for any General Electric Transistor
or Diode is available on individual specification sheets (See Chapter 3). Such informa-
tion may be obtained on request from the Semiconductor Products Department of the
General Electric Company.
385
TYPE INDEX
TYPE PAGE TYPE PAGE TYPE PAGE TYPE PAGE
386
SILICON UNIJUNCTION TRANSISTORS<2>
See Outline Drawing No. 5
Intrinsic Max. Max. Max. Min. Min.
Standoff Emitter Peak Point Emitter Emitter Base One
lnterbase Ratio Revene Emitter Saturation Revene Peak Pulse
Resistance Cunent Current Voltage Voltage Voltage
RBB '1J IEO IP VE (SAT) VOBl
IE=50ma
Vaa=3v lz=O Vaa=10v TJ=150°C Vaa=25v VaB=lOv TJ<150°C
Type Kohms VB&2 µ.a µ.a Volts Volts Volts Comments
2N489ll) 4.7-6.8 .51-.62 10 20 20 5.0 60 - Applications include the fol-
2N489A 4.7-6.8 .51-.62 10 20 15 4.0 60 3.0 lowing:
2N4898 4.7-6.8 .51-.62 30 5 6 4.0 60 3.0 • Frequency Dividers
2N490<1> 6.2-9.1 .51-.62 10 20 20 5.0 60 - • High Sensitivity Trigger
Circuits
2N490A 6.2-9.1 .51-.62 10 20 15 4.0 60 3.0 • Hybrid Multivibrator
2N490B 6.2-9.1 .51-.62 30 5 6 4.0 60 3.0 Circuits
• Lowest Cost SCR(3) Fir-
2N491<1> 4.7-6.8 .56-.68 10 20 20 5.0 60 - ing Circuits
2N491A 4.7-6.8 .56-.68 10 20 15 4.3 60 3.0 • One Shot Multivibrators
2N491B 4.7-6.8 .56-.68 30 5 6 4.3 60 3.0 • Pulse Genera tors
• Precision Voltage Sensing
2N492< 1> 6.2-9.1 .56-.68 10 20 20 5.0 60 - Circuits
2N492A 6.2-9.1 .56-.68 10 20 15 4.3 60 3.0 • RegenerativePulseAmpli-
fiers
2N492B 6.2-9.1 .56-.68 30 5 6 4.3 60 3.0
• Ring Counters
2N493(t) 4.7-6.8 .62-.75 10 20 20 5.0 60 - • Sawtooth Oscillators
2N493A 4.7-6.8 .62-.75 10 20 15 4.6 60 3.0 • SCR<a> Phase Control
Circuits
2N493B 4.7-6.8 .62-.75 30 5 6 4.6 60 3.0
• SCR( 3 ) Regulated Power
2N494< 1> 6.2-9.1 .62-.75 10 20 20 5.0 60 - Supplies
• Stable Relaxation Oscil-
2N494A 6.2-9.1 .62-.75 10 20 15 4.6 60 3.0
lators
2N494B 6.2-9.1 .62-.75 30 5 6 4.6 60 3.0 • Stable Time Delay Cir-
2Nl671 4.7-9.1 .47-.62 30 12(4) 25 5.0 30 - cuits
• Staircase Wave Genera-
2Nl67IA 4.7-9.1 .47-.62 30 12(4) 25 5.0 30 3.0 tors
2Nl671B 4.7-9.1 .47-.62 30 5 6.0 5.0 30 3.0 • Solid State Time Delay
Circuits
2N2160 4.0-12.0 .47-.80 30 12( 4 ) 25 - 30 3.0
NOTES: <1>Available as USAF TYPF.S (MIL-T-19500/75) (2) See also Chapter 13 (3) See General Electric Silicon Controlled Rectifier Manual COT1=25°C
Test conditions in italics
w
00
00
2N699 40-120 80 5.0 1.3 35-100 60 200 5 0.6 1.0 - - - - - High Voltage 2N697.
2Nl613 40-120 50 1.5 1.3 30-100 60 IO 1 0.8 1.7 35 20 20 20 - Lower leakage 2N697.
2Nl711 100-300 so 1.5 1.3 50-200 60 10 7 0.8 1.7 75 35 35 40 - High beta 2NI613.
2Nl889 40-120 80 5.0 1.3 30-100 75 15 1 0.8 1.7 35 20 20 - - High Voltage 2Nl613.
2Nl893 40-120 100 s.o 1.3 30-100 90 15 1 0.8 1.7 35 20 20 - - High voltage 2Nl613.
2Nl983 - 30 0.25(11) - 70-210 30 200 5 0.6 1.0 - - - - - Very high beta for hi,rh
ff:in,.Iov.: noise ampli-
er ctrcuats.
'i
,:
..u
• Q,
:a>-
.
2Nl984 - 30 0.25(11) - 35-100 30 200 5 0.6 1.0 - - - - - Amplifier Circuits.
:r·
2Nl985 - 30 0.25(6) - 15-45 30 200 5 0.6 1.0 - - - - - Amplifier Circuits.
2N2049 - 50 0.4(11) 0 9( 5 )
.I 75- 60 10 1 0.8 1.7 - - 60 - - Very hi((h beta for high gain,
Low noise amplifier circuits.
NF=3db Max.
SILICON PLANAR EPITAXIAL PASSIVATED (PEP) TRANSISTORS<
1, 4 >
2N2194 20-60 40(2) 0.35 1.3 - 30 25 5 0.8 1.6 15 - - 12 - Similar to 2N696, but lower
VcE (SAT).
2N2194A 20-60 40(2) 0.25 1.3 - 30 25 5 0.8 1.6 15 - - 12 -
2N2195 20 Min. 25(2) 0.35 1.3 - 30 50 5 0.6 1.6 - - - - - Industrial types.
