Nano-Crystallization of High-Entropy Amorphous NbTiAlSiWxNy Films Prepared by Magnetron Sputtering
Abstract
:1. Introduction
2. Experiment Details
3. Results and Discussion
3.1. Chemical Composition
3.2. Structure and Thermal Stability
3.3. Mechanical Properties
4. Conclusions
Acknowledgments
Author Contributions
Conflicts of Interest
References
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Element (at.%) | Nb | Ti | Al | Si | W |
---|---|---|---|---|---|
Nominal (target) | 20 | 20 | 20 | 20 | 20 |
Actual (film) (deviation = ±0.5%) | 19.8 | 21.1 | 20.2 | 20.5 | 18.4 |
Nb | Ti | Al | W | NbN | TiN | AlN | |
---|---|---|---|---|---|---|---|
Lattice constant () | 3.371 | a = 2.950; c = 4.686 | 4.050 | 3.158 | 4.40 | 4.24 | 4.04 |
Atomic radius () [21] | 1.429 | 1.462 | 1.432 | 1.3367 | - | - | - |
Structure | BCC | HCP | FCC | BCC | FCC | FCC | HCP |
Composition | Method | Duration (°C) | Holding Time | Reference |
---|---|---|---|---|
(TiVCrZrHf)N | sputtering | 300 | 2 h in air | [23] |
AlxCo1Cr1Cu1Fe1Ni1 | sputtering | 600 | 20 min vacuum | [24] |
(AlBCrSiTi)N | sputtering | 700 | 2 h vacuum | [25] |
TaNbTiW | sputtering | 700 | 90 min vacuum | [26] |
6FeNiCoCrAlTiSi | laser cladding | 750 | 5 h vacuum | [27] |
(NbTiAlSiW)Nx | sputtering | 700 | 24 h vacuum | this work |
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Sheng, W.; Yang, X.; Wang, C.; Zhang, Y. Nano-Crystallization of High-Entropy Amorphous NbTiAlSiWxNy Films Prepared by Magnetron Sputtering. Entropy 2016, 18, 226. https://doi.org/10.3390/e18060226
Sheng W, Yang X, Wang C, Zhang Y. Nano-Crystallization of High-Entropy Amorphous NbTiAlSiWxNy Films Prepared by Magnetron Sputtering. Entropy. 2016; 18(6):226. https://doi.org/10.3390/e18060226
Chicago/Turabian StyleSheng, Wenjie, Xiao Yang, Cong Wang, and Yong Zhang. 2016. "Nano-Crystallization of High-Entropy Amorphous NbTiAlSiWxNy Films Prepared by Magnetron Sputtering" Entropy 18, no. 6: 226. https://doi.org/10.3390/e18060226