This document contains summaries of research papers on vacuum technology and low pressure measurement. It includes:
1) A proposal for a new type of high-speed ion pump using a multipactor cathode that could produce electron emission densities up to 30 times higher than a normal ion pump.
2) A discussion of vacuum pump design, accessories, oils and operating procedures for applications involving corrosive and aggressive materials like those encountered in the semiconductor industry.
3) A calculation of sputtering ion pump speed using theories of magnetic confined gas discharge, sputtering and adsorption, finding the pumping speed formula to be in fairly good agreement with experimental results.
This document contains summaries of research papers on vacuum technology and low pressure measurement. It includes:
1) A proposal for a new type of high-speed ion pump using a multipactor cathode that could produce electron emission densities up to 30 times higher than a normal ion pump.
2) A discussion of vacuum pump design, accessories, oils and operating procedures for applications involving corrosive and aggressive materials like those encountered in the semiconductor industry.
3) A calculation of sputtering ion pump speed using theories of magnetic confined gas discharge, sputtering and adsorption, finding the pumping speed formula to be in fairly good agreement with experimental results.
Original Title
Vacuum Volume 33 Issue 6 1983 [Doi 10.1016%2F0042-207x%2883%2990131-8] -- On Cryosorption Pumping of Hydrogen With ZDB-150 Type Cryopump Cooled by a Two-stage Closed-cycle Refrigerator- Bing-kun Liu Et
This document contains summaries of research papers on vacuum technology and low pressure measurement. It includes:
1) A proposal for a new type of high-speed ion pump using a multipactor cathode that could produce electron emission densities up to 30 times higher than a normal ion pump.
2) A discussion of vacuum pump design, accessories, oils and operating procedures for applications involving corrosive and aggressive materials like those encountered in the semiconductor industry.
3) A calculation of sputtering ion pump speed using theories of magnetic confined gas discharge, sputtering and adsorption, finding the pumping speed formula to be in fairly good agreement with experimental results.
This document contains summaries of research papers on vacuum technology and low pressure measurement. It includes:
1) A proposal for a new type of high-speed ion pump using a multipactor cathode that could produce electron emission densities up to 30 times higher than a normal ion pump.
2) A discussion of vacuum pump design, accessories, oils and operating procedures for applications involving corrosive and aggressive materials like those encountered in the semiconductor industry.
3) A calculation of sputtering ion pump speed using theories of magnetic confined gas discharge, sputtering and adsorption, finding the pumping speed formula to be in fairly good agreement with experimental results.
recommended in the dome method to obtain the intrinsic speed of the
pump. (India) J K N Sbarma and D R Shamsa, Vacuum, 32 (S), 1982, 253-256. 21 5454. Higbqeed ion pump witb a multipctor cntbode-tbe multipactor ion 21 pump. (GB) A new type of high-speed ion pump using a multipactor cathode is proposed and the experimental results, combined with the first trial pump, are described. The multipactor cathode has excellent characteristics as an electron source in order to obtain increased pumping speed of an ion pump, namely: (1) since it is a cold cathode made of pure metal, such as Al, it does not contaminate the vacuum condition, (2) the electron emission density is high, (3) the supply of electrons can be greatly increased in comparison with that of any other supply method, (4) the electrons can be supplied easily into a very wide area. This proposal is to make a high-speed ion pump by combining such an attractive cathode with a normal ion pump. The experimental results showed that the maximum pump current per unit pump volume reached up to 30 times that of a normal ion pump in vacuum conditions of less than 10m4 Pa. (Japan) K Yokoo and S Ow, Vacuum, 32 (S), 1982,265-268. 5455. M&a&al vaeunm pumping equipment for applications involving corrosive and aggressive materials (USA) In chemical environments such as those encountered in the semiconductor industry it is important to specify a complete pumping system including pumps, accessories, oils and an operating procedure. The paper discusses certain features of the pump design that are important in ensuring reliability when pumping aggressive materials. Further the accessories designed to augment the performance of the pump in aggressive situations are discussed with specific data on their performance under controlled conditions. Special attention is given to a range of oils and oil filtration methods, as in most cases it is the results of oil degradation and contamination that cause operating difficulties in aggressive atmospheres. (GB) J Currington et al, J Vat Sci Technol, 20 (4), 1982, 1019-1022. 54% Calculation of sputtering ion pump speed. (USA) 21 Until now, a semiempirical formula S=K(I/P) is widely used to express the pumping speed of a sputtering ion pump. The constant K is decided by experiments. An attempt is made to find this constant by the Schuurmans theory of magnetic confined gas discharge, the theory of sputtering and the Langmuirs theory of adsorption. It is found that K may be expressed as K =4.9 x 10-3Cfu~4[g+2-(gz +4g)], for nitrogen at room tempera- ture in a diode pump, where C is a configuration factor,f is a pressure dependent factor, u, is the anode potential, g = 2.45 x 10-3Cfu,41/P.4, and A is the area of the inner surface of the anode. This relation is in fairly good agreement with experimental results. (China) W Ho R K Wongnnd T P Keng, J Vat Sci Technof, 20 (4). 1982,1010-1013. 