2N2195A 20 Min. 25(2) 0.25 1.3 - 30 50 5 0.6 1.6 - - - - -
2N2243 40-120 80(2) 0.35 1.3 - 60 15 7 0.8 1.6 30 20 15 15 - Similar to 2Nl893 but lower
VCE(SAT,)
2N2243A 40-120 80(2) 0.25 1.3 - 60 15 7 0.8 1.6 30 20 15 15 -
NOTES: Test Conditions in Italics. (1) Typical ft for all types ~ 130 Mc. (2) VcEo
(3) Storage temperature on all types is -65 to +300° C. Operating junction temperature on all types is -65 to +200° C, except on
2N696, 2N697, and 2N699. On these types the rating is -65 to +175° C.
(4) For switching and amplifier applications. (6 ) le"" IO ma, and I b.., 1 ma. (6 ) le"" 5 ma. and I b = .5 ma.
(7) Also available in military types.
SILICON PLANAR EPITAXIAL PASSIVATED (PEP) HIGH SPEED SWITCHES<3 >
TO-18 Package (See Outline Drawing No. 8)
10 1.0 30 10 100 15
2N706 20 Min. 20 - 3 0.9 0.6 30 - - 6 10 Economy Units.
to 1.0 10 10 10 10 15
2N706A 20-60 20 15 5 0.9 0.6 30 40 75 5 5 Economy units. High speed.
10 1.0 30 10 30 10 20
2N708 30-120 20 15 5 0.8 0.4 15 40 70 6 10 Low leakage current.. High speed.
10 1.0 to 10 10 10 15
2N753 40-120 20 15 5 0.9 0.6 30 40 75 5 5 High bet.a. High speed.
10 1.0 10µ.a 0 - 100 20
2N834 25 Min. 30( 1) - 5 0.9 0.25 30 35 75 4 10 Low saturation voltage.
10 1.0 30 10 30 10 20
2N914 30-120 20 15 5 0.8 0.25 15 40 40 6 10 Ult.ra-higb speed. Low saturation voltage.
10 5.0 10 100 60
2N915 40-160 - so 5 0.9 1.0 30 - - 3.5 10 These devices are intended for non-sat-
orating switching circuits, amplifier and
10 1.0 30 10 15 and oscillator circuits.
2N916 50-200 - 25 5 0.9 0.5 10 - - 6 5
SILICON PLANAR PASSIVATED SWITCHES<
3>
TO-18 Package (See Outline Drawing No. 8)
lc=l50 mo lc=l50mo
la=l5 mo la=l5 mo
150 10 100 10 - 1 ma 30
2N717 20-60 40 - 5 1.3 1.5 100 - - 35 10 Electrically equivalent. to 2N6Q6.
150 10 100 10 - 1 ma 30
2N718 40-120 40 - 5 1.3 1.5 100 - - 35 10 Electrically equivalent. to 2N697.
2N718A
150
40-120
10 100 10
50
- - 100
7 1.3 1.5
60
10 - - 25 10 Electrically equivalent. to 2Nl613.
150 10 100 10 - 1 ma 60
-
2N719 20-60 80 - 5 1.3 5 200 - 20 10 Electrically equivalent. to 2N698.
150 10 100 10 30 100 75
2N719A 20-60 80 60 7 1.3 5 15 - - 15 10 Electrically equivalent. to 2N698.
150 10 100 to - - 1 ma 60
2N720 40-120 80 5 1.3 5 200 - - 20 10 Electrically equivalent. to 2N699.
150 to 100 10 30 too 90
2N720A 40-120 100 80 7 1.3 5 15 - - 15 10 Electrically equivalent. to 2Nl893.
150 10 100 10 - - 100 60
2N956 100-300 so 7 1.3 1.5 15 - - 25 10 Electrically equivalent. to 2Nl7ll.
NOTES: Test. conditions in lt.alics. (1) VcBS (2) bee @ I Kc. (3 ) Typical ft for all t.ypes ~ 350 me.
POWER DISSIPATION
PT ( Free Air @ 25°C)
40(,)
'"'
4C28 9-19 2.0 12 150 15
4D20 Seehm 40(,) 1.0(8) - 150 15-50(10) Applications include the following:
• Audio amplifiers
4D21 Seebm 40(,) 1.0(8)
- 150 40-135(10) • Low cost industrial switches
4D22 See hFB 40<•> 1.0(8) - 150 120-250(10)
NOTES: (1) Typical hre@ Vce=20 V, IE=l ma. (o) Vca=20 V, IE=0 (10) Pulsed measurement.
(2) Typical hre@ Vco=20 V, lc=l mo. (7) Vce=15V,IE=0 (11) VcB=5V, le= 10 ma.
(4) Iceo-=100 pa, IE-=0. Cs>Vce-=12 V, IE=0 (12) Vcs=l0 V, lc=5 ma.
(11) BVcEo @ lcaoa::::100 pa. (II) Vce=20 V, IE=l mo. (1a) Also available in military types.
SILICON NPNP LOW CURRENT CONTROLLEDSWITCHES<
4>
u-=•
.. •~u
u
0In
u
0In t 0
II
aU I: go
~::g e >- >- >
U111
o E
0!.c
U
oe
0!.c
C11 Ill
E
CII
E
~'s
:1.0 .c .c
Ill
gu E 13- :a .. C
i:.l i:.l In
~'8 ~8
lllg
o.5
-a.x a
oU•
VI
:l"a~
.5 ciu
• to
.n~
aa
,¥
"C
,¥ e
.!!
a
Q,
+~
1111
I~
1111
0
0
E
In
>')l.
