Resist

In semiconductor fabrication, a resist is a thin layer used to transfer a circuit pattern to the semiconductor substrate which it is deposited upon. A resist can be patterned via lithography to form a (sub)micrometer-scale, temporary mask that protects selected areas of the underlying substrate during subsequent processing steps. The material used to prepare said thin layer is typically a viscous solution. Resists are generally proprietary mixtures of a polymer or its precursor and other small molecules (e.g. photoacid generators) that have been specially formulated for a given lithography technology. Resists used during photolithography are called photoresists.

Background

Semiconductor devices (as of 2005) are built by depositing and patterning many thin layers. The patterning steps, or lithography, define the function of the device and the density of its components.

For example, in the interconnect layers of a modern microprocessor, a conductive material (copper or aluminum) is inlaid in an electrically insulating matrix (typically fluorinated silicon dioxide or another low-k dielectric). The metal patterns define multiple electrical circuits that are used to connect the microchip's transistors to one another and ultimately to external devices via the chip's pins.

Resist (album)

Resist is the debut album by English electronica group Kosheen. The album was first released on June 25, 2001 in the Benelux countries as a Benelux Limited Edition by Moksha Records. The U.K. edition was then released on September 17 as a sixteen-track record by Sony BMG. The Japanese edition, released in 2003, was a Double-CD set containing fifteen B-sides and Remixes, plus the exclusive track "Tell Me".

Track listings

Trivia

The BBC used the song "Catch" in trailers for Season 1 of 24.

References

Resist (disambiguation)

Resist may refer to:

See also

OPM

OPM may refer to:

Organizations

Science and technology

Entertainment

Music

OPM (band)

OPM is an American band based in Los Angeles, California. OPM has a distinctive sound, combining hip hop, rock music, and pop with laid-back reggae.

Band history

Originally called "Stash", the name OPM, according to the band's frontman John E. Necro, is an abbreviation of the phrase "Open People's Minds" (originally "Other People's Money"). This was stated during an interview with MarijuanaRadio.com. The name also sounds like the drug opium. The band's original members were John E. Necro, Matthew Meschery and Geoff Turney, with Gary Dean and Etienne Franc later appointed permanent members in 2001. John E. and Geoff aka Casper first met on a bus ride through 2 girls they were dating in 1996. At the time John E. was a label scout at Island Records and Geoff was in a band called "Alpha Jerk". In 1997 John E. invited Geoff to do some recordings with him and his then brother-in-law Matthew Meschery. After 2 years they finally managed to start writing songs and sent a 3 track demo to Atlantic Records, leading them to get signed despite having never played live together. OPM released their debut album, Menace to Sobriety, in August 2000 on Atlantic Records. Their debut single "Heaven Is a Halfpipe" charted worldwide and won the Kerrang! Award for Best Single. They performed their hit single on Top of the Pops on July 20, 2001.

OPM3

The Organizational Project Management Maturity Model or OPM3® is a globally recognized best-practice standard for assessing and developing capabilities in executing strategy through projects via Portfolio Management, Program Management, and Project Management. It is published by the Project Management Institute (PMI). OPM3 provides a method for organizations to understand their Organizational Project Management processes and practices, and to make these processes capable of performing successfully, consistently, and predictably. OPM3 helps organizations develop a roadmap that the company will follow to improve performance. The Second Edition (2008) was recognized by the American National Standards Institute (ANSI) as an American National Standard (ANSI/PMI 08-004-2008). The Third Edition was published in 2013.

History

In 1998, PMI chartered a team named the OPM3 Program to develop an Organizational Project Management Maturity Model to be a global standard for Organizational Project Management (OPM). During development, part of that team of volunteers analyzed twenty-seven existing models and deployed surveys repeatedly to 30,000 practitioners. The concept of maturity model had been popularized through the Capability Maturity Model or CMM for software development that was created by the Software Engineering Institute (SEI) of Carnegie Mellon University between 1986 and 1993. The volunteer OPM3 model review team reviewed CMM and other models to understand the scope of each model, capabilities of each model, methodology for conducting assessments against each model, each model's structure, and each model's implementation procedures. The analysis concluded that existing models left many important questions about Organizational Project Management (OPM) maturity unanswered and that the team should proceed with the development of an original model through the sponsorship of PMI.