21 5457. On cryosorption pumping of bydrogen with the ZDB-150 type cryopump cooled by a two-stage closed-cycle refrigerator. (USA) The ZDB-150 type cryopump with a 150-mm i.d. flange, cooled by a two- stage refrigerator, has been developed for pumping hydrogen, which is the major outgassing product of most metals and the main gas load to be removed in some special applications, such as nuclear fusion. In order to improve the pumping performance of this cryopump for hydrogen, several different configurations and geometries of cryosorption panels were designed and tested. On the other hand, the favourable distribution of the refrigeration capacity and temperature at two cold heads of the refrigerator were also considered and tested. This paper presents the test results on pumping speed and pump capacity for hydrogen with forenamed various considerations. In the selected optimum configuration and condition, the maximum pumping speed and capacity, 2400 1 s- and 11000 torr I, respectively, were reached. It was concluded that enhancing the pumping capability of cryopump for hydrogen is potentially feasible. (China) Bing-kun Liu et al, J Vat Sci Technol, 7.0 (4). 1982, 1000-1004. 21 54%. InlIuence of magnetic fields on a large-sired turbomolecular pump. (USA) Application of turbomolecular pumps in the field of nuclear fusion research and accelerators requires knowledge concerning the temperature rise and the decrease of rotation frequency due to leakage magnetic field. We measured them for pumps OV-TH 5ooo (pumping speed: 5000 I s- ) and OV-TH 500 (500 1 s - i), set in a leakage magnetic field of mirror field coils used for plasma research. The allowable magnetic field is about 100 G for both types, if we take 120C to be tolerable rotor temperature. An effective magnetic shield can be realized by the use of simple permalloy cylinders. (Japan) A Nisbide et al, J Vat Sci Technol, 20 (4), 1982, 1105-l 108. 21 5459. Factors inllueucing tbe ultimate vacuum of single structure vapour pumping groups (USA) N T M Deunls et al, J Vat Sci Technol, 20 (4), 1982, 996999. The single structure vapour pumping group consists of a vapour pump, watercooled baffle and a quarter swing valve mounted in a single casing. Ten years of experience with such pumping groups using polyphenyl ether has shown that they can give a virtually contamination-free vacuum. Potential sources of contamination such as vacuum sealing, pump design, high vacuum valves (their sealing gaskets and mode of operation), and the fore vacuum conditions have been studied using both mass spectrometers and quartz crystal microbalances to determine the low levels of organic contamination that arise in the system from the above sources. It is shown that the precautions taken to ensure a clean vacuum must be more stringent than were previously appreciated. (GB) 22. GAUGES AND MEASUREMENT OF LOW PRESSURES 22 5460. Pressure measurements in magnetic fusion devices. (USA) Accurate pressure measurements are important in magnetic fusion devices for: (1) plasma diagnostic measurements of particle balance and ion temperature; (2) discharge cleaning optimization; (3) vacuum system performance; and (4) tritium accountability. This paper reviews the application, required accuracy and suitable instrumentation for these measurements. Demonstrated used of ionization-type and capacitance- diaphragm gauges for various pressure and gas-flow measurements in tokamaks are presented, with specific reference to the effects of magnetic fields on gauge performance and the problems associated with gauge calibration. H F Dylla, J Vat Sci Technol, 20 (2), 1982, 119-128. 5461. An axbtl-emission ultrabigb vacuum pump. (USA) 22 The BA gauge has been widely used in ultrahigh vacuum systems for many years. However, it has some well-known dlsadvantages. In this paper a new ionization gauge structure, the Axial-Emission gauge (AEG) is described. The filament and the ion collector plate of the AEG are located on the two terminals of a spiral grid, respectively. The sensitivity (for N,) ofthe AEG isO. Pa- (37.5 torr-I). Thedistance between electrodesin the AEG has only a slight eNect on the gauge sensitivity. The variation in sensitivity from gauge to gauge is less than +5x. The x-ray limit of the AEG is 2.67 x 10m9 Pa (2 x lo- torr). The upper limit of linearity (f 5%) has been ascertained to be 5.3 x 1O-2 Pa (4 x 10m4 torr). The electrodes in the AEG are quite simple. Therefore it is easy to degas and can be used on any general purpose uhv system. (China) J Z Chm and C D Suen, J Vat Sci Technol, 20 (I), 1982, 88-91. 22 5462. A report from tbe AVS Standards Committee: Comparison of ion gauge calibrations by several standards laboratories. (USA) Calibrations by four US laboratories of four hot-cathode ion gauges, in the range 0.07-l 3 mPa, showed systematic differences among laboratories that were much larger than the expected error of any one calibration. They also suggested that any of the four gauges tested, if properly packaged and shipped, was able to serve as a transfer standard with probable error of 2%. A second comparison was made of the calibrations by two US laboratories of some other gauges that had also been calibrated by the National Physical Laboratory, England. Results did not permit conclusive determination of whether digerences were due to the laboratories or to changes in the gauges. I Wnrshawsky, J Vat Sci Tech&, Xl (I), 1982, 75-79. 5463. Gas analysis in the ironmaking process. (GB) 22 Knowledge of the composition of process gases in ironworks has always been required to ensure efficient operation. This paper describes the development of an on-line quadrupole mass spectrometer for the analysis of blast furnace off-gas from initial development trials using a prototype instrument up to the present day when production instruments are in operation on all blast furnaces in the British Steel Corporation, 346