VLSI Design Manual
VLSI Design Manual
VLSI Design
Lab-02
1. Objectives
To become acquainted with MOS device characteristics and full custom design by using
Micro Wind tools. This lab consists of three parts. Part I is to analyse NMOS and PMOS
devices. Part II is to draw a layout of the gate for the logic function y=a. (b+c).Part III is
to simulate this layout and do its parametric analysis.
2.Theory
The n-channel MOS is built using polysilicon as the gate material and N+ diffusion to
make the source and drain. The p-channel MOS is built using polysilicon as the gate
material and P+ diffusion to make the source and drain.
In this lab, the model 3 is employed. For the evaluation of the current Ids as a function of
Vd, Vg and Vs between Drain and Source, we use the equations on page 16 and 17 in the
manual of Micro Wind. The equations are derived from Model 1 and take into account a
set of physical limitations in a semi-empirical way.
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3. Labs
Double click the icon “Micro Wind” The Micro Wind window pops up.
File>Select foundry>
An “Open” window pops up. Select “cmos025.rul” and push “open” button.
In this lab, we use 0.25um CMOS technology.
Simulate>MOS characteristics>
A “MOS Viewer” window pops up. In this window, we will analyse the characteristics
of MOS devices.
Select “NMOS” (lower right), “level3” (upper right), “W=10um L=10um”, “Id vs.Vd”.
Push the button “Draw Curve”, the display window displays several curves.
Find the Ids value with Vgs = 2V and Vds = 2V and fill it into table 1.
Select “NMOS” (lower right), “level3” (upper right), “W=0.60um L=10um”, “Id
vs.Vd”. Push the button “Draw Curve”, the display window displays several curves.
Find the Ids value with Vgs = 2V and Vds = 2V and fill it into table 1.
Select “NMOS” (lower right), “level3” (upper right), “W=10um L=0.30um”, “Id
vs.Vd”. Push the button “Draw Curve”, the display window displays several curves.
Find the Ids value with Vgs = 2V and Vds = 2V and fill it into table 1.
Select “NMOS” (lower right), “level3” (upper right), “W=0.60um L=0.30um”, “Id
vs.Vd”. Push the button “Draw Curve”, the display window displays several curves.
Find the Ids value with Vgs = 2V and Vds = 2V and fill it into table 1.
From this part, we can conclude that:
0.6um 10um 2V 2V
10um 0.3um 2V 2V
0.6um 0.3um 2V 2V
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VLSI Design
Select “PMOS” (lower right), “level3” (upper right), “W=10um L=10um”, “Id vs.Vd”.
Push the button “Draw Curve”, the display window displays several curves. Find the
Ids value with Vgs = -2V and |Vds| = 2V and fill it into table 2.
Select “PMOS” (lower right), “level3” (upper right), “W=0.60um L=10um”, “Id
vs.Vd”. Push the button “Draw Curve”, the display window displays several curves.
Find the Ids value with Vgs = -2V and |Vds| = 2V and fill it into table 2.
Select “PMOS” (lower right), “level3” (upper right), “W=10um L=0.30um”, “Id
vs.Vd”. Push the button “Draw Curve”, the display window displays several curves.
Find the Ids value with Vgs = -2V and |Vds| = 2V and fill it into table 2.
Select “PMOS” (lower right), “level3” (upper right), “W=0.60um L=0.30um”, “Id
vs.Vd”. Push the button “Draw Curve”, the display window displays several curves.
Find the Ids value with Vgs = -2V and |Vds| = 2V and fill it into table 2.
From this part, we can conclude that
TABLE 2. PMOS
Note: If you can finish the layout, please go ahead to PART III and use your layout
to do the simulation and parametric analysis in PART III.
Figure 1 gives a schematic of the gate for the logic function y=/a.(b+c).
If your layout is correct, then no messages will appear. If there are some errors, then the
warning messages will appear near the errors. Please modify your layout until no error
messages appear. Save your layout.
Step1:
Using “cut” command, clear everything in the display window. Make sure that nothing
remains in the window. Go to main menu:
A “CMOS Cell Complier” window pops up. Input “y=/ (a. (b+c))”, push “Compile”,
a layout of y=a. (b+c) will appear in the window.
