United States Patent [191

[111

Larsson et al.

[45]

[54-] GAS DISTRIBUTION DEVICE FOR THE

3,803,723

SUPPLY OF A PROCESSING GAS TO AN

499847

Belgium ................................... .. 55/260

2/1962

55/260
55/260

France ............................. ..

[57]

Denmark ........................... .. 3640/78

[51]

Int. Cl.2 ............................................ .. B01D 47/16

[52]

US. Cl. ...................................... .. 55/260; 55/226;

55/230; 159/4 B; 159/4 S; 261/79 A; 261/88;

261/89; 261/118
Field of Search .................. .. 261/78 A, 96, 79 A,

261/88, 109, 89, 118; 55/226, 230, 260,

442-445, 459 R, 459 C; 159/4 R, 4 B, 4 S

References Cited

55/260

ABSTRACT

A processing gas is supplied to the atomizing zone

around an atomizing device arranged centrally in an
atomizing chamber through a conical guide duct com
municating with a horizontal spiral supply duct through
an annular mouth. A uniform gas distribution with re

spect to ?ow direction and velocity is obtained by

means of guide vanes arranged with a Small angular

spacing in the mouth and comprising two succeeding

vane sets, in which the vanes of one set are shaped to

de?ect the tangential gas stream in the spiral duct to a

flow direction, for which the radial velocity component

considerably exceeds the tangential component,

Us PATENT DOCUMENTS
619 6 6 934 B _
l

3,373,095

Lamm et al. .................. .. 159/4 B X

Primary ExaminerRichard L. Chiesa

Attorney, Agent, or Firm-Sughrue, Rothwell, Mion,
Zinn and Macpeak

A/S Niro Atomizer, Soborg,

[21] Appl. No.: 63,884

[22] Filed:
Aug. 3, 1979
[30]
Foreign Application Priority Data

[56]

3/1951

1289817

Denmark

[58]

Oct. 14, 1980

70827 l/l970 Fed. Rep. of Germany

80661 3/1971 Fed. Rep. of Germany

Denmark

Aug. 17, 1978 [DK]

4,227,896

FOREIGN PATENT DOCUMENTS

ATOMIZING CHAMBER
[75] Inventors: Finn H. Larsson, Tastrup; Christian
Schwartzbach, Malov, both of

[73] Assignee:

4/1974

>

5 226

whereas each vane of the other set positioned at the

opening of the mouth towards the conical guide duct

l/1963 nlgibgtiteg et a. ................. " 53230

projects into the space between neighboring vanes of

3112239

11/1963

Andermai't' ' ' ' ' ' ' ' ' '

3:175:340

3/1965

Schulze

3,596,885

8/1971

Stone

3,789,582

2/ 1974

Graybill ........................... .. 55/260 X

._

' ' ' ' ' "159/4 B

"""

. . .. .. .

. . . . . ..

/79 A X

the ?rst set and extends substantlally parallel to tangen

tial planes to said vanes at their internal edges.

55/260 X

2 Claims, 3 Drawing Figures

17
._

1&1

";
//

I20
/0

Ma
I00

/4b
/0b

/2b
6'

__..__t

U.S. Patent

Oct. 14, 1980

Sheet 1 of 3'

I20

/0

/40 I00

4,227,896

F76.
/

US. Patent

Oct. 14, 1980

Sheet 2 of 3

4,227,896

U.S. Patent

Oct. 14, 1980

Sheet 3 of 3

4,227,896

4,227,896

jGAS DISTRIBUTION DEVICE FOR THE SUPPLY

OF A PROCESSING GAS TO AN ATOMIZING
CHAMBER

'

The invention relates to a gas distribution device for

supplying a processing gas to an atomizing zone around

an atomizing device arranged centrally in an atomizing

chamber, said processing gas being conducted from a
horizontal spiral supply duct through an annular mouth
extending in rotational symmetry around the axis of the
chamber into the space between two conical guide
walls extending around and above the atomizing device,
guide vanes being provided in said mouth for imparting
a change of direction to the gas stream from a mainly

