CERN Accelerating science

Article
Title	Optimal preamorphization conditions for the formation of highly activated ultra shallow junctions in Silicon-On-Insulator
Author(s)	Hamilton, J J ; Collart, E J H ; Bersani, M ; Giubertoni, D ; Gennaro, S ; Bennett, N S ; Cowern, N E B ; Kirkby, K J
Publication	2006
In:	AIP Conf. Proc. 866 (2006) pp.73-75
In:	16th International Conference on Ion Implantation Technology, Marseilles, France, 11 - 16 Jun 2006, pp.73-75