Investigation of stress in shallow trench isolation using UV micro-Raman spectroscopy - Kai F. Dombrowski; B. Dietrich; Ingrid De Wolf; R. Rooyackers; G. Badenes (Microelectron. Reliab., 2001)

Impact of gate oxide nitridation process on 1/f noise in 0.18 mum CMOS - M. Da Rold; Eddy Simoen; Sofie Mertens; Marc Schaekers; G. Badenes; Stefaan Decoutere (Microelectron. Reliab., 2001)