It is to check the layout. It should be correct. If any error appears, please let the assistant
know it. Save the layout.
click on the clock icon and then click the “a” node on the layout.
The clock window appears; make sure the properties on the window are below:
Low level 0.0V High level 2.5V Time low40 Rise time0.5 Time high40 Fall time0.5 ns
Push “Assign”.
click on the clock icon and click the “b” node on the layout.
The clock window appears; make sure the properties on the window are below:
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VLSI Design
low level 0.0V High 2.5V Time low 20 Rise time 0.5 Time high 20 Fall time 0.5 ns
Push “Assign”.
click on the clock icon and click the “c” node on the layout.
The clock window appears; make sure the properties on the window are below:
low level 0.0V High level 2.5V Time low 10Rise time 0.5 Time high 10Fall time 0.5 ns
Push “Assign”.
click on the node visible icon and then click the “y” node on the layout.
Push “Assign”.
Simulate>Simulate Option
An Extraction window pops up. Select” Purge and merge” for “database”, “generate a
SPICE file after extraction” for “Options”.
Make sure: “use MOS Model” is “Berkeley Spice level 3” “power Supply” is 2.5V
“Temperature” is 27.0
>Simulate>Start Simulate
A “simulation of example” window pops up. Select “Voltage vs. time”, and step is 2
ps,
time scale is 100ns. Check your simulation results. If you are sure that your simulation
results are correct, then draw the waves in figure 2.
>Analysis>Parametric Analysis
Click on the output node, and then a window “Start Analysis” pops up. Select “Power
Supply”, the range is from 0.0V to 5.0V, the step is 1.0V. The “measurement” is
“dissipation”, push “Start analysis”; curve (dissipation vs. Vdd supply) appears. Click
“Large” button to zoom in and draw the curve in figure 3.
Select “Power Supply”, the range is from 0.0V to 5.0V, the step is 1.0V. The
“measurement” is “rise delay”, push “Start analysis”, a curve (rise delay vs. Vdd
supply) appears. Draw the curve in figure 4.
Figure 3.5: Rise Delay & Fall Delay vs. power supply
Select “Power Supply”, the range is from 0.0V to 5.0V, the step is 1.0 V. The
“measurement” is “fall delay”, push “Start analysis”, a curve (fall delay vs. Vdd
supply) appears. Draw the curve in figure 4.
Select “Node capacitance”, the range is from 0 to 100 fF, the step is 20 fF. The
“measurement” is “rise delay”, push “Start analysis”, a curve (rise delay vs. load
capacitance) appears. Draw the curve in figure5.
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VLSI Design
Figure 3.6: Rise Delay & Fall Delay vs. load capacitance
Select “Node capacitance”, the range is from 0 to 100 fF, the step is 20 fF. The
“measurement” is “fall delay”, push “Start analysis”, a curve (fall delay vs. load
capacitance) appears. Draw the curve in figure5.
Evaluation
Lab Performance 15
Lab participation 5
Total 50
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VLSI Design
Lab-03 Layout
1. Objective
In this lab students will design and implement a CMOS Inverter. Different design
Parameter’s effects like transistor sizing, supply voltages etc well be analyzed and delay,
area, power and currents will be observed. This lab assumed that students are familiar
with MicroWind and Lambda based design rules. The tool used in this lab is MicroWind.
The goals for this Lab are:
• Design of CMOS Inverter and transistor sizing.
• Layout Design using the tool.
• Gate delay, area, power and current analysis and the effects of transistor sizing on these
parameters.
2. Theory
2.1 MOSFET
The Metal Oxide Semiconductor Field Effect Transistor is very important part of Digital
Integrated Circuits. It is mostly used as switch in digital design. MOSFET is a four
terminal device. The voltage applied to the gate terminal determine the current flow
between drain and source terminals. The body/substrate of the transistor is the fourth
terminal. Mostly the fourth terminal (body/substrate) of the device is connected to dc
supply that is identical for all devices of the same type (GND fro nMOS and Vdd for
pMOS). Usually this terminal is not shown on the schematics
2.2 nMOS
The nMOS transistor consists of n+ drain and source diffusion regions, which are
embedded in a p-type substrate. The electrons in the channel beneath the gate between
source and drain terminal are responsible for the current flow.
