Crystal Growth Technology
Crystal Growth Technology
Crystal Growth Technology
Crystal Growth
Technology
123
Professor Kullaiah Byrappa Professor Tadashi Ohachi
University of Mysore Doshisha University
P.B. No. 21, Manasagangotri Department of Electrical Engineering
Mysore 570 006, India Kyoto, Japan
E-mail: [email protected] E-mail: [email protected]
Series Editors:
Professor Dr. Walter Michaeli
Institut für Kunststoffverarbeitung, Pontstrasse 49
52062 Aachen, Germany
Professor Dr. Hans Warlimont
Institut für Festkörper- undWerkstoffforschung e.V., Helmholtzstrasse 20
01069 Dresden, Germany
Professor Dr. Eicke Weber
University of California, Materials Science and Mineral Engineering
587 Evans Hall, Berkeley, CA 94720-1760, USA
issn 1434-9795
isbn 0-8155-1453-0 William Andrew Inc., Norwich, New York
isbn 3-540-00367-3 Springer-Verlag Berlin Heidelberg New York
This work is subject to copyright. All rights are reserved, whether the whole or part of the material is
concerned, specifically the rights of translation, reprinting, reuse of illustrations, recitation,
broadcasting, reproduction on microfilm or in other ways, and storage in data banks. Duplication of
this publication or parts thereof is permitted only under the provisions of the German Copyright Law
of September 9, 1965, in its current version, and permission for use must always be obtained from
Springer-Verlag. Violations are liable for prosecution act under German Copyright Law.
The use of general descriptive names, registered names, trademarks, etc. in this publication does not
imply, even in the absence of a specific statement, that such names are exempt from the relevant
protective laws and regulations and therefore free for general use.
J.B. Mullin
U.K.
PREFACE
senior crystal growers with the upcoming talents of the recent generation. The
range of crystals included in this book varies from electronic, electro-optic, pie-
zoelectric, ferroelectric, jewelry, to bioelectric fields. Furthermore, techniques like
MOCVD, hydrothermal, laser assisted, CVD, flux, melt, etc., dealing with the ac-
tual process of crystal growth are discussed.
We hope that this book will be highly valuable to the entire crystal growth
community and remain as an important source for crystal growers, beginners and
specialists alike. The editors greatly acknowledge the help and cooperation ex-
tended by each and every author in this book. Our special thanks go to Professor
Brian Mullin for penning the foreword for this book. Also, thanks to our esteemed
friends like Prof. Masahiro Yoshimura of Tokyo Institute of Technology, Japan;
Prof. Richard E. Riman of Rutgers University, NJ, USA; Prof. Jan Bart of DSM,
The Netherlands; Prof. H. Klapper, Germany; Prof. J.N. Sherwood, UK; Prof.
D.T.J. Hurle, UK; Prof. H. Scheel, Switzerland; Prof. T. Nishinaga, Japan; Prof.
H. Komatsu, Japan; Dr. R. Fornari, Italy; Prof. M. Dudley, USA; Dr. David Bliss,
USA; Prof. K. Sato, Japan; Prof. T. Duffar, France; Prof. Derek Palmer, UK; Prof.
Keshra Sangwal, Poland; Prof. Rafael Rodriguez Clemente, Spain; Prof. Salvador
Gali, Spain, and many others who have helped us directly or indirectly for the suc-
cessful completion of this useful volume. Also, our indebted thanks to our family
members Dr. K.T. Sunitha Byrappa, Mr. Shayan M. Byrappa, Mr. Nayan M.
Byrappa, Mrs. Michiko Ohachi, Mr. Shinobu Ohachi, and daughters Kyoko and
Keiko for their patience and cooperation.
Lastly, our thanks to all those from William Andrew and Springer publications
associated with the production of this book, especially to Kathy Breed, Keith
Stein, Brent Beckley, Jim Willis, and Nanette Anderson.
June 2002
Editors
K. Byrappa
T. Ohachi