From the speci?cations of Belgian Pat. No. 499,847

and GDR (German Democratic Republic) Pat. No.
80,661, it is known to conduct gas either from an annu

lar supply duct directly into an atomizing chamber or

from a spiral supply duct into a conical guide duct com

municating therewith by means of adjustable guide

vanes arranged in the annular month between the sup
ply duct and the atomizing chamber or the conical duct,
respectively. However, in these prior art constructions,
the gas distribution has been relatively casual, and no

unambiguous directional guiding of the supplied gas

into a downwards directed stream with a certain rota~

tion in the conical guide duct has been obtained due to

the rather complex and critical adjustment of the indi

vidual dampers and a relatively great angular spacing

purely tangential ?ow in the spiral duct into a rotating

flow with a smaller tangential velocity component in
the space between the conical guide walls.
By atomizing chambers is herein to be understood

thereof.
It is the object of the invention to provide a gas distri
bution device, by means of which an optimum and with

drying, cooling and absorption, in which a liquid which

internal opening of the mouth towards the conical guide

respect to rotational symmetry, uniform distribution of

processing chambers for different processes, such as 20 the processing gas supplied in the spiral duct at the
duct is obtained at a considerably lower pressure drop
across the mouth, and by which there is furthermore
obtained already at this place an unambiguous direc
- as a rotating atomizer wheel arranged centrally in the
25 tional guiding of the gas stream into a downwards di~
normally mainly cylindrical chamber.
rected spiral path with a relatively low rotational com
The atomized material leaves the atomizing device in
ponent in the conical guide duct.
may be a homogenous substance, a solution or a suspen

sion, is atomized by means of an atomizing device such

mainly horizontal radial directions out into an atomiz

ing zone. In the processes in question, one or the other

In order to achieve this, a gas distribution device

according to the invention is characterized in that the

kind of a processing gas is most frequently supplied to 30 guide vanes are arranged in the mouth with a small
this atomizing zone for achieving a desired result. In a
angular spacing and comprise two succeeding sets of
' drying process, for example, a heated drying gas which
stationary guide vanes, in which the guide vanes of one
may be atmospheric air or an inactive gas may be sup
set positioned at the external opening of the mouth
plied. In other processes, gases may be supplied which
towards the spiral duct are shaped to deflect the gas
perform other physical or chemical reactions with the 35 stream to a ?ow direction, for which the radial velocity

atomized liquid.

For obtaining a distribution of the supplied process

ing gas around the atomizing device which in respect of

component considerably exceeds the tangential velocity

component, whereas each vane of the other vane set

positioned at the internal opening of the mouth towards

the space between the conical guide walls projects into
the space between the internal portions of neighbouring

rotational symmetry is as uniform as possible, use is

most frequently made of a distribution device of the 40
above mentioned kind, in which the gas is conducted
vanes of the ?rst vane set and extends substantially

from the horizontal spiral supply duct which is posi

parallel to tangential planes to these vanes at the inter

tioned at a higher level than the atomizing device

through said mouth into the conical duct formed by the

nal edges thereof.

space between the conical guide walls, the annular

arranged in this manner with closely positioned guide

mouth of said conical duct being positioned in a hori

zontal plane immediately overlying the atomizing zone.

vanes, such an equalization of the velocity distribution

in the space between each pair of neighbouring vanes in

Through the use of two guide vane sets shaped and

In order to obtain uniformity of the gas distribution

the one direction-changing vane set is obtained that

throughout the length of the internal opening of the

throughout the internal opening of the mouth towards

mouth towards the conical duct, there has been used in

the constructions hitherto known a relatively high
working pressure in the spiral duct in combination with
a plate grid in the form, for example, of a perforated

obtained substantially without any observable velocity

plate arranged in the mouth, said grid having caused a

relatively high pressure drop, such as disclosed in
French Patent Speci?cation No. 1,289,817. Since such
plate grids do not per se exert any essential directional
effect on the gas, a desired ?ow direction with a down

the conical guide duct, a uniform gas distribution is

variations. In addition, the vanes of the other vane set

positioned towards the conical duct exert such a direc

tional effect on the gas streams passing through the ?rst
vane set that at any place at the internal opening of the
mouth towards the conical guide duct, a well de?ned
flow direction forming a relatively small angle with a
radial plane in the gas distribution device is obtained, so

wards directed rotating movement could subsequently

that the entire amount of gas is conducted into the con
be imparted to the amount of gas supplied into the coni 60 cial guide duct as a spiral stream with a strong radial
cal duct by means of guide vanes arranged in the coni
and, thus, downwards directed velocity component and
a relatively smaller rotational component.
cal duct. Likewise, it is known to divide the conical

