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Lecture15-Pass Ratioed PDF

1) The document discusses a lecture that covers pass transistor logic and CMOS layout. 2) It introduces standard cells that are used to synthesize logic and datapath cells for regular designs like arithmetic. 3) The lecture also discusses cell height, mirrored cells, diffusion routing, and logic graphs for circuit design.

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Surya Kannan
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0% found this document useful (0 votes)
123 views22 pages

Lecture15-Pass Ratioed PDF

1) The document discusses a lecture that covers pass transistor logic and CMOS layout. 2) It introduces standard cells that are used to synthesize logic and datapath cells for regular designs like arithmetic. 3) The lecture also discusses cell height, mirrored cells, diffusion routing, and logic graphs for circuit design.

Uploaded by

Surya Kannan
Copyright
© © All Rights Reserved
We take content rights seriously. If you suspect this is your content, claim it here.
Available Formats
Download as PDF, TXT or read online on Scribd
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EE141

EECS141
EE141 Lecture #15 1

Hw 6 posted.
Project phase 1 underway. Mail your group
composition (list of names) to
[email protected]
No lecture on Fr
Make-up on Tu March 16 at 3:30pm

EECS141
EE141 Lecture #15 2

1
EE141

Last lecture
Optimizing complex logic
Pass transistor logic
Todays lecture
Pass transistor logic continued
CMOS Layout
Pseudo-NMOS
Reading (Ch 6)

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EE141 Lecture #15 3

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EE141 Lecture #13 4

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Advantage: Full Swing


Restorer adds capacitance, takes away pull down current at X
Ratio problem

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Upper limit on restorer size


Pass-transistor pull-down
can have several transistors in
stack

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B
A
C

D
OUT = D + A (B + C)
A
D
B C

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Standard Cells
General purpose logic
Used to synthesize RTL/HDL
Same height, varying width
Datapath Cells
For regular, structured designs (arithmetic)
Includes some wiring in the cell

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Mirrored Cell

No routing VDD
channels
VDD

M2

M3
GND

Mirrored Cell GND

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N Well
VDD Cell height 12 metal tracks
Metal track is approx. 3 + 3
Pitch =
repetitive distance between objects

Cell height is 12 Mn pitch

Out
In
2

Rails ~10
GND
Cell boundary

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With minimal VDD With silicided VDD


diffusion diffusion
routing

Out In Out
In

GND GND

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VDD 2-input NAND gate

A B

Out

GND

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Contains no dimensions
Represents relative positions of transistors

VDD VDD

Inverter
NAND2

Out Out

In A B
GND GND

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A C B A B C

VDD VDD

X X

GND GND

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Logic Graph X PUN


A
j C
B C

X i VDD
X = C (A + B)
C
i B j A

A B
PDN
A GND
B
C

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X
A B C
Has PDN and PUN C

X i VDD
B C A
Has PUN, but no PDN
B j A

GND

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X PUN
A C

B D D C

X VDD
X = (A+B)(C+D)

C D
B A

A B PDN
A GND
B
C
D

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One finger Two fingers (folded)

Less diffusion capacitance

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Goal: build gates faster/smaller than static


complementary CMOS
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Rising and falling delays arent the same


Calculate LE for the two edges separately

For tpLH:
Cgate = WCG Cinv = (3/2)WCG LELH =

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What is LE for tpHL?


Switch model would predict Reff = Rn||Rp
Would that give the right answer for LE?

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vo(t)/VDD

Rp=Rn

Rp=2Rn
Rp=4Rn
Rp=

t
Time constant is smaller, but it takes more time
to complete 50% VDD transient (arguably)
Rp actually takes some current away from
discharging C
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Think in terms of the current driving Cload

When you have a conflict between currents


Available current is the difference between the two
In pseudo-nMOS case:

(Works because Rp >> Rn for good noise margin)

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For tpHL (assuming Rsqp = 2Rsqn):


Rgate = Rn/(1-Rn/Rp) = 2Rn Rinv = Rn
Cgate = WCG Cinv = 3WCG
LEHL =
LE is lower than an inverter!
But have static power dissipation

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Differential Cascode Voltage Switch Logic (DCVSL)

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XOR/XNOR gate

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