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The impact of H$_2$ and N$_2$ on the material properties and secondary electron yield of sputtered amorphous carbon films for anti-multipacting applications / Fernández, H Moreno (CERN) ; Himmerlich, M (CERN) ; Costa Pinto, P (CERN) ; Coroa, J (CERN) ; Sousa, D (Nova U., Lisboa) ; Baris, A (CERN) ; Taborelli, M (CERN)
Amorphous carbon thin films were prepared by direct current hollow cathode sputter deposition in Ar discharge with the injection of small amounts of H$_2$ and/or N$_2$. The influence of these additives on the film properties with particular focus on the application as a coating for electron cloud mitigation in particle accelerators is characterized by optical spectroscopy, X-ray photoelectron spectroscopy, and secondary electron yield (SEY) measurements. [...]
2021 - 10 p. - Published in : Appl. Surf. Sci. 542 (2021) 148552

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