00
v-
1111
r-i
I
II
3
V
II
llil
~8
Uil Uil Uil
a!o a"' i uu
• o
uu
• Cl II uu
•
1:.1 •0 •..: •..: •..: •..:
~ci~ io8
uu.-
woo
A.u.-
w :I
A.U 0 >~ >~ ~
C,
>c::: >
0
> >c::: >c::: >c::: >c:::
Type Volts ma amp ma mw µa µa Volts ma µo µa ma Volts µa Volts
3N6o<a> 40 100 0.5 so 300 20 20 1.5 1.5 20 0.2 (25°C) 1.5 -0.6 to -1.2 1.0 0.4 to 0.65
NOTES:
<1> For this characterization GA is electrically open, This corresponds to the conventional SCR (6) configuration. <•> See also Chapter 19.
(2) For this characterization, G~ is connected to C. This correspnds to the complementary SCR (6) configuration. (s) Derate at 2.4 mw per °C.
(3) Thi:1 characterization is for SCR, complementary SCR(6), and Binistor circuit configurations. The 3N60 meets (6) See General Electric Silicon Controlled
all specifications for tho 3N58 and 3N59. Rectifier Manual.
GERMANIUM MESA TRANSISTORS
TO-18 Package (See Outline Drawing No. 8)
MAXIMUM MINIMUM MAXIMUM MAXIMUM
VeE Cs.t.Tl VeE1<sATl VBEI
hFE Volts Volts Volts
@le @VeE le Diss. <1> Veso Vc&s VF.BO lcBO @le @Is @le @IB @le @IB ton tou
Type ma Volts ma mw Volts Volts Volts µ.a ma ma ma ma ma ma nsec nsec Comments
2N705( 2 l
10
25min.
.3
so 150 15 15 3.5 3
10
.30
.4 - - 10
.34-.44
.4
75 200 Low current, relatively slow speed, econ-
omy units, relatively high saturation
2N710
10
25 min.
.5
50 150 15 15 2.0 3
10
.so
.4 - - 10
.34-.50
.4
75 200
voltage, high voltage.
2N711
10
20-250
.5
100 150 12 12 1.0 3
to
.50
.5 - - 10
.35-.50
.4
100 350
Low current, relatively slow speed, econ-
omy units, relatively hi,!' S11turation
voltaite, low voltaire, low eta.
10 .5 10 .5 50 2 10 .4 Economy units, relatively slow, medium
2N711A 25-150 JOO 150 15 14 1.5 1.5 .30 .55 .34-.50 75 230 current, low Jcuo.
10 .5 10 .4 50 2 10 .4 Low lceo relatively slow speed, medium
2N711B 30-150 100 150 18 15 2.0 1.5 .25 .45 .34-.45 75 200 current, higher beta.
2N725
10
20 min.
.5
50 150 15 12 2.0 3
to
.50
.5 - - 15 1.2
.34-.60 75 200
Low current, relatively slow speed, econ-
omy units, relatively high saturation
voltaize, lower voltal(e, low beta.
10 .22 10 1 100 10 10 .4 Hiith current, very low saturation, high
2N781 25min. 200 150 15 15 2.5 3 .16 .25 .34-.44 60 70 voltaae, medium to hi1rh sneed.
10 .25 10 1 100 10 10 .4 High current, medium saturation.lower
2N782 20min. 200 150 12 12 1.0 3 .20 .45 .34-.50 75 110 voltaite, medium speed.
10 .3 10 1 50 5 10 1 Hiith current. very low saturation, high
2N828 25min. 200 150 15 15 2.5 3 .25 .25 .34-.44 70 100 voltage, medium to high speed.
to 1 10 1 100 10 10 1 Medium current, high speed, low beta,
2N960 20 min. 150 150 15 15 2.5 3 .20 .70 .30-.50 50 90 hi1rh volta,re.
10 1 10 1 100 10 10 1 High speed, low beta, lower voltage,
2N961 20min. 150 150 12 12 2.0 3 .20 .70 . 30-.50 50 90 medium current .
10 1 10 1 100 10 10 1
2N962 20 min. 150 150 12 12 1.25 3 .20 .70 .30-.50 50 90 High speed, high beta, high voltage,
10 1 10 1 100 10 10 1 medium current.
2N964 40min. 150 150 15 15 2.5 3 .18 .60 .30-.50 50 90
10 1 10 1 100 10 10 1
2N965 40 min. 150 150 12 12 2.0 3 .18 .60 .30-.50 so 90 High speed, high beta, lower voltage,
10 1 10 1 100 10 10 1 medium current.
2N966 40 min. 150 150 12 12 1.25 3 .18 .60 .30-.50 50 90
to .25 10 .4 100 8 10 .4 Very high speed, high dissipation, high
2N994 45-140 150 200 15 15 4.0 3 .18 .45 .34-.44 35 45 voltage, medium current, high beta,
low saturation.
NOTES:Test Conditions in Italics. <1>25°C Ambient Free Air. (2) Also available in military types.
GERMANIUM ALLOY PNP TRANSISTORS<
1>
NOTES: Test conditions in Italics. (4) Vcs-SV, Is"" I ma, f,... l Kc. (8) VRT=60 V.
<•> All specs. at 25°C unless noted otherwise <6> BVc1ro. (ll)R ... 1 K.
(2) Vcs-lV, Jc ... JO Ma. (G) VRT. (10) Also available as military types.
(al Vcs .... 25V, Je ... 1 Ma. ( 7) VRT... 4SV.
GERMANIUM ALLOY NPN TRANSISTORS
TO-5 Package(See Outline DrawingNo. 2)
2N377 20-60(5) 6 20(8) 20(3) 150 Not recommended for new designs. See 2N634A.
2N385 30-110( 4 ) 6 25(9) 35 150 Not recommended for new designs. See 2N634A.
2N388 60-180(2) 12 20(8) 10 150 Medium Speed Switch. Guaranteed Maximum Switching Speed.
USN2N388 60-180C2) 12 20C8) 10 150 Medium Speed Switch To MIL-T-19500/65.
