Tunable semimetallic state in compressive-strained SrIrO3 films revealed by transport behavior

Lunyong Zhang, Qifeng Liang, Ye Xiong, Binbin Zhang, Lei Gao, Handong Li, Y. B. Chen, Jian Zhou, Shan-Tao Zhang, Zheng-Bin Gu, Shu-hua Yao, Zhiming Wang, Yuan Lin, and Yan-Feng Chen
Phys. Rev. B 91, 035110 – Published 9 January 2015; Erratum Phys. Rev. B 92, 039904 (2015)
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Abstract

Orthorhombic SrIrO3 is a typical spin-orbit-coupled correlated metal that shows diversified physical properties under external stimuli. Here the nonlinear Hall effect and weakly temperature-dependent resistance are observed in a SrIrO3 film epitaxially grown on a SrTiO3 substrate. It infers that orthorhombic SrIrO3 is a semimetal oxide. However, a linear Hall effect and insensitive-temperature-dependent resistance are observed in SrIrO3 films grown on (La,Sr)(Al,Ta)O3 (LSAT) substrates, suggesting a tunable semimetallic state due to a band structure change in SrIrO3 films under different compressive strains. The mechanism of this evolution is explored in detail through a strain-state analysis by reciprocal space mapping and electron diffraction, carrier density and mobility calculations, as well as electronic band structure evolution under compressive strain (predicted by a tight-binding approximation). It might suggest that the strain-induced band shift leads to semimetallic tuning in the SrIrO3 film grown on SrTiO3 to LSAT substrates. Our findings illustrate the tunability of SrIrO3 properties and pave the way to induce different physical states in SrIrO3, such as the proposed topological insulator state in heterostructures.

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  • Received 18 June 2014
  • Revised 8 October 2014

DOI:https://doi.org/10.1103/PhysRevB.91.035110

©2015 American Physical Society

Erratum

Erratum: Tunable semimetallic state in compressive-strained SrIrO3 films revealed by transport behavior [Phys. Rev. B 91, 035110 (2015)]

Lunyong Zhang, Qifeng Liang, Ye Xiong, Binbin Zhang, Lei Gao, Handong Li, Y. B. Chen, Jian Zhou, Shan-Tao Zhang, Zheng-Bin Gu, Shu-hua Yao, Zhiming Wang, Yuan Lin, and Yan-Feng Chen
Phys. Rev. B 92, 039904 (2015)

Authors & Affiliations

Lunyong Zhang1,*, Qifeng Liang2, Ye Xiong3, Binbin Zhang1, Lei Gao4, Handong Li4, Y. B. Chen5,†, Jian Zhou1, Shan-Tao Zhang1, Zheng-Bin Gu1, Shu-hua Yao1,‡, Zhiming Wang4, Yuan Lin4, and Yan-Feng Chen1

  • 1National Laboratory of Solid State Microstructures and Department of Materials Science and Engineering, Nanjing University, Nanjing 210093, People's Republic of China
  • 2Department of Physics, Shaoxing University, Shaoxing 312000, People's Republic of China
  • 3College of Physical Science and Technology, Nanjing Normal University, Nanjing 210093, People's Republic of China
  • 4State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, People's Republic of China
  • 5National Laboratory of Solid State Microstructures and Department of Physics, Nanjing University, Nanjing 210093, People's Republic of China

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Issue

Vol. 91, Iss. 3 — 15 January 2015

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