Heidelberg Instruments’ Post

Integration of standard #lithography techniques with #multiphoton lithography

Pictured here are two microlens arrays. The 19x19 microlenses and 14x14 inverted microlenses were patterned with the MPO 100, our TPP-Multi-User Tool for 3D Lithography and 3D Microprinting. The frame around it was exposed using the MLA 150 Maskless Aligner. Learn more about both tools on labindiainstruments.com #LabindiaInstruments #Labindia #LabEfficiency #laboratoryequipment  #InnovativeLabSolutions #TechRevolutionLab #laboratory #LabResearchAdvancements #LabindiaTrustedProducts #3Dmicrofabrication #3Dmicroprinting #onephoton #twophoton #2PP #TPP #microfabrication, #microstructures, #nanoscale, #nanotechnology #highresolution #throughput #laserlithography #InnovateWithLabindia #India #Labindia

Despite its unique capacity for three-dimensional fabrication with minimal feature sizes below 100 nm, achieving high throughput with Two-Photon Polymerization (TPP) remains a challenge, when compared to established direct laser writing systems. To unlock the full potential of TPP, Heidelberg Instruments propose a novel approach: the integration of standard lithography techniques with multiphoton lithography.

The dose-to-size—the amount of exposure a specific area receives—in electron beam lithography, is crucial for achieving the desired critical dimensions (CD). Overexposure can oversize patterns, where features become larger than intended, while underexposure can result in underdeveloped or missing features. To optimize your results, it's essential to calibrate the dose for your specific resist and substrate combination, considering factors like resist sensitivity, beam energy, substrate material and pattern density. 🌎 Register for MAEBL 2024 to learn how to calibrate your exposure dose in electron beam lithography: https://www.maebl.org #nano #nanotechnology #nanofabrication #chips #chipsact #ebeam #ebl #electron #workforcedevelopment #semicon #semiconductor #semiconductors #lithography #nanolithography #litho Image credit: "On the trends and application of pattern density dependent isofocal dose of positive resists for 100 keV electron beam lithography," https://lnkd.in/emgQ7T3S, Gerald Lopez, Glen de Villafranca, Sam Griggs, Meredith Metzler, Kevin Lister, LaBella Michael, Chad Eichfeld, Nikola Belic, Uli Hofmann

National Research Council Canada / Conseil national de recherches Canada authors Alexei L. Bogdanov, Jean Lapointe and Jens Schmid, in their paper "Electron-beam lithography for #photonic #waveguide fabrication: Measurement of the effect of field stitching errors on optical performance and evaluation of a new compensation method," deliberately introduced artificial #stitching errors of #SOI-based photonic waveguides to test their multipass exposure methods spanning the field boundaries for stitching error compensation in electron beam lithography (#EBL). Learn how they improved waveguide #optical losses using their multipass technique: https://lnkd.in/eDFFAtCd ✅ It's time to register for MAEBL 2024: https://lnkd.in/epjKQwuy 🔔 Follow MAEBL for more! #nano #nanotechnology #nanofabrication #chips #chipsact #ebeam #ebl #electron #workforcedevelopment #semicon #semiconductor #semiconductors #lithography #nanolithography #litho

New research discusses conventional optical microscopes' limitations and dielectric microspheres' potential to overcome these limitations. It describes a novel 3D microdevice fabricated using femtosecond laser ablation and multi-photon lithography. This device integrates a modified coverslip and a microsphere to achieve enhanced resolution.#Microscopy #SyntecOptics

📢 Foundation for Research and Technology - Hellas (FORTH) is organising a one-day #PhotonHub Demo Centre about Laser-based Additive Micro-Manufacturing for Industrial Applications. 📅 13 November 2024 📍 Heraklion, Greece 👉 https://lnkd.in/eEdssAkd Additive Manufacturing (AM) has established itself as the manufacturing technology of choice in a wide range of industries, from aerospace and automotive to medical devices and photonics. Multiphoton Lithography (MPL) is a laser-based AM technique that enables the 'direct writing' of computer-designed structures with sub-micron resolution. Based on the phenomenon of multiphoton absorption, MPL is the only technique capable of free-form 3D nanoprinting. In this demo, you will: ✔️ Understand the key features of additive micromanufacturing, ✔️ Participate in the fabrication of high-resolution 3D components using custom materials, ✔️ Observe and evaluate working micro-components, such as axicons on fibres (hands-on activity), ✔️ Communicate and seek solutions to specific problems related to additive micromanufacturing. 🎓 Don't miss this opportunity and register your spot now at https://lnkd.in/eEdssAkd. #additive #manufacturing #3Dprinting #microoptics

An essential aspect of running a 3D #microfabrication job shop is #qualitycontrol. Our 3D confocal measuring microscope enables careful analysis of the microlens geometry produced by our Nanoscribe Quantum X Align tool and the quality of the surfaces on which we print. ➤ More about 3D microfabrication at PHIX: https://lnkd.in/eQDd3x6m #3Dprinting #microscopy #microoptics

In electron beam lithography (#EBL), patterns larger than a tool's deflection field are divided into multiple fields. These fields must be aligned (and stitched) to each other and should be the correct size and shape. As mentioned last week, the order in which the fields and shapes within the fields are exposed can ultimately impact the lithography fidelity of your pattern. Tool vendors use different calibration routines to ensure proper field shape and stitching. Be sure you understand how to optimize your fields, field ordering, and within-field exposure of shapes from your vendor. 🌎 Register for MAEBL 2024 to learn more about best practices in electron beam lithography: https://www.maebl.org #nano #nanotechnology #nanofabrication #chips #chipsact #ebeam #ebl #electron #workforcedevelopment #semicon #semiconductor #semiconductors #lithography #nanolithography #litho

We bring light into the darkness… 🔦 Here you can see the black light control of the first ZEISS projection optics for the High-NA-EUV lithography. The heart of the lithography machine consists of more than 40,000 parts and weighs around twelve tons. 💙🎉💪 The High-NA-EUV lithography is the further development of EUV lithography. At 0.55, the numerical aperture (NA) for High-NA-EUV lithography is significantly larger than the previous EUV generation's 0.33. This allows up to three times more structures on a microchip. 🔍📏 With that, Moore's Law will continue beyond 2030. 💡 More information about the High-NA-EUV lithography https://lnkd.in/e4XS6FCF 👀 Stay tuned for more content on High-NA-EUV lithography here on our channel! #highNAEUV #lithography