2.3 pMOS
The pMOS transistor consists of p+ drain and source diffusion regions, which are
embedded in an n-type substrate. The holes in the channel beneath the gate between
source and drain terminal are responsible for the current flow.
2.4 CMOS
CMOS Inverter/NOT gate is considered to be the heart of VLSI circuits, based on the
understanding of NOT gate we can extend it easily to NAND and NOR gates which are
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VLSI Design
the basic building blocks of more complex circuits e.g. multipliers and microprocessors.
As per discussion and design on white board in the Lab, a NOT gate can be implemented
using two FETs i.e. a pFET and an nFET both connected in series, in which Vdd is
supplied to pFET and nFET is grounded, input x is applied to the gate terminals of both
and the output is obtained at node y.
3. Design/ Diagram/Circuit
4. Lab Instructions
5. Lab Report
You can increase the table and also the entries for in depth analysis.
A properly presented in depth analysis with graph based on the table entries will be
highly appreciated.
Discuss the Effects of width design parameter of the MOS devices on their behavior.
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VLSI Design
Evaluation
Lab Performance 15
Lab participation 5
Total 50
Lab-05 Layout
1. Objective
In this lab students will design and implement the layouts of different CMOS gates,
which includes NAND, NOR. The tool used in this lab is Microwind. The goals for
this Lab are:
2. Theory
As per discussion and design on white board in the Lab, a NAND gate can be
implemented using four FETS i.e. two pFETs and two nFETs as the inputs of the gate is
two. pFETs are connected in parallel while nFETs are connected in series, Vdd is
supplied to the parallel combination of pFETs while the series combination of nFETs is
grounded. Inputs a & b are applied to the gate terminals of all FETs, and the output f is
obtained from the common junction of these series and parallel combinations as
illustrated in NAND circuit under the heading of Design Diagram / Circuit.
As per discussion and design on white board in the Lab, A NOR Gate can be
implemented using fours FETS i.e two pFETs and two nFETs as the inputs of the gate is
two. pFETs are connected in series while nFETs are connected in parallel, Vdd is
supplied to the series combination of pFETs while the parallel combination of nFETs is
grounded. Inputs a & b are applied to the gate terminals of all FETs, and the output f is
obtained from the common junction of these parallel and series combinations as
illustrated inNOR circuit under the heading of Design Diagram/Circuit.
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VLSI Design
4. Lab Instructions
NAND Gate using Metal 3 for inputs, Metal 2 for Vdd and Gnd, and Metal 1 for
diffusion interconnection and CMOS 0.12 micron process
5. Lab Report
A properly presented in depth analysis with graph based on the table entries will
be highly appreciated.
Why the Low to High propagation delay is smaller than High to Low propagation
delay for NAND gate.
Why the Low to High propagation delay is larger High to Low propagation delay
for NOR gate.
How for NAND Gate the delay can be made symmetric. Explain, and what will be
its effects on power consumption.
How for Complex Gate the delay can be made symmetric. Explain, and what will
be its effects on power consumption.
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VLSI Design
Evaluation
Lab Performance 15
Lab participation 5
Total 50
Lab 06 Layout
1. Objective
In this lab students will design and implement the layouts of a complex CMOS
gate. The tool used in this lab is MicroWind. The goals for this Lab are:
Design of CMOS Complex Gate.
Layout Design using the tool.
Gate delay, area, power and current analysis and the effects of
transistor sizing on these parameters.
2. Theory
As per discussion and design on white board in the Lab, this complex gate can be
implemented as under
Group1: Two pFETs with inputs “c” & “d” at its gate terminals are connected in
parallel.
Group2: A pFET with input “a” at its gate terminal is in series with Group1.
Group3: A pFET with input “b” at its gate terminal is parallel to Group1-Group2.
Group4: Two pFETs with inputs “a” and “d” are in parallel and is connected in
series with Group1-Group2-Group3
Group1: Two nFETs with inputs “c” & “d” at its gate terminals are connected in
series.
Group2: An nFET with input “a” at its gate terminal is in parallel with Group1.
Group3: An nFET with input “b” at its gate terminal is in seies to Group1-
Group2.
