Briefly The Shapes of The Graphs. (2-3 Sentences)
Briefly The Shapes of The Graphs. (2-3 Sentences)
Briefly The Shapes of The Graphs. (2-3 Sentences)
Fall 2006
Note: The pn junction and BJT are included in Exam 1 on 11th Oct. Solutions to
questions 1-2 will be posted on 4 Oct, and will not be graded. However, it is strongly
recommended that you work on the problems for practice before looking at the solutions.
Questions 3-5 on MOS are due Oct. 18th and will be graded.
1. a) For a pn junction, draw the electron and hole concentrations vs distance outside the
depletion region in the case of no bias, forward bias, and reverse bias, explaining
briefly the shapes of the graphs. (2-3 sentences)
b) Estimate the voltage you would need to apply to cause avalanche breakdown in a Si pn
junction with ND in the n-side = NA in the p-side = 1015 cm-3. Assume that
avalanche breakdown occurs at a field of 105 V cm-1, and state any other
assumptions you make.
c) A BJT can be used to detect light by allowing the light to fall on the base region. How
could you bias the two junctions in the BJT to get a good response to light? For
your biasing scheme, draw the band structure and explain where the current(s)
flow.
2. Consider a pnp bipolar junction transistor with an emitter doping level of 1018 cm-3, a
base doping level of 1016 cm-3, and a collector doping level of 1015 cm-3. The cross-
sectional area of this device is 10-7 cm2. The width of the base is WB = 5 um, and WB <
LDB the minority carrier diffusion length in the base. Assume also that widths of the
emitter and collector are much longer than minority carrier diffusion lengths in those
regions.
(a) Sketch the equilibrium minority carrier concentration vs distance along the
transistor from the emitter to the collector, in every region except for the
depletion regions.
Voltages of VEB = .3 volts and VCB = -2 volts are now applied to the device.
(b) What regime of operation is the device in? What will be the relative values of IE,
IB, and IC, compared to one another?
(c) Sketch minority carrier concentration vs distance within the device, given the
applied biases. Quantitatively label maximum and minimum concentrations
within the emitter, base, and collector.
(d) Neglecting the length of the depletion region within the base, determine the
current density flowing from the collector to the emitter, ICE.
(e) If the polarity of VEB were reversed, how would ICE change (qualitatively)?
3. An ideal MOS junction is shown below. Band bending has caused the fermi level to
a) Sketch the charge buildup, the electrostatic potential, and the electric field inside the
w
E f,metal
Ec
E f,semi
Ei
Ev
p+ n p+
a) What happens when you apply a voltage VG to G (when S and D are grounded)?
Consider both positive and negative voltages. Illustrate with a sketch of the MOS band
diagram.
b) What happens when you apply a negative voltage VD to D, for different values of VG
(zero, positive and negative)? (assume S is grounded.) Draw plots of current ISD vs VD
Ec
Ef
Ev
a) Suppose now that one layer is p-type and the other is n-type. Draw the SOS band
c) Explain what currents or carrier distributions might be expected in the device under