I VCharacteristics 2
I VCharacteristics 2
To begin, recall from our discussion of diffusion that the free electrons in
the n-type material and the free holes in the p-type material will move
across the junction until equilibrium is reached. The width of the resulting
depletion region is related to the barrier potential and is a function of
applied bias.
Now, with that said, let’s look at how a diode actually works...
vD
nVT
iD = IO (e − 1) (Equation 3.26)
where:
iD is the current through the diode
vD is the voltage (potential difference) measured across the diode
terminals
IO is the reverse saturation current
n is a device constant between 0.5 and 2 that is dependent on
material, diode construction, and operational considerations.
Unless otherwise explicitly stated, the standard simplification of
n=1 will be used for all examples and may be made for all
analyses.
VT is defined as the thermal voltage and is approximately 26mV at
room temperature (25oC).
Let’s look more closely at this figure and Equation 3.26. From observation
(and quick-and-dirty-math), we can define three distinct regions for the
diode:
nVT
rd ≈ Rf = . (Equation 3.31)
iD
So…now we’ve got a semi-ideal diode that’s based on physics and is still
pretty well behaved. Since we can never let well enough alone, let’s goof
with it, shall we?
The first change that must be made when discussing practical devices is the
removal of the assumption of the ideal, instantaneous change of material
type at the pn junction. Instead of an ideal junction, the doping near the
junction may be graded – that is, doping concentrations are a function of
distance from the junction definition. This arises from the use of diffusion
and implantation techniques – we don’t actually have two distinct material
types and “stick” them together. We’re not actually going to do anything
with this here (ah, for a solid state class), but I just wanted to bring it to
your attention.
The most important modification we must make in the forward bias region
is the applied voltage required to get a measurable diode current (known as
turn-on voltage). Rather than the few VT we used in the semi-ideal diode
discussion above, this value (called VON) is approximately 0.7 V for silicon,
0.2 V for germanium, and 1.2 V for gallium arsenide diodes. Yep, this is the
potential barrier voltage, Vo, of the pn junction we talked about in Section
A6.
There is also a difference in the reverse bias region due to both material
characteristics and fabrication of the diode junction. The semi-ideal diode
had a leakage current across the junction (the reverse saturation current,
shown by –Io in the figure above), but had no restrictions on the magnitude
of the applied reverse voltage. Practical devices have a breakdown voltage
VBR (also called the peak inverse voltage (PIV) on manufacturer’s spec
sheets). For magnitudes less than this breakdown voltage, the IV
characteristics of the diode have a slope of 1/Rr. If the magnitude of the
reverse bias approaches VBR, avalanche breakdown occurs. In this case,
the junction breaks down, a large current flows, the device overheats, and a
normal diode may be destroyed.
The last effect on diode operational characteristics we’re going to look at has
to do with temperature. Going back to the thermal effects at the material
level (Remember? More free carriers through EHP generation with increasing
temperature?), there is more current, both for the forward and reverse
operating regions, as the temperature increases. Therefore, the turn on
voltage of the diode is directly related to the device temperature – as T
increases, VON decreases and vice versa. Although there are numerous
components to this dependence, it is standard practice to express the
temperature dependence as a constant kT (see below). Equation 3.32
defines this temperature dependence numerically in terms of the relationship
between room temperature parameters and a “new” temperature, which
may be greater than or less than room temperature.
This figure should be no surprise – again, it comes back to the physics of the
junction. Remember that EHP generation is directly related to thermal
excitation – as the temperature increases, the more free carriers are
generated. So…with an increase in temperature the curves in forward bias
shift left since less applied potential is required for the same current.
Likewise, as temperature decreases, the curves will shift right. Regardless of
the temperature change, the overall shape of the curve remains the same
since it is controlled by the exponential relationship defined in equation 3.26.