2N634 15 Min.Cl) 8 20 IOC3) 150 Not recommended Cor new designs. See 2N634A.
2N634A 40-120 8 20(10) 6 150 Medium speed switch and audio amplifier having close control or hFE from
10 ma to 200 ma, guaranteed minimum hFE at -55°C, mmdmum lcso at 71°C.
2N635 25 Min.Cl) 12 20 10Ca) 150 Not recommended for new designs. See 2N63SA.
2N635A 80-240 12 20(10) 6 150 Medium speed switch and audio amplifier havint close control or hFB from
10 ma to 200 ma, guaranteed minimum hFE at -55 C, maximum lceo at 71°C.
2N636 35 Min.Ci) 17 15 10(3) 150 Not recommended for new designs. See 2N636A.
2N636A 100-300 17 15(10) 6 ISO Medium speed switch and audio amplifier havini close control or hFE Crom
10 ma to 200 ma, guaranteed minimum hFE at - 5 °C, maximum lceo at 71 °C.
2Nl302 20 Min. 4.5 25(8) 6 ISO Medium Speed Switch.
2Nl304 40-200 8 20(11) 6 ISO Medium Speed Switch.
2Nl306 60-300 12 15(11) 6 150 Medium Speed Switch.
2Nl308< 12> 80 Min. 17 15(11) 6 150 Medium Speed Switch.
2Nl605 42 Min.(7) 16 24(11) 5(G) 150 Medium Speed Switch.
NOTES: (1) Ic-200 ma, VcE=.75 V. (6) lc=30 ma, VcE= 1.0 V. (u) lc=400 µa.
(2) lc=30 ma, VcE=.5 V. (&) Vee= 12 V. (JO) le= 100 µa.
(3) Vco=20 V. (7) lc=20 ma, VcB=.25 V. (11) VRT.
(4) Ic=30 ma, VcB=.75 V. (8) lc=SOµ,a. (12) Also available in military types.
GERMANIUM RATE GROWN NPN TRANSISTORS
(See Outline Drawing No. 3)
Power Power
hPE BcEo lcso Gain Dissipation fbtb
VcE=l v ls=O
lc=l ma lc=300 µ.a Vcs=15 v @ 455 kc
Type volts µa db mw me Comments
NOTES: (1) lce18ma., Vcs=l V. Ca) BVcERL R=IOK. (11)Vco=5 V. <7> Also available in military types.
(2) lce12 ma., Vcse1l V. (4) MAX VCE(BAT).., .4 V. (6) Conversion Gain @ 1600 Kc.
SILICON SIGNAL DIODES
MAXIMUM MAXIMUM
Reveno Current
la ......
GI
E
->
.. \0
GI
u
C
J:
C =11, •u
ca
0 .! >11:
"a ua 8> ~GI
:,•
!-=>
&g,
A.
a
u
0:08
Q
oE
~ C
0
;:
u.!
'!In
Forward
-0 Z!o_ ~_; a,.
Voltage
V"M'
di7 u
i::~ t!.> .! :jj II
~.:::& ·U
Cl.Ci
t1
o.2
M.ln
Drwg. 2s c
0
1so c
0
IN3604 14 1.0 @SO ma .05 @SOV 50 @SOV 75 2 2 250 115 Very high speed, high conductance, computer diode.
Subminiature package .
1N3606 14 See Table I .05@ 50V 50 @SOV 75 2 2 250 115 Coot.rolled conductance, very high speed diode. Sub-
miniature glass package.
1N3063 14 See Table II .1 @50V 100@ 50V 75 2 2 250 115
1N3607 15 1.0@ 50 ma .05@ 50V 50 @50V 75 2 2 150 115 Very high speed, high oooduct.aoce diode in micro-
miruature package.
IN3608 15 See Table I .05 @30V 50 @30V 40 2 2 150 115 Controlled oooductaoce, very high speed diode in mi-
1N3609 15 See Table I ,05 @50V 50 @50V 75 2 2 150 115 crominiature package.
Note- above ratinp also
• apply to diodes in pall'S, and •
quads.
I:!.Vr-Max. Forward
Voltage
difference between diodes
In pairs or quads
(TA=-55°C to +125°C)
lt==0.1 lr=lO
to 10 ma to 50 ma
mv mv
4JF4-MP-l 16 1.0@ SOma .OS @SOV so @ sov 75 10 20
Matched pairs in molded package.
4JF4-MP-2 16 1.0@ 10 ma .10 @30V 100 @ 30V 40 10 so
TABLE 1 TABLE l
MAXIMUM
Max.
Peak Point Valley Point Peak Serles Negative Typlcal Resistive
Current Current Capacitance Voltage Resist. Conductance Cutoff Frequency
IP Iv C VP Rs -G fro
Drwg.
Type No. ma ma pf mv ohms mhos X 10- 1 Kmc Comments
NOTES:
(1) See General Electric Tunnel Dicxu Manual.
TRANSISTOR SPECIFICATIONS
OUTLINEDRAWINGS
0 r~r~
~(: .151
ITT
.020 MAX~ i.
(GLASS EXTENSION) 11
•
.370MAX
DIMENSIONSWITHIN .360MIN
JEDEC OUTLINE l--.335MAX
T0-5 I_ .325MIN
1011 h Thiszoneis controlled
for auto-
matichandling.Thevariationin actual
diameter
withinthiszoneshallnote1ceed
.010.
ICOTI21 Measured
frommax.diameter
ol
theactualdevice.
1011 31 Thespecified
leaddiameter
ap-
pliesin the zonebetween .050and.250
fromthebaseseat.Between .250and.5
maximum. ()f.021diameter
isheld.Outside
of thesezonesthe leaddiameter is not
controlled.leadsmaybeinserted,without
damage. in .031holeswhiletransistor
enters.371holeconcentricwithleadhole
circle.
