Formation mechanism of sidewall striation in high-aspect-ratio hole etching

詳細情報 詳細情報について

• CRID

  1360566399836119296

• NII論文ID

  210000156100

• DOI

  10.7567/1347-4065/ab163c

• ISSN

  13474065

  00214922

• Web Site

  https://iopscience.iop.org/article/10.7567/1347-4065/ab163c/pdf

  https://iopscience.iop.org/article/10.7567/1347-4065/ab163c

• データソース種別

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