Fiber Bragg gratings are produced using phase masks that diffract UV light into an interference pattern within an optical fiber. This creates a periodic refractive index modulation that acts as a wavelength-selective filter. Phase masks are precision diffraction gratings etched in fused silica. They can operate in either a +1/-1 configuration, where the interference pattern period is half the phase mask period, or a 0/-1 configuration, where the pattern period matches the phase mask period. Correct specification of the phase mask parameters is important for producing fiber Bragg gratings with the desired properties.
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Phase Mask
Fiber Bragg gratings are produced using phase masks that diffract UV light into an interference pattern within an optical fiber. This creates a periodic refractive index modulation that acts as a wavelength-selective filter. Phase masks are precision diffraction gratings etched in fused silica. They can operate in either a +1/-1 configuration, where the interference pattern period is half the phase mask period, or a 0/-1 configuration, where the pattern period matches the phase mask period. Correct specification of the phase mask parameters is important for producing fiber Bragg gratings with the desired properties.
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White Paper
An Introduction to Phase Masks for FBG Writing
Fiber Bragg Gratings (FBGs) are critical components in many telecommunications applications, fiber sensing systems and fiber lasers. Since FBGs are virtually all produced using phase masks, correctly specifying phase mask parameters is vital to achieving proper operation in the resultant FBG. This whitepaper provides a brief introduction and overview of phase mask operation and outlines how to specify their most vital parameters. Introduction to Phase Masks Phase masks are surface relief gratings, typically etched in fused silica as shown in Figure 1. In most applications, a phase mask essentially serves as a precision diffraction grating that divides an incident monochromatic beam, often in the UV spectral range, into two outgoing beams. These two exit beams create an interference pattern in the region in which they overlap as illustrated in Figure 2.
this link provide an overview of the ranges of various
phase mask parameters for our standard products.
Figure 2. A phase mask produces two diffracted beams, and an
interference pattern is created where they overlap.
The "period" (or "pitch") of phase mask gratings range
from a few hundred nanometers to almost 2 microns. The grating areas come in a wide variety of dimensions, ranging from a few millimeters square to 10 mm by 150 mm. The silica substrates on which the phase mask gratings are etched are typically 1/8" thick. The grating profile is essentially binary (a rectangular wave) for the longer periods, and tends to be somewhat quasi-sinusoidal for the shorter periods. Figure 1. Phase masks are surface relief gratings etched in fused silica.
Phase masks have a wide variety of applications, but
most frequently, Coherent phase masks are used to record other gratings. Typical examples of these are planar waveguide gratings used in integrated optics devices, and FBGs. An FBG is a periodic modulation in the refractive index of the core of an optical fiber, and is usually employed to create high reflection properties at one or more wavelengths. Phase Mask Configurations Most phase masks are fabricated in UV-transparent fused silica of high purity, but other materials are available as well. The data sheets accessible through
configurations, +1/-1 or 0/-1, where the numbers refer to the diffracted orders which contain the bulk of the diffracted light. In the +1/-1 configuration, the UV radiation is directed with normal incidence at the phase mask, and the period of the fringe pattern generated by the interference of the outgoing beams is exactly one half of the period of the phase mask grating as shown in Figure 3. In the 0/-1 configuration, the UV radiation is directed at the phase mask with a specially chosen angle of incidence, and the period of the fringe pattern is exactly equal to the period of the phase mask grating.
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wavelengths pass through unattenuated. FBGs are
located at the heart of many fiber sensing devices and telecom components. They are fundamental building blocks in many fiber systems.
Figure 4. Phase masks are used to record other gratings, such as
fiber Bragg gratings (FBGs).
Figure 3. Schematic representation of phase masks configured in
the -1/+1 (top) and 0/-1 (bottom) configurations.
The upper part of Figure 4 is a schematic depiction of
the recording of an FBG in the +1/-1 configuration. UV radiation is normally incident on the phase mask. A pattern of fringes, which are stationary alternating zones of high and low intensity, is generated by the interference of the two outgoing beams. A length of optical fiber (usually made of silica) is placed in this interference pattern. The fiber's core has been rendered photosensitive, usually through doping with oxides of germanium, tin, boron, phosphorus and other elements. Due to this photosensitivity, the refractive index of the core is altered through exposure to UV radiation. Thus, exposure to the interference pattern causes a periodic modulation of the index of refraction in the core material. The result is a fiber Bragg grating (FBG), shown in the bottom part of the figure. In operation, the FBG acts as a narrow band reject filter as shown in Figure 5. Specifically, one wavelength is highly reflected by the FBG, while the other
Figure 5. A Fiber Bragg Grating is a wavelength selective filter
located in the core of an optical fiber.
Phase Mask Formulas
When a phase mask is operated in the +1/-1 configuration, the UV light is normally incident on the grating (Figure 6). The angles of diffraction 0, -1, +1, -2, +2 etc. are given in terms of the UV wavelength UV and the phase mask period PM, by the formula sinm= m UV / PM The period of the fringe pattern created by the interference of the +1 and -1 beams is exactly one half of the period of the phase mask, regardless of the wavelength of the incident radiation.
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fringe = PM / 2
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The period of the fringe pattern created by the
interference of the 0 order and -1 order beams is exactly equal to the period of the phase mask period. fringe = PM
Figure 6. +1/-1 Phase Mask Configuration
Coherent's phase masks are optimized so that the
intensity of the +1 and -1 orders is maximized, while the intensity carried in the zeroth order is minimized. Also, the intensity in any higher orders (m =2, 3, etc.), if such orders are present, is also minimized.
Figure 7. +0/-1 Phase Mask Configuration
A phase mask can also be operated effectively in the
0/-1 configuration, as depicted in Figure 7. This configuration is defined by the condition |0|=|-1|, which ensures that the fringes are perpendicular to the phase mask surface. In order to satisfy this condition, the required angle of incidence is: |sin in| = |sin 0| = UV /(2 PM ) Moreover, if the condition (2/3) PM < UV < 2 PM is satisfied, then there will be one and only one diffracted order (the -1 order) and no other orders (such as +1, 2, 3, etc.). In other words, there are two and only two outgoing beams: the 0 order and the -1 order. This guarantees a clean fringe pattern.
This remains true regardless of the wavelength of the
incident radiation, and regardless of whether the condition |sin in| = UV /(2 PM) is perfectly achieved. Conclusion Coherent holographically produced phase masks are high precision components, suitable for the most demanding applications, such as Fiber Bragg Grating writing. However, it is necessary to understand the basic operational principles of phase masks and how to properly specify them in order to obtain optimum performance from these devices. Since there are several other important parameters involved in phase mask operation besides just period, we encourage those interested to contact Coherent and discuss their needs in detail with our applications engineers.