APPROX WEIGHT: .05 OZ
ALL DIMENSIONSIN INCHES
.575MAX.
• .235MAX.
1.s· nn____LEAD
EMITIER-uir-
.-t:002•
DIA.•.017 -:OOI•
l
--1~.0481"COLLECTOR
1-,192~
406
TRANSISTOR SPECIFICATIONS
.37OMAX
DIMENSIONS WITHIN
0
.360MIN
JEDEC OUTLINE .335MAX
TO-:S .325MIN
•
. 370MAX
DIMENSIONSWITHIN .360MIN
JEDEC OUTLINE.. . .TO-33 .335MAX
.325MIN
11C111 is Clll1Jo:lcd
Is TllisZ!111t forn!G-
lllllicfllndl:q.Tbtari&1icD ill aduil
N1ie1ttllilltb tllis1t1111slllll aotIXCCfd
.010.
11C111l1 llmaredlrcmmu. diameter
of
l1ltactuildmc:t.
11C111 11 Thi ~lied Ind dilmderap-
brlffll1 .050and.250
l)lia in the 111111
ITomIllebul sat. Bchlffn250and 1.5
muimum i1held.Outside
ol.OZIdiameter
olthese1011Htheluddialllfflfisaot
conlrc!ltd.
B2
E LEAD
4
LEA
81
EMITTER.. .E } LEAD2
BASEONE
•. BI GOLDLEADS
BASETW0
.. 82 .017~:ggf
INOTE3)
DIMENSIONSWITHIN
JEDEC OUTLINE
T0-5
IICl1lbTtls111111isCllllmllldba
l:lltic:llal&&,Tl:lari&ti»iaadllal
a:x!rtwbi:l!l:is1t1111sllalaoteiacd
.CIO.
lffl II llasme:llnx:I -. dilaUf ol
llltll!mldna.
IICl1ll1ThlSlleCilildadmmda1P-
plialllllll11111bclllUll.0SOad.250
flcmllll bm sal. lletwun.2SOand.5
m,dmum o1.o2Idtnm ishtld.Oatsidt
ollhallllnCStheludanftffisnot
a:allollfd.
I
-,.ioot.010
I
I- 0
407
TRANSISTOR SPECIFICATIONS
IIOTI
.
DIMENSIONS WITHIN
JEDEC OUTLINE
T0-18
b Mai.diamtterleadsat a ca,,ne
,230 MAX
.209 MIN
l,__J95 MAx__J
I .1711 MIN 7 e
plane.OSH.001-.000belowbase SUI .210 MAX
ta be •11hin.007al their trllt klcalioo ,170 MIN
ta mu. widthtabandtothemu.
relative
130 dilmetermeasuredwith a suitable
pge. Wh(neaie is not used.~re•
men!wdlbemadeat baseseat.
IIG1I:b Leaddilmeteris controlledin
the zonebetwttn.050and150 fromthe
base seal.Btt-,, .250and endof lead
amu.al.021 is held.
.!500 MIN
~.~!~~ 1~ =:~~.:!'~!
andSilNraclini
Ille smaller lrOffl
d1amfler
tilt larEtrdiameter. 3 LEADS
,01!1 MAX
.016 MIN
APPROX WEIGHT .015 OZ !NOTE21
ALL DIMENSIONS IN INCHES
F
_·::_As_x·_......,t--T-"'0-L-ER_AN_c_E_D-.------
0 1,003 MAX.
,H7MIN,
!LEADS
.017!:ggf
(NOTE II
.505 MAX.
,497MIN.
in the mnebetween
IOTIt, lead dilmeteris cuntrolled .050and.250lromthe
baseseat.Betwttn150andendof lud a mu. of .021is hild.
408
TRANSISTORSPECIFICATIONS
.33!1 IIAX..j
.32s 11111. I
IIOtl II LeaddumeltriSconw!ledinllle ,__....., _____
'
IJ2!1MIN
_
IIGTIII Leiddi&IIIIICI
is conbolledin the
1011ebttwccn.050alld.250IIClnIlle bas1
ieal Sci- .250111d tndol leadI mu.
.021iSheld.
IIOTIZIOonol~tuinsetta #2·56
sludineuessGl.045.
IOTI la Cluranceis provided
lo bend
baseand cmittelluds l0r Mltiud cir•
Cllitlywitllocltinterltrin&willlhutsink
rnountina
onchassis.
rf
.S7511AlC.9
__J
.SS5 MAX.
.S25UIN, l
'
.s,z 1·52
409
TRANSISTOR SPECIFICATIONS
t
A52
10n h Lead
zonebetween
diameter inthe
is controlled
.050and.250fromthecap
MAX.
or baseseat Between .250andendof
t
.300
leada max.of .021is held.
IOtl 2a Provisionis made forthedevice
to beefectrically
insulated frommounting
surfaceasshown below. Forthis service
a clearance
holeof.281is recommended.
•on 31Allexposed metalparts, including
hardware,but not including leads,are
nickelplated.
1.500
WN.
A37MAX.
,424tlN .
•200
ALL DIMENSIONS
ARE REFERENCEUNLESS TOLERANCED
'.,.2:------J~------
NOTE: .IOSDIAMAX
ALLDIMENSIONS
IN INCHES
F.no:t.on l_.1_
-B-- -~
j-- ---,--
-j.010:1:.001
AU-INSIOICSWIIICMIS
-IISIOIII &Ill A[F[A[NCt UICI.Ill '101.IIWICIO
410
TRANSISTOR SPECIFICATIONS
L,.10+••,+•·•oJ
1 ..,N . ..,N
7 1-·•72
•__ , _ _L
DOS
n-.-"'----1!--MAX.
