Semiconductor vertical furnaces are used in the semiconductor manufacturing process to perform deposition and oxidation on wafers. To increase the equipment throughput, a shorter process time is one of the criteria needed. To achieve this, this paper presents a control method consists of fast mode and tracking mode. The fast mode utilizes the maximum capacity of the actuators and is implemented as time-optimal control using binary search algorithm. The tracking mode is introduced to maintain constant temperature and deal with inaccuracies in the fast mode caused by plant unmodeled dynamics and time discretization. It is implemented as a two-degree-of-freedom control. Simulation results have shown that shorter rising time and settling time can be achieved by the fast mode and tracking mode respectively, resulting in the reduction of total process time.