Subsequently, a further changeof direction, possibly

guide ducts for vproducing two gas streams passing

through the atomizing zone with different directions,

after division into two partial streams, may be imparted

" suchas an internalmainly axially downwards directed

65 to this gas stream by means of guide vanes in the conical

'Yannular'streariifand any external spirally downwards

duct. The pronounced uniform distribution along the

internal side of the mouth of the gas stream entering into

"directed gas streamwith a relatively high rotational

component.

the conical duct with respect to ?ow direction as well

4,227,896

as velocity facilitates the adjustment and regulation of

subsequent guide vanes and, thus, the achievement of a
rotational symmetrically uniform gas supply to the at
omizing zone, whereby the atomized material is sub
jected to a considerably more uniform in?uence from

the processing gas than in the gas distribution devices

hitherto known.
As a result of theuse of stationary guide vanes, the
guide vanes per se may form distance members, so that
separate stay or supporting means in the mouth may be 0

dispensed with.
In the following, the invention will be further ex

plained with reference to the accompanying drawings,

in which
FIG. 1 is a simpli?ed vertical sectional view of an
embodiment of a gas distribution device according to

the invention,
FIG. 2 is a horizontal sectional view along the line
II~II in FIG. 1, and

FIG. 3 is a perspective view, for illustrating the guide

vanes in the embodiment shown in FIGS. 1 and 2.
In FIGS. 1 and 2 a rotating atomizing device, such as
an atomizer wheel, is shown at 1, which device is pre

supposed to be arranged centrally in the upper part of

an atomizing chamber, of which only the underside of
the chamber ceiling is indicated at 2.

ducing the above mentioned internal stream of process

ing gas.

'

For each of the two streams of processing gas, the

?ow direction is determined by guide vanes, as shown
at 140 and 14b in the ducts 10a and 10b.
For obtaining an optimum and, with respect to rota

tional symmetry, uniform distribution of the processing

gas conducted from the spiral supply duct 8 into the
conical guide duct 10, there are arranged in the mouth
9, according to the invention, two succeeding sets of
stationary guide vanes 15 and 16, respectively, in which
the vanes in one vane set positioned at the opening of
the mouth 9 towards the spiral duct 8 are shaped to

de?ect the gas stream from the purely tangential ?ow

shown by an arrow 17 in the duct 8 to a flow direction

shown by arrows18, for which the radial velocity com

ponent inwards to the axis of the gas distribution device

considerably exceeds the tangential velocity compo

nent, whereas each of the vanes 16 in the other vane set

at the internal opening of the mouth 9 towards the coni

cal guide duct 10 projects into the space between the
internal portions of neighbouring vanes in the ?rst vane

set and extends substantially parallel to tangential planes

to these vanes at their internal edges, i.e. parallel to the
direction to which the gas stream has been de?ected by
these neighbouring vanes.

form of homogenous substance, a solution or a suspen

In the embodiment shown in the drawings, each vane

15 has a bend form composed of two substantially plane
portions 15a and 15b, but these vanes may also have a
more uniformly curved cross sectional shape which can
provide the desired de?ection of the gas stream in the

sion in a manner not further illustrated.

To the atomizing zone of the chamber which is situ

duct 8. The vanes 16 are shown as ?at guide vanes, but

should only extend substantially parallel to the vane

ated radially around the atomizing device 1, there shall

be supplied by means of a gas distribution device ac
cording to the invention a processing gas adapted to the
process, such as drying, cooling or absorption, to which
the supplied material is to be subjected after atomization
by means of the atomizing device 1. In a drying process,

parts 15b, so as to stabilize the gas streams to the direc

atmospheric air.

de?ection will be suitable that the gas streams leave the

The atomizing device 1 is positioned at the bottom of

a conical skirt 3 surrounding the lower part of drive

means, not shown, for the atomizing device, through

which skirt the liquid to be atomized is supplied in the

tions to which they have been de?ected by the vanes 15.