~~ AW
+.ooz +A0Z
-.001 IMOI~~ J00MAJC.,-----""""--..1 •AOI
.005 MAX
.075 MIN COLOR CODE FOR
TYPE DESIGNATION
(COUNTER·CLOCKWIS£)
.195 MAX
.182 MIN
411
7
2Nl04 PNP 150 -30 -50 85 44 .7 33T -10 -12 2Nl415. 2Nl414 2,2
2Nl05 PNP 35 -25 -15 85 55 .7 .75 42 -5 -12 2Nl415 2
2Nl06 PNP 100 -6 -10 85 25 .8 28 -12 -6 2Nl097. 2Nl098 2,2
2Nl07 PNP AF so -6 -10 60 20 .6 -10 -12 2Nl07, 2Nl098 1, 2
2Nl08 PNP 50 -20 -15 2N322 4·
2Nl09 PNP 150 -25 -70 85 75• 30T 2Nll75 2
2Nll0 Pt 200 -so• -so 85 32 1.5
2Nlll PNP 150 -15 200 85 15 3T 33T -5 -12 2N394 2
2NlllA PNP 150 -15 -200 85 15 3T 33T -5 -12 2N394 2
2Nll2 PNP 150 -15 -200 85 15 ST 35T -5 -12 2N394 2
2N112A PNP 150 -15 -200 85 15 ST 35T -5 -12 2N394 2
2Nll3 PNP 100 -6 -5 85 45T lOT 33T 2N394 2
2N114 PNP 100 -6 -5 85 65T 20T 2N394 2
2Nll7 NPN 150 30* 25 150 .90a 1 1 10 30 2N332, 2N334 4,4
2N118 NPN 150 so• 25 150 .95a 1 2 10 30 2N333, 2N335 4, 4
2N118A NPN-G 150 45 25 ISOJ 54T 7.50 10 2N335 4
2Nll9 NPN 150 so• 25 150 .974a 1 2 10 30 2N335, 2N336 4, 4
2Nl20 NPN 150 45• 25 175 .987a ) 7T 2 30
2Nl22 NPN 8.75W HOA 150 3 100 !Oma 50
2Nl23 PNP Sw 150 -15 -125 85 so• -10 5 -6 -20 2Nl23 7
2N124 NPN 50 10• 8 75 12• 5 3 2 5 2N293 3
2Nl25 NPN so 10• 8 75 24• 5 5 2 5 2Nl67 3
2Nl26 NPN so 10• 8 75 48• 5 5 2 5 2Nl67, 2Nl69 3, 3
2Nl27 NPN so 10• 8 75 100• 5 5 2 5 2Nl67, 2N169 3,3
2N128 PNP 30 -4.5 -5 85 .95 .5 45 rmu: -3 -5 2N711 8
2Nl29 PNP 30 -4.5 -5 85 .92 .5 30 rmu: -3 -5 2N711 8
2Nl30 PNP 85 -22 -10 85 22T 39T 2Nl413, 2Nl924 2, 2
2Nl30A PNP 100 -40 -100 85 14 1 .7T 40T -15 -20 2N1413. 2Nl924 2, 2
2Nl31 PNP 85 -15 -10 85 45T 41T 2Nl413, 2Nl415 2, 2
2Nl31A PNP 100 -30 -100 85 27 1 .BT 42T -15 -20 2Nl413, 2N1924 2,2
2Nl32 PNP 85 -12 -10 85 90T 42T 2Nl175 2
2Nl32A PNP 100 -20 -100 85 56 1 IT 44T -15 -20 2Nl415 2
2Nl33 PNP 85 -15 -10 85 25 36T -12 -15 2Nl414 3
2N133A PNP 100 -20 -100 85 SOT 1 .BT 38T -15 -20 2Nl414, 2Nll75 3,2
2Nl35 PNP Obsolete 100 -12 -so 85 20T 4.ST 29T 2N394 2
2Nl36 PNP Obaolete 100 -12 -so 85 40T 6.5T 31T 2N394 2
2Nl37 PNP Obsolete 100 -6 -50 85 60T lOT 33T 2N394 2
2N138 PNP so -12 -20 50 140T 30T 2NS08 2
2Nl38A PNP 150 -30 -100 85 29T 2Nl098 2
2Nl38B PNP 100 -30 -100 85 29T 2Nl098 2
2Nl39 PNP 80 -16 -15 85 48 1 6.8 30 -6 -12 2N394 2
2Nl40 PNP 35 -16 -15 85 45 .4 7 27 -6 -12 2N394, 2N395 2,2
MAXIMUM RATINGS ELECTRICAL
PARAMETERS
JEDEC Pcmw BVce MIN. MIN. MIN. MAX. Closest Dwg.
No. Type Use @25°C BVca• lcma T,oc hfe-hvE• @lcma fbfb me Gedb lco (µa) @Vea GE No.
