UIC’s fiscal year just concluded.

What it
revealed was record sales, and our Phos Palladium: The Better
indisputable position as the industry’s #1 Choice for Gold Wire Bonding
supplier of ENIG, ENEPIG, electroless to an ENEPIG Finish
gold, and via fill coppers.
We are grounded in the idea that Successful gold wire bonding is achieved
between a gold wire and a clean soft gold
developing and adapting technologies
surface finish. The wire has to be high purity
that produce a substantial competitive (99.99+%); the mating surface must have a
advantage for our customers is our most similar level of purity.
important mission. At the core of this,
Immersion gold deposits meet the purity
always, is a commitment to scientific
requirement for gold wire bonding. Does it
review, and what is provable. follow that ENIG is a good gold wire bondable
It is our highest endeavor to continue to surface finish? The short answer is no. The
bring to the market products that make immersion gold in ENIG is crystalline in structure
and as such, is susceptible to the diffusion of
customers successful - based on good
the underlying nickel to the surface. A
science and good economics – and nickel-contaminated gold surface will not
supported by the industry’s finest team successfully bond with the gold wire.
of field professionals. (continued on pg. 2)
Phos Palladium: The Better Choice for
Gold Wire Bonding to an ENEPIG Finish (continued)
(continued )

Traditionally, the diffusion of nickel to the surface was overcome by plating a

relatively thick (50+µm) electrolytic soft gold surface, thus blocking the migration of
nickel to the surface. An alternative solution is the introduction of a diffusion barrier
between the nickel and the bonding gold surface. A thin layer of amorphous Immersion Gold

electroless palladium (4µm; 0.01µm) provides this barrier.

Phos palladium is ideally suited for this purpose. Phos palladium contains 3-5% 60 nm Phos Palladium

phosphorous and is amorphous in structure. (Non-phos palladium, by contrast, has

a crystalline structure and is far from an ideal diffusion barrier.) Phos palladium is
also easier to apply, has better side wall coverage, and is substantially more cost EN layer
effective.
This micrograph shows the structure of
ENEPIG metallic layers with phos
palladium. The crystalline structure of the
immersion gold is obvious. As little as
60 nm of amorphous Pd-P creates a
solid diffusion barrier that will allow
successful wire bonding to relatively
thin (1-3µm) immersion gold.

• In the “as plated” condition, there is no

observable difference in the wire bond
reliability performance of phos
palladium vs. non-phos palladium.
• After heat treatment, the reliability of
non-phos Pd declines.
• At 0.06µm of Pd, the wire bonding
performance increases with gold
thickness.

ENIG Wire Bonding

The IPC-4552 Specification for Electroless Nickel testing. Samples were not stressed or preconditioned
Immersion Gold (ENIG) Plating for Printed Circuit prior to wire bonding.
Boards is being updated. Specifically, the thickness of
The research data indicate that aluminum wire at 1.0
the immersion gold layer is being revised to reduce
mil and 10 mils, as well as 1.0 mil copper wire, were
minimum thickness from 2.0µm to 1.6µm. Studies
successfully bonded to the surfaces tested. It is fair
were undertaken to determine whether this would
to conclude that the thickness of the immersion gold
have an adverse effect on deposit performance.
is not a critical bonding parameter. In fact, as little as
One of the attributes for investigation was wire 1.2 microinches of gold successfully preserved the
bonding to the ENIG surface. electroless nickel surface for bonding. The bonding
tested showed excellent pull strengths for the
The question: Would reduced gold thickness
electroless nickel electroless palladium sample
affect the wire bondability of the surface finish?
included in the study.
In addition to wire bonding, the testing included
solderability testing (wetting balance and spread test)
contact resistance, and hole fill. The test vehicle was
plated with approximately 6 microns of electroless
nickel with three different thicknesses of immersion
gold. Samples from each of the 3 levels of gold
thickness were submitted for wire bond testing. An
additional sample with electroless nickel/electroless
palladium with no gold was included for wire bond
A Comparison of EPIG and ENEPIG
Deposits in Ultra-Fine Line Applications
As electronic devices have miniaturized, so have their performance. Cross-sectional analysis of solder joints
chip size packages, along with the spacing of wiring indicated that a more-uniform intermetallic formed when
lines. As a result, short circuit risk has increased. using LF35 solder in conjunction with EPIG, as compared
Uyemura EPIG is an excellent response to this. Along to the M705 solder.
with lowering the risk of short circuits, the plating
process can be shortened, and EPIG may also be
usable in high frequency devices.
Tests compared the characteristics of EPIG
deposits with ENEPIG deposits. The ability to plate
fine patterns, the solder joint reliability, and the wire
bonding reliability of the electroless Pd/Au (EPIG)
deposit process were compared with the electroless
Ni-P/Pd/Au (ENEPIG) deposit process. The coupons
used in this study consisted of a copper-clad
laminated substrate plated to a thickness of 20µm
using an acid copper electroplating process.
Substrates were plated with Uyemura EPIG and
ENEPIG.

