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Photo Resists

This document outlines the typical steps in a photolithography process which includes applying an adhesion promoter, applying photoresist, soft baking the resist, exposing the resist, performing optional post-exposure and developing cycles, hard baking the resist, and optionally stabilizing the resist. It also shows the processing sequence for Ag/Se-Ge resists which includes additional deposition and etching steps.

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Kulwant Nagi
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84 views3 pages

Photo Resists

This document outlines the typical steps in a photolithography process which includes applying an adhesion promoter, applying photoresist, soft baking the resist, exposing the resist, performing optional post-exposure and developing cycles, hard baking the resist, and optionally stabilizing the resist. It also shows the processing sequence for Ag/Se-Ge resists which includes additional deposition and etching steps.

Uploaded by

Kulwant Nagi
Copyright
© Attribution Non-Commercial (BY-NC)
We take content rights seriously. If you suspect this is your content, claim it here.
Available Formats
Download as PPT, PDF, TXT or read online on Scribd
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Applying and Developing Photoresist

Dehydration bake

Adhesion promoter application

Resist application

Softbake

Exposure

Post exposure bake*

Develop cycle

Hardbake

Resist stabilization*
*
Optional steps
Typical process flow in a photolithography step.
Advanced Photoresists and Photoresist Processes+

Processing sequence for Ag/Se-Ge resists.

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