2Nl41 PNP 4W -30 -.BA 65 .975aT so .4T lBT -100 -20
2Nl42 NPN 4W 30 .BA 65 .975aT · -50 .4T 26T -100 20
2N143 PNP 4W -30 -.BA 65 .975aT so .4T 26T -100 -20
2Nl44 NPN 4W 30 .BA 65 .975aT so .4T 26T 100 20
2N145 NPN 65 20 5 75 30 30 3 9 2N293, 2Nll21 3, 3
2Nl46 NPN 65 20 5 75 33 33 3 9 2Nll21 3
2Nl47 NPN 65 20 5 75 36 36 3 9 2Nll21 3
2Nl48 NPN 65 16 5 75 32 3 12 2N169 3
2Nl48A NPN 65 32 5 75 32 3 12 2N169 3
2Nl49 NPN 65 16 5 75 35 3 12 2Nl69 3
2Nl49A NPN 65 32 5 75 35 3 12 2Nl69 3
2Nl50 NPN 65 16 s 75 38 3 12 2Nl69 3
2Nl50A NPN 65 32 s 75 38 3 12 2Nl69 3
2N155 PNP B.SW -30• -3A 85 .lST 30 1 ma -30
2N156 PNP 8.SW -30* -3A 85 24* .SA .lST 33 1 ma -30
2Nl57 PNP B.SW -60• -3A 85 20* .SA .l 1 mo -60
2Nl57A PNP 8.SW -9o• -3A 85 20• .SA .1 1 ma -90
2Nl58 PNP 8.SW -60• -3A 85 21* .SA .lST 37 1 ma -60
2N158A PNP 8.SW -so• -3A 85 21* .SA .15 l ma -80
2Nl60 NPN 150 40* 25 150 .9a -1 4T 34T 5 40 2N332, 2Nl276 4, 4
2Nl60A NPN 150 40• 25 150 .9a -1 4T 34T s 40 2N332 4
2Nl61 NPN 150 40• 25 150 .95a -1 ST 37T 5 40 2N333, 2Nl277 4, 4
2Nl61A NPN 150 40* 25 150 .95a -1 ST 37T s 40 2N333 4
2N162 NPN 150 40• 25 150 .95a -1 8 38T 5 40 2N335, 2Nl278 4. 4
2Nl62A NPN 150 40• 25 150 .95a -1 8 38T 5 40 2N335 4
2N163 NPN 150 40• 25 150 .975a -1 6T 40T 5 40 2N335, 2N 1278 4, 4
2Nl63A NPN 150 40• 25 150 .975a -1 6T 40T 5 40 2N335 4
2Nl64A NPN 65 1.0• 20 BSJ 40T 8.00 30 2Nll21 3
2Nl65 PNP-M 55 1.0• 20 75J 72T 5.00 26 2Nl6CJ 3
2Nl66 NPN Obsolete 25 6 20 so 32T l ST 24T 5 s 2Nl70 :1
2Nl67 NPN Sw 65 30 75 85 11• 8 s 1.5 15 2Nl67 3
2Nl67A NPN Sw 65 30 75 85 17* 8 5 1.5 15 2Nl67A 3
2Nl68 NPN IF 55 15 20 75 20T 1 6T 28 5 15 2N293 3
2Nl6BA NPN Obsolete 65 15 20 85 23* 1 5 28 5 15 2Nl086, 2Nll21 3, 3
2Nl69 NPN IF 65 15 20 85 34• 1 BT 27 5 15 2N169 :1
2NI69A NPN AF 65 15 20 85 34* I BT 27 5 15 2Nl69A 3
2N17o NPN IF 25 6 20 so .95aT 1 4T 22T 5 5 2Nl70 3
2Nl72 NPN 65 16 5 75 22 3 9 2N2CJ3 3
2N173 PNP 40W -60 -13A 95 SST• IA .6T 40T -.Sma -40
2Nl74 PNP 40W -80 -13A 95 40T• IA .2T 39T -lOma -60
2Nl74A PNP SSW -80 -ISA 95 40• 1.2A .1 -Bma -80
2N175 PNP 20 -10 -2 85 65 .s 2 43T -12 -25 2Nll75A 2
MAXIMUM RATINGS ELECTRICALPARAMETERS
2N417 PNP 150 -10 -200 85 140T l 20T 27T -5 -12 2N394 2
2N418 PNP 25W 80 SA 100 40* 4A 400 Kc lSma -60
2N420 PNP 25W 45 SA 100 40* 4A 400 Kc lOm lOma -25
2N420A PNP 25W 70 SA 100 40• 4A 400 Kc 15 ma -60
2N422 PNP 150 -20 -100 85 SOT l .BT 38T -15 -20 2N320, 2Nll75A 4, 2
2N425 PNP 150 -20 -400 85 20• l 2.5 -25 -30 2N394 2
2N426 PNP 150 -18 -400 85 30* l 3 -25 -30 2N395 2
2N427 PNP 150 -15 -400 85 40• l 5 -25 -30 2N396, 2N427 2, 4
2N428 PNP 150 -12 -400 85 60• 1 10 -25 -30 2N397 2
2N438 NPN 100 25 85 20• 50 2.5 10 25 2N634A 2
2N438A NPN 150 25 85 20• so 2.5 10 25 2N634A 2
2N439 NPN 100 20 85 30 so 5 10 25 2N634A 2
2N439A NPN 150 20 85 30• 50 5 10 25 2N634A 2
2N440 NPN 100 15 85 40• so 10 10 25 2N635A 2
2N440A NPN 150 15 85 40• 50 10 10 25 2N635A 2
2N444 NPN 120 15 85 1ST .ST 2T 10 2N634A 2
2N444A NPN-A 150 40 1008 30T .so 25 2N634A 2
2N445 NPN 100 12 85 35T 2T 2T 10 2N634A 2
2N445A NPN-A 150 30 1008 90T• 2.00 25 2N634A 2
2N446 NPN 100 10 85 60T ST 2T 10 2N634A 2
2N446A NPN-A 150 30 1008 !SOT• 5.00 25 2N634A 2
2N447 NPN 100 6 85 125T 9T 2T 10 2N635A 2
2N447A NPN-A 150 30 1008 200T* 9.00 25 2N635A 2
2N448 NPN IF 65 15 20 85 8• l ST 23 5 15 2N448, 2N292 3, 3
2N449 NPN IF 65 15 20 85 34• l BT 24.5 5 15 2N449, 2N293 3, 3
2N450 PNP Sw 150 -12 -125 85 30* -10 5 -6 -12 2N450, 2N394A. 7, 2
