Scribd
Upload
514 views1 page

Positive and Negative Photoresist

Positive photoresist becomes more soluble when exposed to UV light, so the exposed areas are washed away, leaving the underlying material exposed. Negative photoresist becomes less soluble when exposed, so the exposed areas remain after development. Positive resist is now more commonly used for integrated circuits as it offers better control for small features.

Uploaded by

Tejas Kumbar
Copyright
© © All Rights Reserved
We take content rights seriously. If you suspect this is your content, claim it here.
Available Formats
Download as PDF, TXT or read online on Scribd
514 views1 page

Positive and Negative Photoresist

Positive photoresist becomes more soluble when exposed to UV light, so the exposed areas are washed away, leaving the underlying material exposed. Negative photoresist becomes less soluble when exposed, so the exposed areas remain after development. Positive resist is now more commonly used for integrated circuits as it offers better control for small features.

Uploaded by

Tejas Kumbar
Copyright
© © All Rights Reserved
We take content rights seriously. If you suspect this is your content, claim it here.
Available Formats
Download as PDF, TXT or read online on Scribd
You are on page 1/ 1

Positive and Negative Photoresist

There are two types of photoresist: positive and negative. For positive resists, the resist is exposed with UV light wherever the
underlying material is to be removed. In these resists, exposure to the UV light changes the chemical structure of the resist so that it
becomes more soluble in the developer. The exposed resist is then washed away by the developer solution, leaving windows of the
bare underlying material. In other words, "whatever shows, goes." The mask, therefore, contains an exact copy of the pattern which is
to remain on the wafer.
Negative resists behave in just the opposite manner. Exposure to the UV light causes the negative resist to become polymerized, and
more difficult to dissolve. Therefore, the negative resist remains on the surface wherever it is exposed, and the developer solution
removes only the unexposed portions. Masks used for negative photoresists, therefore, contain the inverse (or photographic
"negative") of the pattern to be transferred. The figure below shows the pattern differences generated from the use of positive and
negative resist.

Negative resists were popular in the early history of integrated circuit processing, but positive resist gradually became more widely
used since they offer better process controllability for small geometry features. Positive resists are now the dominant type of resist
used in VLSI fabrication processes.

You might also like