Group4: Two nFETs with inputs “a” and “d” are in series and is connected in
parallel with Group1-Group2-Group3
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VLSI Design
4. Lab Instructions
5. Lab Report
Give a short description of the contents of the lab
Include block diagram/diagrams of your design in the lab report
Describe your layout design approach parameters and explain the effects of
each the parameter
Include layout of your design also add your name on the design for evaluation
purpose.
Include the results in timing waveform format in your report
Only follow the provided cover page format.
Evaluation
Lab Performance 15
Lab participation 5
Total 50
Lab 08 Layout
1. Objective
In this lab students will design and implement the layout of a CMOS Full Adder.
Delay, area, power and currents of Full Adder will be observed. This lab assumed
that students are familiar with Microwind and Lambda based design rules. The
tool used in this lab is Microwind. The goals for this Lab are:
Design of CMOS Full Adder Layout.
Layout Design using the tool.
Gate delay, area, power and current analysis
2. Theory
The XOR can be read from the Table as follows: IF B=0, OUT=A, IF B=1, OUT=Inv
(A). The principle of the circuit presented below is to enable the A signal to flow to
node W1 if B=1 and to enable Inv (A) the signal to flow to node W1 if B=0. The
output inverts the node W1 so that we can get the XOR operator.
5. Lab Report
Give a short description of the contents of the lab
Include block diagram/diagrams of your design in the lab report
Describe your layout design approach parameters and explain
the effects of each the parameter
Include layout of your design also add your name on the design
for evaluation purpose.
Include the results in timing waveform format in your report
Only follow the provided cover page format.
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VLSI Design
Evaluation
Lab Performance 15
Lab participation 5
Total 50
Lab-09 Layout
“Design and Implementation of Static RAM Cell Layout using CMOS 0.12
micron Technology in Microwind”
1. Objective
In this lab students will design and implement the layout of a six-transistor static memory
cell.
The technology for this lab is cmos012 micron process. The tool used in this lab is
Microwind.
The goals for this Lab are:
Design of Static RAM Cell schematic.
Design of Static RAM Cell Layout using the tool.
Gate delay, area, power and current analysis.
The basic cell for static memory design is based on 6 transistors, with two pass gates
instead of one. The circuit consists of two cross coupled inverters, but uses two pass
transistors instead of one. The cell has been designed to be duplicated in X and Y in order
to create a large arrays of cells. Usual sizes of Megabit SRAM memories are 256
columns x 256 rows or higher. The selection lines WL concern all the cells of one row.
The bit lines BL and ~BL concerns all the cells of one column.
3. Design/ Diagram/Circuit
4. Lab Instructions
5. Lab Report
Evaluation
Lab Performance 15
Lab participation 5
Total 50
Lab-10 Layout
1. Objective
In this lab students will design and implement the layout of 4 bit 2-input Look UP Table
(LUT).
The technology for this lab is cmos025 micron process. The tool used in this lab is
Microwind.
The goals for this Lab are:
Design of Static D Register schematic.
Design of Static D Register Layout using the tool.
Design of 4-to-1 Multiplexer using Pass Transistor Logic
Gate delay, area, power and current analysis.
3. Design/ Diagram/Circuit
4. Lab Instructions
5. Lab Report
Evaluation
Lab Performance 15
Lab participation 5
Total 50
Lab-11
“Chip Design”
1. Objectives
This lab consists of designing a complete chip with a buffered 8-bit barrel shifter on
layout level (Lab4) and I/O pads. I/O pad ring consists of 32 pads which are 16 input
pads, 8 output pads, 4 VDD pads and 4 VSS pads, respectively. Each basic bonding pad
size is 100 x 100 m2.
Note: This lab is VERY time consuming and the only way to be able to finish the lab
in time is to prepare the homework tasks carefully.
You must carefully read Appendix to know how the chip can be generated. Meanwhile
you must finish the lab3 since the lab4 is based on the lab3. If you have not finished the
lab3, don’t do this lab4 first.
3. MicroWind manual
Study the MicroWind manual thoroughly, so that you are very familiar with the features
of the programme.