Fine Patterns Figure 4. HSS results with M705 as the solder ball; EPIG (Pd 0.05-0.2um,
Au 0.1um) and ENEPIG (Ni-P 6um, Pd 0.05-0.2um, Au 0.1um)
The plating of fine patterns clearly favors EPIG – see
Figure 1. The ENEPIG sample on the left shows
obvious over-plating into the space where wiring lines
are located. The wiring line gap is 15μm. In contrast,
no over-plating was observed with the EPIG plating.

ENEPIG EPIG
(Ni 6µm, Pd 0.1µm, Au 0.1µm ) (Pd 0.1µm, Au 0.1µm)

Over-plating

Space between wiring Space between wiring

15µm 15µm
Figure 1. Over-plating comparison of ENEPIG and EPIG processes

Solder Joint Reliability Figure 7. HSS result with LF35 as the solder ball; EPIG (Pd 0.05-0.2um,
For both EPIG and ENEPIG processes, the solder joint Au 0.1um) and ENEPIG (Ni-P 6um, Pd 0.05-0.2um, Au 0.1um)

reliability as determined by a high speed shear test

was examined, with the deposits as-plated and after
heat treatment. Two different solders were used in the
Wire Bonding Reliability
When the gold and palladium thickness was decreased,
high speed shear tests (HSS): M705 (Sn-3.0Ag-0.5Cu)
the EPIG film had less WBR after heat treatment because
and LF35 (Sn-1.2Ag-0.5Cu-0.05Ni).
copper diffused onto the gold, and the ratio of palladium
For the M705 solder, the break energy following heat in the gold layer was higher.
treatment with EPIG decreased compared to
EPIG deposits with thicker palladium had good WBR
as-plated, while the break energies remained similar
because the palladium layer prevented copper diffusion to
for ENEPIG. However, when using the LF35 solder,
the top of the gold surface after heat treatment. Also,
the break energy for EPIG was markedly increased.
when the gold in the EPIG deposit was thicker, the wire
Break energies for ENEPIG remained consistent for the
bonding reliability improved because the ratio of palladium
LF35 solder.
on the top surface was restrained after heat treatment. In
The results show that the choice of proper solder contrast, WBR after heat treatment was improved by
when using EPIG is necessary for optimum applying plasma treatment to the gold surface.
Populated Boards Benefit
Most from Important New
Plasma Technology from UIC

Uyemura has brought advanced vacuum

plasma treatment technology to electronic
manufacturing companies and board makers in
the US, Canada and Mexico.

Marketed as Nanofics®, this low pressure, dry

plasma technology deposits hydrophobic/
oleophobic polymer nanocoatings onto
electronic components and assembled boards.
The process uses a proprietary method of
tuning the plasma power, which enables stable Nanofics coatings provide permanent,
and effective plasma polymerization. effective protection against corrosion and
There are five systems, with plasma chamber oxidation in harsh environments. Coatings
volumes of 50 to 500 liters. Systems also have a provide Z axis conductivity that allows
unique electrode design to maximize deposition electrical connection through the coating;
uniformity, and minimize batch-to-batch coatings can also be soldered through.
variability. The Nanofics system is inherently Nanofics technology was a major draw
“green” and does not generate chemical waste. among device makers at January’s
Consumer Electronics Show. Two
electronic manufacturers have purchased
the technology for 2014/2015 programs;
beta testing by a major international brand
will be completed this spring.

In addition to electronics and PCB

manufacturing, Nanofics technology has
demonstrated applicability for medical
device, automotive, aerospace and
technical textiles applications. Uyemura
manages applications development for
Nanofics coating chemistry and equipment
throughout North America. Test processing
is available at the Uyemura Tech Center;
for details, contact Don Walsh.