2N456 PNP so -40 SA 95 130T* IA -2ma -40
2N457 PNP so -60 SA 95 130T* IA -2ma -60
2N458 PNP so -so SA 95 130T• IA -2ma -80
2N459 PNP so -60 SA 100 20• 2A 5 Kc lOOma -60
2N460 PNP 200 -45• -400 100 .94a 1 1.2T 34T -15 -45 2N524 2
2N461 PNP 200 -45• -400 100 .91a l 1.2T 37T -15 -45 2N461 2
2N462 PNP ISO -40• -200 75 20• -200 .s -35 -35 2N1614, 2N527 1,2
2N463 PNP 37.SW -60 SA 100 20• -2A 4mc -300 -40
2N464 PNP 150 -40 -100 85 14 l .7T 40T -15 -20 2Nl614, 2N527 1, 2
2N465 PNP 150 -30 -100 85 27 l .BT 42T -15 -20 2Nl414, 2Nl924 2,2
2N466 PNP 150 -20 -100 85 56 l IT 44T -15 -20 2N321, 2Nll75 4,2
2N467 PNP 150 -15 -100 85 112 1 1.2T 45T -15 -20 2N508 2
2N469 PNP so 75 10 l IT -so -6
2N470 NPN-GD 200 15 175A 16T 2N335 4
2N471 NPN-GD 200 30 175A 16T 2N335 4
2N471A NPN-GD 200 30 175A 25T 2N335 4
MAXIMUM RATINGS ELECTRICAL PARAMETERS
2Nl016E NPN 150 i45°C0 250 7.5A 150 10* SA 20T Kc 20ma 250
2Nl016F NPN 1so 4s c 300 7.SA 150 10* 5A 20T Kc 20ma 300
2Nl017 PNP 150 -10 -400 85 70* 1 15 -25 -30
2Nl021 PNP sow -100 -5 95 70T* -IA -2 mil -100
2Nl022 PNP sow -120 -5 95 70T* -IA -2 mil -120
2Nl038 PNP 20W -40 -3A 95 35* -IA -125 .5
2Nl039 PNP 20W -60 -3A 95 35* -IA -125 .5
2Nl040 PNP 20W -80 -3A 95 35* -IA -125 .5
2Nl041 PNP 20W -100 -3A 95 35* -IA -125 .5
2Nl046 PNP ISW -8 -3A 65 70* -0.SA -1 ma -40
2Nl047 NPN 40W i2s°C 80* 500 200 12* 500 15 30 71.;} 12
2Nl048 NPN 40W 25°C 120* 500 200 12* 500 15 30 7E.1 12
2Nl049 NPN 40W @25°C 80* 500 200 30* 500 15 30 7E2 12
2Nl050 NPN 40W @25°C 120* 500 200 30* 500 15 30 2N2204 12
2Nl056 PNP Obsolete 240 -50 -300 100 18* -20 .5 -25 -70 2Nl614, 2Nl924 1. 2
2Nl057 PNP Sw 240 -45 -300 100 34* -20 .5 -16 -45 2Nl057, 2Nl924 1, 2
2Nl058 NPN so 20 so 75 10 1 4 22.5 50 18 2N292 3
2Nl059 NPN 180 15 100 75 50* 35 10 Kc 25 50 40 2N635A 2
2N1067 NPN SW 30 .SA 175 15* 200 .75 500 60
2N1068 NPN IOW 30 I.SA 175 15* 750 .75 500 60
2Nl069 NPN sow 45 4A 175 10* 1.5A .5 1 ma 60
2Nl070 NPN sow 45 4A 175 10* I.SA .5 1 ma 60
2Nl086 NPN Osc 65 9 20 85 17* 1 BT 24T 3 5 2NI086 3
2Nl086A NPN Osc 65 9 20 85 17* 1 BT 24T 3 5 2Nl086A 3
2Nl087 NPN Osc 65 9 20 85 17* 1 BT 26T 3 5 2Nl087 3
2Nl090 NPN 120 15 400 85 50* 20 5 8 12 2N635A 2
2Nl091 NPN 120 12 400 85 40* 20 10 8 12 2N635A 2
2Nl092 NPN 2W 30 500 175 15* 200 .75 500 60
2Nl093 PNP-A 150 30 250 85J 125T 8.00 6.0 2Nl307 2
2Nl097 PNP AF Out. 140 -16 -100 85 SST 1 -16 -16 2Nl097 2
2Nl098 PNP AF Out. 140 -16 -100 85 45T 1 -16 -16 2Nl098 2
2Nl099 PNP 30W 80* 95 35* SA 10 Kc Bma -80
2N1100 PNP 30W 100* 95 25* SA 10 Kc 8ma -100
2N1101 NPN 180 15 100 75 25* 35 10 Kc 50 20 2N635A 2
2N1102 NPN 180 25 100 75 25• 35 10 Kc 50 40 2N635A 2
2N1107 PNP 30 16* 5 85 33 -0.5 40 -10 -12
2Nl108 PNP 30 16* 5 85 30 -0.5 35 -10 -12
2Nllo9 PNP 30 16* 5 85 15 -0.5 35 -10 -12
2Nll10 PNP 30 16* 5 85 26 -0.5 35 -10 -12
2Nllll PNP 30 20* 5 85 22 -o.s 35 -10 -12
2Nlll4 NPN-A 150 25 200 lOOJ llOT* 10.0 30 2N635A 2
2Nlll5 PNP Sw 150 -20 -125 85 35 -60 5 -6 -20 2Nll15, 2N396A 7,2
MAXIMUM RATINGS ELECTRICAL PARAMETERS
GEN·ERA L • ELECTRI C
SEMICONDUCTOR
PRODUCTS
DEPARTMENT
ELECTRONICS
PARK
· SYRACUSE
I.NEWYORK
( IN CA.NADA, CANADIAN GENERAL ELECTR I C COMPANY, LTD . , TORONTO, ONTARIO • OUTSIDE THE U.S.A . , AN O CANA DA, BY:
INTERNA TI ONAL GENERAL ELECTR IC COM PANY , INC • • ELECTRONIC S DIV ISIO N , 150 EAST 42ND ST., HEW YORK, N. Y . , U .S . A .)
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