BibTeX record journals/mj/HuLSZNCBZ11

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@article{DBLP:journals/mj/HuLSZNCBZ11,
  author       = {Zhiyuan Hu and
                  Zhangli Liu and
                  Hua Shao and
                  Zhengxuan Zhang and
                  Bingxu Ning and
                  Ming Chen and
                  Dawei Bi and
                  Shichang Zou},
  title        = {Impact of within-wafer process variability on radiation response},
  journal      = {Microelectron. J.},
  volume       = {42},
  number       = {6},
  pages        = {883--888},
  year         = {2011},
  url          = {https://doi.org/10.1016/j.mejo.2011.04.001},
  doi          = {10.1016/J.MEJO.2011.04.001},
  timestamp    = {Sat, 22 Feb 2020 19:34:14 +0100},
  biburl       = {https://dblp.org/rec/journals/mj/HuLSZNCBZ11.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}