“I worked with Amit for nearly 4 & half years during my graduate studies in Rensselaer Polytechnic Institute. Amit is a smart, hard-working and intelligent person with a very keen sense for details. He is known to grasp things quickly and is an excellent source of guidance and motivation for his team members. I really admire the way Amit approached challenges and opportunities graduate life provided. He went above and beyond the expectations for a typical graduate student. He has an excellent publication track record and academic background which attests his abilities to excel in any given field. He has a wonderfully warm and engaging personality, makes friends easily, and is always in good spirits. It was my pleasure to work and collaborate with him on many occasions. Amit is an excellent talent and a solid team player. I am sure he will be a major asset to any organization or business. I strongly recommend Amit and hope to work with him in the future.”
Activity
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Check out the latest launch by Backbone in collaboration with Post Malone!!
Check out the latest launch by Backbone in collaboration with Post Malone!!
Shared by Amit Singh
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I’m thrilled to announce that I will be speaking next week at the upcoming #LetiDays event at CEA-Leti in Grenoble, France. I'll try to address the…
I’m thrilled to announce that I will be speaking next week at the upcoming #LetiDays event at CEA-Leti in Grenoble, France. I'll try to address the…
Liked by Amit Singh
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Thank you Ilya Bukshteyn was great to hear your insights and the Microsoft teams for our great multi year partnership and collaboration. Together we…
Thank you Ilya Bukshteyn was great to hear your insights and the Microsoft teams for our great multi year partnership and collaboration. Together we…
Liked by Amit Singh
Licenses & Certifications
Publications
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Selective deposition of a cross-linked low-permittivity polycarbosilane on copper
ACS Applied Materials & Interfaces 2 (8), 2180-2184
Other authors -
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Effects of silylation on fracture and mechanical properties of mesoporous silica films interfaced with copper
Journal of Applied Physics 106 (5), 054502
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Pore orientation and silylation effects on mesoporous silica film properties
Applied Physics Letters 94 (9), 093502
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High-coercivity FePt nanoparticle assemblies embedded in silica thin films
Nanotechnology 20 (2), 025609
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Stabilization of mesoporous silica films using multiple organosilanes
Applied Physics Letters 92 (11), 113516
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Thermal stability of molecularly functionalized mesoporous silica thin films
Journal of Applied Physics 102 (4), 4507
Other authors -
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Diffusion barrier properties of carboxyl-and amine-terminated molecular nanolayers
Applied physics letters 85, 579
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Annealing-induced interfacial toughening using a molecular nanolayer
Nature Publishing Group
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Copper diffusion and mechanical toughness at Cu-silica interfaces glued with polyelectrolyte nanolayers
Journal of applied physics 101 (8), 4505
Other authors -
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Suppression of chemical and electrical instabilities in mesoporous silica films by molecular capping
Journal of applied physics 100 (11), 114504
Mesoporous silica (MPS) thin films are attractive for achieving low relative dielectricpermittivity (low k) interlayer isolation in integrated circuit wiring, but are susceptible to instabilities in electrical behavior due to water uptake and copper diffusion. Here, we show that capping MPS films with a trimethyl-group terminated organosilane layer irreversibly suppresses moisture-induced capacitance instabilities, and decreases the relative dielectricpermittivity and Cu-induced leakage…
Mesoporous silica (MPS) thin films are attractive for achieving low relative dielectricpermittivity (low k) interlayer isolation in integrated circuit wiring, but are susceptible to instabilities in electrical behavior due to water uptake and copper diffusion. Here, we show that capping MPS films with a trimethyl-group terminated organosilane layer irreversibly suppresses moisture-induced capacitance instabilities, and decreases the relative dielectricpermittivity and Cu-induced leakage currents. Analysis of capacitance-voltage and current-voltage characteristics along with infrared spectroscopy shows that the trimethyl organosilanes inhibit hydrogen bonding of water molecules by rendering the dielectricsurfaces hydrophobic. These features are promising for tailoring the chemical and interfacial properties and reliability of porous dielectric materials for insulation in device wiring applications.
Other authors -
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Moisture-induced capacitance-voltage instabilities in mesoporous silica thin films
Applied Physics Letters 87 (25), 3506
Courses
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Advanced Mechanical Properties
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Advanced Solid State Physics
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Advanced Structures
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Defects in Solids
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IC Fabrication laboratory
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Light Emitting Triodes
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Materials Characterization
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Mechanics of Thin films
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Optoelectronics
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Physical Fundamentals of Solid State Devices
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Semiconductor Device Modeling
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Semiconductor Materials
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VLSI Fabrication Technology
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Recommendations received
1 person has recommended Amit
Join now to viewMore activity by Amit
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Come join USAA, a mission driven company, to serve who…
Come join USAA, a mission driven company, to serve who…
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Global #shippingrates are going up again. Main reasons are #drought in #Panamacanal, #middleeast instability and #pirateattacks. Another reason why…
Global #shippingrates are going up again. Main reasons are #drought in #Panamacanal, #middleeast instability and #pirateattacks. Another reason why…
Liked by Amit Singh
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Exciting News: Hinge Health is Going Global! 🌍 We are thrilled to announce the launch of Hinge Health Global in Canada, the UK, Ireland, France…
Exciting News: Hinge Health is Going Global! 🌍 We are thrilled to announce the launch of Hinge Health Global in Canada, the UK, Ireland, France…
Liked by Amit Singh
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After the best part of 10 years, last Friday marked my last day at Hinge Health. And what a ride. - Back in the autumn of 2014 we started hacking…
After the best part of 10 years, last Friday marked my last day at Hinge Health. And what a ride. - Back in the autumn of 2014 we started hacking…
Liked by Amit Singh
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Thank you to Jonathan Morgan and the #StrategyGap team for having me on their podcast. Enjoyed speaking about BizOps and the process of strategy…
Thank you to Jonathan Morgan and the #StrategyGap team for having me on their podcast. Enjoyed speaking about BizOps and the process of strategy…
Liked by Amit Singh
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