All Inversion Region
All Inversion Region
Abstract—This paper presents a general optimization method- information provided by the foundry. As a hypothesis,
ology for analog blocks in RF applications, with CMOS nanome- MOST is considered to be working quasistatically, so its
ter technologies, based on the complete exploration of all-in- working frequency f0 is at least one tenth of its transition
version regions of MOS transistor (MOST). The fundamental
tool is the systematic use of the MOST gm /ID technique and frequency fT [3].
the description of the real behavior of all devices by means of 2) Passive semi-empirical modeling : Parasitic parameters
semi-empirical models. To exemplify this technique, the differen- extraction of passive components (inductors, capacitors,
tial ratioless cross-coupled LC-tank voltage controlled oscillator varactors and resistors) are expressed in LUTs, for the
(LC-VCO) circuit is studied. The implemented design flow working frequency f0 . Since for each nominal value of
minimizes the LC-VCO phase noise considering the constraints of
current consumption, output common-mode voltage and output the element, different geometries are possible, only the
amplitude. To verify the method, six LC-VCO were designed and best devices are included in the LUTs (e.g. devices with
validated by comparing them with the corresponding electrical the largest quality factor for each nominal value).
simulations. 3) Signal and noise analytical modeling : RF block core
Index Terms—Optimization, Low power, MOST all-inversion characteristics are modeled. When necessary, perform
regions, Design Methodology, LC-VCOs, RF
the equations modifications to link them with the device
characteristics described in steps 1) and 2).
I. I NTRODUCTION
4) Design Flow : Create a simple and systematic design
At present, the demands of low-cost, efficient and quick flow where the relations between block equations, ex-
time-to-market solutions oblige RF designers to use CMOS tracted parameters and necessary decisions are properly
nanometer technologies as well as accurate design methodolo- organized, all intended to fulfill the particular specifica-
gies applied prior to electrical simulations. It is particularly tions of the block and technological process constraints.
useful to observe the design’s trade-offs when low-power The paper is organized as follows. Section II presents the
constraints exist. This paper presents a general design method- way the CMOS process is modeled, dividing its study in
ology focused on nanometer technologies for analog RF the modeling of MOST and passive components. Section III
blocks that provides the electrical elements sizing as well as discuses the design flow of one particular RF circuit: the
the design compromises. The circuit used to exemplify the cross-coupled ratioless differential LC-VCO. Finally come the
technique is a cross-coupled differential LC-VCO in which Conclusions.
nMOS and pMOS transconductances can take different values
(ratioless LC-VCO). The design process is established over II. M ODELING OF NANOMETER CMOS PROCESSES
the exploration in all-inversion regions of the MOST, to find A good modeling of the process involved in the design
the best working zone. is necessary in order to correctly characterize its active and
We distinguish four main steps: passive devices. Not doing so would lead to substantial
1) MOST semi-empirical modeling : The MOST is char- mismatches between the circuit features observed at the de-
acterized as function of the gm /ID ratio, which defines sign level and after electrical simulation. MOST and passive
the MOST inversion region and has a biunivocal relation devices are modeled in this work using: a) semi-analytical
with the normalized current i = ID /(W/L) [1], [2], models whose parameters are in LUTs and depend on primary
with ID , W and L the MOST drain current, width and electrical magnitudes; and b) semi-empirical models whose
length, respectively. By measurements or simulations, data are in LUTs extracted from electrical simulations. These
the behavior of a small set of MOST is captured in models prove to be enough for RF applications at least until
look-up tables (LUTs). In them, gm /ID is related biuni- 5 GHz with our RF 1.2-V 90nm CMOS process.
vocally with basic MOST characteristics: transconduc-
tance gm , drain-source conductance gds , drain current A. MOS transistor model
0
ID , normalized intrinsic capacitances Cij , with ij = As a rule of thumb [4], for the 90nm CMOS technol-
{gs, gd, gb, bd, bs} and noise parameters. In this work, ogy used in this work, weak inversion (WI) is considered
these data are extracted via electrical simulation with the for gm /ID above 20 V −1 , strong inversion (SI) is below
Figure 2. (a) Inductor parallel parasitic resistance Rp,ind versus inductance
Lind for a wide set of inductors’ sizes; and (b) capacitor series parasitic
resistance Rs,cap vs. capacitance Ccap for a wide set of capacitors’ size.
(gm /ID )n (gm /ID )p Aout (V) Vo,cm (V) L@400kHz (dBc/Hz) Lind Rind ID Wn Wp Cvar
Design
(1/V) (1/V) Calc. Sim. Calc. Sim. Calc. Sim. (nH) (kΩ) (mA) (µm) (µm) (pF)
PSI1 10 7 0.9 1.16 0.51 0.54 -119.2 -118.2 2.6 0.64 0.73 15.1 25.9 1.36
PSI1 10 7 0.9 1.16 0.51 0.54 -110.6 -111.3 8.7 1.6 0.29 6.0 10.2 0.26
PMI1 16 11.3 0.56 0.72 0.39 0.37 -115.5 -115.3 2.6 0.64 0.45 44.8 41.9 1.27
PMI2 16 11.3 0.56 0.72 0.39 0.37 -113.3 -112.2 5.1 1.12 0.25 25.4 24.0 0.54
PWI1 20 14 0.45 0.58 0.28 0.29 -110.2 -109 5.1 1.12 0.20 115.3 36.0 0.38
PWI2 20 14 0.45 0.58 0.28 0.29 -113.6 -112.6 2.6 0.64 0.35 181 63.3 0.98
Figure 6. Color plot of (gm /ID )p versus (gm /ID )n and Lind . Zones
where constraints are not met are shadowed.