JRE Group of Institutions Assignment-1 Sub: Electronics Engineering (EEC-101) Faculty: Gaurav Sinha
JRE Group of Institutions Assignment-1 Sub: Electronics Engineering (EEC-101) Faculty: Gaurav Sinha
Q1. Explain the difference between the conductivity of metal, insulator and semiconductor with the help of energy band diagrams? Q2. Draw the figure and derive an expression for the current density, J, of semiconductor? Q3. A block of silicon is doped with a donor atom density of ND= 4 X 1014 atoms/cm3, and with an acceptor atom density of NA= 3.3 X 1014 atoms/cm3. Determine the resultant densities of free electrons & holes. Q4. A cylindrically shaped section of n-type silicon has a 1 mm length and 0.1 mm2 cross-sectional area. Calculate its conductivity and resistance a) When it is purely intrinsic material? b) When it has a free electron density of n= 8 X 1013/cm3?
Q5. Calculate the free electron density in a 1 mm cube of N-type silicon if its measured resistance is 35k. Q6. Determine the applied voltage required to produce a drift current velocity of 1.2X105 cm/sec in a 0.15mm section of germanium. Q7. A bar of silicon with ni=1.4X1016/m3 is doped with impurity atoms until the hole density p=8.5X1021/m3. The mobility of the electrons and holes are n=0.14m2/Vsec & p=0.05m2/V-sec: a) b) c) Find the electron density, n? Is the material N type or P type? Find the conductivity, ?
Q8. The voltage across a silicon diode (=2, V T=26mV) at room temperature (300K) is 0.7V when 2mA current flows through it. If the voltage increases to 0.75V, calculate: a) the diode current, I?