4. Lab instructions
Electrostatic discharge (ESD) exists in input and output pads. In order to protect the chip,
ESD protections are required. One of the most simple ESD protection is made up of a set
of two diodes and a resistance (Appendix Fig.5). One diode handles the negative voltage
Vss flowing inside the circuit (N+/Psubstrate), the other diode (P+/N well) handles the
positive voltage Vdd. The layout of ESD protection pad with the N+/P substrate diode
and P+/N well) diode is shown in Fig1.
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VLSI Design
One simple way to add a diode in the layout is to click on the cell library icon, then click
on the Contacts menu and to assert the options: <Diff P + Metal1> and <Diff N+ on
Nwell>. This creates a P+/ Nwell diode with its appropriate contacts (Fig. 2). To select
<Diff N+ to Metal1> and <Diff P+ on Psubstrate> generate N+/P substrate diode.
2. Select M 6, M 5, M 4 and M 3 on the Palette, and remove all these layers in the
layout (pads and pad ring).
3. Select M 2 on the Palette and remove the Metal 2 on the left side of the inner ring.
4. After removing the metal layers, make sure that the power supply pads are still
correctly connected, the 4 Vdd pads should be connected to the inner ring and the
5. Just as in the lab instruction, besides that the power supply pads are now already
properly connected. You only need to distribute the pads to the signals (A0-A7, Sh0-Sh7
and the outputs s0-s7).
2. Click File -> Insert ->open your ESDprotections.msk file. It appears on the right corner
of the pad ring window. Put it in each I/O pad. The connection way can be referred Fig.1.
3. Click File -> Insert ->open your lab3 msk file. The barrel shifter is on the right corner
of the pad ring window. Moving it into the centre of the pad ring.
4. Connecting all I/O,Vdd and Vss of lab 3 cell to the relative pads with Metal 1 and
Metal 2. Please refer to Path between Pads and Cells in appendix. The Width Metal can
be filled in any more than 10 lamda in order to visible on the whole chip.
Note that the work need you careful and patient. It consumes lots of time.
Hint: repeating using <Zoom in>, <all> to enlarge the part of chip.
4. put the VIA to make M1/M2 contacted as need two metal wires;
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VLSI Design
5. Check node if identified between pads and cells;
Name the inputs to the barrel shifter A7 through A0 in the order displayed in
figure 4. Use the Visible node in the palette for this and select the properties to
Vdd or Vss so that You set a clever selection of fixed input values to enable Your
investigation on how the output is depending on the control signals.
Name the control inputs to the barrel shifter Sh0 through Sh7 in the order
displayed in figure 6. Use the Visible node in the palette for this and select the
property to pulse in order to apply interesting control signals. Let one and only
one control signal be high at each instant. The pulse should have a rise and fall
time of 0.5ns. The pulse width should stay high for at least 2ns
Name Your buffer outputs s7 through s0 in such manner that the index
corresponds to that of the barrel shifters input signals. Use the Visible node in the
palette for this and select the property to variable. Apply Vdd and Vss voltages to
the buffer, using Vdd supply and Ground from the palette.
5. Simulate
A7: ______ F
A6: ______ F
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VLSI Design
A5: ______ F
A4: ______ F
A3: ______ F
A2: ______ F
A1: ______ F
A0: ______ F
Also check the capacitance, on the barrel shifters output before the buffer:
B7: ______ F
B6: ______ F
B5: ______ F
B4: ______ F
B3: ______ F
B2: ______ F
B1: ______ F
B0: ______ F
6. Discussion
Motivate why the obtained capacitance values on A7 through A0 are not equal.
________________________________________________________________________
________________________________________________________________________
________________________________________________________________________
Explain the obtained results regarding the capacitance values on B7 through B0.
________________________________________________________________________
________________________________________________________________________
You can now call an assistant and demonstrate results and discuss Your conclusions.
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VLSI Design
Evaluation
Lab Performance 15
Lab participation 5
Total 50
Appendix
ESD Protections
The input pad includes some voltage boosting and under voltage protections linked with
problems of electrostatic discharge (ESD). Such protections are required as the oxide of
the gate connected to the input could be destroyed by over voltage. One of the most
simple ESD protection is made up of a set of two diodes and a resistance (Fig. 5). One
diode handles the negative voltage flowing inside the circuit (N+/P substrate), the other
diode (P+/N well) handles the positive voltage. An example of ESD in a real case circuit
is shown in Fig. 6.