"Remote charge scattering: a full Coulomb interaction approach and its ..."

Kangliang Wei et al. (2014)

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DOI: 10.1007/S11432-013-4810-0

access: closed

type: Journal Article

metadata version: 2020-03-02

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Kangliang Wei, James Egley, Xiaoyan Liu, Gang Du:
Remote charge scattering: a full Coulomb interaction approach and its impact on silicon nMOS FinFETs with HfO2 gate dielectric. Sci. China Inf. Sci. 57(2): 1-9 (2014)

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