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Sheet: Dip-In Laser Lithography (Dill)

Dip-in Laser Lithography (DiLL) is a novel 3D nano- and microfabrication technique developed by Nanoscribe that allows for high-resolution 3D patterning along the optical axis by directly dipping the high-NA objective lens into a liquid photoresist that serves as both the immersion medium and photosensitive material. DiLL is especially suitable for fabricating tall structures exceeding the objective's working distance and for patterning on opaque substrates. It offers constant homogeneity along the optical axis and is compatible with Nanoscribe's dedicated photoresists for producing structures over 100 micrometers tall.

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199 views1 page

Sheet: Dip-In Laser Lithography (Dill)

Dip-in Laser Lithography (DiLL) is a novel 3D nano- and microfabrication technique developed by Nanoscribe that allows for high-resolution 3D patterning along the optical axis by directly dipping the high-NA objective lens into a liquid photoresist that serves as both the immersion medium and photosensitive material. DiLL is especially suitable for fabricating tall structures exceeding the objective's working distance and for patterning on opaque substrates. It offers constant homogeneity along the optical axis and is compatible with Nanoscribe's dedicated photoresists for producing structures over 100 micrometers tall.

Uploaded by

muthurajan_h
Copyright
© Attribution Non-Commercial (BY-NC)
We take content rights seriously. If you suspect this is your content, claim it here.
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DATA SHEET

DIP-IN LASER LITHOGRAPHY (DILL)


Dip-in Laser Lithography (DiLL) is a novel concept for nano- and microfabrication developed by Nanoscribe, allowing for three-dimensional (3D) patterning with optimal homogeneity along the optical axis. In the DiLL process, the objective lens is directly dipped into a liquid photoresist which serves as immersion medium and photosensitive material at the same time. The height of structures may even exceed the working distance of the high-NA objective. DiLL is especially suitable for fabricating tall structures (compared to the objective lens working distance) and for high-resolution patterning on opaque substrates.

TECHNOLOGY & FEATURES


Patent-pending Dip-in technology for liquid photoresists Upgrade to Nanoscribe's Photonic Professional lithography systems Constant homogeneity along the optical axis Perfect match with Nanoscribes dedicated IP-L and IP-L 780 photoresist Tall structures with high resolution
100 m

50 m

Gallery of structures manufactured by using DiLL.

40 m

Calculated laser intensity distribution of the laser focus within an indexmatched photoresist.

CONTACT

Nanoscribe GmbH Tel +49 721 60 82 88 40 Hermann-von-Helmholtz-Platz 1 Fax +49 721 60 82 88 48 76344 Eggenstein-Leopoldshafen Germany E-Mail Web [email protected] www.nanoscribe.de

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