BibTeX record journals/tcad/YangLDMYY20

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@article{DBLP:journals/tcad/YangLDMYY20,
  author       = {Haoyu Yang and
                  Shuhe Li and
                  Zihao Deng and
                  Yuzhe Ma and
                  Bei Yu and
                  Evangeline F. Y. Young},
  title        = {{GAN-OPC:} Mask Optimization With Lithography-Guided Generative Adversarial
                  Nets},
  journal      = {{IEEE} Trans. Comput. Aided Des. Integr. Circuits Syst.},
  volume       = {39},
  number       = {10},
  pages        = {2822--2834},
  year         = {2020},
  url          = {https://doi.org/10.1109/TCAD.2019.2939329},
  doi          = {10.1109/TCAD.2019.2939329},
  timestamp    = {Tue, 06 Oct 2020 17:44:07 +0200},
  biburl       = {https://dblp.org/rec/journals/tcad/YangLDMYY20.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}