The magnitude of the de?ection angle may vary
somewhat according to the kind of processing gas and
the supply velocity thereof and with a consideration to
the desired progress of the ?nal gas streams through the
the processing gas may consist, for example, of heated 40 atomizing zone. For many applications, such a strong
In many cases, the processing gas is caused to pass

through the atomizing chamber in two separate streams,

vanes 16 under an angle of 15, for example, with axial

planes in the mouth since, thereby, a gas supply is ob

tained at the upper end of the conical guide duct 10 with

i.e. an internal stream supplied to the atomizing zone
from above with a strong downwards directed move 45 a suitably low, but well de?ned rotation.
The detailed construction of the vanes 15 and 16 may
ment, as shown by arrows 4 and 5, and an external
be as shown in the perspective view in FIG. 3. In order
stream carried through the chamber at a greater dis
to obtain the desired gas distributing and directional
tance from the atomizing device 1, as shown by arrows

6 and 7, and with a strong rotational component.

The processing gas is supplied from a fan device, not

shown, through a spiral supply duct 8 arranged above

the ceiling 2 of the atomizing chamber, said supply duct
communicating through an endless annular mouth 9
with a conical guide duct 10. This guide duct 10 is
restricted to one side by an internal conical guide wall
11, the lower end of which is connected to the skirt 3
and, in the example illustrated, in which two separate
streams of processing gas are to be produced, the duct
10 is divided, by means of two external conical guide

walls 120 and 12b spaced differently from the guide wall
11 and overlapping each other on a small portion only
at the underside of the chamber ceiling 2, into an exter
nal channel 10a opening at the underside of the chamber

ceiling 2 for producing the above mentioned external

stream of processing gas, and an internal channel 10b to

which only a part of the amount of gaspassing through

the duct 10a is supplied and which opens some distance
below the underside of the chamber ceiling 2 for pro

guiding effect, it is essential that the vanes 15 and 16 in

the two vane sets are positioned at a small angular spac

ing in the mouth 9, preferably such that the spacing of

neighbouring vanes is smaller than the radial extension
of the mouth 9 between the internal opening of the duct
8 and the inlet opening to the conical guide duct 10.

The vanes may be manufactured by simple stamping

and folding or bending of vane members of a plate mate

rial, such as steel, which is resistant to the possibly

corroding in?uences from the processing gas.

What is claimed is:
1. A gas distribution device for supplying a process
ing gas to an atomizing zone around an atomizing de

vice arranged centrally in an atomizing chamber, com

prising a horizontal spiral supply duct for said process
ing gas, said duct having an annular mouth extending in
rotational symmetryaround the axis of the chamber,
and two conical guide walls extending around and
above the atomizing device, said guide walls limiting a
space communicating with said mouth, guide vanes

4,227,896
6

tangential velocity component, the other vane set being

positioned at the internal opening of the mouth towards
the space between the conical guide walls, and each

being provided in said mouth for imparting a change of

direction to the gas stream from a mainly purely tangen
tial flow in the spiral duct into a rotating ?ow with a

smaller tangential velocity component in the space be

tween the conical guide walls, wherein the improve
mouth with a small angular spacing and comprise two

vane of said other vane set projecting into the space

between the internal portions of neighbouring vanes of
the ?rst vane set and extending substantially parallel to
tangential planes to these vanes at the internal edges

succeeding sets of stationary guide vanes, the guide

thereof.

ment comprises that the guide vanes are arranged in the

vanes of one set being positioned at the external opening

2. A gas distribution device as claimed in claim 1,

wherein the spacing of the vanes is smaller than the
radial extension of the mouth.

of the mouth towards the spiral duct and being shaped

to deflect the gas stream to a flow direction, for which

the radial velocity component considerably exceeds the

II

15

20

25

30

35

40

45

55

60

65

It

1i

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